Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 11 · NO. 3 | July 2012
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(3), 030101 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.030101
TOPICS: Compact discs, Data communications, Biomedical optics
Special Section on Directed Self-Assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031301 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031301
TOPICS: Lithography, Electron beam lithography, Nanotechnology, Plasma etching, Etching, Nanofabrication, Semiconducting wafers, Plasma, Nanoimprint lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031302 (9 July 2012) https://doi.org/10.1117/1.JMM.11.3.031302
TOPICS: Semiconducting wafers, Etching, Nanostructures, Scanning electron microscopy, Annealing, Plasma etching, Photoresist processing, Chemistry, Materials processing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031303 (10 July 2012) https://doi.org/10.1117/1.JMM.11.3.031303
TOPICS: Scanning electron microscopy, Semiconducting wafers, Optical lithography, Reticles, Image processing, Coating, Photoresist processing, Photomasks, Photoresist materials, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031304 (12 July 2012) https://doi.org/10.1117/1.JMM.11.3.031304
TOPICS: Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Lithography, Line edge roughness, Nanoimprint lithography, Optical lithography, Overlay metrology, Polymethylmethacrylate, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031305 (9 July 2012) https://doi.org/10.1117/1.JMM.11.3.031305
TOPICS: Polymethylmethacrylate, Picosecond phenomena, Ultraviolet radiation, Lithography, Mercury, Nanostructures, Oxygen, Lamps, Scanning electron microscopy, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031306 (24 July 2012) https://doi.org/10.1117/1.JMM.11.3.031306
TOPICS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Polymethylmethacrylate, Scanning electron microscopy, Thin films, Reactive ion etching
Special Section on Alternative Lithographic Technologies
J. Micro/Nanolith. MEMS MOEMS 11(3), 031401 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031401
TOPICS: Lithography, Optical lithography, Explosives, Nanoimprint lithography, Semiconductor manufacturing, Semiconductors, Optics manufacturing, Immersion lithography, Double patterning technology, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031402 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031402
TOPICS: Photomasks, Scanning electron microscopy, Nanofabrication, Silicon, Semiconducting wafers, Projection systems, Lithography, Optical lithography, Calibration, High volume manufacturing
J. Micro/Nanolith. MEMS MOEMS 11(3), 031403 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031403
TOPICS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography
J. Micro/Nanolith. MEMS MOEMS 11(3), 031404 (22 August 2012) https://doi.org/10.1117/1.JMM.11.3.031404
TOPICS: Photomasks, Particles, Semiconducting wafers, Lithography, Semiconductors, Inspection, Printing, Contamination, Manufacturing, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 11(3), 031405 (7 August 2012) https://doi.org/10.1117/1.JMM.11.3.031405
TOPICS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 11(3), 031406 (9 August 2012) https://doi.org/10.1117/1.JMM.11.3.031406
TOPICS: Silicon, Prototyping, Electrodes, Semiconducting wafers, Photomasks, Lenses, Scanning electron microscopy, Raster graphics, Gold, Electron beams
J. Micro/Nanolith. MEMS MOEMS 11(3), 031407 (13 September 2012) https://doi.org/10.1117/1.JMM.11.3.031407
TOPICS: Scanning probe microscopy, Beam propagation method, Contamination, Scanning electron microscopy, Silica, Inspection, Nanoimprint lithography, Hydrogen, Particles, Critical dimension metrology
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 11(3), 033001 (14 August 2012) https://doi.org/10.1117/1.JMM.11.3.033001
TOPICS: Switches, Microelectromechanical systems, Aluminum, Resistance, Capacitance, Signal attenuation, Inductance, Gold, Roads, Telecommunications
J. Micro/Nanolith. MEMS MOEMS 11(3), 033002 (16 July 2012) https://doi.org/10.1117/1.JMM.11.3.033002
TOPICS: Optical filters, Mirrors, Image filtering, Tunable filters, Microopto electromechanical systems, Electrodes, Quartz, Imaging spectroscopy, Imaging systems, Fabry–Perot interferometers
J. Micro/Nanolith. MEMS MOEMS 11(3), 033003 (6 August 2012) https://doi.org/10.1117/1.JMM.11.3.033003
TOPICS: Interfaces, Liquids, Capillaries, Optical lithography, Stereolithography, Lithium, Photoresist materials, Manufacturing, Shape analysis, Chemical elements
J. Micro/Nanolith. MEMS MOEMS 11(3), 033004 (12 July 2012) https://doi.org/10.1117/1.JMM.11.3.033004
TOPICS: Polymers, Lithography, Extreme ultraviolet, Atomic force microscopy, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet lithography, Chemistry, Photoresist materials, Scanners
J. Micro/Nanolith. MEMS MOEMS 11(3), 033005 (13 July 2012) https://doi.org/10.1117/1.JMM.11.3.033005
TOPICS: Resonators, Microelectromechanical systems, Chemical elements, Mathematical modeling, 3D modeling, Finite element methods, Data modeling, Temperature metrology, Sensors, Body temperature
J. Micro/Nanolith. MEMS MOEMS 11(3), 033006 (19 July 2012) https://doi.org/10.1117/1.JMM.11.3.033006
TOPICS: Actuators, Silicon, In situ remote sensing, Aluminum, Capacitors, Calibration, Photomasks, Deep reactive ion etching, Capacitance, Interferometers
J. Micro/Nanolith. MEMS MOEMS 11(3), 033007 (22 August 2012) https://doi.org/10.1117/1.JMM.11.3.033007
TOPICS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions
J. Micro/Nanolith. MEMS MOEMS 11(3), 033008 (14 August 2012) https://doi.org/10.1117/1.JMM.11.3.033008
TOPICS: Etching, Quartz, Resistance, Fluorine, Nanoimprint lithography, Lithography, Photoresist processing, Silicon, Dry etching, Contamination
J. Micro/Nanolith. MEMS MOEMS 11(3), 033009 (20 September 2012) https://doi.org/10.1117/1.JMM.11.3.033009
TOPICS: Microelectromechanical systems, Silicon, Ferroelectric materials, Etching, Resistance, Finite element methods, Optical simulations, Wind energy, Platinum, Deep reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 11(3), 033010 (21 September 2012) https://doi.org/10.1117/1.JMM.11.3.033010
TOPICS: Light emitting diodes, Zone plates, Semiconducting wafers, Sapphire, Diodes, Metals, Electron beam lithography, Contact lenses, Etching, Nickel
J. Micro/Nanolith. MEMS MOEMS 11(3), 033011 (28 September 2012) https://doi.org/10.1117/1.JMM.11.3.033011
TOPICS: Semiconducting wafers, Scanners, Photomasks, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Prototyping, Wafer-level optics, Electron beam lithography, Tolerancing
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