journal of micro nanolithography mems and moems
VOL. 16 · NO. 1 | January 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(1), 010102 (22 February 2017) https://doi.org/10.1117/1.JMM.16.1.010102
TOPICS: Lithium, Microelectromechanical systems, Alternate lighting of surfaces, Chaos, Fluctuations and noise, Microopto electromechanical systems, Mendelevium, Baryon acoustic oscillations, Holmium, Sun
Letters
J. Micro/Nanolith. MEMS MOEMS 16(1), 010501 (5 January 2017) https://doi.org/10.1117/1.JMM.16.1.010501
TOPICS: Error analysis, Line edge roughness, Line width roughness, Statistical analysis, Metrology, Edge roughness, Fourier transforms, Roads, Lithography, Stochastic processes
Lithography
Tobias Schröter, Frieder Koch, Pascal Meyer, Martin Baumann, Daniel Münch, Danays Kunka, Sabine Engelhardt, Marcus Zuber, Tilo Baumbach, Jürgen Mohr
J. Micro/Nanolith. MEMS MOEMS 16(1), 013501 (12 January 2017) https://doi.org/10.1117/1.JMM.16.1.013501
TOPICS: Photomasks, X-rays, X-ray imaging, Synchrotrons, Scanners, Visibility, Gold, Sensors, Phase shifts, Interferometers
J. Micro/Nanolith. MEMS MOEMS 16(1), 013502 (7 February 2017) https://doi.org/10.1117/1.JMM.16.1.013502
TOPICS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Fin field effect transitor, Photomasks, 3D modeling, Computational lithography, Optical proximity correction
Rituraj Singh Rathore, Rajneesh Sharma, Ashwani Rana
J. Micro/Nanolith. MEMS MOEMS 16(1), 013503 (16 February 2017) https://doi.org/10.1117/1.JMM.16.1.013503
TOPICS: Field effect transistors, Fin field effect transitor, Line edge roughness, Optical lithography, Doping, Metals, Oxides, Tin, Statistical analysis, Calibration
J. Micro/Nanolith. MEMS MOEMS 16(1), 013504 (16 March 2017) https://doi.org/10.1117/1.JMM.16.1.013504
TOPICS: Signal to noise ratio, Interference (communication), Inspection, Speckle, Extreme ultraviolet, Optical design, Cameras, Defect detection, Speckle pattern, Photomasks
J. Micro/Nanolith. MEMS MOEMS 16(1), 013505 (28 March 2017) https://doi.org/10.1117/1.JMM.16.1.013505
TOPICS: Photomasks, Extreme ultraviolet, Lithography, Legal, Electron beam lithography, Germanium, Surface plasmons, Optical lithography, Double patterning technology, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(1), 014001 (8 February 2017) https://doi.org/10.1117/1.JMM.16.1.014001
TOPICS: Scattering, Fin field effect transitor, Laser scattering, Silicon, X-rays, Sensors, X-ray sources, Synchrotrons, Semiconductors, Dimensional metrology
Microfabrication
Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, Jenq-Huey Shyu
J. Micro/Nanolith. MEMS MOEMS 16(1), 014501 (28 January 2017) https://doi.org/10.1117/1.JMM.16.1.014501
TOPICS: Etching, Electroplating, Silicon, Copper, Gold, Electrochemical etching, Hydrogen, Metals, Photoresist materials, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 16(1), 014502 (1 February 2017) https://doi.org/10.1117/1.JMM.16.1.014502
TOPICS: Metals, Etching, Silicon, Nanostructures, Gold, Nanolithography, Scanning electron microscopy, Anisotropy, Wet etching, Oxides
Microelectromechanical systems (MEMS)
Li Jingmin, Li Xia, Liu Ziyang, Liang Chao, Liu Chong
J. Micro/Nanolith. MEMS MOEMS 16(1), 015001 (2 January 2017) https://doi.org/10.1117/1.JMM.16.1.015001
TOPICS: Liquids, Microfluidics, Point-of-care devices, Silicon, Polymethylmethacrylate, Adhesives, Lithium, Temperature metrology, Chaos, Quantitative analysis
Chengyang Wang, Jiandong Jin, Yuling Li, Wenbo Ding, Mingjun Dai
J. Micro/Nanolith. MEMS MOEMS 16(1), 015002 (6 January 2017) https://doi.org/10.1117/1.JMM.16.1.015002
TOPICS: Gas sensors, Sensors, Microelectromechanical systems, Silicon, Resistance, Platinum, Computer simulations, Infrared cameras, Thermography, Electrodes
Leonid S. Sinev, Vladimir T. Ryabov
J. Micro/Nanolith. MEMS MOEMS 16(1), 015003 (23 January 2017) https://doi.org/10.1117/1.JMM.16.1.015003
TOPICS: Glasses, Silicon, Semiconducting wafers, Estimation theory, Temperature metrology, Finite element methods, Wafer bonding, Thermal modeling, Borosilicate glass, Silicon films
Micro-optoelectromechanical systems (MOEMS)
Hui Zuo, Farzad Hossein Nia, Siyuan He
J. Micro/Nanolith. MEMS MOEMS 16(1), 015501 (24 February 2017) https://doi.org/10.1117/1.JMM.16.1.015501
TOPICS: Micromirrors, Fluctuations and noise, Mirrors, Laser scanners, 3D scanning, Actuators, Metals, Prototyping, Lens design, Signal generators
Errata
Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, Jenq-Huey Shyu
J. Micro/Nanolith. MEMS MOEMS 16(1), 019801 (16 February 2017) https://doi.org/10.1117/1.JMM.16.1.019801
TOPICS: Electrochemical etching, Electroplating, Mechanical engineering
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