Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 12 · NO. 2 | April 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(2), 020101 (29 April 2013) https://doi.org/10.1117/1.JMM.12.2.020101
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Beryllium, Fluctuations and noise, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 12(2), 020102 (1 April 2013) https://doi.org/10.1117/1.JMM.12.2.020102
Special Section on Photomasks for Extreme Ultraviolet Lithography
J. Micro/Nanolith. MEMS MOEMS 12(2), 021001 (25 June 2013) https://doi.org/10.1117/1.JMM.12.2.021001
TOPICS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Process modeling, Instrument modeling, Reflectivity, Defect inspection, Inspection, Mask making, Printing
J. Micro/Nanolith. MEMS MOEMS 12(2), 021002 (1 March 2013) https://doi.org/10.1117/1.JMM.12.2.021002
TOPICS: Palladium, Signal detection, Inspection, Semiconducting wafers, Photomasks, Extreme ultraviolet, Defect detection, Wafer inspection, Printing, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 12(2), 021003 (28 February 2013) https://doi.org/10.1117/1.JMM.12.2.021003
TOPICS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Image resolution, Defect detection, Optical design, EUV optics, Sensors, Data processing
J. Micro/Nanolith. MEMS MOEMS 12(2), 021004 (1 March 2013) https://doi.org/10.1117/1.JMM.12.2.021004
TOPICS: Semiconducting wafers, Photomasks, Inspection, Extreme ultraviolet lithography, Critical dimension metrology, Opacity, Extreme ultraviolet, Defect inspection, Wafer-level optics, Optical inspection
J. Micro/Nanolith. MEMS MOEMS 12(2), 021005 (1 March 2013) https://doi.org/10.1117/1.JMM.12.2.021005
TOPICS: Extreme ultraviolet, Computer simulations, Waveguides, Photomasks, Diffraction, Multilayers, Data modeling, Matrices, Electromagnetism, Finite-difference time-domain method
J. Micro/Nanolith. MEMS MOEMS 12(2), 021006 (18 March 2013) https://doi.org/10.1117/1.JMM.12.2.021006
TOPICS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 12(2), 021007 (22 March 2013) https://doi.org/10.1117/1.JMM.12.2.021007
TOPICS: Etching, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Line width roughness, Inspection, Photoresist processing, Plasma, Silicon
J. Micro/Nanolith. MEMS MOEMS 12(2), 021008 (1 April 2013) https://doi.org/10.1117/1.JMM.12.2.021008
TOPICS: Extreme ultraviolet, Inspection, Polishing, Photomasks, Extreme ultraviolet lithography, Glasses, Defect inspection, Silicon, Molybdenum, Wafer-level optics
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 12(2), 023001 (8 April 2013) https://doi.org/10.1117/1.JMM.12.2.023001
TOPICS: Capacitance, Feedback control, Electrodes, Feedback loops, Defense technologies, Amplifiers, Fabrication, Gyroscopes, Mechatronics, Anisotropic etching
J. Micro/Nanolith. MEMS MOEMS 12(2), 023002 (25 April 2013) https://doi.org/10.1117/1.JMM.12.2.023002
TOPICS: Molybdenum, Optical components, Micro cutting, Light emitting diodes, Light sources, Waveguides, Light sources and illumination, Light, Polymethylmethacrylate, Prototyping
J. Micro/Nanolith. MEMS MOEMS 12(2), 023003 (26 April 2013) https://doi.org/10.1117/1.JMM.12.2.023003
TOPICS: Critical dimension metrology, Extreme ultraviolet lithography, Edge roughness, Molecules, Extreme ultraviolet, Line width roughness, Image enhancement, Scanning electron microscopy, Picosecond phenomena, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 12(2), 023004 (26 April 2013) https://doi.org/10.1117/1.JMM.12.2.023004
