journal of micro nanolithography mems and moems
VOL. 14 · NO. 4 | October 2015
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 14(4), 040101 (11 November 2015) doi:10.1117/1.JMM.14.4.040101
TOPICS: Chemistry, Nanolithography, Lenses, Optical engineering, Photoresist materials, Polymers, Chemical elements, Molecules, Microelectromechanical systems, Microopto electromechanical systems
Special Section on the Interface of Holography and MEMS
J. Micro/Nanolith. MEMS MOEMS 14(4), 041301 (30 November 2015) doi:10.1117/1.JMM.14.4.041301
TOPICS: Holography, Microelectromechanical systems, Digital holography, Microopto electromechanical systems, Interfaces, Physics, Metrology, Spatial light modulators, 3D displays, Computer engineering
Maik Rahlves, Christian Kelb, Maher Rezem, Sebastian Schlangen, Kristian Boroz, Dina Gödeke, Maximilian Ihme, Bernhard Roth
J. Micro/Nanolith. MEMS MOEMS 14(4), 041302 (25 July 2015) doi:10.1117/1.JMM.14.4.041302
TOPICS: LCDs, Digital micromirror devices, Polymethylmethacrylate, Maskless lithography, Lithography, Polymers, Holography, Diffractive optical elements, Mirrors, Light sources
J. Micro/Nanolith. MEMS MOEMS 14(4), 041303 (27 July 2015) doi:10.1117/1.JMM.14.4.041303
TOPICS: Holography, 3D image reconstruction, 3D displays, Spatial light modulators, Diffraction, Holograms, 3D image processing, Image acquisition, Imaging systems, Image quality
Hongbo Zhang, Wenjing Zhou, Donald Leber, Zhijuan Hu, Xin Yang, Peter W. Tsang, Ting-Chung Poon
J. Micro/Nanolith. MEMS MOEMS 14(4), 041304 (3 August 2015) doi:10.1117/1.JMM.14.4.041304
TOPICS: Digital holography, Holograms, Image compression, Semiconducting wafers, Wavelets, 3D image reconstruction, Holography, Wavelet transforms, Reconstruction algorithms, CMOS devices
Quang Duc Pham, Yoshio Hayasaki
J. Micro/Nanolith. MEMS MOEMS 14(4), 041305 (10 August 2015) doi:10.1117/1.JMM.14.4.041305
TOPICS: Frequency combs, Digital micromirror devices, Compressed sensing, Cameras, Digital cameras, Radio optics, Mirrors, Photodetectors, Phase measurement, Femtosecond phenomena
J. Micro/Nanolith. MEMS MOEMS 14(4), 041306 (11 August 2015) doi:10.1117/1.JMM.14.4.041306
TOPICS: Microelectromechanical systems, Cameras, Holography, Holograms, Crystals, Scattering, Holographic interferometry, Laser crystals, Digital holography, Interferometry
Joseph Rosen, Roy Kelner, Yuval Kashter
J. Micro/Nanolith. MEMS MOEMS 14(4), 041307 (14 August 2015) doi:10.1117/1.JMM.14.4.041307
TOPICS: Spatial light modulators, Holograms, Imaging systems, Digital holography, Holography, 3D image reconstruction, Polarization, Confocal microscopy, Spherical lenses, Multiplexing
Daniel Smalley, Stephen McLaughlin, Christopher Leach, Jacob Kimball, V. Michael Bove, Sundeep Jolly
J. Micro/Nanolith. MEMS MOEMS 14(4), 041308 (27 August 2015) doi:10.1117/1.JMM.14.4.041308
TOPICS: Modulators, Waveguides, Holography, Video, Acoustics, Control systems, Spatial frequencies, Polarization, Prisms, Transducers
Pascal Picart, Mokrane Malek, Jorge Garcia-Sucerquia, Mathieu Edely, Rahma Moalla, Nicolas Delorme, Jean-François Bardeau
J. Micro/Nanolith. MEMS MOEMS 14(4), 041309 (11 September 2015) doi:10.1117/1.JMM.14.4.041309
TOPICS: Thin films, Sensors, Mirrors, Silicon films, Atomic force microscopy, Interferometry, Polymers, Silicon, Polymer thin films, RGB color model
J. Micro/Nanolith. MEMS MOEMS 14(4), 041310 (16 September 2015) doi:10.1117/1.JMM.14.4.041310
TOPICS: Holograms, Holography, Spatial light modulators, Diffraction, Modulation, Modulators, Phase shift keying, Reconstruction algorithms, Holography applications, Phase modulation
J. Micro/Nanolith. MEMS MOEMS 14(4), 041311 (16 September 2015) doi:10.1117/1.JMM.14.4.041311
