Editorial
J. Micro/Nanolith. MEMS MOEMS 15(2), 020101 (31 March 2016) https://doi.org/10.1117/1.JMM.15.2.020101
TOPICS: Beryllium
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 15(2), 020501 (7 June 2016) https://doi.org/10.1117/1.JMM.15.2.020501
TOPICS: Standards development, Microfluidics, Manufacturing, Connectors, Product engineering, Roads, Roentgenium, Capillaries, Life sciences, Microscopes
Special Section on Photomask Manufacturing Technology
J. Micro/Nanolith. MEMS MOEMS 15(2), 021001 (31 March 2016) https://doi.org/10.1117/1.JMM.15.2.021001
TOPICS: Photomasks, Manufacturing, Optical lithography, Nanoimprint lithography, Optical proximity correction, Nanotechnology, Printing, Semiconductor lasers, Semiconductors, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(2), 021002 (29 January 2016) https://doi.org/10.1117/1.JMM.15.2.021002
TOPICS: Silicon, Inspection, Extreme ultraviolet, Defect detection, Photomasks, Etching, Oxides, Tin, Multilayers, Metals
J. Micro/Nanolith. MEMS MOEMS 15(2), 021003 (29 January 2016) https://doi.org/10.1117/1.JMM.15.2.021003
TOPICS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, EUV optics, Optical lithography, Absorption, Image transmission, Reflectivity
J. Micro/Nanolith. MEMS MOEMS 15(2), 021004 (1 February 2016) https://doi.org/10.1117/1.JMM.15.2.021004
TOPICS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology
J. Micro/Nanolith. MEMS MOEMS 15(2), 021005 (2 February 2016) https://doi.org/10.1117/1.JMM.15.2.021005
TOPICS: Optical lithography, Photomasks, Inspection, Sensors, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Signal detection, Metals
J. Micro/Nanolith. MEMS MOEMS 15(2), 021006 (5 February 2016) https://doi.org/10.1117/1.JMM.15.2.021006
TOPICS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids
J. Micro/Nanolith. MEMS MOEMS 15(2), 021007 (18 February 2016) https://doi.org/10.1117/1.JMM.15.2.021007
TOPICS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging
J. Micro/Nanolith. MEMS MOEMS 15(2), 021008 (8 March 2016) https://doi.org/10.1117/1.JMM.15.2.021008
TOPICS: Inspection, Photomasks, Defect detection, Image sensors, Extreme ultraviolet lithography, Signal detection, Sensors, Defect inspection, Image processing, Image resolution
J. Micro/Nanolith. MEMS MOEMS 15(2), 021009 (11 March 2016) https://doi.org/10.1117/1.JMM.15.2.021009
TOPICS: Optical proximity correction, Data modeling, Model-based design, Performance modeling, Statistical modeling, Simulation of CCA and DLA aggregates, Lithography, Feature extraction, Monte Carlo methods, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 15(2), 021010 (18 March 2016) https://doi.org/10.1117/1.JMM.15.2.021010
TOPICS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 15(2), 021011 (27 April 2016) https://doi.org/10.1117/1.JMM.15.2.021011
TOPICS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 15(2), 021012 (23 March 2016) https://doi.org/10.1117/1.JMM.15.2.021012
TOPICS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology
Special Section on Extending VLSI and Alternative Technology with Optical and Complementary Lithography
J. Micro/Nanolith. MEMS MOEMS 15(2), 021201 (29 June 2016) https://doi.org/10.1117/1.JMM.15.2.021201
TOPICS: Lithography, Optical lithography, 3D modeling, Very large scale integration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, Process control, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 15(2), 021202 (3 February 2016) https://doi.org/10.1117/1.JMM.15.2.021202
TOPICS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms
J. Micro/Nanolith. MEMS MOEMS 15(2), 021203 (29 January 2016) https://doi.org/10.1117/1.JMM.15.2.021203
TOPICS: Phase shifts, Photomasks, Printing, Phase measurement, Microscopy, Diffraction, Quartz, Semiconducting wafers, Resolution enhancement technologies
J. Micro/Nanolith. MEMS MOEMS 15(2), 021204 (16 February 2016) https://doi.org/10.1117/1.JMM.15.2.021204
TOPICS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology
J. Micro/Nanolith. MEMS MOEMS 15(2), 021205 (1 March 2016) https://doi.org/10.1117/1.JMM.15.2.021205
TOPICS: Photomasks, Deep ultraviolet, Extreme ultraviolet, Diffraction, Extreme ultraviolet lithography, Refractive index, Lithography, Polarization, Chromium, Monochromatic aberrations
J. Micro/Nanolith. MEMS MOEMS 15(2), 021206 (4 March 2016) https://doi.org/10.1117/1.JMM.15.2.021206
TOPICS: Projection systems, Image processing, Fourier transforms, Optical spheres, Diffraction, Photomasks, Wave propagation, Optical lithography, Lithography, Radio propagation
J. Micro/Nanolith. MEMS MOEMS 15(2), 021207 (11 March 2016) https://doi.org/10.1117/1.JMM.15.2.021207
TOPICS: Computer engineering, Photomasks, Optical lithography, Double patterning technology, Computer programming, Overlay metrology, Detection and tracking algorithms, Communication engineering, Lithography, Logic
Special Section on Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension
J. Micro/Nanolith. MEMS MOEMS 15(2), 021401 (30 June 2016) https://doi.org/10.1117/1.JMM.15.2.021401
