Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 11 · NO. 4 | October 2012
CONTENTS
IN THIS ISSUE

Editorial (2)
Errata (1)
Editorial
J. Micro/Nanolith. MEMS MOEMS 11(4), 040101 (3 October 2012) https://doi.org/10.1117/1.JMM.11.4.040101
TOPICS: Optical lithography, Microelectromechanical systems, Microopto electromechanical systems, Gold
J. Micro/Nanolith. MEMS MOEMS 11(4), 040102 (19 November 2012) https://doi.org/10.1117/1.JMM.11.4.040102
TOPICS: Photomasks, Inspection, Microelectromechanical systems, Microopto electromechanical systems, Ultraviolet radiation, Critical dimension metrology, Compact discs, Dichroic materials, Multilayers, Integrated circuits
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 11(4), 040501 (19 October 2012) https://doi.org/10.1117/1.JMM.11.4.040501
TOPICS: Reflectivity, Mirrors, Local area networks, Multilayers, Extreme ultraviolet lithography, Boron, Interfaces, Extreme ultraviolet, Lithography, Lanthanum
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 11(4), 043001 (1 October 2012) https://doi.org/10.1117/1.JMM.11.4.043001
TOPICS: Sensors, Microelectromechanical systems, Microfabrication, Electromechanical design, Error analysis, Capacitors, Structural design, Gyroscopes, Silicon, Boron
J. Micro/Nanolith. MEMS MOEMS 11(4), 043002 (1 October 2012) https://doi.org/10.1117/1.JMM.11.4.043002
TOPICS: Semiconducting wafers, Metals, Copper, Silicon, Silicon films, Sensors, Capacitance, Annealing, 3D metrology, Temperature metrology
J. Micro/Nanolith. MEMS MOEMS 11(4), 043003 (1 October 2012) https://doi.org/10.1117/1.JMM.11.4.043003
TOPICS: Etching, Gallium arsenide, Quantum well infrared photodetectors, Plasma etching, Staring arrays, Argon, Plasma, Scanning electron microscopy, Quantum efficiency, Photomasks
J. Micro/Nanolith. MEMS MOEMS 11(4), 043004 (4 October 2012) https://doi.org/10.1117/1.JMM.11.4.043004
TOPICS: Polarization, Optical lithography, Beam splitters, Photonic crystals, Biomedical optics, Interferometry, Beam controllers, Metamaterials, Lithography, Prisms
J. Micro/Nanolith. MEMS MOEMS 11(4), 043005 (12 October 2012) https://doi.org/10.1117/1.JMM.11.4.043005
TOPICS: Photomasks, Finite element methods, Distortion, Chemical elements, Photovoltaics, Spatial frequencies, Extreme ultraviolet lithography, Algorithm development, Shape analysis, Electrodes
J. Micro/Nanolith. MEMS MOEMS 11(4), 043006 (12 October 2012) https://doi.org/10.1117/1.JMM.11.4.043006
TOPICS: Mirrors, Monochromatic aberrations, Electrodes, Semiconducting wafers, Deformable mirrors, Wafer bonding, Microopto electromechanical systems, Silicon, Aluminum, Control systems
J. Micro/Nanolith. MEMS MOEMS 11(4), 043007 (20 October 2012) https://doi.org/10.1117/1.JMM.11.4.043007
TOPICS: Photoresist developing, Stochastic processes, Line edge roughness, Point spread functions, Photoresist materials, Lithography, Fourier transforms, Chemically amplified resists, Computer simulations, Surface roughness
J. Micro/Nanolith. MEMS MOEMS 11(4), 043008 (15 November 2012) https://doi.org/10.1117/1.JMM.11.4.043008
TOPICS: Optical proximity correction, Photomasks, Optical lithography, Source mask optimization, Semiconducting wafers, Systems modeling, Imaging systems, Polarization, Wavefront aberrations, Detection and tracking algorithms
J. Micro/Nanolith. MEMS MOEMS 11(4), 043009 (22 November 2012) https://doi.org/10.1117/1.JMM.11.4.043009
TOPICS: Surface roughness, Photoresist materials, Spiral phase plates, Lithography, Additive manufacturing, Optical components, Photoresist developing, Optical vortices, Photoresist processing, Ultraviolet radiation
J. Micro/Nanolith. MEMS MOEMS 11(4), 043010 (30 November 2012) https://doi.org/10.1117/1.JMM.11.4.043010
TOPICS: Image filtering, Line width roughness, Scanning electron microscopy, Optical filters, Statistical analysis, Solids, Image analysis, Error analysis, Monte Carlo methods, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 11(4), 043011 (11 December 2012) https://doi.org/10.1117/1.JMM.11.4.043011
TOPICS: Scanning electron microscopy, Semiconducting wafers, Photoresist processing, Scatterometry, Electron microscopes, Metrology, Photomasks, Critical dimension metrology, Detection and tracking algorithms, Algorithm development
Errata
J. Micro/Nanolith. MEMS MOEMS 11(4), 049801 (4 October 2012) https://doi.org/10.1117/1.JMM.11.4.049801
TOPICS: Manufacturing, Carbon, Lithography, Physics, Chemistry
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