New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography

Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai

doi:10.1117/1.JMM.11.1.013009

13 March 2012 New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Kuen-Yu Tsai

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 1, 013009 (March 2012). https://doi.org/10.1117/1.JMM.11.1.013009

Abstract

Electron-beam-direct-write lithography has been considered a candidate next-generation technique for achieving high resolution. An accurate point spread function (PSF) is essential for reliable patterning prediction and proximity-effects correction. It can be derived via an effective parametric PSF calibration methodology, typically involving the fitting of the absorbed energy distribution (AED) from an electron-scattering simulation. However, the existing parametric PSF calibration methodology does not employ a systematic approach to obtain a new PSF form that is both compact and accurate when conventional PSF forms are not satisfactory. Only the AED fitting quality (rather than its patterning-prediction quality) is considered during the conventional calibration methodology. It also lacks a process to consider whether the predicted deviation (as simulated using the chosen PSF form) is satisfactory. This paper proposes a new parametric PSF calibration methodology to systematically obtain a PSF form consisting of the smallest number of terms, with a better combination of basis functions and that optimizes pattern accuracy. The effectiveness of using the new methodology is demonstrated in terms of fitting accuracy, patterning-prediction accuracy, and patterning sensitivity.

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Chun-Hung Liu, Hoi-Tou Ng, and Kuen-Yu Tsai "New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(1), 013009 (13 March 2012). https://doi.org/10.1117/1.JMM.11.1.013009

Published: 13 March 2012

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