journal of micro nanolithography mems and moems
VOL. 14 · NO. 3 | July 2015
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 14(3), 030101 (14 July 2015) doi:10.1117/1.JMM.14.3.030101
TOPICS: Microelectromechanical systems, Roads, Transparency, Lithography, Microopto electromechanical systems, Microfabrication, Metrology, Databases, Visualization
Special Section on Alternative Lithographic Technologies IV
J. Micro/Nanolith. MEMS MOEMS 14(3), 031201 (11 September 2015) doi:10.1117/1.JMM.14.3.031201
TOPICS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly
Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Yana Krivoshapkina, Manuel Hofer, Steve Lenk, Ivaylo Atanasov, Mathias Holz, Ivo Rangelow
J. Micro/Nanolith. MEMS MOEMS 14(3), 031202 (10 June 2015) doi:10.1117/1.JMM.14.3.031202
TOPICS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons
Pieter Brandt, Céline Tranquillin, Marco Wieland, Sébastien Bayle, Matthieu Milléquant, Guillaume Renault
J. Micro/Nanolith. MEMS MOEMS 14(3), 031203 (2 July 2015) doi:10.1117/1.JMM.14.3.031203
TOPICS: Electron beam lithography, Monte Carlo methods, Electroluminescence, Metals, Nano opto mechanical systems, Lithography, Error analysis, Semiconducting wafers, Critical dimension metrology, Overlay metrology
J. Micro/Nanolith. MEMS MOEMS 14(3), 031204 (2 July 2015) doi:10.1117/1.JMM.14.3.031204
TOPICS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031205 (7 July 2015) doi:10.1117/1.JMM.14.3.031205
TOPICS: Annealing, Polymers, Scanning electron microscopy, Gas lasers, Polymer thin films, Temperature metrology, Plasma etching, Diffusion, Semiconductor lasers, Directed self assembly
Marijke Scotuzzi, Martin Kamerbeek, Andy Goodyear, Mike Cooke, Cornelis Hagen
J. Micro/Nanolith. MEMS MOEMS 14(3), 031206 (15 July 2015) doi:10.1117/1.JMM.14.3.031206
TOPICS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma
Jordi Llobet, Marta Gerbolés, Marc Sansa, Joan Bausells, Xavier Borrisé, Francesc Pérez-Murano
J. Micro/Nanolith. MEMS MOEMS 14(3), 031207 (27 July 2015) doi:10.1117/1.JMM.14.3.031207
TOPICS: Silicon, Scanning electron microscopy, Wet etching, Ion beams, Ion implantation, Resonators, Etching, Nanolithography, Ions, Nanowires
J. Micro/Nanolith. MEMS MOEMS 14(3), 031208 (3 August 2015) doi:10.1117/1.JMM.14.3.031208
TOPICS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties
Ahmad Ahmad, Tzvetan Ivanov, Tihomir Angelov, Ivo Rangelow
J. Micro/Nanolith. MEMS MOEMS 14(3), 031209 (27 July 2015) doi:10.1117/1.JMM.14.3.031209
TOPICS: Atomic force microscopy, Silicon, Lithography, Transducers, Scanners, Wheatstone bridges, Adaptive control, Semiconducting wafers, Amplifiers, Metrology
Hubert Hauser, Nico Tucher, Katharina Tokai, Patrick Schneider, Christine Wellens, Anne Volk, Sonja Seitz, Jan Benick, Simon Barke, Frank Dimroth, Claas Müller, Thomas Glinsner, Benedikt Bläsi
J. Micro/Nanolith. MEMS MOEMS 14(3), 031210 (29 July 2015) doi:10.1117/1.JMM.14.3.031210
TOPICS: Nanoimprint lithography, Silicon, Solar cells, Photovoltaics, Etching, Semiconducting wafers, Absorption, Optical lithography, Silicon solar cells, Plasma etching
J. Micro/Nanolith. MEMS MOEMS 14(3), 031211 (7 August 2015) doi:10.1117/1.JMM.14.3.031211
TOPICS: Photomasks, Lithography, Metals, Manufacturing, Source mask optimization, Computer programming, Electron beam lithography, Binary data, Fourier transforms, Directed self assembly
Chin-Khai Tang, Ming-Shing Su, Yi-Chang Lu
J. Micro/Nanolith. MEMS MOEMS 14(3), 031212 (11 August 2015) doi:10.1117/1.JMM.14.3.031212
TOPICS: Electron beam lithography, Data compression, Computer programming, Clocks, Lutetium, Stereolithography, Electroluminescence, Data centers, Data processing, Field programmable gate arrays
J. Micro/Nanolith. MEMS MOEMS 14(3), 031213 (12 August 2015) doi:10.1117/1.JMM.14.3.031213
TOPICS: Atrial fibrillation, Optical proximity correction, Lithography, Deep ultraviolet, SRAF, Linear filtering, Etching, Printing, Semiconducting wafers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031214 (12 August 2015) doi:10.1117/1.JMM.14.3.031214
