journal of micro nanolithography mems and moems
VOL. 16 · NO. 2 | April 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(2), 020101 (13 June 2017) doi:10.1117/1.JMM.16.2.020101
TOPICS: Polishing
Lithography
J. Micro/Nanolith. MEMS MOEMS 16(2), 023501 (7 April 2017) doi:10.1117/1.JMM.16.2.023501
TOPICS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection
J. Micro/Nanolith. MEMS MOEMS 16(2), 023502 (16 May 2017) doi:10.1117/1.JMM.16.2.023502
TOPICS: Signal to noise ratio, Extreme ultraviolet, Inspection, Defect detection, Interference (communication)
Donghan Ma, Shiwei Wang, Lijiang Zeng
J. Micro/Nanolith. MEMS MOEMS 16(2), 023503 (22 May 2017) doi:10.1117/1.JMM.16.2.023503
TOPICS: Interferometers, Mirrors, Wavefront aberrations, Diffraction gratings, Holographic interferometry, Holography, Lithography, Optics manufacturing, Optical components
Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy
J. Micro/Nanolith. MEMS MOEMS 16(2), 023504 (23 May 2017) doi:10.1117/1.JMM.16.2.023504
TOPICS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography
J. Micro/Nanolith. MEMS MOEMS 16(2), 023505 (12 June 2017) doi:10.1117/1.JMM.16.2.023505
TOPICS: Lithography, Statistical analysis, Stochastic processes, Photons, Critical dimension metrology, Cadmium, Extreme ultraviolet lithography, Extreme ultraviolet, Quenching (fluorescence), Scanners
J. Micro/Nanolith. MEMS MOEMS 16(2), 023506 (14 June 2017) doi:10.1117/1.JMM.16.2.023506
TOPICS: Directed self assembly, Optical lithography, Immersion lithography, Photomasks, Integrated circuits, Lithography, Logic, Semiconducting wafers, Optical design, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 16(2), 023507 (14 June 2017) doi:10.1117/1.JMM.16.2.023507
TOPICS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, New and emerging technologies, Directed self assembly, Manufacturing, Photomasks
Casey M. Schwarz, Chris N. Grabill, Gerald D. Richardson, Shreya Labh, Anna M. Lewis, Aadit Vyas, Benn Gleason, Clara Rivero-Baleine, Kathleen A. Richardson, Alexej Pogrebnyakov, Theresa S. Mayer, Stephen M. Kuebler
J. Micro/Nanolith. MEMS MOEMS 16(2), 023508 (19 June 2017) doi:10.1117/1.JMM.16.2.023508
TOPICS: Multiphoton lithography, Arsenic, Etching, Multilayers, Chemical lasers, Modulation, Antireflective coatings, Nanostructuring, Nanostructures, Reflection
J. Micro/Nanolith. MEMS MOEMS 16(2), 023509 (19 June 2017) doi:10.1117/1.JMM.16.2.023509
TOPICS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles
Yu Zhang, Jarich Haitjema, Xiaomeng Liu, Fredrik Johansson, Andreas Lindblad, Sonia Castellanos, Niklas Ottosson, Albert Brouwer
J. Micro/Nanolith. MEMS MOEMS 16(2), 023510 (22 June 2017) doi:10.1117/1.JMM.16.2.023510
TOPICS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(2), 024001 (11 April 2017) doi:10.1117/1.JMM.16.2.024001
TOPICS: Directed self assembly, Line edge roughness, Line width roughness, Lithography, Metrology, Scanning electron microscopy, Silicon, Critical dimension metrology, Image segmentation, Picosecond phenomena
J. Micro/Nanolith. MEMS MOEMS 16(2), 024002 (17 May 2017) doi:10.1117/1.JMM.16.2.024002
TOPICS: Critical dimension metrology, Line edge roughness, Model-based design
J. Micro/Nanolith. MEMS MOEMS 16(2), 024003 (19 June 2017) doi:10.1117/1.JMM.16.2.024003
TOPICS: Calibration, Standards development, Atomic force microscopy, Atomic force microscope, Metrology, Contamination, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 16(2), 024004 (29 June 2017) doi:10.1117/1.JMM.16.2.024004
TOPICS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering
J. Micro/Nanolith. MEMS MOEMS 16(2), 024005 (30 June 2017) doi:10.1117/1.JMM.16.2.024005
TOPICS: Calibration, Atomic force microscopy, Metrology, Standards development, Critical dimension metrology, Semiconductors, Electron microscopes
Microfabrication
Bo-Yuan Chen, Jiann-Lin Chen, Chun-Lin Chu, Guangli Luo, Shyong Lee, Edward Yi Chang
J. Micro/Nanolith. MEMS MOEMS 16(2), 024501 (23 May 2017) doi:10.1117/1.JMM.16.2.024501
TOPICS: Transistors, Atomic layer deposition, Numerical simulations, Manufacturing, Semiconductors, Computational fluid dynamics, Systems modeling, Instrument modeling, Thermal modeling, Device simulation
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16(2), 025001 (7 April 2017) doi:10.1117/1.JMM.16.2.025001
TOPICS: Sensors, Silicon, Aluminum nitride, Semiconducting wafers, Silicon films, Electrodes, Electronics, Wafer bonding, Photomasks, Resonators
Raju Patel, Manishkumar Patel, Dharmendar Boolchandani, Kamaljit Rangra
J. Micro/Nanolith. MEMS MOEMS 16(2), 025002 (16 May 2017) doi:10.1117/1.JMM.16.2.025002
TOPICS: Resonators, Gas sensors, Acoustics, Finite element methods, Adsorption, Sensors, Zinc oxide, Reflectors, Molybdenum, Silica
Fubin Wang, Lihong Zhao, Yiliu Paul Tu, Yang Liu, Jian-xiong Chen
J. Micro/Nanolith. MEMS MOEMS 16(2), 025003 (27 June 2017) doi:10.1117/1.JMM.16.2.025003
TOPICS: Plasma, Femtosecond phenomena, Image analysis, Silicon, Semiconductor lasers, Semiconducting wafers, Image segmentation, Laser ablation, Diffraction, Micromachining
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 16(2), 025501 (7 April 2017) doi:10.1117/1.JMM.16.2.025501
TOPICS: Camera shutters, James Webb Space Telescope, Space telescopes, Optical fabrication, Magnetism, Telescopes, Microelectromechanical systems, Silicon, Aerospace engineering, Astronomical imaging
Maryam Ali Akbar Ganji, Reza Asadi
J. Micro/Nanolith. MEMS MOEMS 16(2), 025502 (1 June 2017) doi:10.1117/1.JMM.16.2.025502
TOPICS: Waveguides, Sensors, Polarization, Refractive index, Photoelasticity, Channel waveguides, Crystals, Polarizers, Electronics, Diffusion
Chung-Han Chen, Chieh-Tse Huang, Yiin-Kuen Fuh
J. Micro/Nanolith. MEMS MOEMS 16(2), 025503 (15 June 2017) doi:10.1117/1.JMM.16.2.025503
TOPICS: Tissue optics, In situ metrology, Scanning electron microscopy, Binary data, Tissues
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