Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

Santosh Shaw; Kyle J. Miller; Julien L. Colaux; Ludovico Cademartiri

doi:10.1117/1.JMM.15.3.031607

6 September 2016 Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, Ludovico Cademartiri

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 15, Issue 3, 031607 (September 2016). https://doi.org/10.1117/1.JMM.15.3.031607

Abstract

We describe a lithographic approach—nanocrystal plasma polymerization-based lithography—in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.

Citation Download Citation

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, and Ludovico Cademartiri "Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 031607 (6 September 2016). https://doi.org/10.1117/1.JMM.15.3.031607

Published: 6 September 2016

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