journal of micro nanolithography mems and moems
VOL. 12 · NO. 4 | October 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(4), 040101 (19 December 2013) doi:10.1117/1.JMM.12.4.040101
TOPICS: Visualization, Data communications, Data modeling, Photomicroscopy, Astatine, Error analysis, Statistical analysis, Brain, Data analysis, Graphic design
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 12(4), 040501 (16 December 2013) doi:10.1117/1.JMM.12.4.040501
TOPICS: Nanoimprint lithography, Biopolymers, Waveguides, Silicon, Polymers, Coating, Fabrication, Optical lithography, Cladding, Gold
Special Section on Advanced Fabrication of MEMS and Photonic Devices
J. Micro/Nanolith. MEMS MOEMS 12(4), 041201 (16 December 2013) doi:10.1117/1.JMM.12.4.041201
TOPICS: Microelectromechanical systems, Integrated optics, Active optics, Photonic devices, Sensors, Actuators, Biomedical optics, Metamaterials, Terahertz radiation, Quantum dots
Yeonsang Park, Young-Geun Roh, Un Jeong Kim, Dae-Young Chung, Hwansoo Suh, Jineun Kim, Sangmo Cheon, Jaesoong Lee, Tae-Ho Kim, Kyung-Sang Cho, Chang-Won Lee
J. Micro/Nanolith. MEMS MOEMS 12(4), 041202 (25 September 2013) doi:10.1117/1.JMM.12.4.041202
TOPICS: Electron beam lithography, Surface plasmons, Quantum dots, Luminescence, Plasmonics, Optical lithography, Printing, Molecules, Scanning electron microscopy, Atomic force microscopy
Avinash Kumar, Ankur Gupta, Rishi Kant, Syed Akhtar, Nachiketa Tiwari, Janakrajan Ramkumar, Shantanu Bhattacharya
J. Micro/Nanolith. MEMS MOEMS 12(4), 041203 (25 September 2013) doi:10.1117/1.JMM.12.4.041203
TOPICS: Photomasks, Glasses, Laser processing, Aluminum, Excimer lasers, Edge roughness, Photomicroscopy, Optical lithography, Image analysis, Chromium
Dragoslav Grbovic, Fabio Alves, Brian Kearney, Benjamin Waxer, Rolando Perez, George Omictin
J. Micro/Nanolith. MEMS MOEMS 12(4), 041204 (22 October 2013) doi:10.1117/1.JMM.12.4.041204
TOPICS: Terahertz radiation, Metamaterials, Absorption, Dielectrics, Aluminum, Photoresist materials, Refractive index, Imaging systems, Sensors, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041205 (26 November 2013) doi:10.1117/1.JMM.12.4.041205
TOPICS: Actuators, Polymers, Silicon, Electrodes, Polymeric actuators, Semiconducting wafers, Finite element methods, Micromirrors, Diamond turning, Diamond machining
Viviana Mulloni, Alessandro Faes, Benno Margesin
J. Micro/Nanolith. MEMS MOEMS 12(4), 041206 (27 November 2013) doi:10.1117/1.JMM.12.4.041206
TOPICS: Resonators, Silicon, Oxides, Microelectromechanical systems, Liquids, Solids, Etching, Capillaries, Electrodes, Wet etching
J. Micro/Nanolith. MEMS MOEMS 12(4), 041299 (24 September 2013) doi:10.1117/1.JMM.12.4.041299
TOPICS: Solids, Lenses, Photonics, Micro optics, Microelectromechanical systems, Photonic devices, Computer engineering
Special Section on Advanced Plasma-Etch Technology
J. Micro/Nanolith. MEMS MOEMS 12(4), 041301 (23 December 2013) doi:10.1117/1.JMM.12.4.041301
TOPICS: CMOS technology, Optical lithography, Plasma etching, Etching, Plasma, Semiconductors, Lithography, Extreme ultraviolet, Line edge roughness, Directed self assembly
