Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 14 · NO. 1 | January 2015
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 14(1), 010101 (11 February 2015) https://doi.org/10.1117/1.JMM.14.1.010101
TOPICS: Glasses, Prisms, Roads, Education and training, Printing
Special Section on Continuation of Scaling with Optical and Complementary Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 011001 (19 March 2015) https://doi.org/10.1117/1.JMM.14.1.011001
TOPICS: Optical lithography, Lithography, Integrated optics, Double patterning technology, EUV optics, Optics manufacturing, Process control, Photomasks, Source mask optimization, Device simulation
J. Micro/Nanolith. MEMS MOEMS 14(1), 011002 (4 November 2014) https://doi.org/10.1117/1.JMM.14.1.011002
TOPICS: Photomasks, Lithography, Optical lithography, Computer programming, Electron beam lithography, Manufacturing, Image processing, Double patterning technology, Logic
J. Micro/Nanolith. MEMS MOEMS 14(1), 011003 (4 November 2014) https://doi.org/10.1117/1.JMM.14.1.011003
TOPICS: Lithography, Data modeling, Principal component analysis, Calibration, Performance modeling, Manufacturing, Data processing, Computer programming, Data compression, Dimension reduction
J. Micro/Nanolith. MEMS MOEMS 14(1), 011004 (4 December 2014) https://doi.org/10.1117/1.JMM.14.1.011004
TOPICS: Photomasks, Metals, Lithography, Optical lithography, Double patterning technology, Semiconducting wafers, Manufacturing, Logic, Optical proximity correction, Lithographic illumination
J. Micro/Nanolith. MEMS MOEMS 14(1), 011005 (13 November 2014) https://doi.org/10.1117/1.JMM.14.1.011005
TOPICS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials
J. Micro/Nanolith. MEMS MOEMS 14(1), 011006 (22 December 2014) https://doi.org/10.1117/1.JMM.14.1.011006
TOPICS: Diffusion, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Convolution, Photoresist materials, Principal component analysis, SRAF, Matrices, Fiber optic illuminators
J. Micro/Nanolith. MEMS MOEMS 14(1), 011007 (30 December 2014) https://doi.org/10.1117/1.JMM.14.1.011007
TOPICS: Computer aided design, Manufacturing, System on a chip, Logic, Optical lithography, Standards development, Analog electronics, Semiconductors, CMOS technology
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 013501 (6 January 2015) https://doi.org/10.1117/1.JMM.14.1.013501
TOPICS: Charge-coupled devices, Roentgenium, Polymethylmethacrylate, Cadmium sulfide, Critical dimension metrology, Thermal effects, Lithography, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(1), 013502 (22 January 2015) https://doi.org/10.1117/1.JMM.14.1.013502
TOPICS: Scanning probe microscopy, Defect detection, Extreme ultraviolet, Surface roughness, Inspection, Photomasks, Defect inspection, Signal analysis, Phase measurement, Signal detection
J. Micro/Nanolith. MEMS MOEMS 14(1), 013503 (23 January 2015) https://doi.org/10.1117/1.JMM.14.1.013503
TOPICS: Image classification, Lithography, Metals, Library classification systems, Computer simulations, Device simulation, Fuzzy logic, Optical proximity correction, Tolerancing, Raster graphics
J. Micro/Nanolith. MEMS MOEMS 14(1), 013504 (29 January 2015) https://doi.org/10.1117/1.JMM.14.1.013504
TOPICS: Photoresist materials, Microfluidics, Microscopes, Lamps, Optical lithography, Photomasks, Ultraviolet radiation, Camera shutters, Glasses, Objectives
J. Micro/Nanolith. MEMS MOEMS 14(1), 013505 (5 February 2015) https://doi.org/10.1117/1.JMM.14.1.013505
TOPICS: Polymethylmethacrylate, Thermal effects, Critical dimension metrology, Error analysis, Lithography, Overlay metrology, Picosecond phenomena, Polymers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(1), 013506 (9 February 2015) https://doi.org/10.1117/1.JMM.14.1.013506
TOPICS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography
J. Micro/Nanolith. MEMS MOEMS 14(1), 013507 (23 February 2015) https://doi.org/10.1117/1.JMM.14.1.013507
TOPICS: Phase contrast, Extreme ultraviolet, Microscopes, Digital image correlation, Photomasks, Silicon, Scanning electron microscopy, Phase shifts, Lenses, Point spread functions
J. Micro/Nanolith. MEMS MOEMS 14(1), 013508 (3 March 2015) https://doi.org/10.1117/1.JMM.14.1.013508
TOPICS: Etching, Nanolithography, Thin films, Complex oxides, Electrodes, Electron beam lithography, Dry etching, Barium, Strontium, Argon
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(1), 014001 (11 February 2015) https://doi.org/10.1117/1.JMM.14.1.014001
TOPICS: Signal to noise ratio, Semiconducting wafers, Line edge roughness, Wafer-level optics, Defect detection, Scattering, Scanning electron microscopy, Line width roughness, Inspection
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(1), 014501 (20 January 2015) https://doi.org/10.1117/1.JMM.14.1.014501
TOPICS: Aluminum, Photoresist developing, Photomicroscopy, Metals, Optical lithography, Photoresist materials, Sputter deposition, Palladium, Bolometers, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 14(1), 014502 (18 February 2015) https://doi.org/10.1117/1.JMM.14.1.014502
TOPICS: Silicon, Nanolithography, Etching, Gold, Reactive ion etching, Nanostructures, Chemical species, Scanning electron microscopy, Nanofabrication, Photomasks
J. Micro/Nanolith. MEMS MOEMS 14(1), 014503 (19 February 2015) https://doi.org/10.1117/1.JMM.14.1.014503
TOPICS: Silicon, Chemical analysis, Ultraviolet radiation, Atomic force microscopy, X-rays, Plasma treatment, Oxygen, Photoemission spectroscopy, Optical lithography, Microscopy
J. Micro/Nanolith. MEMS MOEMS 14(1), 014504 (5 March 2015) https://doi.org/10.1117/1.JMM.14.1.014504
TOPICS: Etching, Line width roughness, Double patterning technology, Critical dimension metrology, Amorphous silicon, Plasma, Extreme ultraviolet, Optical lithography, Photomasks
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 14(1), 015001 (17 February 2015) https://doi.org/10.1117/1.JMM.14.1.015001
TOPICS: Sensors, CMOS sensors, Polarizers, Polarization, Nanoimprint lithography, Navigation systems, Dielectric polarization, Nanolithography, Error analysis, Nanowires
J. Micro/Nanolith. MEMS MOEMS 14(1), 015002 (27 February 2015) https://doi.org/10.1117/1.JMM.14.1.015002
TOPICS: Switches, Packaging, Microelectromechanical systems, Computer architecture, 3D modeling, Actuators, Silicon, Scanning electron microscopy, Ceramics, Helium
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 14(1), 015501 (20 January 2015) https://doi.org/10.1117/1.JMM.14.1.015501
TOPICS: Resistors, Micromirrors, Mirrors, Photodiodes, Semiconducting wafers, Gallium arsenide, Actuators, Wafer-level optics, Thin films, Optical arrays
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