Editorial
J. Micro/Nanolith. MEMS MOEMS 13(1), 010101 (31 July 2014) https://doi.org/10.1117/1.JMM.13.1.010101
J. Micro/Nanolith. MEMS MOEMS 13(1), 010102 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.010102
TOPICS: Excel, Visualization, Solids, Eye, Data modeling, Binary data, Uranus, Infrared radiation, Stars, Monte Carlo methods
J. Micro/Nanolith. MEMS MOEMS 13(1), 010103 (15 April 2014) https://doi.org/10.1117/1.JMM.13.1.010103
TOPICS: Optical lithography, Lithography, Extreme ultraviolet lithography, Optics manufacturing, Photomasks, Immersion lithography, Logic, Resolution enhancement technologies, Integrated optics, Product engineering
Special Section on Optical Lithography Extension Beyond the 14-nm Node
J. Micro/Nanolith. MEMS MOEMS 13(1), 011002 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011002
TOPICS: Photomasks, Diffraction, Artificial neural networks, Data modeling, Optical lithography, Systems modeling, Lithography, Polarization, Neurons, Optical simulations
J. Micro/Nanolith. MEMS MOEMS 13(1), 011003 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011003
TOPICS: Photomasks, Electron beam lithography, Computational lithography, Lithography, Manufacturing, Data modeling, Optical proximity correction, Vestigial sideband modulation, Semiconducting wafers, Model-based design
J. Micro/Nanolith. MEMS MOEMS 13(1), 011004 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011004
TOPICS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling
J. Micro/Nanolith. MEMS MOEMS 13(1), 011005 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011005
TOPICS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing
J. Micro/Nanolith. MEMS MOEMS 13(1), 011006 (7 January 2014) https://doi.org/10.1117/1.JMM.13.1.011006
TOPICS: Semiconducting wafers, Scanners, Overlay metrology, Lithography, Reticles, Metrology, Control systems, Projection lithography, Calibration, Actuators
J. Micro/Nanolith. MEMS MOEMS 13(1), 011007 (6 February 2014) https://doi.org/10.1117/1.JMM.13.1.011007
TOPICS: Lithography, Feature extraction, Photomasks, Semiconducting wafers, Design for manufacturing, Data modeling, Semiconductors, Geometrical optics, Binary data, Image classification
J. Micro/Nanolith. MEMS MOEMS 13(1), 011008 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.011008
TOPICS: Optical lithography, Etching, Photoresist materials, Photomasks, Phase shifts, Photoresist developing, Modulation, Double patterning technology, Distortion, Anisotropic etching
Special Section on Emerging MOEMS Technology and Applications
J. Micro/Nanolith. MEMS MOEMS 13(1), 011101 (21 March 2014) https://doi.org/10.1117/1.JMM.13.1.011101
TOPICS: Microopto electromechanical systems, Microelectromechanical systems, Micro optics, Mirrors, Photonics, Technologies and applications, Digital micromirror devices, Microsystems, Actuators
J. Micro/Nanolith. MEMS MOEMS 13(1), 011102 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011102
TOPICS: Digital micromirror devices, Projection systems, Infrared radiation, High dynamic range imaging, Surface plasmons, Micromirrors, Infrared imaging, Analog electronics, Diodes, Modulation
J. Micro/Nanolith. MEMS MOEMS 13(1), 011103 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011103
TOPICS: Mirrors, Microelectromechanical systems, Laser scanners, Roads, Sensors, Laser development, Packaging, Wafer bonding, Actuators
J. Micro/Nanolith. MEMS MOEMS 13(1), 011104 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011104