Kaidong Xu, Laurent Souriau, David Hellin, Janko Versluijs, Patrick Wong, Diziana Vangoidsenhoven, Nadia Vandenbroeck, Harold Dekkers, Xiaoping Shi, Johan Albert, Chi Lim Tan, Johan Vertommen, Bart Coenegrachts, Isabelle Orain, Yoshie Kimura, Vincent Wiaux, Werner Boullart
J. Micro/Nanolith. MEMS MOEMS 12(4), 041302 (4 September 2013) doi:10.1117/1.JMM.12.4.041302
TOPICS: Line width roughness, Optical lithography, Etching, Line edge roughness, Photomasks, Silicon, Extreme ultraviolet lithography, Plasma, Plasma enhanced chemical vapor deposition, Lithography
Gustaf Winroth, Erik Rosseel, Christie Delvaux, Efrain Sanchez, Monique Ercken
J. Micro/Nanolith. MEMS MOEMS 12(4), 041303 (5 September 2013) doi:10.1117/1.JMM.12.4.041303
TOPICS: Photoresist materials, Lithography, Ions, Ion implantation, Critical dimension metrology, Scanning electron microscopy, Annealing, Optical lithography, Etching, Photomasks
Laurent Azarnouche, Erwine Pargon, Kevin Menguelti, Marc Fouchier, Melisa Brihoum, Raphael Ramos, Olivier Joubert, Pascal Gouraud, Christophe Verove
J. Micro/Nanolith. MEMS MOEMS 12(4), 041304 (25 September 2013) doi:10.1117/1.JMM.12.4.041304
TOPICS: Line width roughness, Plasma, Vacuum ultraviolet, Plasma treatment, Optical lithography, Etching, Photoresist materials, Carbon, Plasma etching, Argon
Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Lynne Gignac, James Bucchignano, David Klaus, Christopher Breslin, Eric Joseph, Joy Cheng, Daniel Sanders, Michael Guillorn, Chi-Chun Liu
J. Micro/Nanolith. MEMS MOEMS 12(4), 041305 (25 September 2013) doi:10.1117/1.JMM.12.4.041305
TOPICS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly
Hubert Hody, Vasile Paraschiv, Emma Vecchio, Sabrina Locorotondo, Gustaf Winroth, Raja Athimulam, Werner Boullart
J. Micro/Nanolith. MEMS MOEMS 12(4), 041306 (1 October 2013) doi:10.1117/1.JMM.12.4.041306
TOPICS: Etching, Line width roughness, Double patterning technology, Photomasks, Silicon, Amorphous silicon, Plasma, Optical lithography, Chemistry, Critical dimension metrology
Tao Deng, Jian Chen, Mengwei Li, Chenxu Zhao, Zewen Liu
J. Micro/Nanolith. MEMS MOEMS 12(4), 041307 (18 October 2013) doi:10.1117/1.JMM.12.4.041307
TOPICS: Nanostructures, Silicon, Platinum, Particles, Wet etching, Optical lithography, Nanolithography, Metals, Electron beam lithography, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041308 (28 October 2013) doi:10.1117/1.JMM.12.4.041308
TOPICS: Line edge roughness, Atomic force microscopy, Etching, Plasma, Silicon, Critical dimension metrology, Photoresist materials, Plasma treatment, Plasma etching, Vacuum ultraviolet
Makoto Satake, Taku Iwase, Masaru Kurihara, Nobuyuki Negishi, Yasuhiko Tada, Hiroshi Yoshida
J. Micro/Nanolith. MEMS MOEMS 12(4), 041309 (8 November 2013) doi:10.1117/1.JMM.12.4.041309
TOPICS: Etching, Plasma, Oxygen, Argon, Polymethylmethacrylate, Plasma etching, Ions, Picosecond phenomena, Polymers, Directed self assembly
Vassilios Constantoudis, George Kokkoris, Evangelos Gogolides
J. Micro/Nanolith. MEMS MOEMS 12(4), 041310 (12 November 2013) doi:10.1117/1.JMM.12.4.041310
TOPICS: Line edge roughness, 3D modeling, Etching, Plasma, Anisotropy, Plasma etching, Photoresist processing, Ions, Line width roughness, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041311 (27 December 2013) doi:10.1117/1.JMM.12.4.041311
