Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 12 · NO. 4 | October 2013
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 12(4), 040101 (19 December 2013) https://doi.org/10.1117/1.JMM.12.4.040101
TOPICS: Visualization, Data communications, Data modeling, Photomicroscopy, Astatine, Error analysis, Statistical analysis, Brain, Data analysis, Graphic design
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 12(4), 040501 (16 December 2013) https://doi.org/10.1117/1.JMM.12.4.040501
TOPICS: Nanoimprint lithography, Biopolymers, Waveguides, Silicon, Polymers, Coating, Fabrication, Optical lithography, Cladding, Gold
Special Section on Advanced Fabrication of MEMS and Photonic Devices
J. Micro/Nanolith. MEMS MOEMS 12(4), 041201 (16 December 2013) https://doi.org/10.1117/1.JMM.12.4.041201
TOPICS: Microelectromechanical systems, Integrated optics, Active optics, Photonic devices, Sensors, Actuators, Biomedical optics, Metamaterials, Terahertz radiation, Quantum dots
J. Micro/Nanolith. MEMS MOEMS 12(4), 041202 (25 September 2013) https://doi.org/10.1117/1.JMM.12.4.041202
TOPICS: Electron beam lithography, Surface plasmons, Quantum dots, Luminescence, Plasmonics, Optical lithography, Printing, Molecules, Scanning electron microscopy, Atomic force microscopy
J. Micro/Nanolith. MEMS MOEMS 12(4), 041203 (25 September 2013) https://doi.org/10.1117/1.JMM.12.4.041203
TOPICS: Photomasks, Glasses, Laser processing, Aluminum, Excimer lasers, Edge roughness, Photomicroscopy, Optical lithography, Image analysis, Chromium
J. Micro/Nanolith. MEMS MOEMS 12(4), 041204 (22 October 2013) https://doi.org/10.1117/1.JMM.12.4.041204
TOPICS: Terahertz radiation, Metamaterials, Absorption, Dielectrics, Aluminum, Photoresist materials, Refractive index, Imaging systems, Sensors, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041205 (26 November 2013) https://doi.org/10.1117/1.JMM.12.4.041205
TOPICS: Actuators, Polymers, Silicon, Electrodes, Polymeric actuators, Semiconducting wafers, Finite element methods, Micromirrors, Diamond turning, Diamond machining
J. Micro/Nanolith. MEMS MOEMS 12(4), 041206 (27 November 2013) https://doi.org/10.1117/1.JMM.12.4.041206
TOPICS: Resonators, Silicon, Oxides, Microelectromechanical systems, Liquids, Solids, Etching, Capillaries, Electrodes, Wet etching
J. Micro/Nanolith. MEMS MOEMS 12(4), 041299 (24 September 2013) https://doi.org/10.1117/1.JMM.12.4.041299
TOPICS: Solids, Lenses, Photonics, Micro optics, Microelectromechanical systems, Photonic devices, Computer engineering
Special Section on Advanced Plasma-Etch Technology
J. Micro/Nanolith. MEMS MOEMS 12(4), 041301 (23 December 2013) https://doi.org/10.1117/1.JMM.12.4.041301
TOPICS: CMOS technology, Optical lithography, Plasma etching, Etching, Plasma, Semiconductors, Lithography, Extreme ultraviolet, Line edge roughness, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(4), 041302 (4 September 2013) https://doi.org/10.1117/1.JMM.12.4.041302
TOPICS: Line width roughness, Optical lithography, Etching, Line edge roughness, Photomasks, Silicon, Extreme ultraviolet lithography, Plasma, Plasma enhanced chemical vapor deposition, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041303 (5 September 2013) https://doi.org/10.1117/1.JMM.12.4.041303
TOPICS: Photoresist materials, Lithography, Ions, Ion implantation, Critical dimension metrology, Scanning electron microscopy, Annealing, Optical lithography, Etching, Photomasks
J. Micro/Nanolith. MEMS MOEMS 12(4), 041304 (25 September 2013) https://doi.org/10.1117/1.JMM.12.4.041304
TOPICS: Line width roughness, Plasma, Vacuum ultraviolet, Plasma treatment, Optical lithography, Etching, Photoresist materials, Carbon, Plasma etching, Argon
J. Micro/Nanolith. MEMS MOEMS 12(4), 041305 (25 September 2013) https://doi.org/10.1117/1.JMM.12.4.041305
TOPICS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(4), 041306 (1 October 2013) https://doi.org/10.1117/1.JMM.12.4.041306
TOPICS: Etching, Line width roughness, Double patterning technology, Photomasks, Silicon, Amorphous silicon, Plasma, Optical lithography, Chemistry, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 12(4), 041307 (18 October 2013) https://doi.org/10.1117/1.JMM.12.4.041307
