journal of micro nanolithography mems and moems
VOL. 12 · NO. 2 | April 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(2), 020101 (29 April 2013) doi:10.1117/1.JMM.12.2.020101
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Beryllium, Fluctuations and noise, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 12(2), 020102 (1 April 2013) doi:10.1117/1.JMM.12.2.020102
Special Section on Photomasks for Extreme Ultraviolet Lithography
J. Micro/Nanolith. MEMS MOEMS 12(2), 021001 (25 June 2013) doi:10.1117/1.JMM.12.2.021001
TOPICS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Process modeling, Instrument modeling, Reflectivity, Defect inspection, Inspection, Mask making, Printing
J. Micro/Nanolith. MEMS MOEMS 12(2), 021002 (1 March 2013) doi:10.1117/1.JMM.12.2.021002
TOPICS: Palladium, Signal detection, Inspection, Semiconducting wafers, Photomasks, Extreme ultraviolet, Defect detection, Wafer inspection, Printing, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 12(2), 021003 (28 February 2013) doi:10.1117/1.JMM.12.2.021003
TOPICS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Image resolution, Defect detection, Optical design, EUV optics, Sensors, Data processing
J. Micro/Nanolith. MEMS MOEMS 12(2), 021004 (1 March 2013) doi:10.1117/1.JMM.12.2.021004
TOPICS: Semiconducting wafers, Photomasks, Inspection, Extreme ultraviolet lithography, Critical dimension metrology, Opacity, Extreme ultraviolet, Defect inspection, Wafer-level optics, Optical inspection
J. Micro/Nanolith. MEMS MOEMS 12(2), 021005 (1 March 2013) doi:10.1117/1.JMM.12.2.021005
TOPICS: Extreme ultraviolet, Computer simulations, Waveguides, Photomasks, Diffraction, Multilayers, Data modeling, Matrices, Electromagnetism, Finite-difference time-domain method
J. Micro/Nanolith. MEMS MOEMS 12(2), 021006 (18 March 2013) doi:10.1117/1.JMM.12.2.021006
TOPICS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 12(2), 021007 (22 March 2013) doi:10.1117/1.JMM.12.2.021007
TOPICS: Etching, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Line width roughness, Inspection, Photoresist processing, Plasma, Silicon
Tsutomu Shoki, Masato Ootsuka, Minoru Sakamoto, Tatsuo Asakawa, Ryuuji Sakamoto, Hirofumi Kozakai, Kazuhiro Hamamoto, Takahiro Onoue, Toshihiko Orihara, Osamu Maruyama, Jun-Ichi Horikawa
J. Micro/Nanolith. MEMS MOEMS 12(2), 021008 (1 April 2013) doi:10.1117/1.JMM.12.2.021008
TOPICS: Extreme ultraviolet, Inspection, Polishing, Photomasks, Extreme ultraviolet lithography, Glasses, Defect inspection, Silicon, Molybdenum, Wafer-level optics
Regular Articles
Dingbang Xiao, Jianbin Su, Zhihua Chen, Zhanqiang Hou, Xinghua Wang, Xuezhong Wu
J. Micro/Nanolith. MEMS MOEMS 12(2), 023001 (8 April 2013) doi:10.1117/1.JMM.12.2.023001
TOPICS: Capacitance, Feedback control, Electrodes, Feedback loops, Defense technologies, Amplifiers, Fabrication, Gyroscopes, Mechatronics, Anisotropic etching
J. Micro/Nanolith. MEMS MOEMS 12(2), 023002 (25 April 2013) doi:10.1117/1.JMM.12.2.023002
TOPICS: Molybdenum, Optical components, Micro cutting, Light emitting diodes, Light sources, Waveguides, Light sources and illumination, Light, Polymethylmethacrylate, Prototyping
Vijaya-Kumar Kuppuswamy, Vassilios Constantoudis, Evangelos Gogolides, Alessandro Pret, Roel Gronheid
J. Micro/Nanolith. MEMS MOEMS 12(2), 023003 (26 April 2013) doi:10.1117/1.JMM.12.2.023003
TOPICS: Critical dimension metrology, Extreme ultraviolet lithography, Edge roughness, Molecules, Extreme ultraviolet, Line width roughness, Image enhancement, Scanning electron microscopy, Picosecond phenomena, Line edge roughness
Mohamad Amin Rezvankhah, Mohsen Shayan, Amir Reza Merati, Mohsen Pahlevani
J. Micro/Nanolith. MEMS MOEMS 12(2), 023004 (26 April 2013) doi:10.1117/1.JMM.12.2.023004
