Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima; Yasushi Takahashi; Masaki Takakuwa; Shuzo Ohshio; Shinji Sugatani; Ryo Tsujimura; Hiroshi Takita; Kozo Ogino; Hiromi Hoshino; Yoshio Ito; Masaaki Miyajima; Jun-ichi Kon

doi:10.1117/1.JMM.11.3.031403

7 August 2012 Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3, 031403 (August 2012). https://doi.org/10.1117/1.JMM.11.3.031403

Abstract

Techniques to appropriately control the key factors for a character projection (CP) based electron beam direct writing technology for mass production are shown and discussed. In order to achieve accurate CD control, the CP technique using the master CP is adopted. Another CP technique, the Packed CP, is used to obtain suitable shot count. For the alignment on the some critical layers which normally have an even surface, the process removing SiO₂ material filled in the alignment marks is added and then the alignment marks can be detected using electron beam. The proximity effect correction using the simplified electron energy flux model and the hybrid exposure are used to obtain enough process margins. As a result, the sufficient CD accuracy, overlay accuracy, and yield are obtained on the 65 nm node device. Due to the proper system control, more than 10,000 production wafers have been successfully exposed so far without any major system downtime. It is shown that those techniques can be adapted to the 32 nm node production with slight modifications. It is expected that by using the Multi Column Cell exposure method, those techniques will be applicable to the rapid establishment for the 14 nm node technology.

Citation Download Citation

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, and Jun-ichi Kon "Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031403 (7 August 2012). https://doi.org/10.1117/1.JMM.11.3.031403

Published: 7 August 2012

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available