journal of micro nanolithography mems and moems
VOL. 15 · NO. 3 | July 2016
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 15(3), 030101 (8 July 2016) doi:10.1117/1.JMM.15.3.030101
TOPICS: Brain imaging, Associative arrays, Standards development, Ear, Head, Mathematics, General relativity, Nomenclature, Telescopes, Structural sensing
Special Section on Alternative Lithographic Technologies V
J. Micro/Nanolith. MEMS MOEMS 15(3), 031601 (4 October 2016) doi:10.1117/1.JMM.15.3.031601
TOPICS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography
Tod Laurvick, Ronald Coutu, James Sattler, Robert Lake
J. Micro/Nanolith. MEMS MOEMS 15(3), 031602 (17 August 2016) doi:10.1117/1.JMM.15.3.031602
TOPICS: Photoresist materials, Optical spheres, Lithography, Optical lithography, Reactive ion etching, Photomasks, Etching, Computer aided design, Liquids, 3D printing
J. Micro/Nanolith. MEMS MOEMS 15(3), 031603 (17 August 2016) doi:10.1117/1.JMM.15.3.031603
TOPICS: Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Critical dimension metrology, System on a chip, Optical lithography, Semiconducting wafers, Etching, Silicon, Photomasks
J. Micro/Nanolith. MEMS MOEMS 15(3), 031604 (25 August 2016) doi:10.1117/1.JMM.15.3.031604
TOPICS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma
Mattan Kamon, Mustafa Akbulut, Yiguang Yan, Daniel Faken, Andras Pap, Vasanth Allampalli, Ken Greiner, David Fried
J. Micro/Nanolith. MEMS MOEMS 15(3), 031605 (13 September 2016) doi:10.1117/1.JMM.15.3.031605
TOPICS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching
Rimon Ikeno, Satoshi Maruyama, Yoshio Mita, Makoto Ikeda, Kunihiro Asada
J. Micro/Nanolith. MEMS MOEMS 15(3), 031606 (8 September 2016) doi:10.1117/1.JMM.15.3.031606
TOPICS: Data conversion, Vestigial sideband modulation, Lithography, Scanning electron microscopy, Silicon, Microrings, Electron beam lithography, Data processing, Very large scale integration, Edge roughness
Santosh Shaw, Kyle Miller, Julien Colaux, Ludovico Cademartiri
J. Micro/Nanolith. MEMS MOEMS 15(3), 031607 (6 September 2016) doi:10.1117/1.JMM.15.3.031607
TOPICS: Plasma, Lithography, Nanoparticles, Nanocrystals, Photomasks, Plasma etching, Polymers, Etching, Copper, Hybrid fiber optics
Amit Kumar Goyal, Hemant Sankar Dutta, Sumitra Singh, Mandeep Kaur, Sudhir Husale, Suchandan Pal
J. Micro/Nanolith. MEMS MOEMS 15(3), 031608 (8 September 2016) doi:10.1117/1.JMM.15.3.031608
TOPICS: Waveguides, Fabrication, Photonic crystals, Nanolithography, Optical lithography, Etching, Reactive ion etching, Silicon, Structural design, Ion beams
Ting Han, Hongyi Liu, Yijian Chen
J. Micro/Nanolith. MEMS MOEMS 15(3), 031609 (29 September 2016) doi:10.1117/1.JMM.15.3.031609
TOPICS: Carbon, Etching, Optical lithography, Critical dimension metrology, Phase only filters, Photomasks, Yield improvement, Failure analysis, Error analysis, Lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 031610 (29 September 2016) doi:10.1117/1.JMM.15.3.031610
TOPICS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction
Li Ding, Jin Qin, Yang Chen, Liang Wang
J. Micro/Nanolith. MEMS MOEMS 15(3), 031611 (29 September 2016) doi:10.1117/1.JMM.15.3.031611
TOPICS: Lithography, Near field, Optical lithography, Image quality, Photomasks, Finite-difference time-domain method, Photoresist materials, Near field optics, Nanolithography, 3D modeling
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 033501 (12 July 2016) doi:10.1117/1.JMM.15.3.033501
TOPICS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel
J. Micro/Nanolith. MEMS MOEMS 15(3), 033502 (15 July 2016) doi:10.1117/1.JMM.15.3.033502
TOPICS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing
