Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 13 · NO. 4 | October 2014
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 13(4), 040101 (1 December 2014) https://doi.org/10.1117/1.JMM.13.4.040101
TOPICS: Scientific research, Fluctuations and noise, Nomenclature, Instrument modeling, Statistical analysis, Mirrors
Special Section on Holistic/Hybrid Metrology
J. Micro/Nanolith. MEMS MOEMS 13(4), 041401 (19 December 2014) https://doi.org/10.1117/1.JMM.13.4.041401
TOPICS: Metrology, Overlay metrology, Manufacturing, Roads, Etching, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Germanium, Microelectronics
J. Micro/Nanolith. MEMS MOEMS 13(4), 041402 (15 September 2014) https://doi.org/10.1117/1.JMM.13.4.041402
TOPICS: Germanium, Metrology, Boron, Semiconducting wafers, Diffractive optical elements, Ellipsometry, Doping, Silicon, Chemical species, Infrared radiation
J. Micro/Nanolith. MEMS MOEMS 13(4), 041403 (19 September 2014) https://doi.org/10.1117/1.JMM.13.4.041403
TOPICS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Scanning electron microscopy, Diffraction, Critical dimension metrology, Computing systems, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 13(4), 041404 (6 October 2014) https://doi.org/10.1117/1.JMM.13.4.041404
TOPICS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices
J. Micro/Nanolith. MEMS MOEMS 13(4), 041405 (2 October 2014) https://doi.org/10.1117/1.JMM.13.4.041405
TOPICS: Metrology, Scatterometry, X-rays, Nondestructive evaluation, Scattering, Scanning electron microscopy, Semiconducting wafers, Etching, Scatter measurement, Silicon
J. Micro/Nanolith. MEMS MOEMS 13(4), 041406 (16 October 2014) https://doi.org/10.1117/1.JMM.13.4.041406
TOPICS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching
J. Micro/Nanolith. MEMS MOEMS 13(4), 041407 (1 October 2014) https://doi.org/10.1117/1.JMM.13.4.041407
TOPICS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides
J. Micro/Nanolith. MEMS MOEMS 13(4), 041408 (4 November 2014) https://doi.org/10.1117/1.JMM.13.4.041408
TOPICS: Silicon, Scattering, X-rays, Hydrogen, Critical dimension metrology, Annealing, Metrology, Scatter measurement, Double patterning technology
J. Micro/Nanolith. MEMS MOEMS 13(4), 041409 (10 October 2014) https://doi.org/10.1117/1.JMM.13.4.041409
TOPICS: Overlay metrology, Image processing, Semiconductors, Semiconducting wafers, Detection and tracking algorithms, Algorithm development, Quantization, Reliability, Image segmentation, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 13(4), 041410 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.041410
TOPICS: Line edge roughness, Metrology, Scatterometry, Data modeling, Semiconducting wafers, Critical dimension metrology, Photoresist materials, Transmission electron microscopy, Etching, Scatter measurement
J. Micro/Nanolith. MEMS MOEMS 13(4), 041411 (29 October 2014) https://doi.org/10.1117/1.JMM.13.4.041411
TOPICS: Metrology, Scatterometry, Silicon, Diffraction, X-rays, Data modeling, Semiconducting wafers, X-ray diffraction, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 13(4), 041412 (2 December 2014) https://doi.org/10.1117/1.JMM.13.4.041412
TOPICS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization
J. Micro/Nanolith. MEMS MOEMS 13(4), 041413 (8 December 2014) https://doi.org/10.1117/1.JMM.13.4.041413
TOPICS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Image analysis, Modulation, Diffractive optical elements, Data modeling
J. Micro/Nanolith. MEMS MOEMS 13(4), 041414 (19 December 2014) https://doi.org/10.1117/1.JMM.13.4.041414
TOPICS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement
J. Micro/Nanolith. MEMS MOEMS 13(4), 041415 (29 December 2014) https://doi.org/10.1117/1.JMM.13.4.041415
TOPICS: Data modeling, Metrology, Critical dimension metrology, Scatterometry, Atomic force microscopy, Process modeling, Machine learning, Analytics, Optical lithography, Calibration
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(4), 043001 (2 October 2014) https://doi.org/10.1117/1.JMM.13.4.043001
TOPICS: Source mask optimization, Computer simulations, Lithium, Lithography, Lithographic illumination, Genetic algorithms, Logic, Optimization (mathematics), Zernike polynomials, Airborne remote sensing
J. Micro/Nanolith. MEMS MOEMS 13(4), 043002 (16 October 2014) https://doi.org/10.1117/1.JMM.13.4.043002
TOPICS: Extreme ultraviolet lithography, Polymers, Photoresist materials, Extreme ultraviolet, Electron beam lithography, Etching, Line edge roughness, Resistance, Silicon, Lithography
J. Micro/Nanolith. MEMS MOEMS 13(4), 043003 (21 October 2014) https://doi.org/10.1117/1.JMM.13.4.043003
