Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 15 · NO. 4 | October 2016
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 15(4), 040101 (2 December 2016) https://doi.org/10.1117/1.JMM.15.4.040101
TOPICS: Image processing, Process modeling, Defense and security, Neuroimaging, Brain
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 15(4), 040501 (30 December 2016) https://doi.org/10.1117/1.JMM.15.4.040501
TOPICS: Gyroscopes, Reliability, Microelectromechanical systems, Laser Doppler velocimetry, Doppler effect, Electrodes, Epoxies, Glasses, Resonators, Semiconducting wafers
Lithography
J. Micro/Nanolith. MEMS MOEMS 15(4), 043501 (14 October 2016) https://doi.org/10.1117/1.JMM.15.4.043501
TOPICS: Lithography, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Metals, Critical dimension metrology, Semiconducting wafers, Line width roughness, Optical lithography, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 15(4), 043502 (17 October 2016) https://doi.org/10.1117/1.JMM.15.4.043502
TOPICS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Ultraviolet radiation, Diffraction, Electron beam lithography, Spatial coherence
J. Micro/Nanolith. MEMS MOEMS 15(4), 043503 (18 October 2016) https://doi.org/10.1117/1.JMM.15.4.043503
TOPICS: Directed self assembly, Optical lithography, Annealing, Picosecond phenomena, Critical dimension metrology, Scanning electron microscopy, Materials processing, Semiconducting wafers, Lithography, Molecular self-assembly
J. Micro/Nanolith. MEMS MOEMS 15(4), 043504 (21 October 2016) https://doi.org/10.1117/1.JMM.15.4.043504
TOPICS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 15(4), 043505 (27 October 2016) https://doi.org/10.1117/1.JMM.15.4.043505
TOPICS: Directed self assembly, Scanning electron microscopy, Etching, Resistance, Silicon, Polymethylmethacrylate, Critical dimension metrology, System on a chip, Semiconducting wafers, Lithography
J. Micro/Nanolith. MEMS MOEMS 15(4), 043506 (7 November 2016) https://doi.org/10.1117/1.JMM.15.4.043506
TOPICS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet
J. Micro/Nanolith. MEMS MOEMS 15(4), 043507 (18 November 2016) https://doi.org/10.1117/1.JMM.15.4.043507
TOPICS: Convolutional neural networks, Lithography, Inspection, Neural networks, Machine learning, Convolution, Feature extraction, Data modeling, Semiconductors, Calibration
J. Micro/Nanolith. MEMS MOEMS 15(4), 043508 (30 November 2016) https://doi.org/10.1117/1.JMM.15.4.043508
TOPICS: Critical dimension metrology, Lithographic illumination, Extreme ultraviolet lithography, Lithography, Tantalum, Photomasks, Diffraction, Extreme ultraviolet, Line width roughness, Image acquisition
J. Micro/Nanolith. MEMS MOEMS 15(4), 043509 (20 December 2016) https://doi.org/10.1117/1.JMM.15.4.043509
TOPICS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data
Metrology
J. Micro/Nanolith. MEMS MOEMS 15(4), 044001 (12 October 2016) https://doi.org/10.1117/1.JMM.15.4.044001
TOPICS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement
J. Micro/Nanolith. MEMS MOEMS 15(4), 044002 (13 October 2016) https://doi.org/10.1117/1.JMM.15.4.044002
TOPICS: Critical dimension metrology, Calibration, Transmission electron microscopy, Electron microscopes, Error analysis, Silicon, Line width roughness, Oxides, Statistical analysis, Standards development
J. Micro/Nanolith. MEMS MOEMS 15(4), 044003 (21 October 2016) https://doi.org/10.1117/1.JMM.15.4.044003
