Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 14 · NO. 3 | July 2015
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 14(3), 030101 (14 July 2015) https://doi.org/10.1117/1.JMM.14.3.030101
TOPICS: Microelectromechanical systems, Roads, Transparency, Lithography, Microopto electromechanical systems, Microfabrication, Metrology, Databases, Visualization
Special Section on Alternative Lithographic Technologies IV
J. Micro/Nanolith. MEMS MOEMS 14(3), 031201 (11 September 2015) https://doi.org/10.1117/1.JMM.14.3.031201
TOPICS: Lithography, Optical lithography, Nanofabrication, Extreme ultraviolet lithography, Nanotechnology, Nanoimprint lithography, Silver, Extreme ultraviolet, Integrated circuit design, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031202 (10 June 2015) https://doi.org/10.1117/1.JMM.14.3.031202
TOPICS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons
J. Micro/Nanolith. MEMS MOEMS 14(3), 031203 (2 July 2015) https://doi.org/10.1117/1.JMM.14.3.031203
TOPICS: Electron beam lithography, Monte Carlo methods, Electroluminescence, Metals, Nano opto mechanical systems, Lithography, Error analysis, Semiconducting wafers, Critical dimension metrology, Overlay metrology
J. Micro/Nanolith. MEMS MOEMS 14(3), 031204 (2 July 2015) https://doi.org/10.1117/1.JMM.14.3.031204
TOPICS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031205 (7 July 2015) https://doi.org/10.1117/1.JMM.14.3.031205
TOPICS: Annealing, Polymers, Scanning electron microscopy, Gas lasers, Polymer thin films, Temperature metrology, Plasma etching, Diffusion, Semiconductor lasers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031206 (15 July 2015) https://doi.org/10.1117/1.JMM.14.3.031206
TOPICS: Etching, Silicon, Chemistry, Chlorine, Scanning electron microscopy, Photomasks, Fluorine, Photomicroscopy, Electron beams, Plasma
J. Micro/Nanolith. MEMS MOEMS 14(3), 031207 (27 July 2015) https://doi.org/10.1117/1.JMM.14.3.031207
TOPICS: Silicon, Scanning electron microscopy, Wet etching, Ion beams, Ion implantation, Resonators, Etching, Nanolithography, Ions, Nanowires
J. Micro/Nanolith. MEMS MOEMS 14(3), 031208 (3 August 2015) https://doi.org/10.1117/1.JMM.14.3.031208
TOPICS: Line edge roughness, Silicon, Scatterometry, Data modeling, Optical components, Scanning electron microscopy, Picosecond phenomena, Chemical elements, Line width roughness, Optical properties
J. Micro/Nanolith. MEMS MOEMS 14(3), 031209 (27 July 2015) https://doi.org/10.1117/1.JMM.14.3.031209
TOPICS: Atomic force microscopy, Silicon, Lithography, Transducers, Scanners, Wheatstone bridges, Adaptive control, Semiconducting wafers, Amplifiers, Metrology
J. Micro/Nanolith. MEMS MOEMS 14(3), 031210 (29 July 2015) https://doi.org/10.1117/1.JMM.14.3.031210
TOPICS: Nanoimprint lithography, Silicon, Solar cells, Photovoltaics, Etching, Semiconducting wafers, Absorption, Optical lithography, Silicon solar cells, Plasma etching
J. Micro/Nanolith. MEMS MOEMS 14(3), 031211 (7 August 2015) https://doi.org/10.1117/1.JMM.14.3.031211
TOPICS: Photomasks, Lithography, Metals, Manufacturing, Source mask optimization, Computer programming, Electron beam lithography, Binary data, Fourier transforms, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031212 (11 August 2015) https://doi.org/10.1117/1.JMM.14.3.031212
TOPICS: Electron beam lithography, Data compression, Computer programming, Clocks, Lutetium, Stereolithography, Electroluminescence, Data centers, Data processing, Field programmable gate arrays
J. Micro/Nanolith. MEMS MOEMS 14(3), 031213 (12 August 2015) https://doi.org/10.1117/1.JMM.14.3.031213
