journal of micro nanolithography mems and moems
VOL. 14 · NO. 1 | January 2015
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 14(1), 010101 (11 February 2015) doi:10.1117/1.JMM.14.1.010101
TOPICS: Glasses, Prisms, Roads, Education and training, Printing
Special Section on Continuation of Scaling with Optical and Complementary Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 011001 (19 March 2015) doi:10.1117/1.JMM.14.1.011001
TOPICS: Optical lithography, Lithography, Integrated optics, Double patterning technology, EUV optics, Optics manufacturing, Process control, Photomasks, Source mask optimization, Device simulation
Bei Yu, Subhendu Roy, Jhih-Rong Gao, David Pan
J. Micro/Nanolith. MEMS MOEMS 14(1), 011002 (4 November 2014) doi:10.1117/1.JMM.14.1.011002
TOPICS: Photomasks, Lithography, Optical lithography, Computer programming, Electron beam lithography, Manufacturing, Image processing, Double patterning technology, Logic
J. Micro/Nanolith. MEMS MOEMS 14(1), 011003 (4 November 2014) doi:10.1117/1.JMM.14.1.011003
TOPICS: Lithography, Data modeling, Principal component analysis, Calibration, Performance modeling, Manufacturing, Data processing, Computer programming, Data compression, Dimension reduction
J. Micro/Nanolith. MEMS MOEMS 14(1), 011004 (4 December 2014) doi:10.1117/1.JMM.14.1.011004
TOPICS: Photomasks, Metals, Lithography, Optical lithography, Double patterning technology, Semiconducting wafers, Manufacturing, Logic, Optical proximity correction, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 14(1), 011005 (13 November 2014) doi:10.1117/1.JMM.14.1.011005
TOPICS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials
Pei-Chun Lin, Chun-Chang Yu, Charlie C. Chen
J. Micro/Nanolith. MEMS MOEMS 14(1), 011006 (22 December 2014) doi:10.1117/1.JMM.14.1.011006
TOPICS: Diffusion, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Convolution, Photoresist materials, Principal component analysis, SRAF, Matrices, Fiber optic illuminators
Kaushik Vaidyanathan, Qiuling Zhu, Lars Liebmann, Kafai Lai, Stephen Wu, Renzhi Liu, Yandong Liu, Andzrej Strojwas, Larry Pileggi
J. Micro/Nanolith. MEMS MOEMS 14(1), 011007 (30 December 2014) doi:10.1117/1.JMM.14.1.011007
TOPICS: Computer aided design, Manufacturing, System on a chip, Logic, Fin field effect transitor, Optical lithography, Standards development, Analog electronics, Semiconductors, CMOS technology
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 013501 (6 January 2015) doi:10.1117/1.JMM.14.1.013501
TOPICS: Charge-coupled devices, Roentgenium, Polymethylmethacrylate, Cadmium sulfide, Critical dimension metrology, Thermal effects, Lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(1), 013502 (22 January 2015) doi:10.1117/1.JMM.14.1.013502
TOPICS: Scanning probe microscopy, Defect detection, Extreme ultraviolet, Surface roughness, Inspection, Photomasks, Defect inspection, Signal analysis, Phase measurement, Signal detection
Seongbo Shim, Youngsoo Shin
J. Micro/Nanolith. MEMS MOEMS 14(1), 013503 (23 January 2015) doi:10.1117/1.JMM.14.1.013503
TOPICS: Image classification, Lithography, Metals, Library classification systems, Computer simulations, Device simulation, Fuzzy logic, Optical proximity correction, Tolerancing, Raster graphics
MacCallister Higgins, Emil Geiger
J. Micro/Nanolith. MEMS MOEMS 14(1), 013504 (29 January 2015) doi:10.1117/1.JMM.14.1.013504
TOPICS: Photoresist materials, Microfluidics, Microscopes, Lamps, Optical lithography, Photomasks, Ultraviolet radiation, Camera shutters, Glasses, Objectives
Nabil Laachi, Tatsuhiro Iwama, Kris Delaney, Bongkeun Kim, Robert Bristol, David Shykind, Corey Weinheimer, Glenn Fredrickson
J. Micro/Nanolith. MEMS MOEMS 14(1), 013505 (5 February 2015) doi:10.1117/1.JMM.14.1.013505
