Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 16 · NO. 2 | April 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(2), 020101 (13 June 2017) https://doi.org/10.1117/1.JMM.16.2.020101
TOPICS: Polishing
Lithography
J. Micro/Nanolith. MEMS MOEMS 16(2), 023501 (7 April 2017) https://doi.org/10.1117/1.JMM.16.2.023501
TOPICS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection
J. Micro/Nanolith. MEMS MOEMS 16(2), 023502 (16 May 2017) https://doi.org/10.1117/1.JMM.16.2.023502
TOPICS: Signal to noise ratio, Extreme ultraviolet, Inspection, Defect detection, Interference (communication)
J. Micro/Nanolith. MEMS MOEMS 16(2), 023503 (22 May 2017) https://doi.org/10.1117/1.JMM.16.2.023503
TOPICS: Interferometers, Mirrors, Wavefront aberrations, Diffraction gratings, Holographic interferometry, Holography, Lithography, Optics manufacturing, Optical components
J. Micro/Nanolith. MEMS MOEMS 16(2), 023504 (23 May 2017) https://doi.org/10.1117/1.JMM.16.2.023504
TOPICS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography
J. Micro/Nanolith. MEMS MOEMS 16(2), 023505 (12 June 2017) https://doi.org/10.1117/1.JMM.16.2.023505
TOPICS: Lithography, Statistical analysis, Stochastic processes, Photons, Critical dimension metrology, Cadmium, Extreme ultraviolet lithography, Extreme ultraviolet, Quenching (fluorescence), Scanners
J. Micro/Nanolith. MEMS MOEMS 16(2), 023506 (14 June 2017) https://doi.org/10.1117/1.JMM.16.2.023506
TOPICS: Directed self assembly, Optical lithography, Immersion lithography, Photomasks, Integrated circuits, Lithography, Logic, Semiconducting wafers, Optical design, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 16(2), 023507 (14 June 2017) https://doi.org/10.1117/1.JMM.16.2.023507
TOPICS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, Directed self assembly, Manufacturing, Photomasks
J. Micro/Nanolith. MEMS MOEMS 16(2), 023508 (19 June 2017) https://doi.org/10.1117/1.JMM.16.2.023508
TOPICS: Multiphoton lithography, Arsenic, Etching, Multilayers, Chemical lasers, Modulation, Antireflective coatings, Nanostructuring, Nanostructures, Reflection
J. Micro/Nanolith. MEMS MOEMS 16(2), 023509 (19 June 2017) https://doi.org/10.1117/1.JMM.16.2.023509
TOPICS: Systems modeling, Data modeling, Lithography, Tolerancing, Binary data, Photomasks, Image transmission, Semiconductors, Reticles
J. Micro/Nanolith. MEMS MOEMS 16(2), 023510 (22 June 2017) https://doi.org/10.1117/1.JMM.16.2.023510
TOPICS: Deep ultraviolet, Hard x-rays, Photoemission spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Oxidation, Chemical species, Extreme ultraviolet, Absorption, 3D modeling
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(2), 024001 (11 April 2017) https://doi.org/10.1117/1.JMM.16.2.024001
TOPICS: Directed self assembly, Line edge roughness, Line width roughness, Lithography, Metrology, Scanning electron microscopy, Silicon, Critical dimension metrology, Image segmentation, Picosecond phenomena
J. Micro/Nanolith. MEMS MOEMS 16(2), 024002 (17 May 2017) https://doi.org/10.1117/1.JMM.16.2.024002
TOPICS: Critical dimension metrology, Line edge roughness, Model-based design
J. Micro/Nanolith. MEMS MOEMS 16(2), 024003 (19 June 2017) https://doi.org/10.1117/1.JMM.16.2.024003
TOPICS: Calibration, Standards development, Atomic force microscopy, Atomic force microscope, Metrology, Contamination, Electron microscopes
J. Micro/Nanolith. MEMS MOEMS 16(2), 024004 (29 June 2017) https://doi.org/10.1117/1.JMM.16.2.024004
TOPICS: Virtual colonoscopy, Scanning electron microscopy, Semiconducting wafers, Metrology, Image filtering
J. Micro/Nanolith. MEMS MOEMS 16(2), 024005 (30 June 2017) https://doi.org/10.1117/1.JMM.16.2.024005
TOPICS: Calibration, Atomic force microscopy, Metrology, Standards development, Critical dimension metrology, Semiconductors, Electron microscopes
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 16(2), 024501 (23 May 2017) https://doi.org/10.1117/1.JMM.16.2.024501
TOPICS: Transistors, Atomic layer deposition, Numerical simulations, Manufacturing, Semiconductors, Computational fluid dynamics, Systems modeling, Instrument modeling, Thermal modeling, Device simulation
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16(2), 025001 (7 April 2017) https://doi.org/10.1117/1.JMM.16.2.025001
TOPICS: Sensors, Silicon, Aluminum nitride, Semiconducting wafers, Silicon films, Electrodes, Electronics, Wafer bonding, Photomasks, Resonators
J. Micro/Nanolith. MEMS MOEMS 16(2), 025002 (16 May 2017) https://doi.org/10.1117/1.JMM.16.2.025002
TOPICS: Resonators, Gas sensors, Acoustics, Finite element methods, Adsorption, Sensors, Zinc oxide, Reflectors, Molybdenum, Silica
J. Micro/Nanolith. MEMS MOEMS 16(2), 025003 (27 June 2017) https://doi.org/10.1117/1.JMM.16.2.025003
TOPICS: Plasma, Femtosecond phenomena, Image analysis, Silicon, Semiconductor lasers, Semiconducting wafers, Image segmentation, Laser ablation, Diffraction, Micromachining
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 16(2), 025501 (7 April 2017) https://doi.org/10.1117/1.JMM.16.2.025501
TOPICS: Camera shutters, James Webb Space Telescope, Space telescopes, Optical fabrication, Magnetism, Telescopes, Microelectromechanical systems, Silicon, Aerospace engineering, Astronomical imaging
J. Micro/Nanolith. MEMS MOEMS 16(2), 025502 (1 June 2017) https://doi.org/10.1117/1.JMM.16.2.025502
TOPICS: Waveguides, Sensors, Polarization, Refractive index, Photoelasticity, Channel waveguides, Crystals, Polarizers, Electronics, Diffusion
J. Micro/Nanolith. MEMS MOEMS 16(2), 025503 (15 June 2017) https://doi.org/10.1117/1.JMM.16.2.025503
TOPICS: Tissue optics, In situ metrology, Scanning electron microscopy, Binary data, Tissues
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