Editorial
J. Micro/Nanolith. MEMS MOEMS 13(1), 010101 (31 July 2014) https://doi.org/10.1117/1.JMM.13.1.010101
J. Micro/Nanolith. MEMS MOEMS 13(1), 010102 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.010102
TOPICS: Excel, Visualization, Solids, Eye, Data modeling, Binary data, Uranus, Infrared radiation, Stars, Monte Carlo methods
J. Micro/Nanolith. MEMS MOEMS 13(1), 010103 (15 April 2014) https://doi.org/10.1117/1.JMM.13.1.010103
TOPICS: Optical lithography, Lithography, Extreme ultraviolet lithography, Optics manufacturing, Photomasks, Immersion lithography, Logic, Resolution enhancement technologies, Integrated optics, Product engineering
Special Section on Optical Lithography Extension Beyond the 14-nm Node
J. Micro/Nanolith. MEMS MOEMS 13(1), 011002 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011002
TOPICS: Photomasks, Diffraction, Artificial neural networks, Data modeling, Optical lithography, Systems modeling, Lithography, Polarization, Neurons, Optical simulations
J. Micro/Nanolith. MEMS MOEMS 13(1), 011003 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011003
TOPICS: Photomasks, Electron beam lithography, Computational lithography, Lithography, Manufacturing, Data modeling, Optical proximity correction, Vestigial sideband modulation, Semiconducting wafers, Model-based design
J. Micro/Nanolith. MEMS MOEMS 13(1), 011004 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011004
TOPICS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling
J. Micro/Nanolith. MEMS MOEMS 13(1), 011005 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011005
TOPICS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing
J. Micro/Nanolith. MEMS MOEMS 13(1), 011006 (7 January 2014) https://doi.org/10.1117/1.JMM.13.1.011006
TOPICS: Semiconducting wafers, Scanners, Overlay metrology, Lithography, Reticles, Metrology, Control systems, Projection lithography, Calibration, Actuators
Hirokazu Nosato, Hidenori Sakanashi, Eiichi Takahashi, Masahiro Murakawa, Tetsuaki Matsunawa, Shimon Maeda, Satoshi Tanaka
J. Micro/Nanolith. MEMS MOEMS 13(1), 011007 (6 February 2014) https://doi.org/10.1117/1.JMM.13.1.011007
TOPICS: Lithography, Feature extraction, Photomasks, Semiconducting wafers, Design for manufacturing, Data modeling, Semiconductors, Geometrical optics, Binary data, Image classification
Frederick Chen, Wei-Su Chen, Ming-Jinn Tsai, Tzu-Kun Ku
J. Micro/Nanolith. MEMS MOEMS 13(1), 011008 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.011008
TOPICS: Optical lithography, Etching, Photoresist materials, Photomasks, Phase shifts, Photoresist developing, Modulation, Double patterning technology, Distortion, Anisotropic etching
Special Section on Emerging MOEMS Technology and Applications
J. Micro/Nanolith. MEMS MOEMS 13(1), 011101 (21 March 2014) https://doi.org/10.1117/1.JMM.13.1.011101
TOPICS: Microopto electromechanical systems, Microelectromechanical systems, Micro optics, Mirrors, Photonics, Technologies and applications, Digital micromirror devices, Microsystems, New and emerging technologies, Actuators
David Mansur, Robert Vaillancourt, Ryan Benedict-Gill, Scott Newbry, Julia Dupuis
J. Micro/Nanolith. MEMS MOEMS 13(1), 011102 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011102
TOPICS: Digital micromirror devices, Projection systems, Infrared radiation, High dynamic range imaging, Surface plasmons, Micromirrors, Infrared imaging, Analog electronics, Diodes, Modulation
Ulrich Hofmann, Mika Aikio, Joachim Janes, Frank Senger, Vanessa Stenchly, Juergen Hagge, Hans-Joachim Quenzer, Manfred Weiss, Thomas von Wantoch, Christian Mallas, Bernhard Wagner, Wolfgang Benecke
J. Micro/Nanolith. MEMS MOEMS 13(1), 011103 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011103
TOPICS: Mirrors, Microelectromechanical systems, Laser scanners, Roads, Sensors, Laser development, Packaging, Wafer bonding, Actuators
J. Micro/Nanolith. MEMS MOEMS 13(1), 011104 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011104
TOPICS: Digital micromirror devices, Diffraction, Optical switching, Mirrors, Optical fibers, Telecommunications, Microopto electromechanical systems, Switches, Binary data, Holograms