TOPICS: Polymethylmethacrylate, Thermal effects, Critical dimension metrology, Error analysis, Lithography, Overlay metrology, Picosecond phenomena, Polymers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(1), 013506 (9 February 2015) doi:10.1117/1.JMM.14.1.013506
TOPICS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 013507 (23 February 2015) doi:10.1117/1.JMM.14.1.013507
TOPICS: Phase contrast, Extreme ultraviolet, Microscopes, Digital image correlation, Photomasks, Silicon, Scanning electron microscopy, Phase shifts, Lenses, Point spread functions
Richard Fu, Ryan Toonen, Samuel Hirsch, Mathew Ivill, Melanie Cole, Kenneth Strawhecker
J. Micro/Nanolith. MEMS MOEMS 14(1), 013508 (3 March 2015) doi:10.1117/1.JMM.14.1.013508
TOPICS: Etching, Nanolithography, Thin films, Complex oxides, Electrodes, Electron beam lithography, Dry etching, Barium, Strontium, Argon
Metrology
Bryan Barnes, Francois Goasmat, Martin Sohn, Hui Zhou, András Vladár, Richard Silver
J. Micro/Nanolith. MEMS MOEMS 14(1), 014001 (11 February 2015) doi:10.1117/1.JMM.14.1.014001
TOPICS: Signal to noise ratio, Semiconducting wafers, Line edge roughness, Wafer-level optics, Defect detection, Scattering, Scanning electron microscopy, Line width roughness, Inspection
Microfabrication
Thomas Wilson, Konstantin Korolev, Nathaniel Crow
J. Micro/Nanolith. MEMS MOEMS 14(1), 014501 (20 January 2015) doi:10.1117/1.JMM.14.1.014501
TOPICS: Aluminum, Photoresist developing, Photomicroscopy, Metals, Optical lithography, Photoresist materials, Sputter deposition, Palladium, Bolometers, Scanning electron microscopy
Yonggang Jiang, Jianchao Fu, Junfeng Pan, Zhonglie An, Jun Cai, Deyuan Zhang
J. Micro/Nanolith. MEMS MOEMS 14(1), 014502 (18 February 2015) doi:10.1117/1.JMM.14.1.014502
TOPICS: Silicon, Nanolithography, Etching, Gold, Reactive ion etching, Nanostructures, Chemical species, Scanning electron microscopy, Nanofabrication, Photomasks
Ning Xue, Leonidas Bleris, Jeong-Bong Lee
J. Micro/Nanolith. MEMS MOEMS 14(1), 014503 (19 February 2015) doi:10.1117/1.JMM.14.1.014503
TOPICS: Silicon, Chemical analysis, Ultraviolet radiation, Atomic force microscopy, X-rays, Plasma treatment, Oxygen, Photoemission spectroscopy, Optical lithography, Microscopy
Hubert Hody, Vasile Paraschiv, David Hellin, Tom Vandeweyer, Guillaume Boccardi, Kaidong Xu
J. Micro/Nanolith. MEMS MOEMS 14(1), 014504 (5 March 2015) doi:10.1117/1.JMM.14.1.014504
TOPICS: Etching, Line width roughness, Double patterning technology, Critical dimension metrology, Amorphous silicon, Fin field effect transitor, Plasma, Extreme ultraviolet, Optical lithography, Photomasks
Microelectromechanical Systems (MEMS)
Ze Liu, Ran Zhang, Zhiwen Wang, Le Guan, Bin Li, Jinkui Chu
J. Micro/Nanolith. MEMS MOEMS 14(1), 015001 (17 February 2015) doi:10.1117/1.JMM.14.1.015001
TOPICS: Sensors, CMOS sensors, Polarizers, Polarization, Nanoimprint lithography, Navigation systems, Dielectric polarization, Nanolithography, Error analysis, Nanowires
Shailendra Singh, Malalahalli Sreenivasamurthy Giridhar, Cheemalamarri V. Rao, Sangam Bhalke, Rifqul Islam
J. Micro/Nanolith. MEMS MOEMS 14(1), 015002 (27 February 2015) doi:10.1117/1.JMM.14.1.015002
TOPICS: Switches, Packaging, Microelectromechanical systems, Computer architecture, 3D modeling, Actuators, Silicon, Scanning electron microscopy, Ceramics, Helium
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 14(1), 015501 (20 January 2015) doi:10.1117/1.JMM.14.1.015501
TOPICS: Resistors, Micromirrors, Mirrors, Photodiodes, Semiconducting wafers, Gallium arsenide, Actuators, Wafer-level optics, Thin films, Optical arrays
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