TOPICS: Finite element methods, Copper, Plasmons, 3D modeling, Plasmonics, Dielectrics, Surface plasmons, Metals, Statistical modeling, Magnetism
J. Micro/Nanolith. MEMS MOEMS 15(4), 044004 (25 October 2016) https://doi.org/10.1117/1.JMM.15.4.044004
TOPICS: Semiconducting wafers, Metrology, Optical lithography, Scatterometry, Critical dimension metrology, Finite element methods, Scatter measurement, Diffractive optical elements, Transmission electron microscopy, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 15(4), 044005 (7 December 2016) https://doi.org/10.1117/1.JMM.15.4.044005
TOPICS: Scatterometry, Diffraction gratings, Cameras, Polarization, Silicon, Semiconductors, Microscopes, Digital holography, Nanolithography, Holography
J. Micro/Nanolith. MEMS MOEMS 15(4), 044006 (15 December 2016) https://doi.org/10.1117/1.JMM.15.4.044006
TOPICS: Metrology, Scanning electron microscopy, Atomic force microscopy, Error analysis, Calibration, 3D metrology, Image segmentation, Optical proximity correction, Lithography, Composites
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 15(4), 044501 (17 October 2016) https://doi.org/10.1117/1.JMM.15.4.044501
TOPICS: Polymethylmethacrylate, Rapid manufacturing, Surface roughness, Prototyping, Photomasks, Nickel, Optical alignment, Single mode fibers, Connectors, Etching
J. Micro/Nanolith. MEMS MOEMS 15(4), 044502 (7 December 2016) https://doi.org/10.1117/1.JMM.15.4.044502
TOPICS: Glasses, Microfluidics, Interfaces, In vitro testing, Oxygen, Polymers, Animal model studies, Carbon, Silica, Sodium
J. Micro/Nanolith. MEMS MOEMS 15(4), 044503 (20 December 2016) https://doi.org/10.1117/1.JMM.15.4.044503
TOPICS: Composites, Field effect transistors, Interfaces, Nanostructuring, Anisotropy, Silver, Scanning electron microscopy, Carbon, Temperature metrology, Resistance
Microelectromechanical Systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 15(4), 045001 (6 October 2016) https://doi.org/10.1117/1.JMM.15.4.045001
TOPICS: Switches, Single point diamond turning, Microelectromechanical systems, Gold, Finite element methods, Photoresist materials, Metals, Capacitance, Etching
J. Micro/Nanolith. MEMS MOEMS 15(4), 045002 (14 October 2016) https://doi.org/10.1117/1.JMM.15.4.045002
TOPICS: Resonators, Sensors, Acoustics, Aluminum nitride, Temperature sensors, Photoresist materials, Temperature metrology, Sapphire, Quartz, Electrodes
J. Micro/Nanolith. MEMS MOEMS 15(4), 045003 (29 November 2016) https://doi.org/10.1117/1.JMM.15.4.045003
TOPICS: Mirrors, Microelectromechanical systems, Optical switching, Phased array optics, Error analysis, Switching, Electrodes, Sensors, Networks, Free space optics
J. Micro/Nanolith. MEMS MOEMS 15(4), 045004 (20 December 2016) https://doi.org/10.1117/1.JMM.15.4.045004
TOPICS: Transducers, Acoustics, Ultrasonics, Optical testing, Electrodes, Microelectromechanical systems, Motion analysis, Motion measurement, Fabrication, Silicon
J. Micro/Nanolith. MEMS MOEMS 15(4), 045005 (21 December 2016) https://doi.org/10.1117/1.JMM.15.4.045005
TOPICS: Mirrors, Acoustics, Microscopy, Ultrasonography, Magnetism, Optical scanning, Raster graphics, Silicon, Transducers, Reflectivity
Micro-optoelectromechanical systems MOEMS
J. Micro/Nanolith. MEMS MOEMS 15(4), 045501 (20 December 2016) https://doi.org/10.1117/1.JMM.15.4.045501
TOPICS: Mirrors, Micromirrors, Etching, Silicon, Optical lithography, Solids, Aluminum, Oxides, Optical components, Chemical elements
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