Kerri Cahoy, Anne Marinan, Benjamin Novak, Caitlin Kerr, Tam Nguyen, Matthew Webber, Grant Falkenburg, Andrew Barg
J. Micro/Nanolith. MEMS MOEMS 13(1), 011105 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011105
TOPICS: Microelectromechanical systems, Wavefronts, Stars, Mirrors, Exoplanets, Wavefront sensors, Sensors, Planets, Actuators, Space telescopes
J. Micro/Nanolith. MEMS MOEMS 13(1), 011106 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011106
TOPICS: Projection systems, Ronchi rulings, Profiling, 3D metrology, Cameras, Denoising, 3D image processing, Fourier transforms, Image processing, Fringe analysis
J. Micro/Nanolith. MEMS MOEMS 13(1), 011107 (27 November 2013) https://doi.org/10.1117/1.JMM.13.1.011107
TOPICS: Mirrors, Temperature metrology, Cryogenics, Deformable mirrors, Manufacturing, Actuators, Finite element methods, Ferroelectric materials, Adaptive optics, Titanium
J. Micro/Nanolith. MEMS MOEMS 13(1), 011108 (2 January 2014) https://doi.org/10.1117/1.JMM.13.1.011108
TOPICS: Digital Light Processing, Optical filters, Micromirrors, Diffraction, Digital micromirror devices, Imaging systems, Diffraction gratings, Image filtering, Spectral resolution, Prototyping
Xiaojing Mu, Dennis Neo, Hongbin Yu, A. Senthil Kumar, Fook Siong Chau
J. Micro/Nanolith. MEMS MOEMS 13(1), 011109 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011109
TOPICS: Microelectromechanical systems, Actuators, Microactuators, Silicon, Optical coherence tomography, Lithography, Optical scanning, Micromirrors, Fluorescence correlation spectroscopy, Reflectors
J. Micro/Nanolith. MEMS MOEMS 13(1), 011110 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011110
TOPICS: Mirrors, Micromirrors, Silicon, Gaussian beams, Optical fibers, Diffraction, Reflectivity, Reflection, 3D modeling, Micromachining
J. Micro/Nanolith. MEMS MOEMS 13(1), 011111 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011111
TOPICS: Optical filters, Digital micromirror devices, Sensors, Chemical detection, Image filtering, Multiplexing, Data acquisition, Mirrors, Imaging spectroscopy, Hyperspectral imaging
Wolfgang Kronast, Ulrich Mescheder, Bernhard Müller, Rolf Huster
J. Micro/Nanolith. MEMS MOEMS 13(1), 011112 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.011112
TOPICS: Silicon, Micromirrors, Mirrors, Electrodes, Semiconducting wafers, Distortion, Finite element methods, 3D modeling, Etching, Aluminum
J. Micro/Nanolith. MEMS MOEMS 13(1), 011113 (12 February 2014) https://doi.org/10.1117/1.JMM.13.1.011113
TOPICS: Wavefronts, Diffraction, Optical testing, Digital micromirror devices, Sensors, Digital holography, Light sources, Holograms, Micromirrors, Fourier transforms
Thilo Sandner, Thomas Grasshoff, Markus Schwarzenberg, Richard Schroedter, Harald Schenk
J. Micro/Nanolith. MEMS MOEMS 13(1), 011114 (20 February 2014) https://doi.org/10.1117/1.JMM.13.1.011114
TOPICS: Mirrors, Microelectromechanical systems, Cameras, Stereoscopic cameras, 3D scanning, 3D-TOF imaging, Sensors, 3D acquisition, Distance measurement, Raster graphics
Thilo Sandner, Thomas Grasshoff, Eric Gaumont, Harald Schenk, Andreas Kenda
J. Micro/Nanolith. MEMS MOEMS 13(1), 011115 (20 March 2014) https://doi.org/10.1117/1.JMM.13.1.011115
TOPICS: Microelectromechanical systems, Mirrors, Protactinium, Fourier transforms, Microopto electromechanical systems, Actuators, System integration, Spectrometers, FT-IR spectroscopy, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(1), 011116 (13 March 2014) https://doi.org/10.1117/1.JMM.13.1.011116
TOPICS: Electronic filtering, Reflectivity, Infrared imaging, Hyperspectral imaging, Imaging systems, Optical filters, Infrared radiation, Semiconducting wafers, Image filtering, Surface roughness
Special Section on Metrology and Inspection for 3-D Integrated Circuits and Interconnects
J. Micro/Nanolith. MEMS MOEMS 13(1), 011201 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.011201
