15 February 2016 Errata: Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks
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Abstract
This PDF file contains the errata for “JM3 Vol. 15 Issue 02 Paper JM3-2016-0202-ERR” for JM3 Vol. 15 Issue 02

This article [J. Micro/Nanolith. MEMS MOEMS 15(2), 021005 (2016)] was originally published online on 2 February 2016 with an error in the author affiliations.

The correct affiliations are shown above.

All online versions of the article were corrected on 3 February 2016. The article appears correctly in print.

© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Zhengqing J. Qi, Zhengqing J. Qi, Jed H. Rankin, Jed H. Rankin, Eisuke Narita, Eisuke Narita, Masayuki Kagawac, Masayuki Kagawac, } "Errata: Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(2), 029801 (15 February 2016). https://doi.org/10.1117/1.JMM.15.2.029801 . Submission:
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