journal of micro nanolithography mems and moems
VOL. 11 · NO. 3 | July 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(3), 030101 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.030101
TOPICS: Compact discs, Data communications, Biomedical optics
Special Section on Directed Self-Assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031301 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031301
TOPICS: Lithography, Electron beam lithography, Nanotechnology, Plasma etching, Etching, Nanofabrication, Semiconducting wafers, Plasma, Nanoimprint lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031302 (9 July 2012) https://doi.org/10.1117/1.JMM.11.3.031302
TOPICS: Semiconducting wafers, Etching, Nanostructures, Scanning electron microscopy, Annealing, Plasma etching, Photoresist processing, Chemistry, Materials processing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031303 (10 July 2012) https://doi.org/10.1117/1.JMM.11.3.031303
TOPICS: Scanning electron microscopy, Semiconducting wafers, Optical lithography, Reticles, Image processing, Coating, Photoresist processing, Photomasks, Photoresist materials, Directed self assembly
Sander Wuister, Jo Finders, Emiel Peeters, Chris van Heesch
J. Micro/Nanolith. MEMS MOEMS 11(3), 031304 (12 July 2012) https://doi.org/10.1117/1.JMM.11.3.031304
TOPICS: Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Lithography, Line edge roughness, Nanoimprint lithography, Optical lithography, Overlay metrology, Polymethylmethacrylate, Directed self assembly
Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma
J. Micro/Nanolith. MEMS MOEMS 11(3), 031305 (9 July 2012) https://doi.org/10.1117/1.JMM.11.3.031305
TOPICS: Polymethylmethacrylate, Picosecond phenomena, Ultraviolet radiation, Lithography, Mercury, Nanostructures, Oxygen, Lamps, Scanning electron microscopy, Directed self assembly
Danvers Johnston, Ming Lu, Charles Black
J. Micro/Nanolith. MEMS MOEMS 11(3), 031306 (24 July 2012) https://doi.org/10.1117/1.JMM.11.3.031306
TOPICS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Polymethylmethacrylate, Scanning electron microscopy, Thin films, Reactive ion etching
Special Section on Alternative Lithographic Technologies
J. Micro/Nanolith. MEMS MOEMS 11(3), 031401 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031401
TOPICS: Lithography, Optical lithography, Explosives, Nanoimprint lithography, Semiconductor manufacturing, Semiconductors, Optics manufacturing, Immersion lithography, Double patterning technology, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031402 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031402
TOPICS: Photomasks, Scanning electron microscopy, Nanofabrication, Silicon, Semiconducting wafers, Projection systems, Lithography, Optical lithography, Calibration, High volume manufacturing
Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon
J. Micro/Nanolith. MEMS MOEMS 11(3), 031403 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031403
TOPICS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography
Zhengmao Ye, Kang Luo, Xiaoming Lu, Brian Fletcher, Weijun Liu, Frank Xu, Dwayne LaBrake, Douglas Resnick, S. Sreenivasan
J. Micro/Nanolith. MEMS MOEMS 11(3), 031404 (22 August 2012) https://doi.org/10.1117/1.JMM.11.3.031404
TOPICS: Photomasks, Particles, Semiconducting wafers, Lithography, Semiconductors, Inspection, Printing, Contamination, Manufacturing, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 11(3), 031405 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031405
TOPICS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031406 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031406
TOPICS: Silicon, Prototyping, Electrodes, Semiconducting wafers, Photomasks, Lenses, Scanning electron microscopy, Raster graphics, Gold, Electron beams
