journal of micro nanolithography mems and moems
VOL. 13 · NO. 3 | July 2014
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 13(3), 030101 (5 August 2014) https://doi.org/10.1117/1.JMM.13.3.030101
TOPICS: Transistors, Microelectromechanical systems, Sensors, Consciousness
JM3 Letters
Angelo Gaitas, Robert Hower
J. Micro/Nanolith. MEMS MOEMS 13(3), 030501 (15 September 2014) https://doi.org/10.1117/1.JMM.13.3.030501
TOPICS: Microfluidics, Electrodes, Silicon, Semiconducting wafers, Oxides, Etching, Resistance, Glasses, Biosensing, Photomasks
Special Section on Alternative Lithographic Technologies III
J. Micro/Nanolith. MEMS MOEMS 13(3), 031301 (3 October 2014) https://doi.org/10.1117/1.JMM.13.3.031301
TOPICS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031302 (16 July 2014) https://doi.org/10.1117/1.JMM.13.3.031302
TOPICS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies
Helmut Schift, Prabitha Urwyler, Per Magnus Kristiansen, Jens Gobrecht
J. Micro/Nanolith. MEMS MOEMS 13(3), 031303 (18 July 2014) https://doi.org/10.1117/1.JMM.13.3.031303
TOPICS: Nanoimprint lithography, Polymers, Nanostructures, Cesium, Manufacturing, Silicon, Optical lithography, Polymer thin films, Thin films, Metals
Thomas Bennett, Kevin Pei, Han-Hao Cheng, Kristofer Thurecht, Kevin Jack, Idriss Blakey
J. Micro/Nanolith. MEMS MOEMS 13(3), 031304 (21 July 2014) https://doi.org/10.1117/1.JMM.13.3.031304
TOPICS: Picosecond phenomena, Polymethylmethacrylate, Thin films, Liquids, Polymers, Scattering, Scanning electron microscopy, Laser scattering, Annealing, Directed self assembly
Kenji Yoshimoto, Ken Fukawatase, Masahiro Ohshima, Yoshihiro Naka, Shimon Maeda, Satoshi Tanaka, Seiji Morita, Hisako Aoyama, Shoji Mimotogi
J. Micro/Nanolith. MEMS MOEMS 13(3), 031305 (7 August 2014) https://doi.org/10.1117/1.JMM.13.3.031305
TOPICS: Polymethylmethacrylate, Picosecond phenomena, Transmission electron microscopy, Calibration, Process modeling, Computer simulations, Optimization (mathematics), System on a chip, Image processing, Directed self assembly
Pieter Brandt, Jérôme Belledent, Céline Tranquillin, Thiago Figueiro, Stéfanie Meunier, Sébastien Bayle, Aurélien Fay, Matthieu Milléquant, Beatrice Icard, Marco Wieland
J. Micro/Nanolith. MEMS MOEMS 13(3), 031306 (11 August 2014) https://doi.org/10.1117/1.JMM.13.3.031306
TOPICS: Electron beam lithography, Electronic design automation, Critical dimension metrology, Raster graphics, Point spread functions, Semiconducting wafers, Lithography, Modulation, Optical proximity correction, Data conversion
XiaoMin Yang, Shuaigang Xiao, Yautzong Hsu, HongYing Wang, Justin Hwu, Philip Steiner, Koichi Wago, Kim Lee, David Kuo
J. Micro/Nanolith. MEMS MOEMS 13(3), 031307 (12 August 2014) https://doi.org/10.1117/1.JMM.13.3.031307
TOPICS: Servomechanisms, Beam propagation method, Scanning electron microscopy, Quartz, Magnetism, Nanoimprint lithography, Etching, Optical lithography, Lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031308 (20 August 2014) https://doi.org/10.1117/1.JMM.13.3.031308
TOPICS: Interfaces, Polymers, Thin films, Computer simulations, Molecular self-assembly, Lithography, Physics, Picosecond phenomena, Manufacturing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031309 (3 October 2014) https://doi.org/10.1117/1.JMM.13.3.031309
