Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 12 · NO. 3 | July 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(3), 030101 (8 August 2013) https://doi.org/10.1117/1.JMM.12.3.030101
TOPICS: Lithography, Transistors, Semiconductors, Logic, Optical lithography, Etching, Manufacturing, Double patterning technology, Semiconductor manufacturing, Logic devices
Special Section on Alternative Lithographic Technologies
J. Micro/Nanolith. MEMS MOEMS 12(3), 031101 (30 September 2013) https://doi.org/10.1117/1.JMM.12.3.031101
TOPICS: Lithography, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Overlay metrology, Explosives, Metrology, Roads, Molecular self-assembly, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(3), 031103 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.031103
TOPICS: Scattering, X-rays, Picosecond phenomena, Lithography, Polymethylmethacrylate, Metrology, 3D metrology, X-ray lithography, Absorption, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(3), 031104 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.031104
TOPICS: Polarizers, Lithography, Aluminum, Nanostructures, Opacity, Nanoimprint lithography, Optical lithography, Etching, Performance modeling, Glasses
J. Micro/Nanolith. MEMS MOEMS 12(3), 031105 (2 August 2013) https://doi.org/10.1117/1.JMM.12.3.031105
TOPICS: Semiconducting wafers, Nanoimprint lithography, Optical lithography, Head, Thin films, Lithography, Manufacturing, Thin film manufacturing, Etching, Overlay metrology
J. Micro/Nanolith. MEMS MOEMS 12(3), 031106 (26 July 2013) https://doi.org/10.1117/1.JMM.12.3.031106
TOPICS: Photoresist materials, Nanoparticles, Silver, Lithography, Sensors, Metals, Nanolithography, Photomasks, Optical lithography, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 12(3), 031107 (5 August 2013) https://doi.org/10.1117/1.JMM.12.3.031107
TOPICS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 12(3), 031108 (2 August 2013) https://doi.org/10.1117/1.JMM.12.3.031108
TOPICS: Photomasks, Semiconducting wafers, Electron beam direct write lithography, Electron beam lithography, Nanofabrication, Lithography, Beam shaping, Optical proximity correction, Wafer-level optics, Electron beams
J. Micro/Nanolith. MEMS MOEMS 12(3), 031109 (28 August 2013) https://doi.org/10.1117/1.JMM.12.3.031109
TOPICS: Semiconducting wafers, Optical alignment, Lithography, Distortion, Interferometry, Microscopes, Lamps, Feedback loops, Halogens, Modulation
J. Micro/Nanolith. MEMS MOEMS 12(3), 031110 (2 August 2013) https://doi.org/10.1117/1.JMM.12.3.031110
TOPICS: Spherical lenses, Magnetism, Picosecond phenomena, Servomechanisms, Quartz, Beam propagation method, Lithography, Nanoimprint lithography, Reactive ion etching, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(3), 031111 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.031111
TOPICS: Scanning probe lithography, Electron beam lithography, Lithography, Optical lithography, Glasses, Extreme ultraviolet lithography, Nanolithography, Optical alignment, Atomic force microscopy, Inspection
J. Micro/Nanolith. MEMS MOEMS 12(3), 031112 (20 August 2013) https://doi.org/10.1117/1.JMM.12.3.031112
TOPICS: Inspection, Etching, Semiconducting wafers, Critical dimension metrology, Particles, Chemical analysis, Scanning electron microscopy, Polymethylmethacrylate, Signal processing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(3), 031113 (29 August 2013) https://doi.org/10.1117/1.JMM.12.3.031113
TOPICS: Ultraviolet radiation, Nanoimprint lithography, Refractive index, Glucose, Polymers, Nanostructures, LCDs, Polymerization, Scanning probe microscopy, Liquids
J. Micro/Nanolith. MEMS MOEMS 12(3), 031114 (24 September 2013) https://doi.org/10.1117/1.JMM.12.3.031114
TOPICS: Lithography, Head-mounted displays, Glasses, Optical lithography, Microfluidics, Nanoimprint lithography, Interfaces, Natural surfaces, Chemistry, Failure analysis
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 12(3), 033001 (8 July 2013) https://doi.org/10.1117/1.JMM.12.3.033001
TOPICS: Digital micromirror devices, Point spread functions, Super resolution, Mirrors, Image restoration, Compressed sensing, Image resolution, Sensors, Imaging systems, Computer programming
J. Micro/Nanolith. MEMS MOEMS 12(3), 033002 (8 July 2013) https://doi.org/10.1117/1.JMM.12.3.033002
TOPICS: Photomasks, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polarization, Diffraction, Finite-difference time-domain method, Semiconducting wafers, Printing, Plasma
J. Micro/Nanolith. MEMS MOEMS 12(3), 033003 (9 July 2013) https://doi.org/10.1117/1.JMM.12.3.033003
TOPICS: Etching, Silicon, Carbon, Fullerenes, System on a chip, Silicon carbide, Silicon films, Plasma, Semiconducting wafers, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 12(3), 033004 (11 July 2013) https://doi.org/10.1117/1.JMM.12.3.033004
