Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 15 · NO. 3 | July 2016
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 15(3), 030101 (8 July 2016) https://doi.org/10.1117/1.JMM.15.3.030101
TOPICS: Brain imaging, Associative arrays, Standards development, Ear, Head, Mathematics, General relativity, Nomenclature, Telescopes, Structural sensing
Special Section on Alternative Lithographic Technologies V
J. Micro/Nanolith. MEMS MOEMS 15(3), 031601 (4 October 2016) https://doi.org/10.1117/1.JMM.15.3.031601
TOPICS: Directed self assembly, Lithography, Electron beam lithography, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Process control, Integrated circuit design, Nanostructures, Nanoimprint lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 031602 (17 August 2016) https://doi.org/10.1117/1.JMM.15.3.031602
TOPICS: Photoresist materials, Optical spheres, Lithography, Optical lithography, Reactive ion etching, Photomasks, Etching, Computer aided design, Liquids, 3D printing
J. Micro/Nanolith. MEMS MOEMS 15(3), 031603 (17 August 2016) https://doi.org/10.1117/1.JMM.15.3.031603
TOPICS: Directed self assembly, Polymethylmethacrylate, Atomic force microscopy, Critical dimension metrology, System on a chip, Optical lithography, Semiconducting wafers, Etching, Silicon, Photomasks
J. Micro/Nanolith. MEMS MOEMS 15(3), 031604 (25 August 2016) https://doi.org/10.1117/1.JMM.15.3.031604
TOPICS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma
J. Micro/Nanolith. MEMS MOEMS 15(3), 031605 (13 September 2016) https://doi.org/10.1117/1.JMM.15.3.031605
TOPICS: Directed self assembly, Etching, Optical lithography, Process modeling, Capacitors, Device simulation, 3D modeling, Polymers, Virtual reality, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 15(3), 031606 (8 September 2016) https://doi.org/10.1117/1.JMM.15.3.031606
TOPICS: Data conversion, Vestigial sideband modulation, Lithography, Scanning electron microscopy, Silicon, Microrings, Electron beam lithography, Data processing, Very large scale integration, Edge roughness
J. Micro/Nanolith. MEMS MOEMS 15(3), 031607 (6 September 2016) https://doi.org/10.1117/1.JMM.15.3.031607
TOPICS: Plasma, Lithography, Nanoparticles, Nanocrystals, Photomasks, Plasma etching, Polymers, Etching, Copper, Hybrid fiber optics
J. Micro/Nanolith. MEMS MOEMS 15(3), 031608 (8 September 2016) https://doi.org/10.1117/1.JMM.15.3.031608
TOPICS: Waveguides, Fabrication, Photonic crystals, Nanolithography, Optical lithography, Etching, Reactive ion etching, Silicon, Structural design, Ion beams
J. Micro/Nanolith. MEMS MOEMS 15(3), 031609 (29 September 2016) https://doi.org/10.1117/1.JMM.15.3.031609
TOPICS: Carbon, Etching, Optical lithography, Critical dimension metrology, Phase only filters, Photomasks, Yield improvement, Failure analysis, Error analysis, Lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 031610 (29 September 2016) https://doi.org/10.1117/1.JMM.15.3.031610
TOPICS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 15(3), 031611 (29 September 2016) https://doi.org/10.1117/1.JMM.15.3.031611
TOPICS: Lithography, Near field, Optical lithography, Image quality, Photomasks, Finite-difference time-domain method, Photoresist materials, Near field optics, Nanolithography, 3D modeling
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 033501 (12 July 2016) https://doi.org/10.1117/1.JMM.15.3.033501
