Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography

Casey M. Schwarz; Chris N. Grabill; Gerald D. Richardson; Shreya Labh; Anna M. Lewis; Aadit Vyas; Benn Gleason; Clara Rivero-Baleine; Kathleen A. Richardson; Alexej Pogrebnyakov; Theresa S. Mayer; Stephen M. Kuebler

doi:10.1117/1.JMM.16.2.023508

19 June 2017 Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography

Casey M. Schwarz, Chris N. Grabill, Gerald D. Richardson, Shreya Labh, Anna M. Lewis, Aadit Vyas, Benn Gleason, Clara Rivero-Baleine, Kathleen A. Richardson, Alexej Pogrebnyakov, Theresa S. Mayer, Stephen M. Kuebler

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 2, 023508 (June 2017). https://doi.org/10.1117/1.JMM.16.2.023508

Abstract

A detailed study of multiphoton lithography (MPL) in arsenic trisulfide ( As 2 S 3 ) films and the effects on nanoscale morphology, chemical networking, and the appearance of the resulting features by the chemical composition, deposition rate, etch processing, and inclusion of an antireflection (AR) layer of As 2 Se 3 between the substrate and the As 2 S 3 layer is reported. MPL was used to photo-pattern nanostructured arrays in single- and multilayer films. The variation in chemical composition for laser-exposed, UV-exposed, and unexposed films is correlated with the etch response, nanostructure formation, and deposition conditions. Reflection of the focused beam at the substrate back into the film produces standing wave interference that modulates the exposure with distance from the substrate and produces nanobead structures. The interference and the modulation can be controlled by the addition of an AR layer of As 2 Se 3 deposited between the substrate and the As 2 S 3 film. Relative to structures produced in a single-layer As 2 S 3 film having no AR layer, photo-patterning in the multilayer As 2 S 3 -on- As 2

Citation Download Citation

Casey M. Schwarz, Chris N. Grabill, Gerald D. Richardson, Shreya Labh, Anna M. Lewis, Aadit Vyas, Benn Gleason, Clara Rivero-Baleine, Kathleen A. Richardson, Alexej Pogrebnyakov, Theresa S. Mayer, and Stephen M. Kuebler "Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(2), 023508 (19 June 2017). https://doi.org/10.1117/1.JMM.16.2.023508

Received: 3 March 2017; Accepted: 26 May 2017; Published: 19 June 2017

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available