journal of micro nanolithography mems and moems
VOL. 15 · NO. 4 | October 2016
CONTENTS
Editorial
Chris Mack
J. Micro/Nanolith. MEMS MOEMS 15(4), 040101 (2 December 2016) doi:10.1117/1.JMM.15.4.040101
TOPICS: Image processing, Process modeling, Defense and security, Neuroimaging, Brain
JM3 Letters
Ankush Jain, Ram Gopal
J. Micro/Nanolith. MEMS MOEMS 15(4), 040501 (30 December 2016) doi:10.1117/1.JMM.15.4.040501
TOPICS: Gyroscopes, Reliability, Microelectromechanical systems, Laser Doppler velocimetry, Doppler effect, Electrodes, Epoxies, Glasses, Resonators, Semiconducting wafers
Lithography
Lijun Zhao, Yayi Wei, Tianchun Ye
J. Micro/Nanolith. MEMS MOEMS 15(4), 043501 (14 October 2016) doi:10.1117/1.JMM.15.4.043501
TOPICS: Lithography, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Metals, Critical dimension metrology, Semiconducting wafers, Line width roughness, Optical lithography, Line edge roughness
J. Micro/Nanolith. MEMS MOEMS 15(4), 043502 (17 October 2016) doi:10.1117/1.JMM.15.4.043502
TOPICS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Ultraviolet radiation, Diffraction, Electron beam lithography, Spatial coherence
J. Micro/Nanolith. MEMS MOEMS 15(4), 043503 (18 October 2016) doi:10.1117/1.JMM.15.4.043503
TOPICS: Directed self assembly, Optical lithography, Annealing, Picosecond phenomena, Critical dimension metrology, Scanning electron microscopy, Materials processing, Semiconducting wafers, Lithography, Molecular self-assembly
J. Micro/Nanolith. MEMS MOEMS 15(4), 043504 (21 October 2016) doi:10.1117/1.JMM.15.4.043504
TOPICS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing
Paulina Rincon-Delgadillo, Boon Teik Chan, Jan Doise, Marleen van der Veen, Nancy Heylen, Steven Demuynck, Juergen Boemmels, Roel Gronheid
J. Micro/Nanolith. MEMS MOEMS 15(4), 043505 (27 October 2016) doi:10.1117/1.JMM.15.4.043505
TOPICS: Directed self assembly, Scanning electron microscopy, Etching, Resistance, Silicon, Polymethylmethacrylate, Critical dimension metrology, System on a chip, Semiconducting wafers, Lithography
Ioannis Karageorgos, Julien Ryckaert, Roel Gronheid, Maryann Tung, H.-S. Philip Wong, Evangelos Karageorgos, Kris Croes, Joost Bekaert, Geert Vandenberghe, Michele Stucchi, Wim Dehaene
J. Micro/Nanolith. MEMS MOEMS 15(4), 043506 (7 November 2016) doi:10.1117/1.JMM.15.4.043506
TOPICS: Directed self assembly, Optical lithography, Metals, Photomasks, Lithography, Algorithm development, Immersion lithography, Molecular self-assembly, Electronic design automation, Extreme ultraviolet
Moojoon Shin, Jee-Hyong Lee
J. Micro/Nanolith. MEMS MOEMS 15(4), 043507 (18 November 2016) doi:10.1117/1.JMM.15.4.043507
TOPICS: Convolutional neural networks, Lithography, Inspection, Neural networks, Machine learning, Convolution, Feature extraction, Data modeling, Semiconductors, Calibration
J. Micro/Nanolith. MEMS MOEMS 15(4), 043508 (30 November 2016) doi:10.1117/1.JMM.15.4.043508
TOPICS: Critical dimension metrology, Lithographic illumination, Extreme ultraviolet lithography, Lithography, Tantalum, Photomasks, Diffraction, Extreme ultraviolet, Line width roughness, Image acquisition
J. Micro/Nanolith. MEMS MOEMS 15(4), 043509 (20 December 2016) doi:10.1117/1.JMM.15.4.043509
TOPICS: Photoresist processing, Photomasks, Critical dimension metrology, Lithography, Semiconducting wafers, Electroluminescence, Process modeling, Optimization (mathematics), Refractive index, Binary data
Metrology
J. Micro/Nanolith. MEMS MOEMS 15(4), 044001 (12 October 2016) doi:10.1117/1.JMM.15.4.044001
TOPICS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement
Ndubuisi G. Orji, Ronald Dixson, Domingo Garcia-Gutierrez, Benjamin Bunday, Michael Bishop, Michael Cresswell, Richard Allen, John A. Allgair
J. Micro/Nanolith. MEMS MOEMS 15(4), 044002 (13 October 2016) doi:10.1117/1.JMM.15.4.044002
TOPICS: Critical dimension metrology, Calibration, Transmission electron microscopy, Electron microscopes, Error analysis, Silicon, Line width roughness, Oxides, Statistical analysis, Standards development