TOPICS: Chemical species, Etching, Silicon, Anisotropic etching, Photomasks, Simulation of CCA and DLA aggregates, Semiconducting wafers, Crystals, Tin, Device simulation
Nan Liu, Jingbei Liu, Jie Lin, Graham Davies, Peng Jin, Dou Zhang
J. Micro/Nanolith. MEMS MOEMS 12(2), 023005 (10 May 2013) doi:10.1117/1.JMM.12.2.023005
TOPICS: Polymerization, Oxygen, FT-IR spectroscopy, Polymers, Diffusion, Photoresist processing, Ultraviolet radiation, Process control, Process modeling, Optoelectronics
Petr Jurčíček, Helin Zou, Shuai Gao
J. Micro/Nanolith. MEMS MOEMS 12(2), 023006 (10 May 2013) doi:10.1117/1.JMM.12.2.023006
TOPICS: Amplifiers, Ions, Nitrogen, Device simulation, Ionization, 3D modeling, Microelectromechanical systems, Optical amplifiers, Computer simulations, Mass spectrometry
J. Micro/Nanolith. MEMS MOEMS 12(2), 023007 (22 May 2013) doi:10.1117/1.JMM.12.2.023007
TOPICS: Semiconducting wafers, 3D modeling, Finite element methods, Chemical elements, Lithography, Extreme ultraviolet lithography, Interfaces, Mechanics, Shape analysis, Scanners
J. Micro/Nanolith. MEMS MOEMS 12(2), 023008 (31 May 2013) doi:10.1117/1.JMM.12.2.023008
TOPICS: Fermium, Frequency modulation, Extreme ultraviolet lithography, Etching, Prototyping, Photomasks, Inspection, Palladium, Extreme ultraviolet, Coating
J. Micro/Nanolith. MEMS MOEMS 12(2), 023009 (4 June 2013) doi:10.1117/1.JMM.12.2.023009
TOPICS: Atomic force microscopy, Data modeling, 3D modeling, Numerical analysis, Error analysis, Metrology, Statistical modeling, Carbon nanotubes, Solids, Standards development
J. Micro/Nanolith. MEMS MOEMS 12(2), 023010 (5 June 2013) doi:10.1117/1.JMM.12.2.023010
TOPICS: Annealing, X-rays, Finite element methods, Semiconducting wafers, Tomography, Copper, Inspection, X-ray imaging, X-ray microscopy, Silicon
Yong-Hwa Park, Yong-Chul Cho, Jang-Woo You, Chang-Young Park, Hee-Sun Yoon, Sang-Hun Lee, Jong-Oh Kwon, Seung-Wan Lee, Byung Hoon Na, Gun Wu Ju, Hee Ju Choi, Yong Tak Lee
J. Micro/Nanolith. MEMS MOEMS 12(2), 023011 (6 June 2013) doi:10.1117/1.JMM.12.2.023011
TOPICS: Camera shutters, 3D image processing, Infrared imaging, Modulation, Image sensors, 3D displays, Cameras, Transmittance, Image processing, Prototyping
J. Micro/Nanolith. MEMS MOEMS 12(2), 023012 (10 June 2013) doi:10.1117/1.JMM.12.2.023012
TOPICS: Aluminum nitride, Microopto electromechanical systems, Microlens, Lenses, Spherical lenses, Nitrogen, Semiconducting wafers, Manufacturing, Silicon, Solids
J. Micro/Nanolith. MEMS MOEMS 12(2), 023013 (11 June 2013) doi:10.1117/1.JMM.12.2.023013
TOPICS: Extreme ultraviolet, Defect detection, Photomasks, Inspection, Defect inspection, Image processing, Monte Carlo methods, Electron microscopes, Sensors, Signal detection
Shayak Banerjee, Kanak Agarwal, Michael Orshansky
J. Micro/Nanolith. MEMS MOEMS 12(2), 023014 (11 June 2013) doi:10.1117/1.JMM.12.2.023014
TOPICS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Detection and tracking algorithms, Optimization (mathematics), Metals, Semiconducting wafers, Photovoltaics, Source mask optimization
J. Micro/Nanolith. MEMS MOEMS 12(2), 023015 (12 June 2013) doi:10.1117/1.JMM.12.2.023015
TOPICS: Solids, Nanolithography, Lenses, Spherical lenses, Polymethylmethacrylate, Lithography, Electron beam lithography, Silicon, Microscopes, Objectives
I-Yu Huang, Chia-Hsun Hsieh, Wei-Chun Chang
J. Micro/Nanolith. MEMS MOEMS 12(2), 023016 (12 June 2013) doi:10.1117/1.JMM.12.2.023016
TOPICS: Chlorine, Microsensors, Ions, Electrodes, Sensors, Magnesium, Field effect transistors, Transistors, Bromine, Microsystems
Errata
J. Micro/Nanolith. MEMS MOEMS 12(2), 029801 (20 June 2013) doi:10.1117/1.JMM.12.2.029801
TOPICS: Diodes, Zone plates, Electrical engineering
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