journal of micro nanolithography mems and moems
VOL. 15 · NO. 1 | January 2016
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 15(1), 010101 (24 December 2015) doi:10.1117/1.JMM.15.1.010101
TOPICS: Visualization
J. Micro/Nanolith. MEMS MOEMS 15(1), 010102 (2 February 2016) doi:10.1117/1.JMM.15.1.010102
TOPICS: Chaos, Microelectromechanical systems, Microopto electromechanical systems, Alternate lighting of surfaces, Fluctuations and noise, Holmium, Lithium, Lutetium, Sun
JM3 Letters
Neam Heng Lee, Varghese Swamy, Narayanan Ramakrishnan
J. Micro/Nanolith. MEMS MOEMS 15(1), 010501 (25 January 2016) doi:10.1117/1.JMM.15.1.010501
TOPICS: Ultraviolet light emitting diodes, Light emitting diodes, Critical dimension metrology, Lithography, Electrodes, Optical lithography, Diffusers, Fabrication, Ultraviolet radiation, Photomasks
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(1), 013501 (22 January 2016) doi:10.1117/1.JMM.15.1.013501
TOPICS: Absorption, Molecules, Optical lithography, Field effect transistors, Organic semiconductors, Ultraviolet radiation, Silicon, Natural surfaces, Ozone, Transistors
Filipp Komissarenko, Ivan Mukhin, Alexander Golubok, Nikolay Nikonorov, Mikhail Prosnikov, Alexander Sidorov
J. Micro/Nanolith. MEMS MOEMS 15(1), 013502 (1 February 2016) doi:10.1117/1.JMM.15.1.013502
TOPICS: Glasses, Metals, Gold, Electron beams, Scanning electron microscopy, Aluminum, Thin films, Nanostructures, Wet etching, Silicate glass
John Sporre, Daniel Elg, Kishor Kalathiparambil, David Ruzic
J. Micro/Nanolith. MEMS MOEMS 15(1), 013503 (5 February 2016) doi:10.1117/1.JMM.15.1.013503
TOPICS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates
Sandeep Kumar Dey, Panagiotis Cheilaris, Maria Gabrani, Evanthia Papadopoulo
J. Micro/Nanolith. MEMS MOEMS 15(1), 013504 (17 February 2016) doi:10.1117/1.JMM.15.1.013504
TOPICS: Logic, Very large scale integration, Printing, Distance measurement, Image segmentation, Lithography, Optical proximity correction, Teeth, Scanning electron microscopy
Weimin Gao, Ivan Ciofi, Yves Saad, Philippe Matagne, Michael Bachmann, Werner Gillijns, Kevin Lucas, Wolfgang Demmerle, Thomas Schmöller
J. Micro/Nanolith. MEMS MOEMS 15(1), 013505 (19 February 2016) doi:10.1117/1.JMM.15.1.013505
TOPICS: Optical lithography, Etching, Extreme ultraviolet lithography, Metals, Lithography, Critical dimension metrology, 3D modeling, Stochastic processes, Cadmium, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(1), 013506 (19 February 2016) doi:10.1117/1.JMM.15.1.013506
TOPICS: Particle swarm optimization, Particles, Photomasks, Optical lithography, Lithographic illumination, Lithography, Optimization (mathematics), Source mask optimization, Image quality, Resolution enhancement technologies
Syed Muhammad Yasser Sherazi, Bharani Chava, Peter Debacker, Marie Garcia Bardon, Pieter Schuddinck, Farshad Firouzi, Praveen Raghavan, Abdelkarim Mercha, Diederik Verkest, Julien Ryckaert
J. Micro/Nanolith. MEMS MOEMS 15(1), 013507 (25 February 2016) doi:10.1117/1.JMM.15.1.013507
TOPICS: Optical lithography, Metals, Copper, Resistance, Extreme ultraviolet, Tungsten, Back end of line, Critical dimension metrology, Capacitance, CMOS technology
J. Micro/Nanolith. MEMS MOEMS 15(1), 013508 (8 March 2016) doi:10.1117/1.JMM.15.1.013508
TOPICS: Directed self assembly, Thin films, Interfaces, Polymers, Annealing, Diffusion, Scattering, Computer simulations, Process control
J. Micro/Nanolith. MEMS MOEMS 15(1), 013509 (17 March 2016) doi:10.1117/1.JMM.15.1.013509
TOPICS: Optical proximity correction, Bismuth, Lawrencium, Image segmentation, Model-based design, Detection and tracking algorithms, Neural networks, Optical lithography, Solids, Evolutionary algorithms
J. Micro/Nanolith. MEMS MOEMS 15(1), 013510 (22 March 2016) doi:10.1117/1.JMM.15.1.013510