TOPICS: Spatial light modulators, Holography, Holograms, Aberration correction, Diffraction, Point spread functions, Digital holography, Wavefronts, Lenses, Optical filters
J. Micro/Nanolith. MEMS MOEMS 14(4), 041312 (1 October 2015) doi:10.1117/1.JMM.14.4.041312
Jianglei Di, Jiwei Zhang, Teli Xi, ChaoJie Ma, Jianlin Zhao
J. Micro/Nanolith. MEMS MOEMS 14(4), 041313 (20 October 2015) doi:10.1117/1.JMM.14.4.041313
TOPICS: Digital holography, Holography, Microscopy, Microlens, Holograms, Numerical simulations, 3D image reconstruction, Optical testing, Digital recording, Charge-coupled devices
J. Micro/Nanolith. MEMS MOEMS 14(4), 041314 (18 November 2015) doi:10.1117/1.JMM.14.4.041314
TOPICS: Microelectromechanical systems, Holograms, Digital holography, Holography, Image processing, 3D image reconstruction, Digital recording, Diffraction, Microscopes, Microscopy
Lithography
J. Micro/Nanolith. MEMS MOEMS 14(4), 043501 (7 October 2015) doi:10.1117/1.JMM.14.4.043501
TOPICS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors
J. Micro/Nanolith. MEMS MOEMS 14(4), 043502 (13 October 2015) doi:10.1117/1.JMM.14.4.043502
TOPICS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling
James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
J. Micro/Nanolith. MEMS MOEMS 14(4), 043503 (14 October 2015) doi:10.1117/1.JMM.14.4.043503
TOPICS: Antimony, Polymers, Molecules, Chromium, Extreme ultraviolet, Polymerization, Lithography, Bromine, Scanning electron microscopy, Metals
J. Micro/Nanolith. MEMS MOEMS 14(4), 043504 (20 October 2015) doi:10.1117/1.JMM.14.4.043504
TOPICS: Polarization, Lithography, Photomasks, Imaging systems, Diffraction, Lithographic illumination, Computer simulations, Image analysis, Zernike polynomials, Image processing
Md. Nazmul Hasan, Muttahid-Ull Haque, Jonathan Trisno, Yung-Chun Lee
J. Micro/Nanolith. MEMS MOEMS 14(4), 043505 (2 November 2015) doi:10.1117/1.JMM.14.4.043505
TOPICS: Semiconductor lasers, Microlens, Optical lithography, Lithography, Excimer lasers, Ultraviolet radiation, Optical simulations, Metals, Zemax, Photomasks
J. Micro/Nanolith. MEMS MOEMS 14(4), 043506 (9 November 2015) doi:10.1117/1.JMM.14.4.043506
TOPICS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters
J. Micro/Nanolith. MEMS MOEMS 14(4), 043507 (23 November 2015) doi:10.1117/1.JMM.14.4.043507
TOPICS: Electroluminescence, Source mask optimization, Photomasks, Optical proximity correction, Computational lithography, Diffractive optical elements, Metals, Lithography, Manufacturing, Optimization (mathematics)
J. Micro/Nanolith. MEMS MOEMS 14(4), 043508 (18 December 2015) doi:10.1117/1.JMM.14.4.043508
TOPICS: Electrodes, Lithography, Tolerancing, 3D modeling, Semiconducting wafers, Dielectrics, Electron beam lithography, Beam shaping, Manufacturing, Mechanical engineering
J. Micro/Nanolith. MEMS MOEMS 14(4), 043509 (21 December 2015) doi:10.1117/1.JMM.14.4.043509
TOPICS: Photoresist materials, Polarization, Resolution enhancement technologies, Lithography, Liquid crystals, Atomic force microscopy, Polarizers, Polymers, Beam splitters, Spiral phase plates
J. Micro/Nanolith. MEMS MOEMS 14(4), 043510 (21 December 2015) doi:10.1117/1.JMM.14.4.043510
TOPICS: Imaging systems, Prisms, Interfaces, Solids, Lithography, Scanning electron microscopy, Optical lithography, Dielectrics, Control systems, Reflectors
Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Tero Kulmala, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard
J. Micro/Nanolith. MEMS MOEMS 14(4), 043511 (24 December 2015) doi:10.1117/1.JMM.14.4.043511
TOPICS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates
Metrology