TOPICS: Plasma etching, Plasma, Etching, Optical lithography, Semiconducting wafers, Ions, Nanotechnology, Nanostructures, Reactive ion etching, Photomasks
Review Articles
J. Micro/Nanolith. MEMS MOEMS 12(4), 042001 (17 December 2013) doi:10.1117/1.JMM.12.4.042001
TOPICS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 12(4), 043001 (2 October 2013) doi:10.1117/1.JMM.12.4.043001
TOPICS: Monochromatic aberrations, Extreme ultraviolet lithography, Metrology, Wavefronts, Diffraction, Data modeling, Semiconducting wafers, Error analysis, Lithography, Zernike polynomials
J. Micro/Nanolith. MEMS MOEMS 12(4), 043002 (25 October 2013) doi:10.1117/1.JMM.12.4.043002
TOPICS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology
Wen Lv, Qi Xia, Shiyuan Liu
J. Micro/Nanolith. MEMS MOEMS 12(4), 043003 (8 November 2013) doi:10.1117/1.JMM.12.4.043003
TOPICS: Photomasks, Lithography, Manufacturing, Gaussian filters, Image processing, Semiconducting wafers, Imaging systems, Filtering (signal processing), Image filtering, Image resolution
Arvydas Palevicius, Sigita Ponelyte, Asta Guobiene, Igoris Prosycevas, Judita Puiso, Rokas Sakalys
J. Micro/Nanolith. MEMS MOEMS 12(4), 043004 (5 December 2013) doi:10.1117/1.JMM.12.4.043004
TOPICS: Ferroelectric polymers, Nanocomposites, Polymethylmethacrylate, Thin films, Polymers, Sensing systems, Coating, Nanolithography, Optical design, Diffraction
J. Micro/Nanolith. MEMS MOEMS 12(4), 043005 (6 December 2013) doi:10.1117/1.JMM.12.4.043005
TOPICS: Silicon, Reflectivity, Molybdenum, Mirrors, Absorption, Extreme ultraviolet, Photonic crystals, Chromium, Lithium, Extreme ultraviolet lithography
Peter Trefonas, James Thackeray, Guorong Sun, Sangho Cho, Corrie Clark, Stanislav Verkhoturov, Michael Eller, Ang Li, Adriana Pavia-Sanders, Emile Schweikert, Karen Wooley
J. Micro/Nanolith. MEMS MOEMS 12(4), 043006 (16 December 2013) doi:10.1117/1.JMM.12.4.043006
TOPICS: Polymers, Lithography, Fluorine, Molecules, Electron beam lithography, Atomic force microscopy, Polymerization, Ions, Electron beams, Diffusion
J. Micro/Nanolith. MEMS MOEMS 12(4), 043007 (19 December 2013) doi:10.1117/1.JMM.12.4.043007
TOPICS: Dielectrics, Resonators, Silicon, Bessel functions, Solids, Micro optics, Waveguides, Silicon photonics, Geometrical optics, Photonic crystals
Robin Scheibler, Paul Hurley, Amina Chebira
J. Micro/Nanolith. MEMS MOEMS 12(4), 043008 (20 December 2013) doi:10.1117/1.JMM.12.4.043008
TOPICS: Transform theory, Very large scale integration, Algorithm development, Lithography, Photomasks, Fourier transforms, Fast wavelet transforms, Etching, Optical lithography, Computational lithography
COMMUNICATIONS
Yiqiang Fan, Huawei Li, Ying Yi, Ian Foulds
J. Micro/Nanolith. MEMS MOEMS 12(4), 049701 (16 December 2013) doi:10.1117/1.JMM.12.4.049701
TOPICS: Polymethylmethacrylate, Deep ultraviolet, Microfluidics, Sputter deposition, Optical lithography, Electrodes, Gold, Photomasks, Laser cutting, Gas lasers
Errata
Lakshminarayanan Sujatha, Siddhartha Murali, Saravanan Mani, Selvakumar Subramani
J. Micro/Nanolith. MEMS MOEMS 12(4), 049801 (4 October 2013) doi:10.1117/1.JMM.12.4.049801
TOPICS: Silicon, Microelectromechanical systems
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