Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 11 · NO. 1 | January 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(1), 010101 (6 April 2012) https://doi.org/10.1117/1.JMM.11.1.010101
TOPICS: Lithography, Optical engineering, Optics manufacturing, Semiconductor manufacturing, Applied physics, Microfabrication, Microsystems, Microelectromechanical systems, Microopto electromechanical systems, Optical lithography
Special Section on Dimensional Metrology with Atomic Force Microscopy: Instruments and Applications
J. Micro/Nanolith. MEMS MOEMS 11(1), 011001 (24 February 2012) https://doi.org/10.1117/1.JMM.11.1.011001
TOPICS: Atomic force microscopy, Dimensional metrology, Metrology, Microscopy, Analytical research, Biological research, Materials science, Cell biology, Nanostructures, Interferometry
J. Micro/Nanolith. MEMS MOEMS 11(1), 011002 (28 February 2012) https://doi.org/10.1117/1.JMM.11.1.011002
TOPICS: Calibration, Error analysis, Metrology, Atomic force microscopy, Interferometers, Atomic force microscope, Interferometry, Time metrology, Standards development, Statistical analysis
J. Micro/Nanolith. MEMS MOEMS 11(1), 011003 (2 March 2012) https://doi.org/10.1117/1.JMM.11.1.011003
TOPICS: Metrology, Sensors, Atomic force microscopy, Scanning probe microscopes, Quartz, Frequency modulation, Scanning probe microscopy, Fermium, Mirrors, Interferometers
J. Micro/Nanolith. MEMS MOEMS 11(1), 011004 (29 February 2012) https://doi.org/10.1117/1.JMM.11.1.011004
TOPICS: Atomic force microscopy, 3D metrology, Critical dimension metrology, Metrology, Digital signal processing, Photomasks, Calibration, Signal processing, Signal detection, Line width roughness
J. Micro/Nanolith. MEMS MOEMS 11(1), 011005 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.011005
TOPICS: Ferroelectric materials, Calibration, Metrology, Interferometers, Atomic force microscopy, Atomic force microscope, Transducers, Mirrors, Sensors, Motion measurement
J. Micro/Nanolith. MEMS MOEMS 11(1), 011006 (8 March 2012) https://doi.org/10.1117/1.JMM.11.1.011006
TOPICS: Calibration, Atomic force microscopy, Atomic force microscope, Standards development, Transmission electron microscopy, Crystals, Metrology, Semiconductor manufacturing, Dimensional metrology, Nanotechnology
J. Micro/Nanolith. MEMS MOEMS 11(1), 011007 (29 February 2012) https://doi.org/10.1117/1.JMM.11.1.011007
TOPICS: Particles, Nanoparticles, Atomic force microscopy, Metrology, Gold, Image analysis, Statistical analysis, Image processing, Reliability, Microscopy
J. Micro/Nanolith. MEMS MOEMS 11(1), 011008 (29 March 2012) https://doi.org/10.1117/1.JMM.11.1.011008
TOPICS: Calibration, Atomic force microscopy, Metrology, Magnetism, Microscopes, Data storage, Standards development, Scanners, Microscopy, Data modeling
J. Micro/Nanolith. MEMS MOEMS 11(1), 011009 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.011009
TOPICS: Atomic force microscope, Carbon nanotubes, Atomic force microscopy, Silicon, Calibration, Cadmium, Sensors, Signal detection, Eye, Distortion
J. Micro/Nanolith. MEMS MOEMS 11(1), 011010 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.011010
TOPICS: Metrology, Atomic force microscopy, Nanotechnology, Critical dimension metrology, Transmission electron microscopy, Scanning electron microscopy, Semiconductors, Silicon, Coating, Silicon carbide
J. Micro/Nanolith. MEMS MOEMS 11(1), 011011 (24 February 2012) https://doi.org/10.1117/1.JMM.11.1.011011
TOPICS: Critical dimension metrology, Semiconducting wafers, Atomic force microscopy, Calibration, Scanning electron microscopy, Metrology, Manufacturing, Silicon, Photoresist materials, Standards development