TOPICS: Photomasks, Extreme ultraviolet, Microscopes, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Modulation, Multilayers, Fiber optic illuminators, Nickel
J. Micro/Nanolith. MEMS MOEMS 15(3), 033502 (15 July 2016) https://doi.org/10.1117/1.JMM.15.3.033502
TOPICS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing
J. Micro/Nanolith. MEMS MOEMS 15(3), 033503 (26 July 2016) https://doi.org/10.1117/1.JMM.15.3.033503
TOPICS: Dielectrics, Optical lithography, Polymers, Semiconducting wafers, Ultraviolet radiation, Silicon, Solids, Thin films, Sodium, Near ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(3), 033504 (1 August 2016) https://doi.org/10.1117/1.JMM.15.3.033504
TOPICS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Reflectivity, Imaging systems, Logic, Semiconductors, Applied physics
J. Micro/Nanolith. MEMS MOEMS 15(3), 033505 (1 August 2016) https://doi.org/10.1117/1.JMM.15.3.033505
TOPICS: Diffraction gratings, Diffraction, Extreme ultraviolet, Photomasks, Iridium, Optical lithography, Electron beam lithography, Photoresist materials, Atomic layer deposition, Ions
J. Micro/Nanolith. MEMS MOEMS 15(3), 033506 (8 August 2016) https://doi.org/10.1117/1.JMM.15.3.033506
TOPICS: Absorption, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Photoresist materials, Chemically amplified resists, Polymethylmethacrylate, Metals, Silicon, Polymers
J. Micro/Nanolith. MEMS MOEMS 15(3), 033507 (23 August 2016) https://doi.org/10.1117/1.JMM.15.3.033507
TOPICS: Electrons, Extreme ultraviolet, Monte Carlo methods, Photons, Extreme ultraviolet lithography, Molybdenum, Absorption, Scattering, Lithography, Computer simulations
Metrology
J. Micro/Nanolith. MEMS MOEMS 15(3), 034001 (7 July 2016) https://doi.org/10.1117/1.JMM.15.3.034001
TOPICS: Detection and tracking algorithms, Scattering, X-rays, Genetic algorithms, Metrology, Computer simulations, Berkelium, Data modeling, Optimization (mathematics), Monte Carlo methods
J. Micro/Nanolith. MEMS MOEMS 15(3), 034002 (19 July 2016) https://doi.org/10.1117/1.JMM.15.3.034002
TOPICS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control
J. Micro/Nanolith. MEMS MOEMS 15(3), 034003 (18 August 2016) https://doi.org/10.1117/1.JMM.15.3.034003
TOPICS: Line width roughness, Fractal analysis, Extreme ultraviolet, Polymers, Diffusion, Scanning electron microscopy, Spatial frequencies, Photoresist materials, Extreme ultraviolet lithography, Polymethylmethacrylate
J. Micro/Nanolith. MEMS MOEMS 15(3), 034004 (23 August 2016) https://doi.org/10.1117/1.JMM.15.3.034004
TOPICS: Signal to noise ratio, Electrons, Monte Carlo methods, Silicon, Image processing, Scanning electron microscopy, Sensors, Inspection, Defect inspection, Defect detection
J. Micro/Nanolith. MEMS MOEMS 15(3), 034005 (26 August 2016) https://doi.org/10.1117/1.JMM.15.3.034005
TOPICS: Scanning electron microscopy, Line edge roughness, Carbon nanotubes, Atomic force microscope, Metrology, Atomic force microscopy, Standards development, Silicon, Manufacturing, Ion beams
J. Micro/Nanolith. MEMS MOEMS 15(3), 034006 (16 September 2016) https://doi.org/10.1117/1.JMM.15.3.034006
TOPICS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 15(3), 034501 (8 July 2016) https://doi.org/10.1117/1.JMM.15.3.034501
TOPICS: Nanowires, Polarization, Sensors, Photoresist processing, Nanoimprint lithography, Quantum efficiency, Plasma, Nanostructures, Personal digital assistants, Aluminum
J. Micro/Nanolith. MEMS MOEMS 15(3), 034502 (22 July 2016) https://doi.org/10.1117/1.JMM.15.3.034502