TOPICS: Chemical species, Etching, Silicon, Anisotropic etching, Photomasks, Simulation of CCA and DLA aggregates, Semiconducting wafers, Crystals, Tin, Device simulation
J. Micro/Nanolith. MEMS MOEMS 12(2), 023005 (10 May 2013) https://doi.org/10.1117/1.JMM.12.2.023005
TOPICS: Polymerization, Oxygen, FT-IR spectroscopy, Polymers, Diffusion, Photoresist processing, Ultraviolet radiation, Process control, Process modeling, Optoelectronics
J. Micro/Nanolith. MEMS MOEMS 12(2), 023006 (10 May 2013) https://doi.org/10.1117/1.JMM.12.2.023006
TOPICS: Amplifiers, Ions, Nitrogen, Device simulation, Ionization, 3D modeling, Microelectromechanical systems, Optical amplifiers, Computer simulations, Mass spectrometry
J. Micro/Nanolith. MEMS MOEMS 12(2), 023007 (22 May 2013) https://doi.org/10.1117/1.JMM.12.2.023007
TOPICS: Semiconducting wafers, 3D modeling, Finite element methods, Chemical elements, Lithography, Extreme ultraviolet lithography, Interfaces, Mechanics, Shape analysis, Scanners
J. Micro/Nanolith. MEMS MOEMS 12(2), 023008 (31 May 2013) https://doi.org/10.1117/1.JMM.12.2.023008
TOPICS: Fermium, Frequency modulation, Extreme ultraviolet lithography, Etching, Prototyping, Photomasks, Inspection, Palladium, Extreme ultraviolet, Coating
J. Micro/Nanolith. MEMS MOEMS 12(2), 023009 (4 June 2013) https://doi.org/10.1117/1.JMM.12.2.023009
TOPICS: Atomic force microscopy, Data modeling, 3D modeling, Numerical analysis, Error analysis, Metrology, Statistical modeling, Carbon nanotubes, Solids, Standards development
J. Micro/Nanolith. MEMS MOEMS 12(2), 023010 (5 June 2013) https://doi.org/10.1117/1.JMM.12.2.023010
TOPICS: Annealing, X-rays, Finite element methods, Semiconducting wafers, Tomography, Copper, Inspection, X-ray imaging, X-ray microscopy, Silicon
J. Micro/Nanolith. MEMS MOEMS 12(2), 023011 (6 June 2013) https://doi.org/10.1117/1.JMM.12.2.023011
TOPICS: Camera shutters, 3D image processing, Infrared imaging, Modulation, Image sensors, 3D displays, Cameras, Transmittance, Image processing, Prototyping
J. Micro/Nanolith. MEMS MOEMS 12(2), 023012 (10 June 2013) https://doi.org/10.1117/1.JMM.12.2.023012
TOPICS: Aluminum nitride, Microopto electromechanical systems, Microlens, Lenses, Spherical lenses, Nitrogen, Semiconducting wafers, Manufacturing, Silicon, Solids
J. Micro/Nanolith. MEMS MOEMS 12(2), 023013 (11 June 2013) https://doi.org/10.1117/1.JMM.12.2.023013
TOPICS: Extreme ultraviolet, Defect detection, Photomasks, Inspection, Defect inspection, Image processing, Monte Carlo methods, Electron microscopes, Sensors, Signal detection
J. Micro/Nanolith. MEMS MOEMS 12(2), 023014 (11 June 2013) https://doi.org/10.1117/1.JMM.12.2.023014
TOPICS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Detection and tracking algorithms, Optimization (mathematics), Metals, Semiconducting wafers, Photovoltaics, Source mask optimization
J. Micro/Nanolith. MEMS MOEMS 12(2), 023015 (12 June 2013) https://doi.org/10.1117/1.JMM.12.2.023015
TOPICS: Solids, Nanolithography, Lenses, Spherical lenses, Polymethylmethacrylate, Lithography, Electron beam lithography, Silicon, Microscopes, Objectives
J. Micro/Nanolith. MEMS MOEMS 12(2), 023016 (12 June 2013) https://doi.org/10.1117/1.JMM.12.2.023016
TOPICS: Chlorine, Microsensors, Ions, Electrodes, Sensors, Magnesium, Field effect transistors, Transistors, Bromine, Microsystems
Errata
J. Micro/Nanolith. MEMS MOEMS 12(2), 029801 (20 June 2013) https://doi.org/10.1117/1.JMM.12.2.029801
TOPICS: Diodes, Zone plates, Electrical engineering
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