Open Access
3 November 2014 Fast pixel-based optical proximity correction based on nonparametric kernel regression
Author Affiliations +
Abstract
Optical proximity correction (OPC) is a resolution enhancement technique extensively used in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography. In pixel-based OPC (PBOPC), the layout is divided into small pixels, which are then iteratively modified until the simulated print image on the wafer matches the desired pattern. However, the increasing complexity and size of modern integrated circuits make PBOPC techniques quite computationally intensive. This paper focuses on developing a practical and efficient PBOPC algorithm based on a nonparametric kernel regression, a well-known technique in machine learning. Specifically, we estimate the OPC patterns based on the geometric characteristics of the original layout corresponding to the same region and a series of training examples. Experimental results on metal layers show that our proposed approach significantly improves the speed of a current professional PBOPC software by a factor of 2 to 3, and may further reduce the mask complexity.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Xu Ma, Bingliang Wu, Zhiyang Song, Shangliang Jiang, and Yanqiu Li "Fast pixel-based optical proximity correction based on nonparametric kernel regression," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 043007 (3 November 2014). https://doi.org/10.1117/1.JMM.13.4.043007
Published: 3 November 2014
Lens.org Logo
CITATIONS
Cited by 13 scholarly publications and 1 patent.
Advertisement
Advertisement
KEYWORDS
Optical proximity correction

Metals

Photomasks

Algorithm development

Semiconducting wafers

Binary data

Image processing

Back to Top