TOPICS: Metrology, Inspection, 3D metrology, Process control, Integrated circuits, 3D modeling, Manufacturing, Roads, Standards development, Control systems
J. Micro/Nanolith. MEMS MOEMS 13(1), 011202 (17 January 2014) https://doi.org/10.1117/1.JMM.13.1.011202
TOPICS: Failure analysis, Silicon, Polishing, Metrology, Ion beams, 3D metrology, Scanning electron microscopy, Inspection, Xenon, Ions
Armen Kteyan, Gevorg Gevorgyan, Henrik Hovsepyan, Jun-Ho Choy, Valeriy Sukharev
J. Micro/Nanolith. MEMS MOEMS 13(1), 011203 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.011203
TOPICS: Silicon, Transistors, 3D modeling, Calibration, Finite element methods, Instrument modeling, Composites, Back end of line, Metals, Device simulation
Yoshihiko Fujimori, Takashi Tsuto, Kazuya Okamoto, Kyoichi Suwa, Hiroyuki Tsukamoto
J. Micro/Nanolith. MEMS MOEMS 13(1), 011204 (29 January 2014) https://doi.org/10.1117/1.JMM.13.1.011204
TOPICS: Diffraction, Semiconducting wafers, Inspection, Silicon, Polarization, Wafer-level optics, Integrated circuits, Signal detection, Wafer testing, Polarizers
Woo Sik Yoo, Jae Hyun Kim, Seung Min Han
J. Micro/Nanolith. MEMS MOEMS 13(1), 011205 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.011205
TOPICS: Silicon, Raman spectroscopy, Copper, Annealing, Semiconducting wafers, Micro raman spectroscopy, Profiling, Chemical mechanical planarization, Navigation systems, Spectral resolution
Victor Vartanian, Richard Allen, Larry Smith, Klaus Hummler, Steve Olson, Brian Sapp
J. Micro/Nanolith. MEMS MOEMS 13(1), 011206 (27 February 2014) https://doi.org/10.1117/1.JMM.13.1.011206
TOPICS: Metrology, Copper, Silicon, X-rays, Semiconducting wafers, X-ray imaging, Etching, Scanning electron microscopy, Sensors, Metals
Sebastian Brand, Adriana Lapadatu, Tatjana Djuric, Peter Czurratis, Jan Schischka, Matthias Petzold
J. Micro/Nanolith. MEMS MOEMS 13(1), 011207 (20 February 2014) https://doi.org/10.1117/1.JMM.13.1.011207
TOPICS: Acoustics, Inspection, Microscopy, Semiconducting wafers, Interfaces, Metrology, Photomicroscopy, Silicon, 3D metrology, Microscopes
Jonny Hoglund, Zoltan Kiss, Gyorgy Nadudvari, Zsolt Kovacs, Szabolcs Velkei, Chris Moore, Victor Vartanian, Richard Allen
J. Micro/Nanolith. MEMS MOEMS 13(1), 011208 (12 February 2014) https://doi.org/10.1117/1.JMM.13.1.011208
TOPICS: Semiconducting wafers, Infrared microscopy, Wafer bonding, Microscopy, Objectives, Interfaces, Infrared imaging, Metrology, Silicon, Microscopes
J. Micro/Nanolith. MEMS MOEMS 13(1), 011209 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.011209
TOPICS: Reflectivity, Reflectometry, Semiconducting wafers, 3D metrology, Metrology, Oxides, Scanning electron microscopy, Silicon, Etching, Calibration
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(1), 013001 (2 January 2014) https://doi.org/10.1117/1.JMM.13.1.013001
TOPICS: Diffraction gratings, Diffraction, Microopto electromechanical systems, Optical design, Optical simulations, Gold, Electrodes, Analog electronics, Mirrors, Optical lithography
Yingtao Tian, Xiaobang Shang, Michael Lancaster
J. Micro/Nanolith. MEMS MOEMS 13(1), 013002 (6 January 2014) https://doi.org/10.1117/1.JMM.13.1.013002
TOPICS: Waveguides, Multilayers, Signal attenuation, Semiconducting wafers, Silver, Terahertz radiation, Microwave radiation, Surface roughness, Metals, Optical alignment
Tzung-Ta Kao, Yi-Yen Chiu
J. Micro/Nanolith. MEMS MOEMS 13(1), 013003 (13 January 2014) https://doi.org/10.1117/1.JMM.13.1.013003
TOPICS: Zinc oxide, Ultraviolet radiation, Aluminum, Adsorption, Oxygen, Molecules, Scanning electron microscopy, Iris, Nanostructures, Nanorods
Jason Sun, Kwong-Kit Choi, Kimberley Olver
J. Micro/Nanolith. MEMS MOEMS 13(1), 013004 (13 January 2014) https://doi.org/10.1117/1.JMM.13.1.013004
TOPICS: Etching, Sensors, Quantum efficiency, Infrared photography, Infrared radiation, Photodetectors, Ions, Plasma, Semiconducting wafers, Plasma etching
Akshdeep Sharma, Prachi Jhanwar, Deepak Bansal, Amit Kumar, Maninder Kaur, Shilpi Pandey, Prem Kumar, Dinesh Kumar, Kamaljit Rangra
J. Micro/Nanolith. MEMS MOEMS 13(1), 013005 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.013005
