16 February 2017 Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating
Author Affiliations +
Abstract
This PDF file contains the errata for “JM3 Vol. 16 Issue 01 Paper JM3-2017-0203-ERR” for JM3 Vol. 16 Issue 01
Chuang, Yang, Wu, Sanchez, and Shyu: Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating

This article [J. Micro/Nanolith. MEMS MOEMS 16, 014501 (2017)] was originally published with an error in the title.

The term “through-silicon” appeared as “though-silicon.” All online versions of the article were corrected on 06 February 2017. The article appears correctly in print.

© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Ho-Chiao Chuang, Hsi-Min Yang, Cheng-Xiang Wu, Jorge Sanchez, Jenq-Huey Shyu, "Errata: Fabrication of through-silicon via arrays by photo-assisted electrochemical etching and supercritical electroplating," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(1), 019801 (16 February 2017). https://doi.org/10.1117/1.JMM.16.1.019801 . Submission:
JOURNAL ARTICLE
1 PAGES


SHARE
Back to Top