journal of micro nanolithography mems and moems
VOL. 11 · NO. 4 | October 2012

Editorial (2)
Errata (1)
J. Micro/Nanolith. MEMS MOEMS 11(4), 040101 (3 October 2012) doi:10.1117/1.JMM.11.4.040101
TOPICS: Optical lithography, Microelectromechanical systems, Microopto electromechanical systems, Gold
J. Micro/Nanolith. MEMS MOEMS 11(4), 040102 (19 November 2012) doi:10.1117/1.JMM.11.4.040102
TOPICS: Photomasks, Inspection, Microelectromechanical systems, Microopto electromechanical systems, Ultraviolet radiation, Critical dimension metrology, Compact discs, Dichroic materials, Multilayers, Integrated circuits
JM3 Letters
Igor Makhotkin, Erwin Zoethout, Eric Louis, Andrei Yakunin, Stephan Müllender, Fred Bijkerk
J. Micro/Nanolith. MEMS MOEMS 11(4), 040501 (19 October 2012) doi:10.1117/1.JMM.11.4.040501
TOPICS: Reflectivity, Mirrors, Local area networks, Multilayers, Extreme ultraviolet lithography, Boron, Interfaces, Extreme ultraviolet, Lithography, Lanthanum
Regular Articles
Xiaoping He, Wei Su, Bei Peng, Wu Zhou
J. Micro/Nanolith. MEMS MOEMS 11(4), 043001 (1 October 2012) doi:10.1117/1.JMM.11.4.043001
TOPICS: Sensors, Microelectromechanical systems, Microfabrication, Electromechanical design, Error analysis, Capacitors, Structural design, Gyroscopes, Silicon, Boron
Yi-sha Ku, Po-Yi Chang, Chris Shen
J. Micro/Nanolith. MEMS MOEMS 11(4), 043002 (1 October 2012) doi:10.1117/1.JMM.11.4.043002
TOPICS: Semiconducting wafers, Metals, Copper, Silicon, Silicon films, Sensors, Capacitance, Annealing, 3D metrology, Temperature metrology
Jason Sun, Kwong-Kit Choi, Unchul Lee
J. Micro/Nanolith. MEMS MOEMS 11(4), 043003 (1 October 2012) doi:10.1117/1.JMM.11.4.043003
TOPICS: Etching, Gallium arsenide, Quantum well infrared photodetectors, Plasma etching, Staring arrays, Argon, Plasma, Scanning electron microscopy, Quantum efficiency, Photomasks
Guy Burrow, Thomas Gaylord
J. Micro/Nanolith. MEMS MOEMS 11(4), 043004 (4 October 2012) doi:10.1117/1.JMM.11.4.043004
TOPICS: Polarization, Optical lithography, Beam splitters, Photonic crystals, Biomedical optics, Interferometry, Beam controllers, Metamaterials, Lithography, Prisms
Gerd Brandstetter, Sanjay Govindjee
J. Micro/Nanolith. MEMS MOEMS 11(4), 043005 (12 October 2012) doi:10.1117/1.JMM.11.4.043005
TOPICS: Photomasks, Finite element methods, Distortion, Chemical elements, Photovoltaics, Spatial frequencies, Extreme ultraviolet lithography, Algorithm development, Shape analysis, Electrodes
J. Micro/Nanolith. MEMS MOEMS 11(4), 043006 (12 October 2012) doi:10.1117/1.JMM.11.4.043006
TOPICS: Mirrors, Monochromatic aberrations, Electrodes, Semiconducting wafers, Deformable mirrors, Wafer bonding, Microopto electromechanical systems, Silicon, Aluminum, Control systems
J. Micro/Nanolith. MEMS MOEMS 11(4), 043007 (20 October 2012) doi:10.1117/1.JMM.11.4.043007
TOPICS: Photoresist developing, Stochastic processes, Line edge roughness, Point spread functions, Photoresist materials, Lithography, Fourier transforms, Chemically amplified resists, Computer simulations, Surface roughness
Xu Ma, Yanqiu Li, Xuejia Guo, Lisong Dong
J. Micro/Nanolith. MEMS MOEMS 11(4), 043008 (15 November 2012) doi:10.1117/1.JMM.11.4.043008
TOPICS: Optical proximity correction, Photomasks, Optical lithography, Source mask optimization, Semiconducting wafers, Systems modeling, Imaging systems, Polarization, Wavefront aberrations, Detection and tracking algorithms
J. Micro/Nanolith. MEMS MOEMS 11(4), 043009 (22 November 2012) doi:10.1117/1.JMM.11.4.043009
TOPICS: Surface roughness, Photoresist materials, Spiral phase plates, Lithography, Additive manufacturing, Optical components, Photoresist developing, Optical vortices, Photoresist processing, Ultraviolet radiation
Atsushi Hiraiwa, Akio Nishida
J. Micro/Nanolith. MEMS MOEMS 11(4), 043010 (30 November 2012) doi:10.1117/1.JMM.11.4.043010
TOPICS: Image filtering, Line width roughness, Scanning electron microscopy, Optical filters, Statistical analysis, Solids, Image analysis, Error analysis, Monte Carlo methods, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 11(4), 043011 (11 December 2012) doi:10.1117/1.JMM.11.4.043011
TOPICS: Scanning electron microscopy, Semiconducting wafers, Photoresist processing, Scatterometry, Electron microscopes, Metrology, Photomasks, Critical dimension metrology, Detection and tracking algorithms, Algorithm development
Silvino José Antuña, Adrian Fernandez, Miguel Garcia, Maria Rodriguez, Jose Rodriguez Garcia
J. Micro/Nanolith. MEMS MOEMS 11(4), 049801 (4 October 2012) doi:10.1117/1.JMM.11.4.049801
TOPICS: Manufacturing, Carbon, Lithography, Physics, Chemistry
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