TOPICS: Nanoimprint lithography, Etching, Silicon, Dry etching, Polymers, Photoresist processing, Nickel, Inkjet technology, Nanostructures, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 13(4), 043004 (21 October 2014) https://doi.org/10.1117/1.JMM.13.4.043004
TOPICS: Lithography, Light emitting diodes, Optical lithography, Ultraviolet radiation, Ultraviolet light emitting diodes, Control systems, Photomasks, Microcontrollers, LCDs, Prototyping
J. Micro/Nanolith. MEMS MOEMS 13(4), 043005 (27 October 2014) https://doi.org/10.1117/1.JMM.13.4.043005
TOPICS: Photomasks, Extreme ultraviolet, Yield improvement, Extreme ultraviolet lithography, Tolerancing, Multilayers, Lithography, Critical dimension metrology, Semiconducting wafers, Algorithms
J. Micro/Nanolith. MEMS MOEMS 13(4), 043006 (27 October 2014) https://doi.org/10.1117/1.JMM.13.4.043006
TOPICS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 13(4), 043007 (3 November 2014) https://doi.org/10.1117/1.JMM.13.4.043007
TOPICS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF
J. Micro/Nanolith. MEMS MOEMS 13(4), 043008 (3 November 2014) https://doi.org/10.1117/1.JMM.13.4.043008
TOPICS: Sensors, Optical fibers, Photoresist materials, Calibration, Fiber optics sensors, Resistance, Refractive index, Lithium, Gas lasers, Etching
J. Micro/Nanolith. MEMS MOEMS 13(4), 043009 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.043009
TOPICS: Sensors, Transparency, Composites, Silicon, Projection systems, Ultraviolet radiation, Scanning electron microscopy, Optical microscopes, Silver, Protactinium
J. Micro/Nanolith. MEMS MOEMS 13(4), 043010 (6 November 2014) https://doi.org/10.1117/1.JMM.13.4.043010
TOPICS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching
J. Micro/Nanolith. MEMS MOEMS 13(4), 043011 (11 November 2014) https://doi.org/10.1117/1.JMM.13.4.043011
TOPICS: Zinc oxide, Bioalcohols, Resonators, Nanofibers, Nanoelectromechanical systems, Adsorption, Electrodes, Silicon, Finite element methods, Sensors
J. Micro/Nanolith. MEMS MOEMS 13(4), 043012 (20 November 2014) https://doi.org/10.1117/1.JMM.13.4.043012
TOPICS: Aluminum nitride, Silicon, Nickel, Etching, Chromium, Electrodes, Photoresist materials, Wet etching, Manufacturing, Thin films
J. Micro/Nanolith. MEMS MOEMS 13(4), 043013 (21 November 2014) https://doi.org/10.1117/1.JMM.13.4.043013
TOPICS: Photomasks, Source mask optimization, Artificial intelligence, Immersion lithography, Lithography, Optical fiber cables, Image processing, Binary data, Imaging systems, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 13(4), 043014 (11 December 2014) https://doi.org/10.1117/1.JMM.13.4.043014
TOPICS: Platinum, Sputter deposition, Resistance, Ferroelectric polymers, Metals, Polymers, Electrodes, Fabrication, Lutetium, Nanolithography
J. Micro/Nanolith. MEMS MOEMS 13(4), 043015 (11 December 2014) https://doi.org/10.1117/1.JMM.13.4.043015
TOPICS: Inspection, Extreme ultraviolet, Defect detection, Ruthenium, Electron microscopes, Monte Carlo methods, Signal detection, Photomasks, Silicon, Optical simulations
J. Micro/Nanolith. MEMS MOEMS 13(4), 043016 (16 December 2014) https://doi.org/10.1117/1.JMM.13.4.043016
TOPICS: Diffraction, Digital micromirror devices, Micromirrors, Optical lithography, Optics manufacturing, Light sources, Diffraction gratings, Error analysis, Projection systems, Calibration
J. Micro/Nanolith. MEMS MOEMS 13(4), 043017 (16 December 2014) https://doi.org/10.1117/1.JMM.13.4.043017
TOPICS: Diffusion, Polymers, Data modeling, Photoresist materials, Chemically amplified resists, Infrared spectroscopy, Nanostructures, Lithography, Absorbance, Spectroscopy
J. Micro/Nanolith. MEMS MOEMS 13(4), 043018 (17 December 2014) https://doi.org/10.1117/1.JMM.13.4.043018
TOPICS: Optical lithography, Double patterning technology, Diffusion, Extreme ultraviolet lithography, Standards development, Transistors, Binary data, Interfaces, Lithography, Machine learning
J. Micro/Nanolith. MEMS MOEMS 13(4), 043019 (18 December 2014) https://doi.org/10.1117/1.JMM.13.4.043019
TOPICS: Resonators, Silicon, Microelectromechanical systems, Aluminum nitride, Tolerancing, Radiation effects, Ions, Quartz, Space operations, Ionization
J. Micro/Nanolith. MEMS MOEMS 13(4), 043020 (18 December 2014) https://doi.org/10.1117/1.JMM.13.4.043020
TOPICS: Motion analysis, Lithography, Plasmonics, Motion models, Line edge roughness, Molecules, Optical lithography, Molecular interactions, Near field scanning optical microscopy, Capillaries
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