journal of micro nanolithography mems and moems
VOL. 11 · NO. 1 | January 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(1), 010101 (6 April 2012) https://doi.org/10.1117/1.JMM.11.1.010101
TOPICS: Lithography, Optical engineering, Optics manufacturing, Semiconductor manufacturing, Applied physics, Microfabrication, Microsystems, Microelectromechanical systems, Microopto electromechanical systems, Optical lithography
Special Section on Dimensional Metrology with Atomic Force Microscopy: Instruments and Applications
J. Micro/Nanolith. MEMS MOEMS 11(1), 011001 (24 February 2012) https://doi.org/10.1117/1.JMM.11.1.011001
TOPICS: Atomic force microscopy, Dimensional metrology, Metrology, Microscopy, Analytical research, Biological research, Materials science, Cell biology, Nanostructures, Interferometry
Virpi Korpelainen, Jeremias Seppä, Antti Lassila
J. Micro/Nanolith. MEMS MOEMS 11(1), 011002 (28 February 2012) https://doi.org/10.1117/1.JMM.11.1.011002
TOPICS: Calibration, Error analysis, Metrology, Atomic force microscopy, Interferometers, Atomic force microscope, Interferometry, Time metrology, Standards development, Statistical analysis
J. Micro/Nanolith. MEMS MOEMS 11(1), 011003 (2 March 2012) https://doi.org/10.1117/1.JMM.11.1.011003
TOPICS: Metrology, Sensors, Atomic force microscopy, Scanning probe microscopes, Quartz, Frequency modulation, Scanning probe microscopy, Fermium, Mirrors, Interferometers
Gaoliang Dai, Wolfgang Hässler-Grohne, Dorothee Hueser, Helmut Wolff, Jens Flügge, Harald Bosse
J. Micro/Nanolith. MEMS MOEMS 11(1), 011004 (29 February 2012) https://doi.org/10.1117/1.JMM.11.1.011004
TOPICS: Atomic force microscopy, 3D metrology, Critical dimension metrology, Metrology, Digital signal processing, Photomasks, Calibration, Signal processing, Signal detection, Line width roughness
J. Micro/Nanolith. MEMS MOEMS 11(1), 011005 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.011005
TOPICS: Ferroelectric materials, Calibration, Metrology, Interferometers, Atomic force microscopy, Atomic force microscope, Transducers, Mirrors, Sensors, Motion measurement
Ronald Dixson, Ndubuisi Orji, Craig McGray, John Bonevich, Jon Geist
J. Micro/Nanolith. MEMS MOEMS 11(1), 011006 (8 March 2012) https://doi.org/10.1117/1.JMM.11.1.011006
TOPICS: Calibration, Atomic force microscopy, Atomic force microscope, Standards development, Transmission electron microscopy, Crystals, Metrology, Semiconductor manufacturing, Dimensional metrology, Nanotechnology
J. Micro/Nanolith. MEMS MOEMS 11(1), 011007 (29 February 2012) https://doi.org/10.1117/1.JMM.11.1.011007
TOPICS: Particles, Nanoparticles, Atomic force microscopy, Metrology, Gold, Image analysis, Statistical analysis, Image processing, Reliability, Microscopy
Donald Chernoff, David Burkhead
J. Micro/Nanolith. MEMS MOEMS 11(1), 011008 (29 March 2012) https://doi.org/10.1117/1.JMM.11.1.011008
TOPICS: Calibration, Atomic force microscopy, Metrology, Magnetism, Microscopes, Data storage, Standards development, Scanners, Microscopy, Data modeling
Masahiro Watanabe, Shuichi Baba, Toshihiko Nakata, Takafumi Morimoto, Satoshi Sekino, Hiroshi Itoh
J. Micro/Nanolith. MEMS MOEMS 11(1), 011009 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.011009
TOPICS: Atomic force microscope, Carbon nanotubes, Atomic force microscopy, Silicon, Calibration, Cadmium, Sensors, Signal detection, Eye, Distortion
J. Micro/Nanolith. MEMS MOEMS 11(1), 011010 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.011010
TOPICS: Metrology, Atomic force microscopy, Nanotechnology, Critical dimension metrology, Transmission electron microscopy, Scanning electron microscopy, Semiconductors, Silicon, Coating, Silicon carbide
Aaron Cordes, Benjamin Bunday, Eric Cottrell
J. Micro/Nanolith. MEMS MOEMS 11(1), 011011 (24 February 2012) https://doi.org/10.1117/1.JMM.11.1.011011
TOPICS: Critical dimension metrology, Semiconducting wafers, Atomic force microscopy, Calibration, Scanning electron microscopy, Metrology, Manufacturing, Silicon, Photoresist materials, Standards development
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 11(1), 013001 (21 March 2012) https://doi.org/10.1117/1.JMM.11.1.013001
TOPICS: Semiconducting wafers, Distortion, Overlay metrology, Lithography, Optical lithography, Scanners, Thin films, Finite element methods, Thin film deposition, Error analysis
