journal of micro nanolithography mems and moems
VOL. 13 · NO. 4 | October 2014
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 13(4), 040101 (1 December 2014) https://doi.org/10.1117/1.JMM.13.4.040101
TOPICS: Scientific research, Fluctuations and noise, Nomenclature, Instrument modeling, Statistical analysis, Mirrors
Special Section on Holistic/Hybrid Metrology
J. Micro/Nanolith. MEMS MOEMS 13(4), 041401 (19 December 2014) https://doi.org/10.1117/1.JMM.13.4.041401
TOPICS: Metrology, Overlay metrology, Manufacturing, Roads, Etching, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Germanium, Microelectronics
Delphine Le Cunff, Thomas Nguyen, Romain Duru, Francesco Abbate, Jonny Hoglund, Nicolas Laurent, Frederic Pernot, Matthew Wormington
J. Micro/Nanolith. MEMS MOEMS 13(4), 041402 (15 September 2014) https://doi.org/10.1117/1.JMM.13.4.041402
TOPICS: Germanium, Metrology, Boron, Semiconducting wafers, Diffractive optical elements, Ellipsometry, Doping, Silicon, Chemical species, Infrared radiation
J. Micro/Nanolith. MEMS MOEMS 13(4), 041403 (19 September 2014) https://doi.org/10.1117/1.JMM.13.4.041403
TOPICS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Scanning electron microscopy, Diffraction, Critical dimension metrology, Computing systems, Manufacturing
DongSub Choi, Tal Itzkovich, Inna Tarshish-Shapir, Eros Huang, Charlie Chen, George K. Huang, Yuan Chi Pai, Jimmy C. Wu, Yu Wei Cheng, Simon C. Hsu, Chun Chi Yu, Nuriel Amir, David Tien, Kelly T. Kuo, Takeshi Kato, Osamu Inoue, Hiroki Kawada, Yutaka Okagawa, Luis Huang, Matthew Hsu, Amei Su
J. Micro/Nanolith. MEMS MOEMS 13(4), 041404 (6 October 2014) https://doi.org/10.1117/1.JMM.13.4.041404
TOPICS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices
J. Micro/Nanolith. MEMS MOEMS 13(4), 041405 (2 October 2014) https://doi.org/10.1117/1.JMM.13.4.041405
TOPICS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
J. Micro/Nanolith. MEMS MOEMS 13(4), 041406 (16 October 2014) https://doi.org/10.1117/1.JMM.13.4.041406
TOPICS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching
Xiaoxiao Zhang, Hua Zhou, Zhenhua Ge, Alok Vaid, Deepasree Konduparthi, Carmen Osorio, Stefano Ventola, Roi Meir, Ori Shoval, Roman Kris, Ofer Adan, Maayan Bar-Zvi
J. Micro/Nanolith. MEMS MOEMS 13(4), 041407 (1 October 2014) https://doi.org/10.1117/1.JMM.13.4.041407
TOPICS: Fin field effect transitor, Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides
Charles Settens, Aaron Cordes, Benjamin Bunday, Abner Bello, Vimal Kamineni, Abhijeet Paul, Jody Fronheiser, Richard Matyi
J. Micro/Nanolith. MEMS MOEMS 13(4), 041408 (4 November 2014) https://doi.org/10.1117/1.JMM.13.4.041408
TOPICS: Silicon, Fin field effect transitor, Scattering, X-rays, Hydrogen, Critical dimension metrology, Annealing, Metrology, Scatter measurement, Double patterning technology
Jinkook Park, ChaeHo Shin, Minkook Kim, Junghwan Kim, JeongKyun Park, JungSoo Kim, ChungSam Jun, Yeny Yim, Janghee Lee
J. Micro/Nanolith. MEMS MOEMS 13(4), 041409 (10 October 2014) https://doi.org/10.1117/1.JMM.13.4.041409
TOPICS: Overlay metrology, Image processing, Semiconductors, Semiconducting wafers, Detection and tracking algorithms, Algorithm development, Quantization, Reliability, Image segmentation, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 13(4), 041410 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.041410
TOPICS: Line edge roughness, Metrology, Scatterometry, Data modeling, Semiconducting wafers, Critical dimension metrology, Photoresist materials, Transmission electron microscopy, Etching, Scatter measurement
Robin Chao, Kriti Kohli, Yunlin Zhang, Anita Madan, Gangadhara Raja Muthinti, Augustin Hong, David Conklin, Judson Holt, Todd Bailey
