journal of micro nanolithography mems and moems
VOL. 12 · NO. 3 | July 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(3), 030101 (8 August 2013) doi:10.1117/1.JMM.12.3.030101
TOPICS: Lithography, Transistors, Semiconductors, Logic, Optical lithography, Etching, Manufacturing, Double patterning technology, Semiconductor manufacturing, Logic devices
Special Section on Alternative Lithographic Technologies
J. Micro/Nanolith. MEMS MOEMS 12(3), 031101 (30 September 2013) doi:10.1117/1.JMM.12.3.031101
TOPICS: Lithography, High volume manufacturing, Extreme ultraviolet lithography, Optical lithography, Overlay metrology, Explosives, Metrology, Roads, Molecular self-assembly, Directed self assembly
Xavier Chevalier, Célia Nicolet, Raluca Tiron, Ahmed Gharbi, Maxime Argoud, Jonathan Pradelles, Michael Delalande, Gilles Cunge, Guillaume Fleury, Georges Hadziioannou, Christophe Navarro
J. Micro/Nanolith. MEMS MOEMS 12(3), 031102 (1 July 2013) doi:10.1117/1.JMM.12.3.031102
J. Micro/Nanolith. MEMS MOEMS 12(3), 031103 (12 August 2013) doi:10.1117/1.JMM.12.3.031103
TOPICS: Scattering, X-rays, Picosecond phenomena, Lithography, Polymethylmethacrylate, Metrology, 3D metrology, X-ray lithography, Absorption, Directed self assembly
Se Hyun Ahn, Shuqiang Yang, Mike Miller, Maha Ganapathisubramanian, Marlon Menezes, Jin Choi, Frank Xu, Douglas Resnick, S. Sreenivasan
J. Micro/Nanolith. MEMS MOEMS 12(3), 031104 (12 August 2013) doi:10.1117/1.JMM.12.3.031104
TOPICS: Polarizers, Lithography, Aluminum, Nanostructures, Opacity, Nanoimprint lithography, Optical lithography, Etching, Performance modeling, Glasses
Daniel Sullivan, Thomas Boonstra, Mark Kief, Lily Youtt, Sethuraman Jayashankar, Carolyn Van Dorn, Harold Gentile, Sriram Viswanathan, Dexin Wang, Dion Song, Dongsung Hong, Sung-Hoon Gee
J. Micro/Nanolith. MEMS MOEMS 12(3), 031105 (2 August 2013) doi:10.1117/1.JMM.12.3.031105
TOPICS: Semiconducting wafers, Nanoimprint lithography, Optical lithography, Head, Thin films, Lithography, Manufacturing, Thin film manufacturing, Etching, Overlay metrology
Ryan Denomme, Krishna Iyer, Michael Kreder, Brendan Smith, Patricia Nieva
J. Micro/Nanolith. MEMS MOEMS 12(3), 031106 (26 July 2013) doi:10.1117/1.JMM.12.3.031106
TOPICS: Photoresist materials, Nanoparticles, Silver, Lithography, Sensors, Metals, Nanolithography, Photomasks, Optical lithography, Semiconducting wafers
Luca Grella, Allen Carroll, Kirk Murray, Mark McCord, William Tong, Alan Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey Elam
J. Micro/Nanolith. MEMS MOEMS 12(3), 031107 (5 August 2013) doi:10.1117/1.JMM.12.3.031107
TOPICS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 12(3), 031108 (2 August 2013) doi:10.1117/1.JMM.12.3.031108
TOPICS: Photomasks, Semiconducting wafers, Electron beam direct write lithography, Electron beam lithography, Nanofabrication, Lithography, Beam shaping, Optical proximity correction, Wafer-level optics, Electron beams
Euclid Moon, Saurabh Chandorkar, S. Sreenivasan, R. Fabian Pease
J. Micro/Nanolith. MEMS MOEMS 12(3), 031109 (28 August 2013) doi:10.1117/1.JMM.12.3.031109
TOPICS: Semiconducting wafers, Optical alignment, Lithography, Distortion, Interferometry, Microscopes, Lamps, Feedback loops, Halogens, Modulation
Shuaigang Xiao, XiaoMin Yang, Kim Lee, Justin Hwu, Koichi Wago, David Kuo
J. Micro/Nanolith. MEMS MOEMS 12(3), 031110 (2 August 2013) doi:10.1117/1.JMM.12.3.031110
TOPICS: Spherical lenses, Magnetism, Picosecond phenomena, Servomechanisms, Quartz, Beam propagation method, Lithography, Nanoimprint lithography, Reactive ion etching, Directed self assembly
Marcus Kaestner, Manuel Hofer, Ivo Rangelow
J. Micro/Nanolith. MEMS MOEMS 12(3), 031111 (12 August 2013) doi:10.1117/1.JMM.12.3.031111