J. Micro/Nanolith. MEMS MOEMS 11(1), 013002 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.013002
TOPICS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters
J. Micro/Nanolith. MEMS MOEMS 11(1), 013003 (1 March 2012) https://doi.org/10.1117/1.JMM.11.1.013003
TOPICS: Lithography, Photomasks, Optical lithography, Communication theory, Image processing, Channel projecting optics, Materials processing, Double patterning technology, Extreme ultraviolet, Diffraction
Oliver Rudolph, Peter Evanschitzky, Andreas Erdmann, Eberhard Bär, Jürgen Lorenz
J. Micro/Nanolith. MEMS MOEMS 11(1), 013004 (23 February 2012) https://doi.org/10.1117/1.JMM.11.1.013004
TOPICS: Photomasks, Line width roughness, Spatial frequencies, Electromagnetism, Critical dimension metrology, Near field, Line edge roughness, Waveguides, Lithography, Artificial intelligence
J. Micro/Nanolith. MEMS MOEMS 11(1), 013005 (23 February 2012) https://doi.org/10.1117/1.JMM.11.1.013005
TOPICS: Sensors, Microfluidics, Capacitance, Oxygen, Transmittance, Plasma, Electrodes, Mechanical sensors, Plasma treatment, Transparent conductors
Chenniappan Venkatesh, Navakanta Bhat, K. Vinoy, Satish Grandhi
J. Micro/Nanolith. MEMS MOEMS 11(1), 013006 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.013006
TOPICS: Capacitance, Microelectromechanical systems, High dynamic range imaging, Capacitors, Photomicroscopy, Scanning electron microscopy, Resistance, Resistors, Device simulation, Actuators
Muhammad Rizwan Saleem, Petri Stenberg, Seppo Honkanen, Jari Turunen, Muhammad Bilal Khan, Zaffar Muhammad Khan
J. Micro/Nanolith. MEMS MOEMS 11(1), 013007 (2 March 2012) https://doi.org/10.1117/1.JMM.11.1.013007
TOPICS: Etching, Silicon, Hydrogen, Reflectivity, Polymers, Nanophotonics, Photoresist processing, Electron beams, Heat treatments, Reactive ion etching
Bidhan Pramanick, Soumen Das, Tarun Bhattacharyya
J. Micro/Nanolith. MEMS MOEMS 11(1), 013008 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.013008
TOPICS: Actuators, Silicon, Photography, Semiconducting wafers, Microelectromechanical systems, Metals, Navigation systems, Glasses, Control systems, Ions
J. Micro/Nanolith. MEMS MOEMS 11(1), 013009 (13 March 2012) https://doi.org/10.1117/1.JMM.11.1.013009
TOPICS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology
Bradley Morgenfeld, Ian Stobert, Ju Jin An, Massud Aminpur, Colin Brodsky, Alan Thomas, Henning Haffner, Martin Ostermayr, Hideki Kanai, Norman Chen
J. Micro/Nanolith. MEMS MOEMS 11(1), 013010 (19 March 2012) https://doi.org/10.1117/1.JMM.11.1.013010
TOPICS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design
Mohammad Malekmohammad, Mohammad Soltanolkotabi, Mohammad Naderi, Reza Asadi, Alireza Erfanian, M. Zahedinejad, Mahdi Khaje, Shahin Bagheri
J. Micro/Nanolith. MEMS MOEMS 11(1), 013011 (21 March 2012) https://doi.org/10.1117/1.JMM.11.1.013011
TOPICS: Silicon, Reflectivity, Antireflective coatings, Refractive index, Nanolithography, Lithography, Finite-difference time-domain method, Scanning electron microscopy, Polarization, Photonic crystals
Nazar Ileri, Pieter Stroeve, Ahmet Palazoglu, Roland Faller, Hoang Nguyen, Jerald Britten, Sonia Letant, Joseph Tringe, Saleem Zaidi
J. Micro/Nanolith. MEMS MOEMS 11(1), 013012 (22 March 2012) https://doi.org/10.1117/1.JMM.11.1.013012
TOPICS: Silicon, Etching, Semiconducting wafers, Diffusion, Lithography, Scanning electron microscopy, Molecules, Manufacturing, Plasma etching, Nanolithography
Waseem Raja, Michael Padgen, James Williams, James Castracane, Frank Gertler, Jeffrey Wyckoff, John Condeelis
J. Micro/Nanolith. MEMS MOEMS 11(1), 013013 (29 March 2012) https://doi.org/10.1117/1.JMM.11.1.013013
TOPICS: Electrodes, Cancer, Tumors, Hypoxia, In vivo imaging, In vitro testing, Control systems, Gold, Glasses, Oxygen
Errata
Mohammad Moghimi, B. Jeffrey Lutzenberger, David Dickensheets, Brant Kaylor
J. Micro/Nanolith. MEMS MOEMS 11(1), 019801 (13 March 2012) https://doi.org/10.1117/1.JMM.11.1.019801
TOPICS: Monochromatic aberrations, Microopto electromechanical systems, Deformable mirrors, Microscopy, Computer engineering, Photonics, Zernike polynomials, Spherical lenses
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