SherJang Singh, Zhaoning Yu, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Tobias Wähler, Peter Dress
J. Micro/Nanolith. MEMS MOEMS 11(3), 031407 (13 September 2012) https://doi.org/10.1117/1.JMM.11.3.031407
TOPICS: Scanning probe microscopy, Beam propagation method, Contamination, Scanning electron microscopy, Silica, Inspection, Nanoimprint lithography, Hydrogen, Particles, Critical dimension metrology
Regular Articles
Abhay Joshi, Shashikala Gangal, R. Gandhi, K. Natarajan, Dhananjay Bodas
J. Micro/Nanolith. MEMS MOEMS 11(3), 033001 (14 August 2012) https://doi.org/10.1117/1.JMM.11.3.033001
TOPICS: Switches, Microelectromechanical systems, Aluminum, Resistance, Capacitance, Signal attenuation, Inductance, Gold, Roads, Telecommunications
Neelam Gupta, Songsheng Tan
J. Micro/Nanolith. MEMS MOEMS 11(3), 033002 (16 July 2012) https://doi.org/10.1117/1.JMM.11.3.033002
TOPICS: Optical filters, Mirrors, Image filtering, Tunable filters, Microopto electromechanical systems, Electrodes, Quartz, Imaging spectroscopy, Imaging systems, Fabry–Perot interferometers
S. Farshid Chini, Alidad Amirfazli
J. Micro/Nanolith. MEMS MOEMS 11(3), 033003 (6 August 2012) https://doi.org/10.1117/1.JMM.11.3.033003
TOPICS: Interfaces, Liquids, Capillaries, Optical lithography, Stereolithography, Lithium, Photoresist materials, Manufacturing, Shape analysis, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 11(3), 033004 (12 July 2012) https://doi.org/10.1117/1.JMM.11.3.033004
TOPICS: Polymers, Lithography, Extreme ultraviolet, Atomic force microscopy, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet lithography, Chemistry, Photoresist materials, Scanners
Saulius Kausinis, Karl Yee, Rimantas Barauskas
J. Micro/Nanolith. MEMS MOEMS 11(3), 033005 (13 July 2012) https://doi.org/10.1117/1.JMM.11.3.033005
TOPICS: Resonators, Microelectromechanical systems, Chemical elements, Mathematical modeling, 3D modeling, Finite element methods, Data modeling, Temperature metrology, Sensors, Body temperature
Jiankun Wang, Zhenchuan Yang, Guizhen Yan
J. Micro/Nanolith. MEMS MOEMS 11(3), 033006 (19 July 2012) https://doi.org/10.1117/1.JMM.11.3.033006
TOPICS: Actuators, Silicon, In situ remote sensing, Aluminum, Capacitors, Calibration, Photomasks, Deep reactive ion etching, Capacitance, Interferometers
J. Micro/Nanolith. MEMS MOEMS 11(3), 033007 (22 August 2012) https://doi.org/10.1117/1.JMM.11.3.033007
TOPICS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions
Kazuyuki Usuki, Satoshi Wakamatsu, Tadashi Oomatsu, Akiko Hattori, Kouji Shitabatake, Shinji Tarutani, Kunihiko Kodama, Hideto Tanabe
J. Micro/Nanolith. MEMS MOEMS 11(3), 033008 (14 August 2012) https://doi.org/10.1117/1.JMM.11.3.033008
TOPICS: Etching, Quartz, Resistance, Fluorine, Nanoimprint lithography, Lithography, Photoresist processing, Silicon, Dry etching, Contamination
Moonkeun Kim, Beomseok Hwang, Yong-Hyun Ham, Jaehwa Jeong, Nam-Ki Min, Kwang-Ho Kwon
J. Micro/Nanolith. MEMS MOEMS 11(3), 033009 (20 September 2012) https://doi.org/10.1117/1.JMM.11.3.033009
TOPICS: Microelectromechanical systems, Silicon, Ferroelectric materials, Etching, Resistance, Finite element methods, Optical simulations, Wind energy, Platinum, Deep reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 11(3), 033010 (21 September 2012) https://doi.org/10.1117/1.JMM.11.3.033010
TOPICS: Light emitting diodes, Zone plates, Semiconducting wafers, Sapphire, Diodes, Metals, Electron beam lithography, Contact lenses, Etching, Nickel
J. Micro/Nanolith. MEMS MOEMS 11(3), 033011 (28 September 2012) https://doi.org/10.1117/1.JMM.11.3.033011
TOPICS: Semiconducting wafers, Scanners, Photomasks, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Prototyping, Wafer-level optics, Electron beam lithography, Tolerancing
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