Editorial
J. Micro/Nanolith. MEMS MOEMS 14(2), 020101 (15 May 2015) https://doi.org/10.1117/1.JMM.14.2.020101
TOPICS: Analytical research, Visualization, Data analysis
J. Micro/Nanolith. MEMS MOEMS 14(2), 020102 (22 April 2015) https://doi.org/10.1117/1.JMM.14.2.020102
TOPICS: Lithium, Fluctuations and noise, Microelectromechanical systems, Microopto electromechanical systems, Silver, Sun
Special Section on Control of Integrated Circuit Patterning Variance Part 1: Metrology, Process Monitoring, and Control of Critical Dimension
J. Micro/Nanolith. MEMS MOEMS 14(2), 021101 (26 June 2015) https://doi.org/10.1117/1.JMM.14.2.021101
TOPICS: Process control, Metrology, Critical dimension metrology, Electron beam lithography, Optical lithography, Optical proximity correction, Scanning electron microscopy, Calibration, Device simulation, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(2), 021102 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021102
TOPICS: Silicon, Picosecond phenomena, Scatterometry, Anisotropy, Semiconducting wafers, Data modeling, Metrology, Optical lithography, Chemical elements, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(2), 021103 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021103
TOPICS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 14(2), 021104 (10 April 2015) https://doi.org/10.1117/1.JMM.14.2.021104
TOPICS: Semiconducting wafers, Silicon, Microscopy, Wavefronts, Illumination engineering, Image enhancement, Metrology, Semiconductors, Image resolution, Scatterometry
J. Micro/Nanolith. MEMS MOEMS 14(2), 021105 (28 April 2015) https://doi.org/10.1117/1.JMM.14.2.021105
TOPICS: Scanning electron microscopy, Optical proximity correction, Calibration, Electron microscopes, Critical dimension metrology, Data modeling, Metrology, Performance modeling, Model-based design, Cadmium
Deborah A. Ryan, Oliver Patterson, Shuen-Cheng Lei, David Conklin, Jim Liang, Glenn Biery, Atsushi Ogino, Bachir Dirahoui, Zachary Baum, Michael Monkowski
J. Micro/Nanolith. MEMS MOEMS 14(2), 021106 (13 May 2015) https://doi.org/10.1117/1.JMM.14.2.021106
TOPICS: Inspection, Semiconducting wafers, Electron beam lithography, Photomasks, Metals, Optical proximity correction, Back end of line, Fin field effect transitor, Etching, Modulation
Eitan Shauly, Shimon Levi, Ishai Schwarzband, Ofer Adan, Sergey Latinsky
J. Micro/Nanolith. MEMS MOEMS 14(2), 021107 (3 July 2015) https://doi.org/10.1117/1.JMM.14.2.021107
TOPICS: Transistors, Semiconducting wafers, Silicon, Scanning electron microscopy, Device simulation, Image segmentation, Resistance, Etching, Line width roughness, Data modeling
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(2), 023501 (2 April 2015) https://doi.org/10.1117/1.JMM.14.2.023501
TOPICS: SRAF, Photomasks, Extreme ultraviolet, Printing, Semiconducting wafers, Extreme ultraviolet lithography, Critical dimension metrology, Model-based design, Lithography, Optical lithography
Naoko Kihara, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Hideki Kanai, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Tsukasa Azuma, Teruaki Hayakawa
J. Micro/Nanolith. MEMS MOEMS 14(2), 023502 (9 April 2015) https://doi.org/10.1117/1.JMM.14.2.023502
TOPICS: Etching, Polymethylmethacrylate, Optical lithography, Silicon, Polymers, Lithography, Scanning electron microscopy, Image processing, Polymerization, Directed self assembly
Jorick van ‘t Oever, Niels Spannenburg, Herman Offerhaus, Dirk van den Ende, Jennifer Herek, Frieder Mugele
J. Micro/Nanolith. MEMS MOEMS 14(2), 023503 (21 April 2015) https://doi.org/10.1117/1.JMM.14.2.023503
TOPICS: Acoustics, Multiphoton lithography, Glasses, Silicon, Microfluidics, Ultrasonics, Fabrication, Particles, Luminescence, Interfaces
Xu Ma, Lisong Dong, Chunying Han, Jie Gao, Yanqiu Li, Gonzalo Arce
J. Micro/Nanolith. MEMS MOEMS 14(2), 023504 (5 May 2015) https://doi.org/10.1117/1.JMM.14.2.023504