TOPICS: Atrial fibrillation, Optical proximity correction, Lithography, Deep ultraviolet, SRAF, Linear filtering, Etching, Printing, Semiconducting wafers, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 031214 (12 August 2015) https://doi.org/10.1117/1.JMM.14.3.031214
TOPICS: Electron beam direct write lithography, Photovoltaics, Lithium, Immersion lithography, Electron beam lithography, Lithography, Electronic design automation, Field programmable gate arrays, Metals, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 14(3), 031215 (11 September 2015) https://doi.org/10.1117/1.JMM.14.3.031215
TOPICS: Silicon, Electrodes, Thin film deposition, Thin films, Lithography, Germanium, Metals, Printing, Semiconducting wafers, Copper
J. Micro/Nanolith. MEMS MOEMS 14(3), 031216 (11 September 2015) https://doi.org/10.1117/1.JMM.14.3.031216
TOPICS: Dysprosium, Photomasks, Immersion lithography, Source mask optimization, Optical proximity correction, Printing, Optical lithography, Visualization, Lens design, Directed self assembly
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(3), 033501 (13 July 2015) https://doi.org/10.1117/1.JMM.14.3.033501
TOPICS: Line edge roughness, Line width roughness, Semiconductors, Reactive ion etching, Double patterning technology, Lithography, Oxides, Extreme ultraviolet lithography, Optical inspection, Visualization
J. Micro/Nanolith. MEMS MOEMS 14(3), 033502 (14 July 2015) https://doi.org/10.1117/1.JMM.14.3.033502
TOPICS: Line edge roughness, Scanning electron microscopy, Statistical analysis, Line width roughness, Fourier transforms, Edge roughness, Lithography, Electron microscopes, Convolution, Error analysis
J. Micro/Nanolith. MEMS MOEMS 14(3), 033503 (14 July 2015) https://doi.org/10.1117/1.JMM.14.3.033503
TOPICS: Line width roughness, Lithography, Critical dimension metrology, Etching, Scanning electron microscopy, Metrology, Photoresist processing, Line edge roughness, Performance modeling, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 14(3), 033504 (15 July 2015) https://doi.org/10.1117/1.JMM.14.3.033504
TOPICS: Ultraviolet radiation, Photoresist materials, Lithography, Antennas, Photomasks, Liquids, Polyurethane, Refractive index, Photoresist developing, Polymers
J. Micro/Nanolith. MEMS MOEMS 14(3), 033505 (21 July 2015) https://doi.org/10.1117/1.JMM.14.3.033505
TOPICS: Chemical species, Sputter deposition, Quartz, Argon, Etching, Silicon, Ions, Dry etching, Mechanical engineering, Molecules
J. Micro/Nanolith. MEMS MOEMS 14(3), 033506 (7 August 2015) https://doi.org/10.1117/1.JMM.14.3.033506
TOPICS: Nanoimprint lithography, Integrated optics, Semiconducting wafers, Holograms, Etching, Electron beam lithography, Information operations, Waveguides, Oxygen, Spectroscopes
J. Micro/Nanolith. MEMS MOEMS 14(3), 033507 (7 August 2015) https://doi.org/10.1117/1.JMM.14.3.033507
TOPICS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 14(3), 033508 (21 August 2015) https://doi.org/10.1117/1.JMM.14.3.033508
TOPICS: Phase measurement, Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Inspection, Quartz, Lithography
J. Micro/Nanolith. MEMS MOEMS 14(3), 033509 (11 September 2015) https://doi.org/10.1117/1.JMM.14.3.033509
TOPICS: Polymethylmethacrylate, Polymers, Atomic force microscopy, Polymer thin films, Thin films, Dewetting, Silicon, Plasma, Manganese, Spatial resolution
J. Micro/Nanolith. MEMS MOEMS 14(3), 033510 (11 September 2015) https://doi.org/10.1117/1.JMM.14.3.033510
TOPICS: Semiconducting wafers, Photomasks, Critical dimension metrology, Quartz, Pulsed laser operation, Signal attenuation, Beam controllers, Deep ultraviolet, Metrology, Process control
J. Micro/Nanolith. MEMS MOEMS 14(3), 033511 (21 September 2015) https://doi.org/10.1117/1.JMM.14.3.033511
TOPICS: Polymers, Electron beam lithography, Atomic force microscopy, Silicon, Photoresist processing, Deep ultraviolet, Annealing, Polymethylmethacrylate, Electrons, Directed self assembly
