25 July 2014 Fundamental study of placement errors in directed self-assembly
Sander F. Wuister, Davide Ambesi, Tamara S. Druzhinina, Emiel Peeters, Jo Finders, Joanne K. Wolterink, Johannes G. Fraaije
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Abstract
Contact holes (CHs) created by 193i lithography were shrunken by directed self-assembly of polystyrene-b-methylmethacrylate (PS-PMMA) block copolymers (BCPs). The placement error of these highly confined systems is determined both experimentally and by simulations. Good agreement between simulations (2 nm) and experiments was observed (2 nm). Extensive simulations show that the placement error is dependent on the length of the PS block only, indicating that the placement error is intrinsic to the BCP. This was explained by considering the BCPs as springs. For double CHs, a relation is found between the offset of the CH from the center of the CHs and the additional placement error.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2014/$25.00 © 2014 SPIE
Sander F. Wuister, Davide Ambesi, Tamara S. Druzhinina, Emiel Peeters, Jo Finders, Joanne K. Wolterink, and Johannes G. Fraaije "Fundamental study of placement errors in directed self-assembly," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033005 (25 July 2014). https://doi.org/10.1117/1.JMM.13.3.033005
Published: 25 July 2014
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CITATIONS
Cited by 10 scholarly publications and 3 patents.
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KEYWORDS
Directed self assembly

Polymethylmethacrylate

Polymers

Picosecond phenomena

Lithography

Error analysis

Thermodynamics

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