Editorial
J. Micro/Nanolith. MEMS MOEMS 14(2), 020101 (15 May 2015) https://doi.org/10.1117/1.JMM.14.2.020101
TOPICS: Analytical research, Visualization, Data analysis
J. Micro/Nanolith. MEMS MOEMS 14(2), 020102 (22 April 2015) https://doi.org/10.1117/1.JMM.14.2.020102
TOPICS: Lithium, Fluctuations and noise, Microelectromechanical systems, Microopto electromechanical systems, Silver, Sun
Special Section on Control of Integrated Circuit Patterning Variance Part 1: Metrology, Process Monitoring, and Control of Critical Dimension
J. Micro/Nanolith. MEMS MOEMS 14(2), 021101 (26 June 2015) https://doi.org/10.1117/1.JMM.14.2.021101
TOPICS: Process control, Metrology, Critical dimension metrology, Electron beam lithography, Optical lithography, Optical proximity correction, Scanning electron microscopy, Calibration, Device simulation, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(2), 021102 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021102
TOPICS: Silicon, Picosecond phenomena, Scatterometry, Anisotropy, Semiconducting wafers, Data modeling, Metrology, Optical lithography, Chemical elements, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(2), 021103 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021103
TOPICS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 14(2), 021104 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021104
TOPICS: Semiconducting wafers, Silicon, Microscopy, Wavefronts, Illumination engineering, Image enhancement, Metrology, Semiconductors, Image resolution, Scatterometry
J. Micro/Nanolith. MEMS MOEMS 14(2), 021105 (28 April 2015) https://doi.org/10.1117/1.JMM.14.2.021105
TOPICS: Scanning electron microscopy, Optical proximity correction, Calibration, Electron microscopes, Critical dimension metrology, Data modeling, Metrology, Performance modeling, Model-based design, Cadmium
J. Micro/Nanolith. MEMS MOEMS 14(2), 021106 (13 May 2015) https://doi.org/10.1117/1.JMM.14.2.021106
TOPICS: Inspection, Semiconducting wafers, Electron beam lithography, Photomasks, Metals, Optical proximity correction, Back end of line, Etching, Modulation
J. Micro/Nanolith. MEMS MOEMS 14(2), 021107 (3 July 2015) https://doi.org/10.1117/1.JMM.14.2.021107
TOPICS: Transistors, Semiconducting wafers, Silicon, Scanning electron microscopy, Device simulation, Image segmentation, Resistance, Etching, Line width roughness, Data modeling
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(2), 023501 (2 April 2015) https://doi.org/10.1117/1.JMM.14.2.023501
TOPICS: SRAF, Photomasks, Extreme ultraviolet, Printing, Semiconducting wafers, Extreme ultraviolet lithography, Critical dimension metrology, Model-based design, Lithography, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 14(2), 023502 (9 April 2015) https://doi.org/10.1117/1.JMM.14.2.023502
TOPICS: Etching, Polymethylmethacrylate, Optical lithography, Silicon, Polymers, Lithography, Scanning electron microscopy, Image processing, Polymerization, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(2), 023503 (21 April 2015) https://doi.org/10.1117/1.JMM.14.2.023503
TOPICS: Acoustics, Multiphoton lithography, Glasses, Silicon, Microfluidics, Ultrasonics, Fabrication, Particles, Luminescence, Interfaces
J. Micro/Nanolith. MEMS MOEMS 14(2), 023504 (5 May 2015) https://doi.org/10.1117/1.JMM.14.2.023504
TOPICS: Polarization, Source mask optimization, Photomasks, Optical proximity correction, Optical lithography, Semiconducting wafers, Computer simulations, Optimization (mathematics), Detection and tracking algorithms, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 14(2), 023505 (15 May 2015) https://doi.org/10.1117/1.JMM.14.2.023505
TOPICS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides
J. Micro/Nanolith. MEMS MOEMS 14(2), 023506 (18 May 2015) https://doi.org/10.1117/1.JMM.14.2.023506
TOPICS: Lithography, Statistical modeling, Optical proximity correction, Process modeling, Calibration, Data modeling, Photomasks, Performance modeling, Computer simulations, CMOS technology
J. Micro/Nanolith. MEMS MOEMS 14(2), 023507 (22 May 2015) https://doi.org/10.1117/1.JMM.14.2.023507
TOPICS: Photomasks, Optical lithography, Photomicroscopy, Lithography, Computer simulations, Photoresist materials, Geometrical optics, Silicon, Mask making, Collimation
J. Micro/Nanolith. MEMS MOEMS 14(2), 023508 (18 June 2015) https://doi.org/10.1117/1.JMM.14.2.023508
TOPICS: Critical dimension metrology, Optical lithography, Semiconducting wafers, Annealing, Coating, Scanning electron microscopy, Lithography, Tolerancing, Inspection, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(2), 024001 (17 June 2015) https://doi.org/10.1117/1.JMM.14.2.024001
TOPICS: Semiconducting wafers, Micro raman spectroscopy, Raman spectroscopy, Silicon, Copper, Microelectromechanical systems, Deep reactive ion etching, Low pressure chemical vapor deposition, Annealing, Boron
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(2), 024501 (27 May 2015) https://doi.org/10.1117/1.JMM.14.2.024501
TOPICS: Switching, Oxygen, Silver, Resistance, Lawrencium, Thin films, Temperature metrology, Electrodes, Tin, Ions
J. Micro/Nanolith. MEMS MOEMS 14(2), 024502 (23 June 2015) https://doi.org/10.1117/1.JMM.14.2.024502
TOPICS: Etching, Silicon, Semiconducting wafers, Deep reactive ion etching, Image processing, Ions, Reactive ion etching, Microelectromechanical systems, Oxides, Scanning electron microscopy
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 14(2), 025001 (9 April 2015) https://doi.org/10.1117/1.JMM.14.2.025001
TOPICS: Sensors, Humidity, Electrodes, Dielectrics, Etching, Capacitance, Photoresist materials, Microelectromechanical systems, Manufacturing, Double patterning technology
J. Micro/Nanolith. MEMS MOEMS 14(2), 025002 (18 May 2015) https://doi.org/10.1117/1.JMM.14.2.025002
TOPICS: Resistors, Sensors, Resistance, Temperature metrology, Time metrology, Reliability, Micromachining, Metals, Photoresist materials, Temperature sensors
J. Micro/Nanolith. MEMS MOEMS 14(2), 025003 (5 June 2015) https://doi.org/10.1117/1.JMM.14.2.025003
TOPICS: Platinum, Reliability, Resistance, Microelectromechanical systems, Temperature metrology, Silicon, Nickel, Tungsten, Resistors, Oxides
J. Micro/Nanolith. MEMS MOEMS 14(2), 025004 (9 June 2015) https://doi.org/10.1117/1.JMM.14.2.025004
TOPICS: Dielectrophoresis, Optical lithography, Electrodes, BioMEMS, Nerve, Glasses, Axons, Silicon, Microelectromechanical systems, Microscopes
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 14(2), 025501 (6 April 2015) https://doi.org/10.1117/1.JMM.14.2.025501
TOPICS: Tunable filters, Electrodes, Plasmonics, Optical filters, Metals, Waveguides, Mechanical engineering, Nanoelectromechanical systems, Channel projecting optics, Gold
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