J. Micro/Nanolith. MEMS MOEMS 13(4), 041411 (29 October 2014) https://doi.org/10.1117/1.JMM.13.4.041411
TOPICS: Metrology, Scatterometry, Fin field effect transitor, Silicon, Diffraction, X-rays, Data modeling, Semiconducting wafers, X-ray diffraction, 3D modeling
Wei Jhe Tzai, Simon C. Hsu, Howard Chen, Charlie Chen, Yuan Chi Pai, Chun-Chi Yu, Chia-Ching Lin, Tal Itzkovich, Lipkong Yap, Eran Amit, David Tien, Eros Huang, Kelly T. Kuo, Nuriel Amir
J. Micro/Nanolith. MEMS MOEMS 13(4), 041412 (2 December 2014) https://doi.org/10.1117/1.JMM.13.4.041412
TOPICS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization
J. Micro/Nanolith. MEMS MOEMS 13(4), 041413 (8 December 2014) https://doi.org/10.1117/1.JMM.13.4.041413
TOPICS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Image analysis, Modulation, Diffractive optical elements, Fin field effect transitor, Data modeling
J. Micro/Nanolith. MEMS MOEMS 13(4), 041414 (19 December 2014) https://doi.org/10.1117/1.JMM.13.4.041414
TOPICS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement
J. Micro/Nanolith. MEMS MOEMS 13(4), 041415 (29 December 2014) https://doi.org/10.1117/1.JMM.13.4.041415
TOPICS: Data modeling, Metrology, Critical dimension metrology, Scatterometry, Atomic force microscopy, Process modeling, Machine learning, Analytics, Optical lithography, Calibration
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(4), 043001 (2 October 2014) https://doi.org/10.1117/1.JMM.13.4.043001
TOPICS: Source mask optimization, Computer simulations, Lithium, Lithography, Lithographic illumination, Genetic algorithms, Logic, Optimization (mathematics), Zernike polynomials, Airborne remote sensing
Vikram Singh, Vardhineedi Sri Venkata Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder Sharma, Felipe Kessler, Francine Scheffer, Daniel Weibel, Subrata Ghosh, Kenneth Gonsalves
J. Micro/Nanolith. MEMS MOEMS 13(4), 043002 (16 October 2014) https://doi.org/10.1117/1.JMM.13.4.043002
TOPICS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Extreme ultraviolet, Electron beam lithography, Etching, Line edge roughness, Resistance, Silicon, Lithography
Manuel Thesen, Dieter Nees, Stephan Ruttloff, Maximilian Rumler, Mathias Rommel, Florian Schlachter, Susanne Grützner, Marko Vogler, Arne Schleunitz, Gabi Grützner
J. Micro/Nanolith. MEMS MOEMS 13(4), 043003 (21 October 2014) https://doi.org/10.1117/1.JMM.13.4.043003
TOPICS: Nanoimprint lithography, Etching, Silicon, Dry etching, Polymers, Photoresist processing, Nickel, Inkjet technology, Nanostructures, Reactive ion etching
Murat Kaya Yapici, Ilyas Farhat
J. Micro/Nanolith. MEMS MOEMS 13(4), 043004 (21 October 2014) https://doi.org/10.1117/1.JMM.13.4.043004
TOPICS: Lithography, Light emitting diodes, Optical lithography, Ultraviolet radiation, Ultraviolet light emitting diodes, Control systems, Photomasks, Microcontrollers, LCDs, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(4), 043005 (27 October 2014) https://doi.org/10.1117/1.JMM.13.4.043005
TOPICS: Photomasks, Extreme ultraviolet, Yield improvement, Extreme ultraviolet lithography, Tolerancing, Multilayers, Lithography, Critical dimension metrology, Semiconducting wafers, Algorithms
J. Micro/Nanolith. MEMS MOEMS 13(4), 043006 (27 October 2014) https://doi.org/10.1117/1.JMM.13.4.043006
TOPICS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 13(4), 043007 (3 November 2014) https://doi.org/10.1117/1.JMM.13.4.043007
TOPICS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF
Chia-Chin Chiang, Chien-Hsing Li
J. Micro/Nanolith. MEMS MOEMS 13(4), 043008 (3 November 2014) https://doi.org/10.1117/1.JMM.13.4.043008
TOPICS: Sensors, Optical fibers, Photoresist materials, Calibration, Fiber optics sensors, Resistance, Refractive index, Lithium, Gas lasers, Etching