J. Micro/Nanolith. MEMS MOEMS 15(4), 044003 (21 October 2016) doi:10.1117/1.JMM.15.4.044003
TOPICS: Finite element methods, Copper, Plasmons, 3D modeling, Plasmonics, Dielectrics, Surface plasmons, Metals, Statistical modeling, Magnetism
J. Micro/Nanolith. MEMS MOEMS 15(4), 044004 (25 October 2016) doi:10.1117/1.JMM.15.4.044004
TOPICS: Semiconducting wafers, Metrology, Optical lithography, Scatterometry, Critical dimension metrology, Finite element methods, Scatter measurement, Diffractive optical elements, Transmission electron microscopy, Reactive ion etching
J. Micro/Nanolith. MEMS MOEMS 15(4), 044005 (7 December 2016) doi:10.1117/1.JMM.15.4.044005
TOPICS: Scatterometry, Diffraction gratings, Cameras, Polarization, Silicon, Semiconductors, Microscopes, Digital holography, Nanolithography, Holography
J. Micro/Nanolith. MEMS MOEMS 15(4), 044006 (15 December 2016) doi:10.1117/1.JMM.15.4.044006
TOPICS: Metrology, Scanning electron microscopy, Atomic force microscopy, Error analysis, Calibration, 3D metrology, Image segmentation, Optical proximity correction, Lithography, Composites
Microfabrication
Evert Ebraert, Berkcan Gökçe, Sandra Van Vlierberghe, Michael Vervaeke, Pascal Meyer, Markus Guttmann, Peter Dubruel, Hugo Thienpont, Jürgen Van Erps
J. Micro/Nanolith. MEMS MOEMS 15(4), 044501 (17 October 2016) doi:10.1117/1.JMM.15.4.044501
TOPICS: Polymethylmethacrylate, Rapid manufacturing, Surface roughness, Prototyping, Photomasks, Nickel, Optical alignment, Single mode fibers, Connectors, Etching
Kyall Pocock, Xiaofang Gao, Chenxi Wang, Craig Priest, Clive Prestidge, Kazuma Mawatari, Takehiko Kitamori, Benjamin Thierry
J. Micro/Nanolith. MEMS MOEMS 15(4), 044502 (7 December 2016) doi:10.1117/1.JMM.15.4.044502
TOPICS: Glasses, Microfluidics, Interfaces, In vitro testing, Oxygen, Polymers, Animal model studies, Carbon, Silica, Sodium
Tien-Chan Chang, Yiin-Kuen Fuh, Rui-Zhong Lee, Li-Yuan Liu, Yueh-Mu Lee
J. Micro/Nanolith. MEMS MOEMS 15(4), 044503 (20 December 2016) doi:10.1117/1.JMM.15.4.044503
TOPICS: Composites, Field effect transistors, Interfaces, Nanostructuring, Anisotropy, Silver, Scanning electron microscopy, Carbon, Temperature metrology, Resistance
Microelectromechanical Systems (MEMS)
Prem Kumar, Deepak Bansal, Anuroop Bajpai, Maninder Kaur, Kamaljit Rangra
J. Micro/Nanolith. MEMS MOEMS 15(4), 045001 (6 October 2016) doi:10.1117/1.JMM.15.4.045001
TOPICS: Switches, Single point diamond turning, Microelectromechanical systems, Gold, Finite element methods, Photoresist materials, Metals, Capacitance, Etching
Jie Liu, Bin Yang, Jingquan Liu, Xiang Chen, Xiaolin Wang, Chunsheng Yang
J. Micro/Nanolith. MEMS MOEMS 15(4), 045002 (14 October 2016) doi:10.1117/1.JMM.15.4.045002
TOPICS: Resonators, Sensors, Acoustics, Aluminum nitride, Temperature sensors, Photoresist materials, Temperature metrology, Sapphire, Quartz, Electrodes
Naru Nemoto, Joji Yamaguchi
J. Micro/Nanolith. MEMS MOEMS 15(4), 045003 (29 November 2016) doi:10.1117/1.JMM.15.4.045003
TOPICS: Mirrors, Microelectromechanical systems, Optical switching, Phased array optics, Error analysis, Switching, Electrodes, Sensors, Networks, Free space optics
Arezoo Emadi, Douglas Buchanan
J. Micro/Nanolith. MEMS MOEMS 15(4), 045004 (20 December 2016) doi:10.1117/1.JMM.15.4.045004
TOPICS: Transducers, Acoustics, Ultrasonics, Optical testing, Electrodes, Microelectromechanical systems, Motion analysis, Motion measurement, Fabrication, Silicon
J. Micro/Nanolith. MEMS MOEMS 15(4), 045005 (21 December 2016) doi:10.1117/1.JMM.15.4.045005
TOPICS: Mirrors, Acoustics, Microscopy, Ultrasonography, Magnetism, Optical scanning, Raster graphics, Silicon, Transducers, Reflectivity
Micro-optoelectromechanical systems MOEMS
J. Micro/Nanolith. MEMS MOEMS 15(4), 045501 (20 December 2016) doi:10.1117/1.JMM.15.4.045501
TOPICS: Mirrors, Micromirrors, Etching, Silicon, Optical lithography, Solids, Aluminum, Oxides, Optical components, Chemical elements
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