TOPICS: Polarization, Source mask optimization, Photomasks, Optical proximity correction, Optical lithography, Semiconducting wafers, Computer simulations, Optimization (mathematics), Detection and tracking algorithms, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 14(2), 023505 (15 May 2015) https://doi.org/10.1117/1.JMM.14.2.023505
TOPICS: Extreme ultraviolet, Photomasks, Multilayers, Chemical species, Inspection, Computer simulations, Interfaces, Transmission electron microscopy, Modeling and simulation, Waveguides
Pardeep Kumar, Babji Srinivasan, Nihar Mohapatra
J. Micro/Nanolith. MEMS MOEMS 14(2), 023506 (18 May 2015) https://doi.org/10.1117/1.JMM.14.2.023506
TOPICS: Lithography, Statistical modeling, Optical proximity correction, Process modeling, Calibration, Data modeling, Photomasks, Performance modeling, Computer simulations, CMOS technology
J. Micro/Nanolith. MEMS MOEMS 14(2), 023507 (22 May 2015) https://doi.org/10.1117/1.JMM.14.2.023507
TOPICS: Photomasks, Optical lithography, Photomicroscopy, Lithography, Computer simulations, Photoresist materials, Geometrical optics, Silicon, Mask making, Collimation
J. Micro/Nanolith. MEMS MOEMS 14(2), 023508 (18 June 2015) https://doi.org/10.1117/1.JMM.14.2.023508
TOPICS: Critical dimension metrology, Optical lithography, Semiconducting wafers, Annealing, Coating, Scanning electron microscopy, Lithography, Tolerancing, Inspection, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(2), 024001 (17 June 2015) https://doi.org/10.1117/1.JMM.14.2.024001
TOPICS: Semiconducting wafers, Micro raman spectroscopy, Raman spectroscopy, Silicon, Copper, Microelectromechanical systems, Deep reactive ion etching, Low pressure chemical vapor deposition, Annealing, Boron
Microfabrication
Da Chen, Shi-Hua Huang
J. Micro/Nanolith. MEMS MOEMS 14(2), 024501 (27 May 2015) https://doi.org/10.1117/1.JMM.14.2.024501
TOPICS: Switching, Oxygen, Silver, Resistance, Lawrencium, Thin films, Temperature metrology, Electrodes, Tin, Ions
Ji Fan, Wen Ting Zhang, Jin Quan Liu, Wen Jie Wu, Tao Zhu, Liang Cheng Tu
J. Micro/Nanolith. MEMS MOEMS 14(2), 024502 (23 June 2015) https://doi.org/10.1117/1.JMM.14.2.024502
TOPICS: Etching, Silicon, Semiconducting wafers, Deep reactive ion etching, Image processing, Ions, Reactive ion etching, Microelectromechanical systems, Oxides, Scanning electron microscopy
Microelectromechanical Systems (MEMS)
Kyo Sang Choi, Deok Su Kim, Hee June Yang, Min Soo Ryu, Ji Sung Chae, Sung Pil Chang
J. Micro/Nanolith. MEMS MOEMS 14(2), 025001 (9 April 2015) https://doi.org/10.1117/1.JMM.14.2.025001
TOPICS: Sensors, Humidity, Electrodes, Dielectrics, Etching, Capacitance, Photoresist materials, Microelectromechanical systems, Manufacturing, Double patterning technology
Deok Su Kim, Kyo Sang Choi, Hee Jun Yang, Min Soo Ryu, Ji Sung Chae, Sung Pil Chang
J. Micro/Nanolith. MEMS MOEMS 14(2), 025002 (18 May 2015) https://doi.org/10.1117/1.JMM.14.2.025002
TOPICS: Resistors, Sensors, Resistance, Temperature metrology, Time metrology, Reliability, Micromachining, Metals, Photoresist materials, Temperature sensors
Mahanth Prasad, Dhairya Singh Arya, Vinod Kumar Khanna
J. Micro/Nanolith. MEMS MOEMS 14(2), 025003 (5 June 2015) https://doi.org/10.1117/1.JMM.14.2.025003
TOPICS: Platinum, Reliability, Resistance, Microelectromechanical systems, Temperature metrology, Silicon, Nickel, Tungsten, Resistors, Oxides
Eiji Nakamachi, Shinya Murakami, Hirotaka Koga, Yusuke Morita
J. Micro/Nanolith. MEMS MOEMS 14(2), 025004 (9 June 2015) https://doi.org/10.1117/1.JMM.14.2.025004
TOPICS: Dielectrophoresis, Optical lithography, Electrodes, BioMEMS, Nerve, Glasses, Axons, Silicon, Microelectromechanical systems, Microscopes
Micro-optoelectromechanical Systems (MOEMS)
Kareem Khirallah, Mohamed Swillam
J. Micro/Nanolith. MEMS MOEMS 14(2), 025501 (6 April 2015) https://doi.org/10.1117/1.JMM.14.2.025501
TOPICS: Tunable filters, Electrodes, Plasmonics, Optical filters, Metals, Waveguides, Mechanical engineering, Nanoelectromechanical systems, Channel projecting optics, Gold
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