Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 13 · NO. 2 | April 2014
CONTENTS
IN THIS ISSUE

Editorial (1)
Editorial
J. Micro/Nanolith. MEMS MOEMS 13(2), 020101 (13 May 2014) https://doi.org/10.1117/1.JMM.13.2.020101
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Patents, Lithography, Electronics, Photonics, Optical lithography, Semiconductors, Optical fabrication, Optical fabrication equipment
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 13(2), 020501 (27 June 2014) https://doi.org/10.1117/1.JMM.13.2.020501
TOPICS: Line width roughness, Critical dimension metrology, Line edge roughness, Lithography, Numerical simulations, Roads, Semiconductors, Metrology, Spatial frequencies
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(2), 023001 (9 April 2014) https://doi.org/10.1117/1.JMM.13.2.023001
TOPICS: Microelectromechanical systems, Electrodes, Silicon, Video, Optical simulations, Solids, Scanning electron microscopy, Sensors, Actuators, Gyroscopes
J. Micro/Nanolith. MEMS MOEMS 13(2), 023002 (25 April 2014) https://doi.org/10.1117/1.JMM.13.2.023002
TOPICS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Data modeling, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Raster graphics, Beam shaping
J. Micro/Nanolith. MEMS MOEMS 13(2), 023003 (28 April 2014) https://doi.org/10.1117/1.JMM.13.2.023003
TOPICS: Photomasks, Lithography, Optical lithography, Semiconducting wafers, Algorithm development, Imaging systems, SRAF, Optimization (mathematics), Computer simulations, Error analysis
J. Micro/Nanolith. MEMS MOEMS 13(2), 023004 (28 April 2014) https://doi.org/10.1117/1.JMM.13.2.023004
TOPICS: Microlens, Microlens array, Epoxies, Coating, Optical fabrication, Liquids, Glasses, Image processing, Lithium, Optical testing
J. Micro/Nanolith. MEMS MOEMS 13(2), 023005 (7 May 2014) https://doi.org/10.1117/1.JMM.13.2.023005
TOPICS: Critical dimension metrology, Extreme ultraviolet lithography, Radiation effects, Etching, Extreme ultraviolet, Photomasks, Reflectivity, Semiconducting wafers, Cadmium, Lithography
J. Micro/Nanolith. MEMS MOEMS 13(2), 023006 (19 May 2014) https://doi.org/10.1117/1.JMM.13.2.023006
TOPICS: Plasma, Photoresist materials, Plasma treatment, Vacuum ultraviolet, Line width roughness, Photons, Polymers, Optical filters, Extreme ultraviolet lithography, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 13(2), 023007 (21 May 2014) https://doi.org/10.1117/1.JMM.13.2.023007
TOPICS: Photonic integrated circuits, Gold, Plasmonics, Silicon, Nanoimprint lithography, Molecules, Nanolithography, Semiconducting wafers, Reflection, Ultraviolet radiation
J. Micro/Nanolith. MEMS MOEMS 13(2), 023008 (21 May 2014) https://doi.org/10.1117/1.JMM.13.2.023008
TOPICS: Silicon, 3D microstructuring, Metals, Silicon films, Printing, Sapphire, Polymers, Scanning electron microscopy, Etching, Light emitting diodes
J. Micro/Nanolith. MEMS MOEMS 13(2), 023009 (11 June 2014) https://doi.org/10.1117/1.JMM.13.2.023009
TOPICS: Brain, Interfaces, Tissues, Silicon, Injuries, Finite element methods, Neurons, Electrodes, Mechanical sensors, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 13(2), 023010 (16 June 2014) https://doi.org/10.1117/1.JMM.13.2.023010
TOPICS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection
J. Micro/Nanolith. MEMS MOEMS 13(2), 023011 (20 June 2014) https://doi.org/10.1117/1.JMM.13.2.023011
TOPICS: Waveguides, Spectroscopy, Gold, Objectives, Fourier transforms, Single mode fibers, Electron beam lithography, Mirrors, Nanostructures, Nanoantennas
J. Micro/Nanolith. MEMS MOEMS 13(2), 023012 (24 June 2014) https://doi.org/10.1117/1.JMM.13.2.023012
TOPICS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 13(2), 023013 (27 June 2014) https://doi.org/10.1117/1.JMM.13.2.023013
TOPICS: Axons, Glasses, Nerve, Microelectromechanical systems, Scanning electron microscopy, Microscopes, Plasma treatment, Nerve regeneration, Photoresist materials, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 13(2), 023014 (27 June 2014) https://doi.org/10.1117/1.JMM.13.2.023014
TOPICS: Photomasks, Phase shifts, SRAF, Semiconducting wafers, Lithography, Opacity, Optical lithography, Scattering, Binary data, Polarization
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