J. Micro/Nanolith. MEMS MOEMS 14(3), 033512 (21 September 2015) https://doi.org/10.1117/1.JMM.14.3.033512
TOPICS: Defect detection, Signal detection, Photomasks, Extreme ultraviolet lithography, Inspection, Target detection, Extreme ultraviolet, Image processing, Image enhancement, Signal processing
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(3), 034001 (9 July 2015) https://doi.org/10.1117/1.JMM.14.3.034001
TOPICS: Scanning electron microscopy, Scanning transmission electron microscopy, Photoresist materials, Atomic layer deposition, Hybrid fiber optics, Monte Carlo methods, Selenium, Electron microscopes, Scattering, Thin films
J. Micro/Nanolith. MEMS MOEMS 14(3), 034002 (5 August 2015) https://doi.org/10.1117/1.JMM.14.3.034002
TOPICS: Plasma, Vacuum ultraviolet, Tin, Gallium, Light sources, Ions, Indium, Extreme ultraviolet, Calibration, Inspection
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(3), 034501 (13 August 2015) https://doi.org/10.1117/1.JMM.14.3.034501
TOPICS: Photomasks, Lithography, Photoresist materials, Binary data, Etching, Electron beam lithography, Chromium, Optical alignment, Double patterning technology, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 14(3), 034502 (24 August 2015) https://doi.org/10.1117/1.JMM.14.3.034502
TOPICS: Polymers, Polymer multimode waveguides, Single mode fibers, Waveguides, Ultraviolet radiation, Optical lithography, Optics manufacturing, Manufacturing, Cladding, Image segmentation
J. Micro/Nanolith. MEMS MOEMS 14(3), 034503 (21 September 2015) https://doi.org/10.1117/1.JMM.14.3.034503
TOPICS: Etching, Sensors, Quantum efficiency, Quantum well infrared photodetectors, Resonators, Gallium arsenide, Reactive ion etching, Quantum wells, Semiconducting wafers, Optical instrument design
J. Micro/Nanolith. MEMS MOEMS 14(3), 034504 (25 September 2015) https://doi.org/10.1117/1.JMM.14.3.034504
TOPICS: Copper, Oxides, Carbonates, Scanning electron microscopy, Chemical species, Manufacturing, Interfaces, Aluminum, Metals, Oxidation
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 14(3), 035001 (7 August 2015) https://doi.org/10.1117/1.JMM.14.3.035001
TOPICS: Silicon, Thin films, Transistors, Scattering, Interfaces, Bismuth, Semiconducting wafers, Resonators, Phonons, Nanowires
J. Micro/Nanolith. MEMS MOEMS 14(3), 035002 (3 September 2015) https://doi.org/10.1117/1.JMM.14.3.035002
TOPICS: Switches, Microelectromechanical systems, Metals, Electrodes, Dielectrics, Capacitance, Switching, Oxides, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 14(3), 035003 (3 September 2015) https://doi.org/10.1117/1.JMM.14.3.035003
TOPICS: Microfluidics, Magnetism, Strontium, Polymethylmethacrylate, Bismuth, Electromagnetism, Liquids, Protactinium, Water, Microfabrication
J. Micro/Nanolith. MEMS MOEMS 14(3), 035004 (4 September 2015) https://doi.org/10.1117/1.JMM.14.3.035004
TOPICS: Mirrors, Ultrasonography, Photoacoustic microscopy, Microfabrication, Magnetism, 3D printing, Data acquisition, Reflectivity, Silicon, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 14(3), 035005 (21 September 2015) https://doi.org/10.1117/1.JMM.14.3.035005
TOPICS: Microelectromechanical systems, Switches, Gold, Etching, Amorphous silicon, Silicon, Dielectrics, Electroplating, Semiconducting wafers
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 14(3), 035501 (3 September 2015) https://doi.org/10.1117/1.JMM.14.3.035501
TOPICS: Thermography, Infrared radiation, Infrared imaging, Holographic optical elements, Infrared cameras, Signal to noise ratio, Infrared detectors, Spatial resolution, Cameras, Silicon
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