TOPICS: Polymethylmethacrylate, Silver, Magnesium, Silicon, Chromium, Gold, Transmittance, Infrared radiation, Electron beams, Etching
J. Micro/Nanolith. MEMS MOEMS 15(3), 034503 (9 August 2016) https://doi.org/10.1117/1.JMM.15.3.034503
TOPICS: Silicon, Surface roughness, Etching, Reactive ion etching, 3D microstructuring, Lithography, Semiconductor lasers, Grayscale lithography, Microfluidics, Microelectromechanical systems
J. Micro/Nanolith. MEMS MOEMS 15(3), 034504 (12 August 2016) https://doi.org/10.1117/1.JMM.15.3.034504
TOPICS: Silicon, Transistors, Integrated circuits, Metals, Capacitance, Spine, Semiconducting wafers, Etching, Lithography, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 15(3), 034505 (12 August 2016) https://doi.org/10.1117/1.JMM.15.3.034505
TOPICS: Polymers, Etching, Ion beams, Polymer multimode waveguides, Waveguides, Optical lithography, Gallium, Silicon, Single mode fibers, Optics manufacturing
J. Micro/Nanolith. MEMS MOEMS 15(3), 034506 (23 August 2016) https://doi.org/10.1117/1.JMM.15.3.034506
TOPICS: Polymers, Photoresist materials, Silicon, Reliability, Manufacturing, Nitrogen, Polymer thin films, Surface roughness, Phase modulation, Electroplating
J. Micro/Nanolith. MEMS MOEMS 15(3), 034507 (8 September 2016) https://doi.org/10.1117/1.JMM.15.3.034507
TOPICS: Quartz, Optical tweezers, Particles, Lithography, Photoresist materials, Polarization, Etching, Electron beam lithography, Submicron lithography, Chromium
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 15(3), 035001 (19 July 2016) https://doi.org/10.1117/1.JMM.15.3.035001
TOPICS: Sensors, Gyroscopes, Oscillators, Nickel, Prototyping, Capacitors, Microelectromechanical systems, Copper, Semiconducting wafers, Ceramics
J. Micro/Nanolith. MEMS MOEMS 15(3), 035002 (19 July 2016) https://doi.org/10.1117/1.JMM.15.3.035002
TOPICS: Actuators, Microfluidics, Nickel, Turbulence, Fluid dynamics, Liquids, Optical lithography, Printing, Scanning electron microscopy, Microfluidic imaging
J. Micro/Nanolith. MEMS MOEMS 15(3), 035003 (3 August 2016) https://doi.org/10.1117/1.JMM.15.3.035003
TOPICS: Mechanics, Silicon, Semiconducting wafers, Oxides, Microelectromechanical systems, Actuators, Motion analysis, Finite element methods, Numerical analysis, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 15(3), 035004 (9 September 2016) https://doi.org/10.1117/1.JMM.15.3.035004
TOPICS: Resonators, Semiconducting wafers, Silicon, Microelectromechanical systems, Polarization, Wafer bonding, Packaging, Etching, Resistance, Microfabrication
J. Micro/Nanolith. MEMS MOEMS 15(3), 035005 (28 September 2016) https://doi.org/10.1117/1.JMM.15.3.035005
TOPICS: Silicon carbide, Oxygen, Silicon, Remote sensing, Resistance, Silver, Chemical species, Lawrencium, Silicon films, Sputter deposition
Micro-optoelectromechanical Systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 15(3), 035501 (8 July 2016) https://doi.org/10.1117/1.JMM.15.3.035501
TOPICS: Microlens, Optical fibers, Free space optics, Silica, Beam propagation method, Refractive index, Optical simulations, Interfaces, GRIN lenses, Wave propagation
J. Micro/Nanolith. MEMS MOEMS 15(3), 035502 (21 September 2016) https://doi.org/10.1117/1.JMM.15.3.035502
TOPICS: Mirrors, Micromirrors, Laser irradiation, Spatial light modulators, Microelectromechanical systems, Transmission electron microscopy, Oxides, Pulsed laser operation, Optical lithography, Reflectivity
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