Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 15 · NO. 1 | January 2016
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 15(1), 010101 (24 December 2015) https://doi.org/10.1117/1.JMM.15.1.010101
TOPICS: Visualization
J. Micro/Nanolith. MEMS MOEMS 15(1), 010102 (2 February 2016) https://doi.org/10.1117/1.JMM.15.1.010102
TOPICS: Chaos, Microelectromechanical systems, Microopto electromechanical systems, Alternate lighting of surfaces, Fluctuations and noise, Holmium, Lithium, Lutetium, Sun
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 15(1), 010501 (25 January 2016) https://doi.org/10.1117/1.JMM.15.1.010501
TOPICS: Ultraviolet light emitting diodes, Light emitting diodes, Critical dimension metrology, Lithography, Electrodes, Optical lithography, Diffusers, Fabrication, Ultraviolet radiation, Photomasks
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(1), 013501 (22 January 2016) https://doi.org/10.1117/1.JMM.15.1.013501
TOPICS: Absorption, Molecules, Optical lithography, Field effect transistors, Organic semiconductors, Ultraviolet radiation, Silicon, Natural surfaces, Ozone, Transistors
J. Micro/Nanolith. MEMS MOEMS 15(1), 013502 (1 February 2016) https://doi.org/10.1117/1.JMM.15.1.013502
TOPICS: Glasses, Metals, Gold, Electron beams, Scanning electron microscopy, Aluminum, Thin films, Nanostructures, Wet etching, Silicate glass
J. Micro/Nanolith. MEMS MOEMS 15(1), 013503 (5 February 2016) https://doi.org/10.1117/1.JMM.15.1.013503
TOPICS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates
J. Micro/Nanolith. MEMS MOEMS 15(1), 013504 (17 February 2016) https://doi.org/10.1117/1.JMM.15.1.013504
TOPICS: Logic, Very large scale integration, Printing, Distance measurement, Image segmentation, Lithography, Optical proximity correction, Teeth, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 15(1), 013505 (19 February 2016) https://doi.org/10.1117/1.JMM.15.1.013505
TOPICS: Optical lithography, Etching, Extreme ultraviolet lithography, Metals, Lithography, Critical dimension metrology, 3D modeling, Stochastic processes, Cadmium, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(1), 013506 (19 February 2016) https://doi.org/10.1117/1.JMM.15.1.013506
TOPICS: Particle swarm optimization, Particles, Photomasks, Optical lithography, Lithographic illumination, Lithography, Optimization (mathematics), Source mask optimization, Image quality, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 15(1), 013507 (25 February 2016) https://doi.org/10.1117/1.JMM.15.1.013507
TOPICS: Optical lithography, Metals, Copper, Resistance, Extreme ultraviolet, Tungsten, Back end of line, Critical dimension metrology, Capacitance, CMOS technology
J. Micro/Nanolith. MEMS MOEMS 15(1), 013508 (8 March 2016) https://doi.org/10.1117/1.JMM.15.1.013508
TOPICS: Directed self assembly, Thin films, Interfaces, Polymers, Annealing, Diffusion, Scattering, Computer simulations, Process control
J. Micro/Nanolith. MEMS MOEMS 15(1), 013509 (17 March 2016) https://doi.org/10.1117/1.JMM.15.1.013509
TOPICS: Optical proximity correction, Bismuth, Lawrencium, Image segmentation, Model-based design, Detection and tracking algorithms, Neural networks, Optical lithography, Solids, Evolutionary algorithms
J. Micro/Nanolith. MEMS MOEMS 15(1), 013510 (22 March 2016) https://doi.org/10.1117/1.JMM.15.1.013510
TOPICS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 15(1), 013511 (23 March 2016) https://doi.org/10.1117/1.JMM.15.1.013511
TOPICS: Computer aided design, Photoresist materials, Photomasks, Grayscale lithography, Solid modeling, Calibration, 3D modeling, Microelectromechanical systems, Photoresist developing, Ultraviolet radiation
Metrology
J. Micro/Nanolith. MEMS MOEMS 15(1), 014001 (6 January 2016) https://doi.org/10.1117/1.JMM.15.1.014001
TOPICS: Scattering, Synchrotrons, Sensors, Time metrology, X-rays, Data modeling, Signal to noise ratio, Laser scattering, Statistical modeling, Metrology
J. Micro/Nanolith. MEMS MOEMS 15(1), 014002 (19 January 2016) https://doi.org/10.1117/1.JMM.15.1.014002
TOPICS: Principal component analysis, Extreme ultraviolet, Photomasks, Databases, Zernike polynomials, Diffraction, Atrial fibrillation, Defect detection, Fourier transforms, Optical filters
J. Micro/Nanolith. MEMS MOEMS 15(1), 014003 (25 January 2016) https://doi.org/10.1117/1.JMM.15.1.014003
TOPICS: Virtual point source, Atomic force microscope, Calibration, Metrology, Critical dimension metrology, Standards development, Atomic force microscopy, Silicon, Semiconductor manufacturing, Statistical modeling
J. Micro/Nanolith. MEMS MOEMS 15(1), 014004 (14 March 2016) https://doi.org/10.1117/1.JMM.15.1.014004
TOPICS: Directed self assembly, Critical dimension metrology, Scatterometry, Polymethylmethacrylate, Optical components, Picosecond phenomena, Optical simulations, Chemical elements, Optical lithography, Ellipsometry
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 15(1), 014501 (5 January 2016) https://doi.org/10.1117/1.JMM.15.1.014501
TOPICS: Gold, Laser ablation, Metals, Nanolithography, Nanostructures, Pulsed laser operation, Glasses, Ultraviolet radiation, Scanning electron microscopy, Fabrication
J. Micro/Nanolith. MEMS MOEMS 15(1), 014502 (1 March 2016) https://doi.org/10.1117/1.JMM.15.1.014502
TOPICS: Photomasks, Waveguides, Lithography, Photoresist materials, Silicon, 3D microstructuring, Projection lithography, Refractive index, Diffraction, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 15(1), 014503 (9 March 2016) https://doi.org/10.1117/1.JMM.15.1.014503
TOPICS: Etching, Silicon, Calibration, Crystals, Standards development, Scanning electron microscopy, Oxides, Metrology, Wet etching, Photomasks
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 15(1), 015001 (19 January 2016) https://doi.org/10.1117/1.JMM.15.1.015001
TOPICS: Gallium arsenide, Diodes, Signal detection, Resistance, Gallium, Signal processing, Fabrication, Electrodes, Bulk micromachining, Magnesium
J. Micro/Nanolith. MEMS MOEMS 15(1), 015002 (11 March 2016) https://doi.org/10.1117/1.JMM.15.1.015002
TOPICS: Electrodes, Resistance, Iridium, Oxides, Copper indium disulfide, In vitro testing, Polarization, Gold, Signal detection, Packaging
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 15(1), 015501 (29 March 2016) https://doi.org/10.1117/1.JMM.15.1.015501
TOPICS: Mirrors, Scanners, Actuators, Deep reactive ion etching, Microelectromechanical systems, Optical scanning, Finite element methods, Semiconducting wafers, Micromirrors, Single mode fibers
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