TOPICS: Plasma, Microelectromechanical systems, Gold, Switches, Surface micromachining, Etching, Semiconducting wafers, Oxygen, Photomicroscopy
Ching-Yu Liu, Frank Yang, Chia-He Chung, Zung-Hua Yang, Ta-Ching Chen, Chang-Hao Yang, Chung-May Yang, Long-Sheng Fan
J. Micro/Nanolith. MEMS MOEMS 13(1), 013006 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.013006
TOPICS: Sensors, Resistance, In vivo imaging, Temperature metrology, Tissues, Finite element methods, Blood, Eye models, Retina, Calibration
Ran Zhang, Jinkui Chu, Le Guan, Shuangliang Li, Jian Min
J. Micro/Nanolith. MEMS MOEMS 13(1), 013007 (6 February 2014) https://doi.org/10.1117/1.JMM.13.1.013007
TOPICS: Sensors, Calibration, Measurement devices, Sensor calibration, Copper, Silicon, Resistance, Photoresist materials, Semiconducting wafers, Metals
Syed Akhtar, Hirendra Choudhary, Subramaniam Anantha Ramakrishna, Janakrajan Ramkumar
J. Micro/Nanolith. MEMS MOEMS 13(1), 013008 (14 February 2014) https://doi.org/10.1117/1.JMM.13.1.013008
TOPICS: Metals, Laser ablation, Excimer lasers, Polymethylmethacrylate, Polymers, Optical simulations, Micromachining, Pulsed laser operation, Thermal modeling, Plasma
J. Micro/Nanolith. MEMS MOEMS 13(1), 013009 (21 February 2014) https://doi.org/10.1117/1.JMM.13.1.013009
TOPICS: Inspection, Photomasks, Defect detection, Transmittance, Signal detection, Extreme ultraviolet, Image resolution, Electron microscopes, Sensors, Extreme ultraviolet lithography
Feng Gao, Sami Ylinen, Markku Kainlauri, Markku Kapulainen
J. Micro/Nanolith. MEMS MOEMS 13(1), 013010 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.013010
J. Micro/Nanolith. MEMS MOEMS 13(1), 013011 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.013011
TOPICS: Fermium, Extreme ultraviolet, Inspection, Frequency modulation, Photomasks, Multilayers, Extreme ultraviolet lithography, Molybdenum, Solids, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(1), 013012 (12 March 2014) https://doi.org/10.1117/1.JMM.13.1.013012
TOPICS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules
Yu-Chi Kang, Chien-Hung Lin, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 13(1), 013013 (13 March 2014) https://doi.org/10.1117/1.JMM.13.1.013013
TOPICS: Electrodes, Feedback control, Microfluidics, Dielectrics, Capacitance, LabVIEW, Switching, Control systems, Relays, Liquids
J. Micro/Nanolith. MEMS MOEMS 13(1), 013014 (17 March 2014) https://doi.org/10.1117/1.JMM.13.1.013014
TOPICS: Multilayers, Annealing, Reflectivity, Lanthanum, Interfaces, Crystals, Temperature metrology, Local area networks, X-ray diffraction, X-rays
Xuejia Guo, Yanqiu Li, Lisong Dong, Lihui Liu
J. Micro/Nanolith. MEMS MOEMS 13(1), 013015 (18 March 2014) https://doi.org/10.1117/1.JMM.13.1.013015
TOPICS: Photomasks, Source mask optimization, Lithography, Electroluminescence, Photoresist materials, Nanoimprint lithography, Metrology, Photoresist developing, Transmittance, Lithium
Zhanqiang Hou, Xuezhong Wu, Dingbang Xiao, Zhihua Chen, Jianbin Su
J. Micro/Nanolith. MEMS MOEMS 13(1), 013016 (20 March 2014) https://doi.org/10.1117/1.JMM.13.1.013016
TOPICS: Silicon, Resonators, Sensors, Glasses, Temperature metrology, Crystals, Wet etching, Semiconducting wafers, Electrodes, Lithography
Xiaoxiao Xu, Zhenyu Li, Pinaki Sarder, Nalinikanth Kotagiri, Arye Nehorai
J. Micro/Nanolith. MEMS MOEMS 13(1), 013017 (26 March 2014) https://doi.org/10.1117/1.JMM.13.1.013017
TOPICS: Target detection, Microfluidics, Fluid dynamics, Computer programming, Blood, Detector arrays, Point-of-care devices, Video processing, Tumors, Proteins
Errata
Avinash Kumar, Ankur Gupta, Rishi Kant, Akhhtar Syed Nadeem, Nachiketa Tiwari, Janakrajan Ramkumar, Shantanu Bhattacharya
J. Micro/Nanolith. MEMS MOEMS 13(1), 019801 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.019801
TOPICS: Laser processing, Photomasks, Microsystems, Imaging arrays, Aluminum, Optics manufacturing, Laser applications, Mechanical engineering, Photomicroscopy, Micro cutting
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