TOPICS: Digital micromirror devices, Diffraction, Optical switching, Mirrors, Optical fibers, Telecommunications, Microopto electromechanical systems, Switches, Binary data, Holograms
J. Micro/Nanolith. MEMS MOEMS 13(1), 011105 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011105
TOPICS: Microelectromechanical systems, Wavefronts, Stars, Mirrors, Exoplanets, Wavefront sensors, Sensors, Planets, Actuators, Space telescopes
J. Micro/Nanolith. MEMS MOEMS 13(1), 011106 (2 December 2013) https://doi.org/10.1117/1.JMM.13.1.011106
TOPICS: Projection systems, Ronchi rulings, Profiling, 3D metrology, Cameras, Denoising, 3D image processing, Fourier transforms, Image processing, Fringe analysis
J. Micro/Nanolith. MEMS MOEMS 13(1), 011107 (27 November 2013) https://doi.org/10.1117/1.JMM.13.1.011107
TOPICS: Mirrors, Temperature metrology, Cryogenics, Deformable mirrors, Manufacturing, Actuators, Finite element methods, Ferroelectric materials, Adaptive optics, Titanium
J. Micro/Nanolith. MEMS MOEMS 13(1), 011108 (2 January 2014) https://doi.org/10.1117/1.JMM.13.1.011108
TOPICS: Digital Light Processing, Optical filters, Micromirrors, Diffraction, Digital micromirror devices, Imaging systems, Diffraction gratings, Image filtering, Spectral resolution, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(1), 011109 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011109
TOPICS: Microelectromechanical systems, Actuators, Microactuators, Silicon, Optical coherence tomography, Lithography, Optical scanning, Micromirrors, Fluorescence correlation spectroscopy, Reflectors
J. Micro/Nanolith. MEMS MOEMS 13(1), 011110 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011110
TOPICS: Mirrors, Micromirrors, Silicon, Gaussian beams, Optical fibers, Diffraction, Reflectivity, Reflection, 3D modeling, Micromachining
J. Micro/Nanolith. MEMS MOEMS 13(1), 011111 (16 December 2013) https://doi.org/10.1117/1.JMM.13.1.011111
TOPICS: Optical filters, Digital micromirror devices, Sensors, Chemical detection, Image filtering, Multiplexing, Data acquisition, Mirrors, Imaging spectroscopy, Hyperspectral imaging
J. Micro/Nanolith. MEMS MOEMS 13(1), 011112 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.011112
TOPICS: Silicon, Micromirrors, Mirrors, Electrodes, Semiconducting wafers, Distortion, Finite element methods, 3D modeling, Etching, Aluminum
J. Micro/Nanolith. MEMS MOEMS 13(1), 011113 (12 February 2014) https://doi.org/10.1117/1.JMM.13.1.011113
TOPICS: Wavefronts, Diffraction, Optical testing, Digital micromirror devices, Sensors, Digital holography, Light sources, Holograms, Micromirrors, Fourier transforms
J. Micro/Nanolith. MEMS MOEMS 13(1), 011114 (20 February 2014) https://doi.org/10.1117/1.JMM.13.1.011114
TOPICS: Mirrors, Microelectromechanical systems, Cameras, Stereoscopic cameras, 3D scanning, 3D-TOF imaging, Sensors, 3D acquisition, Distance measurement, Raster graphics
J. Micro/Nanolith. MEMS MOEMS 13(1), 011115 (20 March 2014) https://doi.org/10.1117/1.JMM.13.1.011115
TOPICS: Microelectromechanical systems, Mirrors, Protactinium, Fourier transforms, Microopto electromechanical systems, Actuators, System integration, Spectrometers, FT-IR spectroscopy, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(1), 011116 (13 March 2014) https://doi.org/10.1117/1.JMM.13.1.011116
TOPICS: Electronic filtering, Reflectivity, Infrared imaging, Hyperspectral imaging, Imaging systems, Optical filters, Infrared radiation, Semiconducting wafers, Image filtering, Surface roughness
