journal of micro nanolithography mems and moems
VOL. 13 · NO. 2 | April 2014

Editorial (1)
J. Micro/Nanolith. MEMS MOEMS 13(2), 020101 (13 May 2014) doi:10.1117/1.JMM.13.2.020101
TOPICS: Microelectromechanical systems, Microopto electromechanical systems, Patents, Lithography, Electronics, Photonics, Optical lithography, Semiconductors, Optical fabrication, Optical fabrication equipment
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 13(2), 020501 (27 June 2014) doi:10.1117/1.JMM.13.2.020501
TOPICS: Line width roughness, Critical dimension metrology, Line edge roughness, Lithography, Numerical simulations, Roads, Semiconductors, Metrology, Spatial frequencies
Regular Articles
Zishan Mohammed, Kenkere Swamy, Banibrata Mukherjee, Suman Chakraborty, Siddhartha Sen
J. Micro/Nanolith. MEMS MOEMS 13(2), 023001 (9 April 2014) doi:10.1117/1.JMM.13.2.023001
TOPICS: Microelectromechanical systems, Electrodes, Silicon, Video, Optical simulations, Solids, Scanning electron microscopy, Sensors, Actuators, Gyroscopes
Jin Choi, In Kyun Shin, Chan-Uk Jeon
J. Micro/Nanolith. MEMS MOEMS 13(2), 023002 (25 April 2014) doi:10.1117/1.JMM.13.2.023002
TOPICS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Data modeling, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Raster graphics, Beam shaping
Wen Lv, Edmund Lam, Haiqing Wei, Shiyuan Liu
J. Micro/Nanolith. MEMS MOEMS 13(2), 023003 (28 April 2014) doi:10.1117/1.JMM.13.2.023003
TOPICS: Photomasks, Lithography, Optical lithography, Semiconducting wafers, Algorithm development, Imaging systems, SRAF, Optimization (mathematics), Computer simulations, Error analysis
J. Micro/Nanolith. MEMS MOEMS 13(2), 023004 (28 April 2014) doi:10.1117/1.JMM.13.2.023004
TOPICS: Microlens, Microlens array, Epoxies, Coating, Optical fabrication, Liquids, Glasses, Image processing, Lithium, Optical testing
J. Micro/Nanolith. MEMS MOEMS 13(2), 023005 (7 May 2014) doi:10.1117/1.JMM.13.2.023005
TOPICS: Critical dimension metrology, Extreme ultraviolet lithography, Radiation effects, Etching, Extreme ultraviolet, Photomasks, Reflectivity, Semiconducting wafers, Cadmium, Lithography
Peter De Schepper, Terje Hansen, Efrain Altamirano-Sanchez, Alessandro Pret, Ziad el Otell, Werner Boulart, Stefan De Gendt
J. Micro/Nanolith. MEMS MOEMS 13(2), 023006 (19 May 2014) doi:10.1117/1.JMM.13.2.023006
TOPICS: Plasma, Photoresist materials, Plasma treatment, Vacuum ultraviolet, Line width roughness, Photons, Polymers, Optical filters, Extreme ultraviolet lithography, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 13(2), 023007 (21 May 2014) doi:10.1117/1.JMM.13.2.023007
TOPICS: Photonic integrated circuits, Gold, Plasmonics, Silicon, Nanoimprint lithography, Molecules, Nanolithography, Semiconducting wafers, Reflection, Ultraviolet radiation
Kuo-Lun Kao, Cho-Wei Chang, Yung-Chun Lee
J. Micro/Nanolith. MEMS MOEMS 13(2), 023008 (21 May 2014) doi:10.1117/1.JMM.13.2.023008
TOPICS: Silicon, 3D microstructuring, Metals, Silicon films, Printing, Sapphire, Polymers, Scanning electron microscopy, Etching, Light emitting diodes
Michael Polanco, Hargsoon Yoon, Sebastian Bawab
J. Micro/Nanolith. MEMS MOEMS 13(2), 023009 (11 June 2014) doi:10.1117/1.JMM.13.2.023009
TOPICS: Brain, Interfaces, Tissues, Silicon, Injuries, Finite element methods, Neurons, Electrodes, Mechanical sensors, 3D modeling
Nai-Ching Chen, Chia-Hao Yu, Ching-Fang Yu, Chi-Lun Lu, James Chu, Luke Hsu, Angus Chin, Anthony Yen
J. Micro/Nanolith. MEMS MOEMS 13(2), 023010 (16 June 2014) doi:10.1117/1.JMM.13.2.023010
TOPICS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection
J. Micro/Nanolith. MEMS MOEMS 13(2), 023011 (20 June 2014) doi:10.1117/1.JMM.13.2.023011
TOPICS: Waveguides, Spectroscopy, Gold, Objectives, Fourier transforms, Single mode fibers, Electron beam lithography, Mirrors, Nanostructures, Nanoantennas
J. Micro/Nanolith. MEMS MOEMS 13(2), 023012 (24 June 2014) doi:10.1117/1.JMM.13.2.023012
TOPICS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography
Eiji Nakamachi, Junpei Yanagimoto, Shinya Murakami, Yusuke Morita
J. Micro/Nanolith. MEMS MOEMS 13(2), 023013 (27 June 2014) doi:10.1117/1.JMM.13.2.023013
TOPICS: Axons, Glasses, Nerve, Microelectromechanical systems, Scanning electron microscopy, Microscopes, Plasma treatment, Nerve regeneration, Photoresist materials, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 13(2), 023014 (27 June 2014) doi:10.1117/1.JMM.13.2.023014
TOPICS: Photomasks, Phase shifts, SRAF, Semiconducting wafers, Lithography, Opacity, Optical lithography, Scattering, Binary data, Polarization
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