Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 13 · NO. 3 | July 2014
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 13(3), 030101 (5 August 2014) https://doi.org/10.1117/1.JMM.13.3.030101
TOPICS: Transistors, Microelectromechanical systems, Sensors, Consciousness
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 13(3), 030501 (15 September 2014) https://doi.org/10.1117/1.JMM.13.3.030501
TOPICS: Microfluidics, Electrodes, Silicon, Semiconducting wafers, Oxides, Etching, Resistance, Glasses, Biosensing, Photomasks
Special Section on Alternative Lithographic Technologies III
J. Micro/Nanolith. MEMS MOEMS 13(3), 031301 (3 October 2014) https://doi.org/10.1117/1.JMM.13.3.031301
TOPICS: Lithography, Optical lithography, Electron beam lithography, Nanotechnology, Extreme ultraviolet lithography, Photomasks, Integrated circuit design, Double patterning technology, Nanolithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031302 (16 July 2014) https://doi.org/10.1117/1.JMM.13.3.031302
TOPICS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies
J. Micro/Nanolith. MEMS MOEMS 13(3), 031303 (18 July 2014) https://doi.org/10.1117/1.JMM.13.3.031303
TOPICS: Nanoimprint lithography, Polymers, Nanostructures, Cesium, Manufacturing, Silicon, Optical lithography, Polymer thin films, Thin films, Metals
J. Micro/Nanolith. MEMS MOEMS 13(3), 031304 (21 July 2014) https://doi.org/10.1117/1.JMM.13.3.031304
TOPICS: Picosecond phenomena, Polymethylmethacrylate, Thin films, Liquids, Polymers, Scattering, Scanning electron microscopy, Laser scattering, Annealing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031305 (7 August 2014) https://doi.org/10.1117/1.JMM.13.3.031305
TOPICS: Polymethylmethacrylate, Picosecond phenomena, Transmission electron microscopy, Calibration, Process modeling, Computer simulations, Optimization (mathematics), System on a chip, Image processing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031306 (11 August 2014) https://doi.org/10.1117/1.JMM.13.3.031306
TOPICS: Electron beam lithography, Electronic design automation, Critical dimension metrology, Raster graphics, Point spread functions, Semiconducting wafers, Lithography, Modulation, Optical proximity correction, Data conversion
J. Micro/Nanolith. MEMS MOEMS 13(3), 031307 (12 August 2014) https://doi.org/10.1117/1.JMM.13.3.031307
TOPICS: Servomechanisms, Beam propagation method, Scanning electron microscopy, Quartz, Magnetism, Nanoimprint lithography, Etching, Optical lithography, Lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031308 (20 August 2014) https://doi.org/10.1117/1.JMM.13.3.031308
TOPICS: Interfaces, Polymers, Thin films, Computer simulations, Molecular self-assembly, Lithography, Physics, Picosecond phenomena, Manufacturing, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 031309 (3 October 2014) https://doi.org/10.1117/1.JMM.13.3.031309
TOPICS: Optical lithography, System on a chip, Optical design, Computer aided design, Lithography, Analog electronics, Manufacturing, Logic, Transistors
Regular Articles
J. Micro/Nanolith. MEMS MOEMS 13(3), 033001 (3 July 2014) https://doi.org/10.1117/1.JMM.13.3.033001
TOPICS: Mirrors, Luminescence, Laser induced fluorescence, Absorbance, Polymethylmethacrylate, Signal to noise ratio, Sensors, Fluorescence spectroscopy, Absorption, Calibration
J. Micro/Nanolith. MEMS MOEMS 13(3), 033002 (3 July 2014) https://doi.org/10.1117/1.JMM.13.3.033002
TOPICS: Electron beam lithography, Scanning electron microscopy, Molecules, Line width roughness, Control systems, Electron beams, Lithography, Silicon, Optical lithography, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 13(3), 033003 (14 July 2014) https://doi.org/10.1117/1.JMM.13.3.033003
TOPICS: Gyroscopes, Microelectromechanical systems, Nickel, Lithium, Manufacturing, Stereolithography, Error analysis, Interfaces, Control systems, Demodulation
J. Micro/Nanolith. MEMS MOEMS 13(3), 033004 (22 July 2014) https://doi.org/10.1117/1.JMM.13.3.033004
TOPICS: Photoresist materials, Oxides, Sapphire, Lithography, Plasma, Etching, Crystals, Laser development, Oxygen, Chlorine