Andrew Dick, William Bell, Brendan Luke, Erin Maines, Brennen Mueller, Brandon Rawlings, Paul Kohl, C. Grant Willson
J. Micro/Nanolith. MEMS MOEMS 15(3), 033503 (26 July 2016) doi:10.1117/1.JMM.15.3.033503
TOPICS: Dielectrics, Optical lithography, Polymers, Semiconducting wafers, Ultraviolet radiation, Silicon, Solids, Thin films, Sodium, Near ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(3), 033504 (1 August 2016) doi:10.1117/1.JMM.15.3.033504
TOPICS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics
J. Micro/Nanolith. MEMS MOEMS 15(3), 033505 (1 August 2016) doi:10.1117/1.JMM.15.3.033505
TOPICS: Diffraction gratings, Diffraction, Extreme ultraviolet, Photomasks, Iridium, Optical lithography, Electron beam lithography, Photoresist materials, Atomic layer deposition, Ions
J. Micro/Nanolith. MEMS MOEMS 15(3), 033506 (8 August 2016) doi:10.1117/1.JMM.15.3.033506
TOPICS: Absorption, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist materials, Chemically amplified resists, Polymethylmethacrylate, Metals, Silicon, Polymers
J. Micro/Nanolith. MEMS MOEMS 15(3), 033507 (23 August 2016) doi:10.1117/1.JMM.15.3.033507
TOPICS: Electrons, Extreme ultraviolet, Monte Carlo methods, Photons, Extreme ultraviolet lithography, Molybdenum, Absorption, Scattering, Lithography, Computer simulations
Metrology
Adam Hannon, Daniel Sunday, Donald Windover, R. Joseph Kline
J. Micro/Nanolith. MEMS MOEMS 15(3), 034001 (7 July 2016) doi:10.1117/1.JMM.15.3.034001
TOPICS: Detection and tracking algorithms, Scattering, X-rays, Genetic algorithms, Metrology, Computer simulations, Berkelium, Data modeling, Optimization (mathematics), Monte Carlo methods
J. Micro/Nanolith. MEMS MOEMS 15(3), 034002 (19 July 2016) doi:10.1117/1.JMM.15.3.034002
TOPICS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control
J. Micro/Nanolith. MEMS MOEMS 15(3), 034003 (18 August 2016) doi:10.1117/1.JMM.15.3.034003
TOPICS: Line width roughness, Fractal analysis, Extreme ultraviolet, Polymers, Diffusion, Scanning electron microscopy, Spatial frequencies, Photoresist materials, Extreme ultraviolet lithography, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 15(3), 034004 (23 August 2016) doi:10.1117/1.JMM.15.3.034004
TOPICS: Signal to noise ratio, Electrons, Monte Carlo methods, Silicon, Image processing, Scanning electron microscopy, Sensors, Inspection, Defect inspection, Defect detection
Jinho Choi, Byong Chon Park, Sang Jung Ahn, Dal-Hyun Kim, Joon Lyou, Ronald Dixson, Ndubuisi Orji, Joseph Fu, Theodore Vorburger
J. Micro/Nanolith. MEMS MOEMS 15(3), 034005 (26 August 2016) doi:10.1117/1.JMM.15.3.034005
TOPICS: Scanning electron microscopy, Line edge roughness, Carbon nanotubes, Atomic force microscope, Metrology, Atomic force microscopy, Standards development, Silicon, Manufacturing, Ion beams
J. Micro/Nanolith. MEMS MOEMS 15(3), 034006 (16 September 2016) doi:10.1117/1.JMM.15.3.034006
TOPICS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms
Microfabrication
Ran Zhang, Jinkui Chu, Ze Liu, Yinlong Wang
J. Micro/Nanolith. MEMS MOEMS 15(3), 034501 (8 July 2016) doi:10.1117/1.JMM.15.3.034501
TOPICS: Nanowires, Polarization, Sensors, Photoresist processing, Nanoimprint lithography, Quantum efficiency, Plasma, Nanostructures, Personal digital assistants, Aluminum
Chi-Chun Ho, Jung-San Chen, Chia-Heng Lin, Yung-Chun Lee, Yu-Bin Chen
J. Micro/Nanolith. MEMS MOEMS 15(3), 034502 (22 July 2016) doi:10.1117/1.JMM.15.3.034502
TOPICS: Polymethylmethacrylate, Silver, Magnesium, Silicon, Chromium, Gold, Transmittance, Infrared radiation, Electron beams, Etching
Shengfeng Deng, Yulong Zhang, Shusen Jiang, Miao Lu