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 11(1), 013001 (21 March 2012) https://doi.org/10.1117/1.JMM.11.1.013001
TOPICS: Semiconducting wafers, Distortion, Overlay metrology, Lithography, Optical lithography, Scanners, Thin films, Finite element methods, Thin film deposition, Error analysis
J. Micro/Nanolith. MEMS MOEMS 11(1), 013002 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.013002
TOPICS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters
J. Micro/Nanolith. MEMS MOEMS 11(1), 013003 (1 March 2012) https://doi.org/10.1117/1.JMM.11.1.013003
TOPICS: Lithography, Photomasks, Optical lithography, Communication theory, Image processing, Channel projecting optics, Materials processing, Double patterning technology, Extreme ultraviolet, Diffraction
J. Micro/Nanolith. MEMS MOEMS 11(1), 013004 (23 February 2012) https://doi.org/10.1117/1.JMM.11.1.013004
TOPICS: Photomasks, Line width roughness, Spatial frequencies, Electromagnetism, Critical dimension metrology, Near field, Line edge roughness, Waveguides, Lithography, Artificial intelligence
J. Micro/Nanolith. MEMS MOEMS 11(1), 013005 (23 February 2012) https://doi.org/10.1117/1.JMM.11.1.013005
TOPICS: Sensors, Microfluidics, Capacitance, Oxygen, Transmittance, Plasma, Electrodes, Mechanical sensors, Plasma treatment, Transparent conductors
J. Micro/Nanolith. MEMS MOEMS 11(1), 013006 (27 February 2012) https://doi.org/10.1117/1.JMM.11.1.013006
TOPICS: Capacitance, Microelectromechanical systems, High dynamic range imaging, Capacitors, Photomicroscopy, Scanning electron microscopy, Resistance, Resistors, Device simulation, Actuators
J. Micro/Nanolith. MEMS MOEMS 11(1), 013007 (2 March 2012) https://doi.org/10.1117/1.JMM.11.1.013007
TOPICS: Etching, Silicon, Hydrogen, Reflectivity, Polymers, Nanophotonics, Photoresist processing, Electron beams, Heat treatments, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 11(1), 013008 (12 March 2012) https://doi.org/10.1117/1.JMM.11.1.013008
TOPICS: Actuators, Silicon, Photography, Semiconducting wafers, Microelectromechanical systems, Metals, Navigation systems, Glasses, Control systems, Ions
J. Micro/Nanolith. MEMS MOEMS 11(1), 013009 (13 March 2012) https://doi.org/10.1117/1.JMM.11.1.013009
TOPICS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 11(1), 013010 (19 March 2012) https://doi.org/10.1117/1.JMM.11.1.013010
TOPICS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design
J. Micro/Nanolith. MEMS MOEMS 11(1), 013011 (21 March 2012) https://doi.org/10.1117/1.JMM.11.1.013011
TOPICS: Silicon, Reflectivity, Antireflective coatings, Refractive index, Nanolithography, Lithography, Finite-difference time-domain method, Scanning electron microscopy, Polarization, Photonic crystals
J. Micro/Nanolith. MEMS MOEMS 11(1), 013012 (22 March 2012) https://doi.org/10.1117/1.JMM.11.1.013012
TOPICS: Silicon, Etching, Semiconducting wafers, Diffusion, Lithography, Scanning electron microscopy, Molecules, Manufacturing, Plasma etching, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 11(1), 013013 (29 March 2012) https://doi.org/10.1117/1.JMM.11.1.013013
TOPICS: Electrodes, Cancer, Tumors, Hypoxia, In vivo imaging, In vitro testing, Control systems, Gold, Glasses, Oxygen
Errata
J. Micro/Nanolith. MEMS MOEMS 11(1), 019801 (13 March 2012) https://doi.org/10.1117/1.JMM.11.1.019801
TOPICS: Monochromatic aberrations, Microopto electromechanical systems, Deformable mirrors, Microscopy, Computer engineering, Photonics, Zernike polynomials, Spherical lenses
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