TOPICS: Optical lithography, System on a chip, Optical design, Computer aided design, Lithography, Analog electronics, Manufacturing, Logic, Fin field effect transitor, Transistors
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(3), 033001 (3 July 2014) https://doi.org/10.1117/1.JMM.13.3.033001
TOPICS: Mirrors, Luminescence, Laser induced fluorescence, Absorbance, Polymethylmethacrylate, Signal to noise ratio, Sensors, Fluorescence spectroscopy, Absorption, Calibration
J. Micro/Nanolith. MEMS MOEMS 13(3), 033002 (3 July 2014) https://doi.org/10.1117/1.JMM.13.3.033002
TOPICS: Electron beam lithography, Scanning electron microscopy, Molecules, Line width roughness, Control systems, Electron beams, Lithography, Silicon, Optical lithography, Electron microscopes
Hongsheng Li, Huiliang Cao, Yunfang Ni
J. Micro/Nanolith. MEMS MOEMS 13(3), 033003 (14 July 2014) https://doi.org/10.1117/1.JMM.13.3.033003
TOPICS: Gyroscopes, Microelectromechanical systems, Nickel, Lithium, Manufacturing, Stereolithography, Error analysis, Interfaces, Control systems, Demodulation
Chun-Ming Chang, Shih-Feng Tseng, Chao-Te Lee, Wen-Tse Hsiao, J. Andrew Yeh, Donyau Chiang
J. Micro/Nanolith. MEMS MOEMS 13(3), 033004 (22 July 2014) https://doi.org/10.1117/1.JMM.13.3.033004
TOPICS: Photoresist materials, Oxides, Sapphire, Lithography, Plasma, Etching, Crystals, Laser development, Oxygen, Chlorine
Sander Wuister, Davide Ambesi, Tamara Druzhinina, Emiel Peeters, Jo Finders, Joanne Wolterink, Johannes Fraaije
J. Micro/Nanolith. MEMS MOEMS 13(3), 033005 (25 July 2014) https://doi.org/10.1117/1.JMM.13.3.033005
TOPICS: Polymethylmethacrylate, Polymers, Picosecond phenomena, Lithography, Error analysis, Thermodynamics, Scanning electron microscopy, Semiconducting wafers, Optical lithography, Directed self assembly
Mohsin Ali Badshah, Hyungjun Jang, Young Kyu Kim, Tae-Hyoung Kim, Seok-Min Kim
J. Micro/Nanolith. MEMS MOEMS 13(3), 033006 (5 August 2014) https://doi.org/10.1117/1.JMM.13.3.033006
TOPICS: Polymers, Glasses, Positron emission tomography, Silicon, Image processing, Distance measurement, Biomedical optics, Ultraviolet radiation, Microscopes, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 13(3), 033007 (8 August 2014) https://doi.org/10.1117/1.JMM.13.3.033007
TOPICS: Photomasks, Diffraction, Critical dimension metrology, Extreme ultraviolet lithography, Waveguides, Extreme ultraviolet, Calibration, Mathematical modeling, Reflectivity, Wave propagation
Lei Wang, Chong Liu, Jingmin Li, Zheng Xu, Lu Gan, Tao Li, Lijie Zhou, Yahui Ma, Hao Zhang, Kaiping Zhang
J. Micro/Nanolith. MEMS MOEMS 13(3), 033008 (11 August 2014) https://doi.org/10.1117/1.JMM.13.3.033008
TOPICS: Microfluidics, Biomimetics, Liquids, Microsystems, Lithium, Polymethylmethacrylate, Particles, Semiconducting wafers, Lutetium, Gallium nitride
J. Micro/Nanolith. MEMS MOEMS 13(3), 033009 (13 August 2014) https://doi.org/10.1117/1.JMM.13.3.033009
TOPICS: Scanning electron microscopy, Line edge roughness, Electrons, Image filtering, Edge detection, Digital filtering, Linear filtering, Error analysis, Metrology, Edge roughness