Wah Seng Wong, Ishak Abdul Azid, Kamarulazizi Ibrahim, Mutharasu Devarajan
J. Micro/Nanolith. MEMS MOEMS 13(4), 043009 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.043009
TOPICS: Sensors, Transparency, Composites, Silicon, Projection systems, Ultraviolet radiation, Scanning electron microscopy, Optical microscopes, Silver, Protactinium
J. Micro/Nanolith. MEMS MOEMS 13(4), 043010 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.043010
TOPICS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching
Somayeh Fardindoost, Saeed Mohammadi, Azam Iraji zad, Reza Sarvari, Seyed Peyman Shariatpanahi
J. Micro/Nanolith. MEMS MOEMS 13(4), 043011 (11 November 2014) https://doi.org/10.1117/1.JMM.13.4.043011
TOPICS: Zinc oxide, Bioalcohols, Resonators, Nanofibers, Nanoelectromechanical systems, Adsorption, Electrodes, Silicon, Finite element methods, Sensors
Ana Pérez-Campos, Gonzalo Fuentes Iriarte, Vadim Lebedev, Fernando Calle Gómez
J. Micro/Nanolith. MEMS MOEMS 13(4), 043012 (20 November 2014) https://doi.org/10.1117/1.JMM.13.4.043012
TOPICS: Aluminum nitride, Silicon, Nickel, Etching, Chromium, Electrodes, Photoresist materials, Wet etching, Manufacturing, Thin films
J. Micro/Nanolith. MEMS MOEMS 13(4), 043013 (21 November 2014) https://doi.org/10.1117/1.JMM.13.4.043013
TOPICS: Photomasks, Source mask optimization, Artificial intelligence, Immersion lithography, Lithography, Optical fiber cables, Image processing, Binary data, Imaging systems, Resolution enhancement technologies
Yiin-Kuen Fuh, Hong-Yi Lu
J. Micro/Nanolith. MEMS MOEMS 13(4), 043014 (11 December 2014) https://doi.org/10.1117/1.JMM.13.4.043014
TOPICS: Platinum, Sputter deposition, Resistance, Ferroelectric polymers, Metals, Polymers, Electrodes, Fabrication, Lutetium, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 13(4), 043015 (11 December 2014) https://doi.org/10.1117/1.JMM.13.4.043015
TOPICS: Inspection, Extreme ultraviolet, Defect detection, Ruthenium, Electron microscopes, Monte Carlo methods, Signal detection, Photomasks, Silicon, Optical simulations
Zheng Xiong, Hua Liu, Xiangquan Tan, Zhenwu Lu, Cuixia Li, Liwei Song, Zhi Wang
J. Micro/Nanolith. MEMS MOEMS 13(4), 043016 (16 December 2014) https://doi.org/10.1117/1.JMM.13.4.043016
TOPICS: Diffraction, Digital micromirror devices, Micromirrors, Optical lithography, Optics manufacturing, Light sources, Diffraction gratings, Error analysis, Projection systems, Calibration
Abhijit Patil, Yogendra Narayan Pandey, Manolis Doxastakis, Gila Stein
J. Micro/Nanolith. MEMS MOEMS 13(4), 043017 (16 December 2014) https://doi.org/10.1117/1.JMM.13.4.043017
TOPICS: Diffusion, Polymers, Data modeling, Photoresist materials, Chemically amplified resists, Infrared spectroscopy, Nanostructures, Lithography, Absorbance, Spectroscopy
J. Micro/Nanolith. MEMS MOEMS 13(4), 043018 (17 December 2014) https://doi.org/10.1117/1.JMM.13.4.043018
TOPICS: Optical lithography, Double patterning technology, Diffusion, Extreme ultraviolet lithography, Standards development, Transistors, Binary data, Interfaces, Lithography, Machine learning
Tobias Bandi, Jacek Baborowski, Alex Dommann, Herbert Shea, Francis Cardot, Antonia Neels
J. Micro/Nanolith. MEMS MOEMS 13(4), 043019 (18 December 2014) https://doi.org/10.1117/1.JMM.13.4.043019
TOPICS: Resonators, Silicon, Microelectromechanical systems, Aluminum nitride, Tolerancing, Radiation effects, Ions, Quartz, Space operations, Ionization
J. Micro/Nanolith. MEMS MOEMS 13(4), 043020 (18 December 2014) https://doi.org/10.1117/1.JMM.13.4.043020
TOPICS: Motion analysis, Lithography, Plasmonics, Motion models, Line edge roughness, Molecules, Optical lithography, Molecular interactions, Near field scanning optical microscopy, Capillaries
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