Special Section on Metrology and Inspection for 3-D Integrated Circuits and Interconnects
J. Micro/Nanolith. MEMS MOEMS 13(1), 011201 (25 March 2014) https://doi.org/10.1117/1.JMM.13.1.011201
TOPICS: Metrology, Inspection, 3D metrology, Process control, Integrated circuits, 3D modeling, Manufacturing, Roads, Standards development, Control systems
J. Micro/Nanolith. MEMS MOEMS 13(1), 011202 (17 January 2014) https://doi.org/10.1117/1.JMM.13.1.011202
TOPICS: Failure analysis, Silicon, Polishing, Metrology, Ion beams, 3D metrology, Scanning electron microscopy, Inspection, Xenon, Ions
J. Micro/Nanolith. MEMS MOEMS 13(1), 011203 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.011203
TOPICS: Silicon, Transistors, 3D modeling, Calibration, Finite element methods, Instrument modeling, Composites, Back end of line, Metals, Device simulation
J. Micro/Nanolith. MEMS MOEMS 13(1), 011204 (29 January 2014) https://doi.org/10.1117/1.JMM.13.1.011204
TOPICS: Diffraction, Semiconducting wafers, Inspection, Silicon, Polarization, Wafer-level optics, Integrated circuits, Signal detection, Wafer testing, Polarizers
J. Micro/Nanolith. MEMS MOEMS 13(1), 011205 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.011205
TOPICS: Silicon, Raman spectroscopy, Copper, Annealing, Semiconducting wafers, Micro raman spectroscopy, Profiling, Chemical mechanical planarization, Navigation systems, Spectral resolution
J. Micro/Nanolith. MEMS MOEMS 13(1), 011206 (27 February 2014) https://doi.org/10.1117/1.JMM.13.1.011206
TOPICS: Metrology, Copper, Silicon, X-rays, Semiconducting wafers, X-ray imaging, Etching, Scanning electron microscopy, Sensors, Metals
J. Micro/Nanolith. MEMS MOEMS 13(1), 011207 (20 February 2014) https://doi.org/10.1117/1.JMM.13.1.011207
TOPICS: Acoustics, Inspection, Microscopy, Semiconducting wafers, Interfaces, Metrology, Photomicroscopy, Silicon, 3D metrology, Microscopes
J. Micro/Nanolith. MEMS MOEMS 13(1), 011208 (12 February 2014) https://doi.org/10.1117/1.JMM.13.1.011208
TOPICS: Semiconducting wafers, Infrared microscopy, Wafer bonding, Microscopy, Objectives, Interfaces, Infrared imaging, Metrology, Silicon, Microscopes
J. Micro/Nanolith. MEMS MOEMS 13(1), 011209 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.011209
TOPICS: Reflectivity, Reflectometry, Semiconducting wafers, 3D metrology, Metrology, Oxides, Scanning electron microscopy, Silicon, Etching, Calibration
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(1), 013001 (2 January 2014) https://doi.org/10.1117/1.JMM.13.1.013001
TOPICS: Diffraction gratings, Diffraction, Microopto electromechanical systems, Optical design, Optical simulations, Gold, Electrodes, Analog electronics, Mirrors, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 13(1), 013002 (6 January 2014) https://doi.org/10.1117/1.JMM.13.1.013002
TOPICS: Waveguides, Multilayers, Signal attenuation, Semiconducting wafers, Silver, Terahertz radiation, Microwave radiation, Surface roughness, Metals, Optical alignment
J. Micro/Nanolith. MEMS MOEMS 13(1), 013003 (13 January 2014) https://doi.org/10.1117/1.JMM.13.1.013003
TOPICS: Zinc oxide, Ultraviolet radiation, Aluminum, Adsorption, Oxygen, Molecules, Scanning electron microscopy, Iris, Nanostructures, Nanorods
J. Micro/Nanolith. MEMS MOEMS 13(1), 013004 (13 January 2014) https://doi.org/10.1117/1.JMM.13.1.013004
TOPICS: Etching, Sensors, Quantum efficiency, Infrared photography, Infrared radiation, Photodetectors, Ions, Plasma, Semiconducting wafers, Plasma etching
