journal of micro nanolithography mems and moems
VOL. 12 · NO. 1 | January 2013
CONTENTS
IN THIS ISSUE

Editorial (1)
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(1), 010101 (28 February 2013) doi:10.1117/1.JMM.12.1.010101
TOPICS: Mathematics, Lithography, Physics, Analytical research, Statistical analysis, Communication engineering, Data communications
Regular Articles
I-Yu Huang, Guan-Ming Chen, Ting-Yi Wu
J. Micro/Nanolith. MEMS MOEMS 12(1), 013001 (2 January 2013) doi:10.1117/1.JMM.12.1.013001
Harsh Sundani, Vijay Devabhaktuni, Christopher Melkonian, Mansoor Alam
J. Micro/Nanolith. MEMS MOEMS 12(1), 013002 (7 January 2013) doi:10.1117/1.JMM.12.1.013002
TOPICS: Silicon, Microelectromechanical systems, Etching, Semiconducting wafers, Photoresist materials, Oxides, Fabrication, Oxygen, Metals, Packaging
Yuan Xue, Siyuan He
J. Micro/Nanolith. MEMS MOEMS 12(1), 013003 (17 January 2013) doi:10.1117/1.JMM.12.1.013003
TOPICS: Prototyping, Actuators, Scanning electron microscopy, Magnetism, Microactuators, Microelectromechanical systems, 3D microstructuring, Semiconducting wafers, Oxides, Surface micromachining
Chuanwei Zhang, Shiyuan Liu, Jinlong Zhu, Xiuguo Chen, Zhengqiong Dong
J. Micro/Nanolith. MEMS MOEMS 12(1), 013004 (17 January 2013) doi:10.1117/1.JMM.12.1.013004
TOPICS: Diffraction, Scatterometry, Error analysis, Computer simulations, Inverse optics, Geometrical optics, Algorithm development, Diffraction gratings, Critical dimension metrology, Optical testing
J. Micro/Nanolith. MEMS MOEMS 12(1), 013005 (25 January 2013) doi:10.1117/1.JMM.12.1.013005
TOPICS: Critical dimension metrology, Scanning electron microscopy, Image filtering, Edge roughness, Image analysis, Electron microscopes, Materials processing, Edge detection, Metrology, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(1), 013006 (1 February 2013) doi:10.1117/1.JMM.12.1.013006
TOPICS: Electrodes, Scanners, Microopto electromechanical systems, Mirrors, Silicon, Actuators, Optical alignment, Capacitance, Semiconducting wafers, Micromirrors
Jenah Harris-Jones, Emilio Stinzianni, Chihcheng Lin, Vibhu Jindal, Ranganath Teki, Hyuk Joo Kwon
J. Micro/Nanolith. MEMS MOEMS 12(1), 013007 (6 February 2013) doi:10.1117/1.JMM.12.1.013007
TOPICS: Extreme ultraviolet, Transmission electron microscopy, Metrology, Scanning electron microscopy, Particles, Photomasks, Multilayers, Ion beams, Smoothing, Molybdenum
J. Micro/Nanolith. MEMS MOEMS 12(1), 013008 (6 February 2013) doi:10.1117/1.JMM.12.1.013008
TOPICS: Spherical lenses, Monochromatic aberrations, Diffraction, Finite element methods, Photomasks, Wavefronts, Nanolithography, Lithography, Error analysis, Silicon
Xiaohu Zheng, Xing Chen, Ji-Kwan Kim, Dong-Weon Lee, Xinxin Li
J. Micro/Nanolith. MEMS MOEMS 12(1), 013009 (11 February 2013) doi:10.1117/1.JMM.12.1.013009
TOPICS: Graphene, Resistance, Temperature metrology, Carbon, Electrodes, Metals, Environmental sensing, Silicon, Semiconducting wafers, Sensors