J. Micro/Nanolith. MEMS MOEMS 13(3), 033005 (25 July 2014) https://doi.org/10.1117/1.JMM.13.3.033005
TOPICS: Polymethylmethacrylate, Polymers, Picosecond phenomena, Lithography, Error analysis, Thermodynamics, Scanning electron microscopy, Semiconducting wafers, Optical lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 033006 (5 August 2014) https://doi.org/10.1117/1.JMM.13.3.033006
TOPICS: Polymers, Glasses, Positron emission tomography, Silicon, Image processing, Distance measurement, Biomedical optics, Ultraviolet radiation, Microscopes, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 13(3), 033007 (8 August 2014) https://doi.org/10.1117/1.JMM.13.3.033007
TOPICS: Photomasks, Diffraction, Critical dimension metrology, Extreme ultraviolet lithography, Waveguides, Extreme ultraviolet, Calibration, Mathematical modeling, Reflectivity, Wave propagation
J. Micro/Nanolith. MEMS MOEMS 13(3), 033008 (11 August 2014) https://doi.org/10.1117/1.JMM.13.3.033008
TOPICS: Microfluidics, Biomimetics, Liquids, Microsystems, Lithium, Polymethylmethacrylate, Particles, Semiconducting wafers, Lutetium, Gallium nitride
J. Micro/Nanolith. MEMS MOEMS 13(3), 033009 (13 August 2014) https://doi.org/10.1117/1.JMM.13.3.033009
TOPICS: Scanning electron microscopy, Line edge roughness, Electrons, Image filtering, Edge detection, Digital filtering, Linear filtering, Error analysis, Metrology, Edge roughness
J. Micro/Nanolith. MEMS MOEMS 13(3), 033010 (27 August 2014) https://doi.org/10.1117/1.JMM.13.3.033010
TOPICS: Etching, Photomasks, Ions, Line width roughness, Electron beam lithography, Plasma, Optical lithography, Silicon, Plasma etching, Transistors
J. Micro/Nanolith. MEMS MOEMS 13(3), 033011 (27 August 2014) https://doi.org/10.1117/1.JMM.13.3.033011
TOPICS: Polymers, Silicon, Nanoimprint lithography, Electroactive polymers, Electron beam lithography, Actuators, Polymer thin films, Annealing, Sensors, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 13(3), 033012 (28 August 2014) https://doi.org/10.1117/1.JMM.13.3.033012
TOPICS: Microelectromechanical systems, Energy harvesting, Sensors, Silicon, Electronics, Microelectronics, Ferroelectric materials, Electromagnetism, Shape analysis, Sensor networks
J. Micro/Nanolith. MEMS MOEMS 13(3), 033013 (5 September 2014) https://doi.org/10.1117/1.JMM.13.3.033013
TOPICS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 13(3), 033014 (9 September 2014) https://doi.org/10.1117/1.JMM.13.3.033014
TOPICS: Objectives, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Bismuth, Lithium, Ray tracing, Lithography, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 13(3), 033015 (15 September 2014) https://doi.org/10.1117/1.JMM.13.3.033015
TOPICS: Scanning electron microscopy, Polymethylmethacrylate, Error analysis, Computer simulations, Semiconductors, Lithography, Polymers, Semiconducting wafers, Nanostructures, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 13(3), 033016 (16 September 2014) https://doi.org/10.1117/1.JMM.13.3.033016
TOPICS: Lithography, Image processing, Calibration, Video processing, Performance modeling, Silicon, Video, Semiconducting wafers, Transistors, Data modeling
J. Micro/Nanolith. MEMS MOEMS 13(3), 033017 (19 September 2014) https://doi.org/10.1117/1.JMM.13.3.033017
TOPICS: Carbon monoxide, Electrodes, Microsensors, Sensing systems, Solids, Chlorine, Sensors, Field effect transistors, Ions, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 13(3), 033018 (23 September 2014) https://doi.org/10.1117/1.JMM.13.3.033018
TOPICS: Microfluidics, Dielectrophoresis, Electrodes, Liquids, Particles, Capillaries, Semiconducting wafers, Glasses, Fabrication, Metals
J. Micro/Nanolith. MEMS MOEMS 13(3), 033019 (26 September 2014) https://doi.org/10.1117/1.JMM.13.3.033019
TOPICS: Electrodes, Biosensors, Proteins, Gold, Computer simulations, Chemical vapor deposition, Atomic force microscope, Point-of-care devices, Atomic force microscopy, Potassium
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