Epifluorescent direct-write photolithography for microfluidic applications

MacCallister Higgins; Emil J. Geiger

doi:10.1117/1.JMM.14.1.013504

29 January 2015 Epifluorescent direct-write photolithography for microfluidic applications

MacCallister Higgins, Emil J. Geiger

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 1, 013504 (January 2015). https://doi.org/10.1117/1.JMM.14.1.013504

Abstract

We present a technique for fabricating soft-lithography molds created using an epifluorescent microscope. By focusing the UV light emitted from a Hg arc lamp, we demonstrate the ability to direct-write photoresist features with a minimum resolution of 45 μm. This resolution is satisfactory for many microfluidic applications. A major advantage of this technique is its low cost, both in terms of capital investment and on-going expenditures. Furthermore, by using a motorized stage, we can quickly fabricate a design on demand, eliminating the need, cost, and lead-time required for a photomask. With the addition of an electronic shutter, complicated separate structures can be imaged and utilized to make a wide range of microfluidic devices. We demonstrate this technique using dry-film resist due to its low cost, ease of application, and less stringent safety protocols.

Citation Download Citation

MacCallister Higgins and Emil J. Geiger "Epifluorescent direct-write photolithography for microfluidic applications," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(1), 013504 (29 January 2015). https://doi.org/10.1117/1.JMM.14.1.013504

Published: 29 January 2015

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