TOPICS: Electron beam direct write lithography, Photovoltaics, Lithium, Immersion lithography, Electron beam lithography, Lithography, Electronic design automation, Field programmable gate arrays, Metals, Optical proximity correction
Nobuyoshi Koshida, Akira Kojima, Naokatsu Ikegami, Ryutaro Suda, Mamiko Yagi, Junichi Shirakashi, Hiroshi Miyaguchi, Masanori Muroyama, Shinya Yoshida, Kentaro Totsu, Masayoshi Esashi
J. Micro/Nanolith. MEMS MOEMS 14(3), 031215 (11 September 2015) doi:10.1117/1.JMM.14.3.031215
TOPICS: Silicon, Electrodes, Thin film deposition, Thin films, Lithography, Germanium, Metals, Printing, Semiconducting wafers, Copper
J. Micro/Nanolith. MEMS MOEMS 14(3), 031216 (11 September 2015) doi:10.1117/1.JMM.14.3.031216
TOPICS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly
Lithography
Lei Sun, Wenhui Wang, Genevieve Beique, Min Sung, Obert Wood, Ryoung-Han Kim
J. Micro/Nanolith. MEMS MOEMS 14(3), 033501 (13 July 2015) doi:10.1117/1.JMM.14.3.033501
TOPICS: Line edge roughness, Line width roughness, Semiconductors, Reactive ion etching, Double patterning technology, Lithography, Oxides, Extreme ultraviolet lithography, Optical inspection, Visualization
J. Micro/Nanolith. MEMS MOEMS 14(3), 033502 (14 July 2015) doi:10.1117/1.JMM.14.3.033502
TOPICS: Line edge roughness, Scanning electron microscopy, Statistical analysis, Line width roughness, Fourier transforms, Edge roughness, Lithography, Electron microscopes, Convolution, Error analysis
J. Micro/Nanolith. MEMS MOEMS 14(3), 033503 (14 July 2015) doi:10.1117/1.JMM.14.3.033503
TOPICS: Line width roughness, Lithography, Critical dimension metrology, Etching, Scanning electron microscopy, Metrology, Photoresist processing, Line edge roughness, Performance modeling, Semiconductors
Jungkwun Kim, Yong-Kyu Yoon
J. Micro/Nanolith. MEMS MOEMS 14(3), 033504 (15 July 2015) doi:10.1117/1.JMM.14.3.033504
TOPICS: Ultraviolet radiation, Photoresist materials, Lithography, Antennas, Photomasks, Liquids, Polyurethane, Refractive index, Photoresist developing, Polymers
Abdul Haadi Abdul Manap, Khairudin Mohamed
J. Micro/Nanolith. MEMS MOEMS 14(3), 033505 (21 July 2015) doi:10.1117/1.JMM.14.3.033505
TOPICS: Chemical species, Sputter deposition, Quartz, Argon, Etching, Silicon, Ions, Dry etching, Mechanical engineering, Molecules
J. Micro/Nanolith. MEMS MOEMS 14(3), 033506 (7 August 2015) doi:10.1117/1.JMM.14.3.033506
TOPICS: Nanoimprint lithography, Integrated optics, Semiconducting wafers, Holograms, Etching, Electron beam lithography, Information operations, Waveguides, Oxygen, Spectroscopes
J. Micro/Nanolith. MEMS MOEMS 14(3), 033507 (7 August 2015) doi:10.1117/1.JMM.14.3.033507
TOPICS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 14(3), 033508 (21 August 2015) doi:10.1117/1.JMM.14.3.033508
TOPICS: Phase measurement, Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Inspection, Quartz, Lithography
Matteo Lorenzoni, Laura Evangelio, Célia Nicolet, Christophe Navarro, Alvaro San Paulo, Gemma Rius, Francesc Pérez-Murano
J. Micro/Nanolith. MEMS MOEMS 14(3), 033509 (11 September 2015) doi:10.1117/1.JMM.14.3.033509
TOPICS: Polymethylmethacrylate, Polymers, Atomic force microscopy, Polymer thin films, Thin films, Dewetting, Silicon, Plasma, Manganese, Spatial resolution
J. Micro/Nanolith. MEMS MOEMS 14(3), 033510 (11 September 2015) doi:10.1117/1.JMM.14.3.033510
TOPICS: Semiconducting wafers, Photomasks, Critical dimension metrology, Quartz, Pulsed laser operation, Signal attenuation, Beam controllers, Deep ultraviolet, Metrology, Process control
J. Micro/Nanolith. MEMS MOEMS 14(3), 033511 (21 September 2015) doi:10.1117/1.JMM.14.3.033511
TOPICS: Polymers, Electron beam lithography, Atomic force microscopy, Silicon, Photoresist processing, Deep ultraviolet, Annealing, Polymethylmethacrylate, Electrons, Directed self assembly
Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenji Terao