J. Micro/Nanolith. MEMS MOEMS 14(4), 044001 (12 November 2015) doi:10.1117/1.JMM.14.4.044001
TOPICS: Scanning electron microscopy, Metrology, Error analysis, Data modeling, Standards development, 3D metrology, Monte Carlo methods, Indium arsenide, Electron microscopes, Calibration
Microfabrication
Chu-Lin Chu, Bo-Yuan Chen, Yiin-Kuen Fuh
J. Micro/Nanolith. MEMS MOEMS 14(4), 044501 (13 October 2015) doi:10.1117/1.JMM.14.4.044501
TOPICS: Germanium, Atomic layer deposition, Aluminum, Field effect transistors, Interfaces, Dielectrics, Molybdenum, Oxides, Gallium arsenide, Silicon
J. Micro/Nanolith. MEMS MOEMS 14(4), 044502 (21 October 2015) doi:10.1117/1.JMM.14.4.044502
TOPICS: Etching, Polymers, Diamond, Nanoimprint lithography, Distortion, Anisotropic etching, Oxides, Image processing, 3D modeling, 3D image processing
Srinagalakshmi Nammi, Nilesh Vasa, G. Balaganesan, Sanjay Gupta, Anil Mathur
J. Micro/Nanolith. MEMS MOEMS 14(4), 044503 (23 October 2015) doi:10.1117/1.JMM.14.4.044503
TOPICS: Copper, Thin films, Aluminum, Laser ablation, Pulsed laser operation, Neodymium, YAG lasers, Scanning electron microscopy, Absorption, Plasma
Ugis Gertners, Zanda Gertnere, Elina Potanina
J. Micro/Nanolith. MEMS MOEMS 14(4), 044504 (27 October 2015) doi:10.1117/1.JMM.14.4.044504
TOPICS: Polarization, Holography, Chalcogenides, Laser beam diagnostics, Thin films, Optical components, Dielectrophoresis, Birefringence, Diffraction gratings, Continuous wave operation
Mitsuhiro Omura, Tsubasa Imamura, Hiroshi Yamamoto, Itsuko Sakai, Hisataka Hayashi
J. Micro/Nanolith. MEMS MOEMS 14(4), 044505 (28 October 2015) doi:10.1117/1.JMM.14.4.044505
TOPICS: Directed self assembly, Etching, Polymethylmethacrylate, Plasma, Carbon monoxide, Picosecond phenomena, Lithography, Ions, Plasma treatment, Chemistry
Pavlo Antonov, Marc Zuiddam, Joost W. Frenken
J. Micro/Nanolith. MEMS MOEMS 14(4), 044506 (10 December 2015) doi:10.1117/1.JMM.14.4.044506
TOPICS: Etching, Silicon, Nanolithography, Deep reactive ion etching, Plasma etching, Electron beam lithography, Cryogenics, Plasma, Hydrogen, Manufacturing
Yingtao Tian, Xiaobang Shang, Yi Wang, Michael Lancaster
J. Micro/Nanolith. MEMS MOEMS 14(4), 044507 (29 December 2015) doi:10.1117/1.JMM.14.4.044507
TOPICS: Waveguides, Microwave radiation, Terahertz radiation, Semiconducting wafers, Antennas, Optical lithography, Electronic filtering, Bandpass filters, Measurement devices, Silver
Microelectromechanical Systems (MEMS)
Weichen Li, Chingfu Tsou
J. Micro/Nanolith. MEMS MOEMS 14(4), 045001 (26 October 2015) doi:10.1117/1.JMM.14.4.045001
TOPICS: Microfluidics, Fluid dynamics, Silicon, Semiconducting wafers, Inspection, Liquids, Biomedical optics, Particles, Dielectrophoresis, Capillaries
Ankush Jain, Hitesh Kumar Sharma, Ram Gopal
J. Micro/Nanolith. MEMS MOEMS 14(4), 045002 (18 December 2015) doi:10.1117/1.JMM.14.4.045002
TOPICS: Oscillators, Gyroscopes, Nickel, Iron, Electrodes, Scanning electron microscopy, Instrument modeling, Copper, Fabrication, Computer aided design
Micro-optoelectromechanical Systems (MOEMS)
Noha Ali Aboulela Gaber, Yuto Takemura, Frédéric Marty, Diaa A. Khalil, Dan Angelescu, Elodie Richalot, Tarik Bourouina
J. Micro/Nanolith. MEMS MOEMS 14(4), 045501 (28 October 2015) doi:10.1117/1.JMM.14.4.045501
TOPICS: Refractometry, Liquids, Sensors, Resonators, Mirrors, Silicon, Optical fibers, Refractive index, Water, Capillaries
Errata
J. Micro/Nanolith. MEMS MOEMS 14(4), 049801 (17 August 2015) doi:10.1117/1.JMM.14.4.049801
TOPICS: Holography, Interfaces, Microelectromechanical systems, Cameras, Frequency combs, Digital cameras, Digital micromirror devices
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