TOPICS: Particles, Visualization, Photoresist processing, Optical lithography, 3D image processing, Image processing, Particle image velocimetry, Calibration, Detection and tracking algorithms, Microscopes
J. Micro/Nanolith. MEMS MOEMS 12(3), 033005 (11 July 2013) https://doi.org/10.1117/1.JMM.12.3.033005
TOPICS: Plasma display panels, Polarizers, Photodetectors, Quantum efficiency, Polarization, Metals, Nanoimprint lithography, Dielectric polarization, Scanning electron microscopy, Nanowires
J. Micro/Nanolith. MEMS MOEMS 12(3), 033006 (17 July 2013) https://doi.org/10.1117/1.JMM.12.3.033006
TOPICS: Monte Carlo methods, Stochastic processes, Photoresist developing, Data modeling, Calibration, Photoresist materials, Standards development, 3D modeling, Lithography, Process modeling
J. Micro/Nanolith. MEMS MOEMS 12(3), 033007 (29 July 2013) https://doi.org/10.1117/1.JMM.12.3.033007
TOPICS: Liquids, Control systems, Capillaries, Roads, Microelectromechanical systems, Glasses, Electronic components, Microfluidics, Astronomical engineering, Local area networks
J. Micro/Nanolith. MEMS MOEMS 12(3), 033008 (2 August 2013) https://doi.org/10.1117/1.JMM.12.3.033008
TOPICS: Gyroscopes, Resonators, Signal detection, Control systems, Silicon, Electronics, Demodulation, Electrodes, Feedback loops, Bandpass filters
J. Micro/Nanolith. MEMS MOEMS 12(3), 033009 (2 August 2013) https://doi.org/10.1117/1.JMM.12.3.033009
TOPICS: Optical lithography, Photoresist materials, Modulation, Lithography, Etching, Photomasks, Semiconducting wafers, Reflectivity, Plasmons, Silicon
J. Micro/Nanolith. MEMS MOEMS 12(3), 033010 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.033010
TOPICS: Fullerenes, Line edge roughness, Extreme ultraviolet lithography, Lithography, Semiconductors, Physics, Extreme ultraviolet, Epoxies, Chromatography, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 12(3), 033011 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.033011
TOPICS: Critical dimension metrology, Semiconducting wafers, Lithography, Polymethylmethacrylate, System on a chip, Semiconductor manufacturing, Tolerancing, Optical lithography, Picosecond phenomena, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(3), 033012 (12 August 2013) https://doi.org/10.1117/1.JMM.12.3.033012
TOPICS: Actuators, Microelectromechanical systems, Deformable mirrors, Mirrors, Gold, Semiconducting wafers, Copper, Chemical mechanical planarization, Power supplies, Ceramics
J. Micro/Nanolith. MEMS MOEMS 12(3), 033013 (19 August 2013) https://doi.org/10.1117/1.JMM.12.3.033013
TOPICS: Error analysis, Mueller matrices, Polarimetry, Silicon, Chemical elements, Statistical analysis, Scanning electron microscopy, Inverse problems, Estimation theory, Diffraction
J. Micro/Nanolith. MEMS MOEMS 12(3), 033014 (19 August 2013) https://doi.org/10.1117/1.JMM.12.3.033014
TOPICS: Overlay metrology, Semiconducting wafers, Photomasks, Optical alignment, Transistors, Lithography, Manufacturing, Double patterning technology, Systems modeling, Scanners
J. Micro/Nanolith. MEMS MOEMS 12(3), 033015 (30 August 2013) https://doi.org/10.1117/1.JMM.12.3.033015
TOPICS: Palladium, Multilayers, Semiconducting wafers, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Etching, Optical lithography, Coating, Quartz
J. Micro/Nanolith. MEMS MOEMS 12(3), 033016 (3 September 2013) https://doi.org/10.1117/1.JMM.12.3.033016
TOPICS: Line edge roughness, Scanning electron microscopy, Fourier transforms, Error analysis, Convolution, Numerical simulations, Solids, Line width roughness, Metrology, Interference (communication)
J. Micro/Nanolith. MEMS MOEMS 12(3), 033017 (3 September 2013) https://doi.org/10.1117/1.JMM.12.3.033017
TOPICS: Optical alignment, Silicon, Etching, Photomicroscopy, Microscopes, Bulk micromachining, Micromachining, Resistance, Reliability, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 12(3), 033018 (9 September 2013) https://doi.org/10.1117/1.JMM.12.3.033018
TOPICS: Image processing, Image compression, Electron beams, Electron beam lithography, Computer programming, Semiconducting wafers, Associative arrays, Lithography, Binary data, Image storage
J. Micro/Nanolith. MEMS MOEMS 12(3), 033019 (25 September 2013) https://doi.org/10.1117/1.JMM.12.3.033019
TOPICS: Nickel, Microfluidics, Chromium, Copper, Fabrication, Electroplating, Thin films, Semiconducting wafers, Metals, Solids
J. Micro/Nanolith. MEMS MOEMS 12(3), 033020 (25 September 2013) https://doi.org/10.1117/1.JMM.12.3.033020
TOPICS: Silicon, Microelectromechanical systems, Actuators, Resistance, Connectors, Photomasks, Video, Semiconductors, Oxides, Electronics
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