J. Micro/Nanolith. MEMS MOEMS 13(1), 013005 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.013005
TOPICS: Plasma, Microelectromechanical systems, Gold, Switches, Surface micromachining, Etching, Semiconducting wafers, Oxygen, Photomicroscopy
J. Micro/Nanolith. MEMS MOEMS 13(1), 013006 (5 February 2014) https://doi.org/10.1117/1.JMM.13.1.013006
TOPICS: Sensors, Resistance, In vivo imaging, Temperature metrology, Tissues, Finite element methods, Blood, Eye models, Retina, Calibration
J. Micro/Nanolith. MEMS MOEMS 13(1), 013007 (6 February 2014) https://doi.org/10.1117/1.JMM.13.1.013007
TOPICS: Sensors, Calibration, Measurement devices, Sensor calibration, Copper, Silicon, Resistance, Photoresist materials, Semiconducting wafers, Metals
J. Micro/Nanolith. MEMS MOEMS 13(1), 013008 (14 February 2014) https://doi.org/10.1117/1.JMM.13.1.013008
TOPICS: Metals, Laser ablation, Excimer lasers, Polymethylmethacrylate, Polymers, Optical simulations, Micromachining, Pulsed laser operation, Thermal modeling, Plasma
J. Micro/Nanolith. MEMS MOEMS 13(1), 013009 (21 February 2014) https://doi.org/10.1117/1.JMM.13.1.013009
TOPICS: Inspection, Photomasks, Defect detection, Transmittance, Signal detection, Extreme ultraviolet, Image resolution, Electron microscopes, Sensors, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 13(1), 013010 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.013010
J. Micro/Nanolith. MEMS MOEMS 13(1), 013011 (6 March 2014) https://doi.org/10.1117/1.JMM.13.1.013011
TOPICS: Fermium, Extreme ultraviolet, Inspection, Frequency modulation, Photomasks, Multilayers, Extreme ultraviolet lithography, Molybdenum, Solids, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(1), 013012 (12 March 2014) https://doi.org/10.1117/1.JMM.13.1.013012
TOPICS: Particles, Polymers, Line edge roughness, Monte Carlo methods, Diffusion, Photoresist developing, Photoresist materials, Lithography, 3D modeling, Molecules
J. Micro/Nanolith. MEMS MOEMS 13(1), 013013 (13 March 2014) https://doi.org/10.1117/1.JMM.13.1.013013
TOPICS: Electrodes, Feedback control, Microfluidics, Dielectrics, Capacitance, LabVIEW, Switching, Control systems, Relays, Liquids
J. Micro/Nanolith. MEMS MOEMS 13(1), 013014 (17 March 2014) https://doi.org/10.1117/1.JMM.13.1.013014
TOPICS: Multilayers, Annealing, Reflectivity, Lanthanum, Interfaces, Crystals, Temperature metrology, Local area networks, X-ray diffraction, X-rays
J. Micro/Nanolith. MEMS MOEMS 13(1), 013015 (18 March 2014) https://doi.org/10.1117/1.JMM.13.1.013015
TOPICS: Photomasks, Source mask optimization, Lithography, Electroluminescence, Photoresist materials, Nanoimprint lithography, Metrology, Photoresist developing, Transmittance, Lithium
J. Micro/Nanolith. MEMS MOEMS 13(1), 013016 (20 March 2014) https://doi.org/10.1117/1.JMM.13.1.013016
TOPICS: Silicon, Resonators, Sensors, Glasses, Temperature metrology, Crystals, Wet etching, Semiconducting wafers, Electrodes, Lithography
J. Micro/Nanolith. MEMS MOEMS 13(1), 013017 (26 March 2014) https://doi.org/10.1117/1.JMM.13.1.013017
TOPICS: Target detection, Microfluidics, Fluid dynamics, Computer programming, Blood, Detector arrays, Point-of-care devices, Video processing, Tumors, Proteins
Errata
J. Micro/Nanolith. MEMS MOEMS 13(1), 019801 (21 January 2014) https://doi.org/10.1117/1.JMM.13.1.019801
TOPICS: Laser processing, Photomasks, Microsystems, Imaging arrays, Aluminum, Optics manufacturing, Laser applications, Mechanical engineering, Photomicroscopy, Micro cutting
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