J. Micro/Nanolith. MEMS MOEMS 15(3), 034503 (9 August 2016) doi:10.1117/1.JMM.15.3.034503
TOPICS: Silicon, Surface roughness, Etching, Reactive ion etching, 3D microstructuring, Lithography, Semiconductor lasers, Grayscale lithography, Microfluidics, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 15(3), 034504 (12 August 2016) doi:10.1117/1.JMM.15.3.034504
TOPICS: Silicon, Transistors, Integrated circuits, Metals, Capacitance, Spine, Semiconducting wafers, Etching, Lithography, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 034505 (12 August 2016) doi:10.1117/1.JMM.15.3.034505
TOPICS: Polymers, Etching, Ion beams, Polymer multimode waveguides, Waveguides, Optical lithography, Gallium, Silicon, Single mode fibers, Optics manufacturing
Meriem Akin, Maher Rezem, Maik Rahlves, Kevin Cromwell, Bernhard Roth, Eduard Reithmeier, Marc Wurz, Lutz Rissing, Hans Juergen Maier
J. Micro/Nanolith. MEMS MOEMS 15(3), 034506 (23 August 2016) doi:10.1117/1.JMM.15.3.034506
TOPICS: Polymers, Photoresist materials, Silicon, Reliability, Manufacturing, Nitrogen, Polymer thin films, Surface roughness, Phase modulation, Electroplating
Zhanna Santybayeva, Afaf Meghit, Rudy Desgarceaux, Roland Teissier, Frederic Pichot, Charles de Marin, Benoit Charlot, Francesco Pedaci
J. Micro/Nanolith. MEMS MOEMS 15(3), 034507 (8 September 2016) doi:10.1117/1.JMM.15.3.034507
TOPICS: Quartz, Optical tweezers, Particles, Lithography, Photoresist materials, Polarization, Etching, Electron beam lithography, Submicron lithography, Chromium
Microelectromechanical Systems (MEMS)
Payal Verma, Khamar Zaman Khan, Svetlana Khonina, Nikolay Kazanskiy, Ram Gopal
J. Micro/Nanolith. MEMS MOEMS 15(3), 035001 (19 July 2016) doi:10.1117/1.JMM.15.3.035001
TOPICS: Sensors, Gyroscopes, Oscillators, Nickel, Prototyping, Capacitors, Microelectromechanical systems, Copper, Semiconducting wafers, Ceramics
Chin-Tai Chen, Cheng-Chih Huang
J. Micro/Nanolith. MEMS MOEMS 15(3), 035002 (19 July 2016) doi:10.1117/1.JMM.15.3.035002
TOPICS: Actuators, Microfluidics, Nickel, Turbulence, Fluid dynamics, Liquids, Optical lithography, Printing, Scanning electron microscopy, Microfluidic imaging
Hui-Min Chou, Meng-Ju Lin, Rongshun Chen
J. Micro/Nanolith. MEMS MOEMS 15(3), 035003 (3 August 2016) doi:10.1117/1.JMM.15.3.035003
TOPICS: Mechanics, Silicon, Semiconducting wafers, Oxides, Microelectromechanical systems, Actuators, Motion analysis, Finite element methods, Numerical analysis, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 15(3), 035004 (9 September 2016) doi:10.1117/1.JMM.15.3.035004
TOPICS: Resonators, Semiconducting wafers, Silicon, Microelectromechanical systems, Polarization, Wafer bonding, Packaging, Etching, Resistance, Microfabrication
Da Chen, Shihua Huang
J. Micro/Nanolith. MEMS MOEMS 15(3), 035005 (28 September 2016) doi:10.1117/1.JMM.15.3.035005
TOPICS: Silicon carbide, Oxygen, Silicon, Remote sensing, Resistance, Silver, Chemical species, Lawrencium, Silicon films, Sputter deposition
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 15(3), 035501 (8 July 2016) doi:10.1117/1.JMM.15.3.035501
TOPICS: Microlens, Optical fibers, Free space optics, Silica, Beam propagation method, Refractive index, Optical simulations, Interfaces, GRIN lenses, Wave propagation
Alexander Mai, Christopher Bunce, Rene Hübner, Daniel Pahner, Ulrike Dauderstädt
J. Micro/Nanolith. MEMS MOEMS 15(3), 035502 (21 September 2016) doi:10.1117/1.JMM.15.3.035502
TOPICS: Mirrors, Micromirrors, Laser irradiation, Spatial light modulators, Microelectromechanical systems, Transmission electron microscopy, Oxides, Pulsed laser operation, Optical lithography, Reflectivity
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