TOPICS: Inspection, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Line edge roughness, Image processing, Image resolution, Ultraviolet detectors, Photomasks, Electron microscopes
James Loomis, Dilan Ratnayake, Curtis McKenna, Kevin Walsh
J. Micro/Nanolith. MEMS MOEMS 15(1), 013511 (23 March 2016) doi:10.1117/1.JMM.15.1.013511
TOPICS: Computer aided design, Photoresist materials, Photomasks, Grayscale lithography, Solid modeling, Calibration, 3D modeling, Microelectromechanical systems, Photoresist developing, Ultraviolet radiation
Metrology
J. Micro/Nanolith. MEMS MOEMS 15(1), 014001 (6 January 2016) doi:10.1117/1.JMM.15.1.014001
TOPICS: Scattering, Synchrotrons, Sensors, Time metrology, X-rays, Data modeling, Signal to noise ratio, Laser scattering, Statistical modeling, Metrology
J. Micro/Nanolith. MEMS MOEMS 15(1), 014002 (19 January 2016) doi:10.1117/1.JMM.15.1.014002
TOPICS: Principal component analysis, Extreme ultraviolet, Photomasks, Databases, Zernike polynomials, Diffraction, Atrial fibrillation, Defect detection, Fourier transforms, Optical filters
Ronald Dixson, Ndubuisi Orji, Ryan Goldband
J. Micro/Nanolith. MEMS MOEMS 15(1), 014003 (25 January 2016) doi:10.1117/1.JMM.15.1.014003
TOPICS: Virtual point source, Atomic force microscope, Calibration, Metrology, Critical dimension metrology, Standards development, Atomic force microscopy, Silicon, Semiconductor manufacturing, Statistical modeling
Dhairya Dixit, Avery Green, Erik Hosler, Vimal Kamineni, Moshe Preil, Nick Keller, Joseph Race, Jun Sung Chun, Michael O’Sullivan, Prasanna Khare, Warren Montgomery, Alain Diebold
J. Micro/Nanolith. MEMS MOEMS 15(1), 014004 (14 March 2016) doi:10.1117/1.JMM.15.1.014004
TOPICS: Directed self assembly, Critical dimension metrology, Scatterometry, Polymethylmethacrylate, Optical components, Picosecond phenomena, Optical simulations, Chemical elements, Optical lithography, Ellipsometry
Microfabrication
Tianrui Zhai, Xiaofeng Wu, Yonglu Wang, Xinping Zhang
J. Micro/Nanolith. MEMS MOEMS 15(1), 014501 (5 January 2016) doi:10.1117/1.JMM.15.1.014501
TOPICS: Gold, Laser ablation, Metals, Nanolithography, Nanostructures, Pulsed laser operation, Glasses, Ultraviolet radiation, Scanning electron microscopy, Fabrication
J. Micro/Nanolith. MEMS MOEMS 15(1), 014502 (1 March 2016) doi:10.1117/1.JMM.15.1.014502
TOPICS: Photomasks, Waveguides, Lithography, Photoresist materials, Silicon, 3D microstructuring, Projection lithography, Refractive index, Diffraction, 3D modeling
Ronald Dixson, William Guthrie, Richard Allen, Ndubuisi Orji, Michael Cresswell, Christine Murabito
J. Micro/Nanolith. MEMS MOEMS 15(1), 014503 (9 March 2016) doi:10.1117/1.JMM.15.1.014503
TOPICS: Etching, Silicon, Calibration, Crystals, Standards development, Scanning electron microscopy, Oxides, Metrology, Wet etching, Photomasks
Microelectromechanical Systems (MEMS)
Mengwei Li, Tao Deng, Kang Du, WeiHang Chu, Jun Liu, Houjin Chen, Zewen Liu
J. Micro/Nanolith. MEMS MOEMS 15(1), 015001 (19 January 2016) doi:10.1117/1.JMM.15.1.015001
TOPICS: Gallium arsenide, Diodes, Signal detection, Resistance, Gallium, Signal processing, Fabrication, Electrodes, Bulk micromachining, Magnesium
Frank Yang, Mao-Yen Chang, Zung-Hua Yang, Chih-Ciao Teng, Long-Sheng Fan
J. Micro/Nanolith. MEMS MOEMS 15(1), 015002 (11 March 2016) doi:10.1117/1.JMM.15.1.015002
TOPICS: Electrodes, Resistance, Iridium, Oxides, Copper indium disulfide, In vitro testing, Polarization, Gold, Signal detection, Packaging
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 15(1), 015501 (29 March 2016) doi:10.1117/1.JMM.15.1.015501
TOPICS: Mirrors, Scanners, Actuators, Deep reactive ion etching, Microelectromechanical systems, Optical scanning, Finite element methods, Semiconducting wafers, Micromirrors, Single mode fibers
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