Aleksandar Aleksov, Dmitri Nikonov, Shawna Liff
J. Micro/Nanolith. MEMS MOEMS 12(1), 013010 (11 February 2013) doi:10.1117/1.JMM.12.1.013010
TOPICS: Magnetism, Reticles, Electron beam lithography, Lithography, Semiconducting wafers, Light sources, Extreme ultraviolet, Spin polarization, Deep ultraviolet, Metals
Xie Peng, Bruce Smith
J. Micro/Nanolith. MEMS MOEMS 12(1), 013011 (11 February 2013) doi:10.1117/1.JMM.12.1.013011
TOPICS: Prisms, Imaging systems, Lithography, Head, Control systems, Semiconducting wafers, Sapphire, Silica, Transducers, Prototyping
Zhiyuan Zhu, Min Yu, Dayu Tian, Yingwei Zhu, Peiquan Wang, Chenchen Liu, Weimin Wang, Min Miao, Jing Chen, Yufeng Jin
J. Micro/Nanolith. MEMS MOEMS 12(1), 013012 (11 February 2013) doi:10.1117/1.JMM.12.1.013012
TOPICS: Tin, Aluminum, Wafer bonding, Semiconducting wafers, Silicon, Scanning electron microscopy, Interfaces, Microelectromechanical systems, Roads, Nanolithography
Yoshihiko Fujimori, Takashi Tsuto, Yuji Kudo, Takeshi Inoue, Kyoichi Suwa, Kazuya Okamoto
J. Micro/Nanolith. MEMS MOEMS 12(1), 013013 (11 February 2013) doi:10.1117/1.JMM.12.1.013013
TOPICS: Semiconducting wafers, Diffraction, Inspection, Silicon, Etching, Wafer-level optics, Wafer testing, Scanning electron microscopy, Near infrared, Signal processing
Shayak Banerjee, Kanak Agarwal, Sani Nassif, Michael Orshansky
J. Micro/Nanolith. MEMS MOEMS 12(1), 013014 (13 February 2013) doi:10.1117/1.JMM.12.1.013014
TOPICS: Tolerancing, Transistors, Lithography, Optical proximity correction, Photomasks, Logic, Critical dimension metrology, Manufacturing, Photovoltaics, Image processing
Kingsley Ogudo, Diethelm Schmieder, Daniel Foty, Lukas Snyman
J. Micro/Nanolith. MEMS MOEMS 12(1), 013015 (6 March 2013) doi:10.1117/1.JMM.12.1.013015
Claudia Reinlein, Michael Appelfelder, Sylvia Gebhardt, Erik Beckert, Ramona Eberhardt, Andreas Tünnermann
J. Micro/Nanolith. MEMS MOEMS 12(1), 013016 (13 March 2013) doi:10.1117/1.JMM.12.1.013016
TOPICS: Mirrors, Copper, Actuators, Microopto electromechanical systems, Temperature metrology, Deformable mirrors, Ceramics, Mirror mounts, Manufacturing, Thermography
Chang-Yu Lin, I-Yu Huang, Je-Wei Lan
J. Micro/Nanolith. MEMS MOEMS 12(1), 013017 (20 March 2013) doi:10.1117/1.JMM.12.1.013017
TOPICS: Gold, Silicon, Chromium, Zinc oxide, Roentgenium, Biosensors, Phase velocity, Acoustics, Transducers, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 12(1), 013018 (27 March 2013) doi:10.1117/1.JMM.12.1.013018
TOPICS: Scatterometry, Data modeling, Scanning electron microscopy, Electron beam lithography, Metrology, Critical dimension metrology, Spectroscopy, Chemical elements, Optical properties, Diffraction gratings
I-Yu Huang, Chang-Yu Lin, Je-Wei Lan
J. Micro/Nanolith. MEMS MOEMS 12(1), 013019 (28 March 2013) doi:10.1117/1.JMM.12.1.013019
TOPICS: Roentgenium, Zinc oxide, Thin films, Thin film devices, Silicon, Acoustics, Silicon films, Electrodes, Reflectivity, Metals
Back to Top