TOPICS: Metrology, Overlay metrology, Control systems, Optical lithography, Process control, Integrated circuits, Lithography, Critical dimension metrology, Optical proximity correction, Image processing
J. Micro/Nanolith. MEMS MOEMS 15(2), 021402 (30 March 2016) https://doi.org/10.1117/1.JMM.15.2.021402
TOPICS: Scanners, Optical proximity correction, Photomasks, Lithography, Metals, Error analysis, Overlay metrology, Semiconducting wafers, Statistical analysis, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 15(2), 021403 (29 March 2016) https://doi.org/10.1117/1.JMM.15.2.021403
TOPICS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks
J. Micro/Nanolith. MEMS MOEMS 15(2), 021404 (31 March 2016) https://doi.org/10.1117/1.JMM.15.2.021404
TOPICS: Semiconducting wafers, Distortion, Optical lithography, Etching, Overlay metrology, Mechanics, Error analysis, Lithography, Shape analysis, Image registration
J. Micro/Nanolith. MEMS MOEMS 15(2), 021405 (27 April 2016) https://doi.org/10.1117/1.JMM.15.2.021405
TOPICS: Metals, Critical dimension metrology, Overlay metrology, Optical lithography, Monochromatic aberrations, Optical proximity correction, Double patterning technology, Error analysis, Photomasks, Computational lithography
J. Micro/Nanolith. MEMS MOEMS 15(2), 021406 (2 May 2016) https://doi.org/10.1117/1.JMM.15.2.021406
TOPICS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration
J. Micro/Nanolith. MEMS MOEMS 15(2), 021407 (27 April 2016) https://doi.org/10.1117/1.JMM.15.2.021407
TOPICS: Directed self assembly, Critical dimension metrology, Polymethylmethacrylate, Smoothing, Image processing, Materials processing, Edge detection, Polymers, Error analysis, Metrology
J. Micro/Nanolith. MEMS MOEMS 15(2), 021408 (6 May 2016) https://doi.org/10.1117/1.JMM.15.2.021408
TOPICS: Photomasks, Diffraction, Extreme ultraviolet lithography, 3D modeling, Extreme ultraviolet, Lithography, Diffraction gratings, Tantalum, Refractive index, 3D image processing
J. Micro/Nanolith. MEMS MOEMS 15(2), 021409 (3 June 2016) https://doi.org/10.1117/1.JMM.15.2.021409
TOPICS: Photomasks, Image registration, Mask making, Palladium, Monte Carlo methods, Quartz, Model-based design, Scattering, Electron beam lithography, Holmium
J. Micro/Nanolith. MEMS MOEMS 15(2), 021410 (9 June 2016) https://doi.org/10.1117/1.JMM.15.2.021410
TOPICS: Photomasks, Semiconducting wafers, Image processing, Image registration, Birefringence, Pulsed laser operation, Inspection, Calibration, Metrology, Overlay metrology
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(2), 023501 (5 April 2016) https://doi.org/10.1117/1.JMM.15.2.023501
TOPICS: Reticles, Nanolithography, Semiconductors, Metals, Sensors, Dielectrics, Quartz, Semiconductor manufacturing, Ionization, Electronic components
J. Micro/Nanolith. MEMS MOEMS 15(2), 023502 (12 April 2016) https://doi.org/10.1117/1.JMM.15.2.023502
TOPICS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 15(2), 023503 (9 May 2016) https://doi.org/10.1117/1.JMM.15.2.023503
TOPICS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Lithography, Optical lithography, Manufacturing, Oxides, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 15(2), 023504 (10 May 2016) https://doi.org/10.1117/1.JMM.15.2.023504
TOPICS: Polarization, Optical design, Optical fabrication, Diffraction gratings, Electron beam lithography, Scanning electron microscopy, Polymethylmethacrylate, Optical lithography, Beam splitters, Infrared radiation
J. Micro/Nanolith. MEMS MOEMS 15(2), 023505 (10 May 2016) https://doi.org/10.1117/1.JMM.15.2.023505
TOPICS: Directed self assembly, Thermodynamics, Polymers, Interfaces, Computer simulations, Polymerization, Systems modeling, Binary data, Thin films, Semiconductors
J. Micro/Nanolith. MEMS MOEMS 15(2), 023506 (9 June 2016) https://doi.org/10.1117/1.JMM.15.2.023506
TOPICS: Pellicles, Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Image transmission, Absorption, Nanoimprint lithography, Extreme ultraviolet lithography, Logic
J. Micro/Nanolith. MEMS MOEMS 15(2), 023507 (24 June 2016) https://doi.org/10.1117/1.JMM.15.2.023507
TOPICS: Defect detection, Inspection, Photomasks, Signal detection, Extreme ultraviolet lithography, Detection and tracking algorithms, Image processing, Optimization (mathematics), Extreme ultraviolet, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 15(2), 023508 (28 June 2016) https://doi.org/10.1117/1.JMM.15.2.023508
TOPICS: Zernike polynomials, Extreme ultraviolet lithography, Extreme ultraviolet, Monochromatic aberrations, Imaging systems, Photomasks, Wavefronts, Metrology, Microscopes, Statistical analysis
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 15(2), 024501 (9 June 2016) https://doi.org/10.1117/1.JMM.15.2.024501
TOPICS: Sensors, Thermoelectric materials, Photoresist materials, Bismuth, Microelectromechanical systems, Metals, Scanning electron microscopy, Photomicroscopy, Semiconductors, Antimony
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 15(2), 025001 (1 June 2016) https://doi.org/10.1117/1.JMM.15.2.025001
TOPICS: Electrodes, Dielectrophoresis, Aluminum, Metals, Sodium, Glasses, Luminescence, Gold, Nickel, Chromium
Errata
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