TOPICS: Scanning probe lithography, Electron beam lithography, Lithography, Optical lithography, Glasses, Extreme ultraviolet lithography, Nanolithography, Optical alignment, Atomic force microscopy, Inspection
J. Micro/Nanolith. MEMS MOEMS 12(3), 031112 (20 August 2013) doi:10.1117/1.JMM.12.3.031112
TOPICS: Inspection, Etching, Semiconducting wafers, Critical dimension metrology, Particles, Chemical analysis, Scanning electron microscopy, Polymethylmethacrylate, Signal processing, Directed self assembly
Satoshi Takei, Gaku Murakami, Yuto Mori, Takumi Ichikawa, Atsushi Sekiguchi, Tsutomu Obata, Yoshiyuki Yokoyama, Wataru Mizuno, Junji Sumioka, Yuji Horita
J. Micro/Nanolith. MEMS MOEMS 12(3), 031113 (29 August 2013) doi:10.1117/1.JMM.12.3.031113
TOPICS: Ultraviolet radiation, Nanoimprint lithography, Refractive index, Glucose, Polymers, Nanostructures, LCDs, Polymerization, Scanning probe microscopy, Liquids
Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson
J. Micro/Nanolith. MEMS MOEMS 12(3), 031114 (24 September 2013) doi:10.1117/1.JMM.12.3.031114
TOPICS: Lithography, Head-mounted displays, Glasses, Optical lithography, Microfluidics, Nanoimprint lithography, Interfaces, Natural surfaces, Chemistry, Failure analysis
Regular Articles
Alex Zlotnik, Yuval Kapellner, Zvika Afik, Itshak Layani, Zeev Zalevsky
J. Micro/Nanolith. MEMS MOEMS 12(3), 033001 (8 July 2013) doi:10.1117/1.JMM.12.3.033001
TOPICS: Digital micromirror devices, Point spread functions, Super resolution, Mirrors, Image restoration, Compressed sensing, Image resolution, Sensors, Imaging systems, Computer programming
Serhiy Danylyuk, Peter Loosen, Klaus Bergmann, Hyun-su Kim, Larissa Juschkin
J. Micro/Nanolith. MEMS MOEMS 12(3), 033002 (8 July 2013) doi:10.1117/1.JMM.12.3.033002
TOPICS: Photomasks, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polarization, Diffraction, Finite-difference time-domain method, Semiconducting wafers, Printing, Plasma
Andreas Frommhold, Richard Palmer, Alex Robinson
J. Micro/Nanolith. MEMS MOEMS 12(3), 033003 (9 July 2013) doi:10.1117/1.JMM.12.3.033003
TOPICS: Etching, Silicon, Carbon, Fullerenes, System on a chip, Silicon carbide, Silicon films, Plasma, Semiconducting wafers, Photoresist materials
Du Jun, Wei Zhengying, Li Shize, Tang Yiping
J. Micro/Nanolith. MEMS MOEMS 12(3), 033004 (11 July 2013) doi:10.1117/1.JMM.12.3.033004
TOPICS: Particles, Visualization, Photoresist processing, Optical lithography, 3D image processing, Image processing, Particle image velocimetry, Calibration, Detection and tracking algorithms, Microscopes
Jinkui Chu, Zhiwen Wang, Yingjie Zhang, Ze Liu, Yinlong Wang
J. Micro/Nanolith. MEMS MOEMS 12(3), 033005 (11 July 2013) doi:10.1117/1.JMM.12.3.033005
TOPICS: Plasma display panels, Polarizers, Photodetectors, Quantum efficiency, Polarization, Metals, Nanoimprint lithography, Dielectric polarization, Scanning electron microscopy, Nanowires
J. Micro/Nanolith. MEMS MOEMS 12(3), 033006 (17 July 2013) doi:10.1117/1.JMM.12.3.033006
TOPICS: Monte Carlo methods, Stochastic processes, Photoresist developing, Data modeling, Calibration, Photoresist materials, Standards development, 3D modeling, Lithography, Process modeling
Tzong-Shyng Leu, Chin-Tsan Wang, Jui-Ming Yo, Yao-Cheng Lee
J. Micro/Nanolith. MEMS MOEMS 12(3), 033007 (29 July 2013) doi:10.1117/1.JMM.12.3.033007
TOPICS: Liquids, Control systems, Capillaries, Roads, Microelectromechanical systems, Glasses, Electronic components, Microfluidics, Astronomical engineering, Local area networks
Jianbin Su, Dingbang Xiao, Xuezhong Wu, Zhihua Chen, Zhanqiang Hou
J. Micro/Nanolith. MEMS MOEMS 12(3), 033008 (2 August 2013) doi:10.1117/1.JMM.12.3.033008
TOPICS: Gyroscopes, Resonators, Signal detection, Control systems, Silicon, Electronics, Demodulation, Electrodes, Feedback loops, Bandpass filters
