21 October 2016 Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations
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Abstract
Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence. Baseline simulations on simple samples are provided for comparison and determination of FEM accuracy.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2016/$25.00 © 2016 SPIE
Samuel O’Mullane, Nick Keller, and Alain C. Diebold "Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations," Journal of Micro/Nanolithography, MEMS, and MOEMS 15(4), 044003 (21 October 2016). https://doi.org/10.1117/1.JMM.15.4.044003
Published: 21 October 2016
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Finite element methods

Copper

Plasmons

3D modeling

Plasmonics

Dielectrics

Surface plasmons

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