J. Micro/Nanolith. MEMS MOEMS 14(3), 033512 (21 September 2015) doi:10.1117/1.JMM.14.3.033512
TOPICS: Defect detection, Signal detection, Photomasks, Extreme ultraviolet lithography, Inspection, Target detection, Extreme ultraviolet, Image processing, Image enhancement, Signal processing
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(3), 034001 (9 July 2015) doi:10.1117/1.JMM.14.3.034001
TOPICS: Scanning electron microscopy, Scanning transmission electron microscopy, Photoresist materials, Atomic layer deposition, Hybrid fiber optics, Monte Carlo methods, Selenium, Electron microscopes, Scattering, Thin films
J. Micro/Nanolith. MEMS MOEMS 14(3), 034002 (5 August 2015) doi:10.1117/1.JMM.14.3.034002
TOPICS: Plasma, Vacuum ultraviolet, Tin, Gallium, Light sources, Ions, Indium, Extreme ultraviolet, Calibration, Inspection
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(3), 034501 (13 August 2015) doi:10.1117/1.JMM.14.3.034501
TOPICS: Photomasks, Lithography, Photoresist materials, Binary data, Etching, Electron beam lithography, Chromium, Optical alignment, Double patterning technology, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 14(3), 034502 (24 August 2015) doi:10.1117/1.JMM.14.3.034502
TOPICS: Polymers, Polymer multimode waveguides, Single mode fibers, Waveguides, Ultraviolet radiation, Optical lithography, Optics manufacturing, Manufacturing, Cladding, Image segmentation
Jason Sun, Kwong-Kit Choi, Kimberley Olver, Richard Fu
J. Micro/Nanolith. MEMS MOEMS 14(3), 034503 (21 September 2015) doi:10.1117/1.JMM.14.3.034503
TOPICS: Etching, Sensors, Quantum efficiency, Quantum well infrared photodetectors, Resonators, Gallium arsenide, Reactive ion etching, Quantum wells, Semiconducting wafers, Optical instrument design
Zhiyuan Zhu, Min Yu, Oluwadamilola Phillips, Lisha Liu, Yufeng Jin
J. Micro/Nanolith. MEMS MOEMS 14(3), 034504 (25 September 2015) doi:10.1117/1.JMM.14.3.034504
TOPICS: Copper, Oxides, Carbonates, Scanning electron microscopy, Chemical species, Manufacturing, Interfaces, Aluminum, Metals, Oxidation
Microelectromechanical Systems (MEMS)
Tieying Ma, Sen Yang, Yidong Liu, Huiquan Wang
J. Micro/Nanolith. MEMS MOEMS 14(3), 035001 (7 August 2015) doi:10.1117/1.JMM.14.3.035001
TOPICS: Silicon, Thin films, Transistors, Scattering, Interfaces, Bismuth, Semiconducting wafers, Resonators, Phonons, Nanowires
Deepak Bansal, Anuroop Bajpai, Prem Kumar, Amit Kumar, Maninder Kaur, Kamaljit Rangra
J. Micro/Nanolith. MEMS MOEMS 14(3), 035002 (3 September 2015) doi:10.1117/1.JMM.14.3.035002
TOPICS: Switches, Microelectromechanical systems, Metals, Electrodes, Dielectrics, Capacitance, Switching, Oxides, Scanning electron microscopy
Abbas Hakim Sima, Alinaghi Salari, Mohammad Behshad Shafii
J. Micro/Nanolith. MEMS MOEMS 14(3), 035003 (3 September 2015) doi:10.1117/1.JMM.14.3.035003
TOPICS: Microfluidics, Magnetism, Strontium, Polymethylmethacrylate, Bismuth, Electromagnetism, Liquids, Protactinium, Water, Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(3), 035004 (4 September 2015) doi:10.1117/1.JMM.14.3.035004
TOPICS: Mirrors, Ultrasonography, Photoacoustic microscopy, Microfabrication, Magnetism, 3D printing, Data acquisition, Reflectivity, Silicon, Electromagnetism
Kaan Demirel, Erdem Yazgan, Şimşek Demir, Tayfun Akın
J. Micro/Nanolith. MEMS MOEMS 14(3), 035005 (21 September 2015) doi:10.1117/1.JMM.14.3.035005
TOPICS: Microelectromechanical systems, Switches, Gold, Etching, Amorphous silicon, Silicon, Dielectrics, Electroplating, Semiconducting wafers
Micro-optoelectromechanical Systems (MOEMS)
Nicholas Chiu Yen Koh, Kok Swee Sim, Tiong Min Hoe
J. Micro/Nanolith. MEMS MOEMS 14(3), 035501 (3 September 2015) doi:10.1117/1.JMM.14.3.035501
TOPICS: Thermography, Infrared radiation, Infrared imaging, Holographic optical elements, Infrared cameras, Signal to noise ratio, Infrared detectors, Spatial resolution, Cameras, Silicon
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