Lingkuan Meng, Xiaobin He, Chunlong Li, Junjie Li, Peizhen Hong, Junfeng Li, Chao Zhao, Jiang Yan
J. Micro/Nanolith. MEMS MOEMS 13(3), 033010 (27 August 2014) https://doi.org/10.1117/1.JMM.13.3.033010
TOPICS: Etching, Photomasks, Ions, Line width roughness, Electron beam lithography, Plasma, Optical lithography, Silicon, Plasma etching, Transistors
Leeya Engel, Slava Krylov, Yosi Shacham-Diamand
J. Micro/Nanolith. MEMS MOEMS 13(3), 033011 (27 August 2014) https://doi.org/10.1117/1.JMM.13.3.033011
TOPICS: Polymers, Silicon, Nanoimprint lithography, Electroactive polymers, Electron beam lithography, Actuators, Polymer thin films, Annealing, Sensors, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 13(3), 033012 (28 August 2014) https://doi.org/10.1117/1.JMM.13.3.033012
TOPICS: Microelectromechanical systems, Energy harvesting, Sensors, Silicon, Electronics, Microelectronics, Ferroelectric materials, Electromagnetism, Shape analysis, Sensor networks
Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre Olynick, Christophe Peroz, Stefano Cabrini
J. Micro/Nanolith. MEMS MOEMS 13(3), 033013 (5 September 2014) https://doi.org/10.1117/1.JMM.13.3.033013
TOPICS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy
Zhen Cao, Yanqiu Li, Fei Liu
J. Micro/Nanolith. MEMS MOEMS 13(3), 033014 (9 September 2014) https://doi.org/10.1117/1.JMM.13.3.033014
TOPICS: Objectives, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Bismuth, Lithium, Ray tracing, Lithography, Semiconducting wafers
Henk Boots, Jessica M. de Ruiter, Thanh Trung Nguyen, Aurelie Brizard, Emiel Peeters, Sander Wuister, Tamara Druzhinina, Joanne Wolterink, Johannes G. E. Fraaije
J. Micro/Nanolith. MEMS MOEMS 13(3), 033015 (15 September 2014) https://doi.org/10.1117/1.JMM.13.3.033015
TOPICS: Scanning electron microscopy, Polymethylmethacrylate, Error analysis, Computer simulations, Semiconductors, Lithography, Polymers, Semiconducting wafers, Nanostructures, Directed self assembly
Sergio Gómez, Francesc Moll, Joan Mauricio
J. Micro/Nanolith. MEMS MOEMS 13(3), 033016 (16 September 2014) https://doi.org/10.1117/1.JMM.13.3.033016
TOPICS: Lithography, Image processing, Calibration, Video processing, Performance modeling, Silicon, Video, Semiconducting wafers, Transistors, Data modeling
Chia-Hsu Hsieh, Wei-Che Hung, Po-Han Chen, I-Yu Huang
J. Micro/Nanolith. MEMS MOEMS 13(3), 033017 (19 September 2014) https://doi.org/10.1117/1.JMM.13.3.033017
TOPICS: Carbon monoxide, Electrodes, Microsensors, Sensing systems, Solids, Chlorine, Sensors, Field effect transistors, Ions, Semiconducting wafers
Yuksel Temiz, Jelena Skorucak, Emmanuel Delamarche
J. Micro/Nanolith. MEMS MOEMS 13(3), 033018 (23 September 2014) https://doi.org/10.1117/1.JMM.13.3.033018
TOPICS: Microfluidics, Dielectrophoresis, Electrodes, Liquids, Particles, Capillaries, Semiconducting wafers, Glasses, Fabrication, Metals
Yi-Ching Kuo, Ching-Sung Chen, Ku-Ning Chang, Chih-Ting Lin, Chih-Kung Lee
J. Micro/Nanolith. MEMS MOEMS 13(3), 033019 (26 September 2014) https://doi.org/10.1117/1.JMM.13.3.033019
TOPICS: Electrodes, Biosensors, Proteins, Gold, Computer simulations, Chemical vapor deposition, Atomic force microscope, Point-of-care devices, Atomic force microscopy, Potassium
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