Boyan Penkov, Garry Bordonaro, Andrii Golovin, Igor Bendoym, Donald Tennant, David Crouse
J. Micro/Nanolith. MEMS MOEMS 12(3), 033009 (2 August 2013) doi:10.1117/1.JMM.12.3.033009
TOPICS: Optical lithography, Photoresist materials, Modulation, Lithography, Etching, Photomasks, Semiconducting wafers, Reflectivity, Plasmons, Silicon
Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, Richard Palmer
J. Micro/Nanolith. MEMS MOEMS 12(3), 033010 (12 August 2013) doi:10.1117/1.JMM.12.3.033010
TOPICS: Fullerenes, Line edge roughness, Extreme ultraviolet lithography, Lithography, Semiconductors, Physics, Extreme ultraviolet, Epoxies, Chromatography, Semiconducting wafers
Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hirokazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima
J. Micro/Nanolith. MEMS MOEMS 12(3), 033011 (12 August 2013) doi:10.1117/1.JMM.12.3.033011
TOPICS: Critical dimension metrology, Semiconducting wafers, Lithography, Polymethylmethacrylate, System on a chip, Semiconductor manufacturing, Tolerancing, Optical lithography, Picosecond phenomena, Directed self assembly
Bautista Fernandez, Mohamed Bouchti, Joel Kubby
J. Micro/Nanolith. MEMS MOEMS 12(3), 033012 (12 August 2013) doi:10.1117/1.JMM.12.3.033012
TOPICS: Actuators, Microelectromechanical systems, Deformable mirrors, Mirrors, Gold, Semiconducting wafers, Copper, Chemical mechanical planarization, Power supplies, Ceramics
Xiuguo Chen, Shiyuan Liu, Chuanwei Zhang, Hao Jiang
J. Micro/Nanolith. MEMS MOEMS 12(3), 033013 (19 August 2013) doi:10.1117/1.JMM.12.3.033013
TOPICS: Error analysis, Mueller matrices, Polarimetry, Silicon, Chemical elements, Statistical analysis, Scanning electron microscopy, Inverse problems, Estimation theory, Diffraction
J. Micro/Nanolith. MEMS MOEMS 12(3), 033014 (19 August 2013) doi:10.1117/1.JMM.12.3.033014
TOPICS: Overlay metrology, Semiconducting wafers, Photomasks, Optical alignment, Transistors, Lithography, Manufacturing, Double patterning technology, Systems modeling, Scanners
J. Micro/Nanolith. MEMS MOEMS 12(3), 033015 (30 August 2013) doi:10.1117/1.JMM.12.3.033015
TOPICS: Palladium, Multilayers, Semiconducting wafers, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Etching, Optical lithography, Coating, Quartz
J. Micro/Nanolith. MEMS MOEMS 12(3), 033016 (3 September 2013) doi:10.1117/1.JMM.12.3.033016
TOPICS: Line edge roughness, Scanning electron microscopy, Fourier transforms, Error analysis, Convolution, Numerical simulations, Solids, Line width roughness, Metrology, Interference (communication)
Duanqin Zhang, Jianxiu Liu, Le Guan, Jinkui Chu
J. Micro/Nanolith. MEMS MOEMS 12(3), 033017 (3 September 2013) doi:10.1117/1.JMM.12.3.033017
TOPICS: Optical alignment, Silicon, Etching, Photomicroscopy, Microscopes, Bulk micromachining, Micromachining, Resistance, Reliability, Microelectromechanical systems
Jeehong Yang, Serap Savari, H. Rusty Harris
J. Micro/Nanolith. MEMS MOEMS 12(3), 033018 (9 September 2013) doi:10.1117/1.JMM.12.3.033018
TOPICS: Image processing, Image compression, Electron beams, Electron beam lithography, Computer programming, Semiconducting wafers, Associative arrays, Lithography, Binary data, Image storage
Jun Zhu, Ying Cao, Hong Wang, Yigui Li, Xiang Chen, Di Chen
J. Micro/Nanolith. MEMS MOEMS 12(3), 033019 (25 September 2013) doi:10.1117/1.JMM.12.3.033019
TOPICS: Nickel, Microfluidics, Chromium, Copper, Fabrication, Electroplating, Thin films, Semiconducting wafers, Metals, Solids
Sujatha Lakshminarayanan, Siddhartha Murali, Saravanan Mani, Selvakumar Subramani
J. Micro/Nanolith. MEMS MOEMS 12(3), 033020 (25 September 2013) doi:10.1117/1.JMM.12.3.033020
TOPICS: Silicon, Microelectromechanical systems, Actuators, Resistance, Connectors, Photomasks, Video, Semiconductors, Oxides, Electronics
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