TOPICS: Nanostructures, Silicon, Platinum, Particles, Wet etching, Optical lithography, Nanolithography, Metals, Electron beam lithography, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041308 (28 October 2013) https://doi.org/10.1117/1.JMM.12.4.041308
TOPICS: Line edge roughness, Atomic force microscopy, Etching, Plasma, Silicon, Critical dimension metrology, Photoresist materials, Plasma treatment, Plasma etching, Vacuum ultraviolet
J. Micro/Nanolith. MEMS MOEMS 12(4), 041309 (8 November 2013) https://doi.org/10.1117/1.JMM.12.4.041309
TOPICS: Etching, Plasma, Oxygen, Argon, Polymethylmethacrylate, Plasma etching, Ions, Picosecond phenomena, Polymers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 12(4), 041310 (12 November 2013) https://doi.org/10.1117/1.JMM.12.4.041310
TOPICS: Line edge roughness, 3D modeling, Etching, Plasma, Anisotropy, Plasma etching, Photoresist processing, Ions, Line width roughness, Lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 041311 (27 December 2013) https://doi.org/10.1117/1.JMM.12.4.041311
TOPICS: Plasma etching, Plasma, Etching, Optical lithography, Semiconducting wafers, Ions, Nanotechnology, Nanostructures, Reactive ion etching, Photomasks
Review Articles
J. Micro/Nanolith. MEMS MOEMS 12(4), 042001 (17 December 2013) https://doi.org/10.1117/1.JMM.12.4.042001
TOPICS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 12(4), 043001 (2 October 2013) https://doi.org/10.1117/1.JMM.12.4.043001
TOPICS: Monochromatic aberrations, Extreme ultraviolet lithography, Metrology, Wavefronts, Diffraction, Data modeling, Semiconducting wafers, Error analysis, Lithography, Zernike polynomials
J. Micro/Nanolith. MEMS MOEMS 12(4), 043002 (25 October 2013) https://doi.org/10.1117/1.JMM.12.4.043002
TOPICS: Semiconducting wafers, Electronic support measures, Overlay metrology, Optical alignment, Silicon, Photomasks, Lithography, Laser range finders, Scanners, Metrology
J. Micro/Nanolith. MEMS MOEMS 12(4), 043003 (8 November 2013) https://doi.org/10.1117/1.JMM.12.4.043003
TOPICS: Photomasks, Lithography, Manufacturing, Gaussian filters, Image processing, Semiconducting wafers, Imaging systems, Filtering (signal processing), Image filtering, Image resolution
J. Micro/Nanolith. MEMS MOEMS 12(4), 043004 (5 December 2013) https://doi.org/10.1117/1.JMM.12.4.043004
TOPICS: Ferroelectric polymers, Nanocomposites, Polymethylmethacrylate, Thin films, Polymers, Sensing systems, Coating, Nanolithography, Optical design, Diffraction
J. Micro/Nanolith. MEMS MOEMS 12(4), 043005 (6 December 2013) https://doi.org/10.1117/1.JMM.12.4.043005
TOPICS: Silicon, Reflectivity, Molybdenum, Mirrors, Absorption, Extreme ultraviolet, Photonic crystals, Chromium, Lithium, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 12(4), 043006 (16 December 2013) https://doi.org/10.1117/1.JMM.12.4.043006
TOPICS: Polymers, Lithography, Fluorine, Molecules, Electron beam lithography, Atomic force microscopy, Polymerization, Ions, Electron beams, Diffusion
J. Micro/Nanolith. MEMS MOEMS 12(4), 043007 (19 December 2013) https://doi.org/10.1117/1.JMM.12.4.043007
TOPICS: Dielectrics, Resonators, Silicon, Bessel functions, Solids, Micro optics, Waveguides, Silicon photonics, Geometrical optics, Photonic crystals
J. Micro/Nanolith. MEMS MOEMS 12(4), 043008 (20 December 2013) https://doi.org/10.1117/1.JMM.12.4.043008
TOPICS: Transform theory, Very large scale integration, Algorithm development, Lithography, Photomasks, Fourier transforms, Fast wavelet transforms, Etching, Optical lithography, Computational lithography
COMMUNICATIONS
J. Micro/Nanolith. MEMS MOEMS 12(4), 049701 (16 December 2013) https://doi.org/10.1117/1.JMM.12.4.049701
TOPICS: Polymethylmethacrylate, Deep ultraviolet, Microfluidics, Sputter deposition, Optical lithography, Electrodes, Gold, Photomasks, Laser cutting, Gas lasers
Errata
J. Micro/Nanolith. MEMS MOEMS 12(4), 049801 (4 October 2013) https://doi.org/10.1117/1.JMM.12.4.049801
TOPICS: Silicon, Microelectromechanical systems
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