Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 16 · NO. 3 | July 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(3), 030101 (20 September 2017) https://doi.org/10.1117/1.JMM.16.3.030101
TOPICS: Information security, Databases
Lithography
J. Micro/Nanolith. MEMS MOEMS 16(3), 033501 (30 June 2017) https://doi.org/10.1117/1.JMM.16.3.033501
TOPICS: Nanolithography, Metals, Gold, Nickel, Nanoimprint lithography, Nanotechnology, Etching, Optical storage, Biosensing, Optical components
J. Micro/Nanolith. MEMS MOEMS 16(3), 033503 (21 August 2017) https://doi.org/10.1117/1.JMM.16.3.033503
TOPICS: Directed self assembly, System on a chip, Picosecond phenomena, Polymethylmethacrylate, Optical lithography, Scanning electron microscopy, Polymers, Annealing, Semiconducting wafers, Lithography
J. Micro/Nanolith. MEMS MOEMS 16(3), 033504 (24 August 2017) https://doi.org/10.1117/1.JMM.16.3.033504
TOPICS: Lithography, Neural networks, Convolution, Neurons, Machine learning, Photomasks, Performance modeling, Feature extraction, Convolutional neural networks, Sensors
J. Micro/Nanolith. MEMS MOEMS 16(3), 033505 (24 August 2017) https://doi.org/10.1117/1.JMM.16.3.033505
TOPICS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 16(3), 033506 (28 August 2017) https://doi.org/10.1117/1.JMM.16.3.033506
TOPICS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing
J. Micro/Nanolith. MEMS MOEMS 16(3), 033507 (8 September 2017) https://doi.org/10.1117/1.JMM.16.3.033507
TOPICS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations
J. Micro/Nanolith. MEMS MOEMS 16(3), 033508 (12 September 2017) https://doi.org/10.1117/1.JMM.16.3.033508
TOPICS: Etching, Electron beam lithography, Polymethylmethacrylate, Nanofabrication, Double patterning technology, Reactive ion etching, Photoresist processing, Dry etching, Head, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 16(3), 033509 (13 September 2017) https://doi.org/10.1117/1.JMM.16.3.033509
TOPICS: Source mask optimization, Data modeling, Calibration, Photoresist processing, Semiconducting wafers, Wafer-level optics, Image processing, Electroluminescence, Critical dimension metrology, Diffusion
J. Micro/Nanolith. MEMS MOEMS 16(3), 033510 (15 September 2017) https://doi.org/10.1117/1.JMM.16.3.033510
TOPICS: Optical lithography, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Absorption, Silicon, Molecules, Chemical species
J. Micro/Nanolith. MEMS MOEMS 16(3), 033511 (20 September 2017) https://doi.org/10.1117/1.JMM.16.3.033511
TOPICS: Polymerization, Polymers, Optical simulations, Photoresist materials, 3D modeling, Direct write lithography, Nanoimprint lithography, Lithography, Calibration, Computer simulations
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(3), 034001 (22 August 2017) https://doi.org/10.1117/1.JMM.16.3.034001
TOPICS: Line edge roughness, Diode pumped solid state lasers, Statistical analysis, Error analysis, Signal to noise ratio, Metrology, Edge roughness, Scanning electron microscopy, Semiconductors, Resolution enhancement technologies
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 16(3), 034501 (10 July 2017) https://doi.org/10.1117/1.JMM.16.3.034501
TOPICS: Reactive ion etching, Etching, Silicon, Oxygen, Gases, Photoresist materials, Oxides
J. Micro/Nanolith. MEMS MOEMS 16(3), 034502 (4 August 2017) https://doi.org/10.1117/1.JMM.16.3.034502
J. Micro/Nanolith. MEMS MOEMS 16(3), 034503 (19 August 2017) https://doi.org/10.1117/1.JMM.16.3.034503
TOPICS: X-rays, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, X-ray characterization, Nanofabrication, Diffraction gratings, Photomasks, Diffraction
J. Micro/Nanolith. MEMS MOEMS 16(3), 034504 (1 September 2017) https://doi.org/10.1117/1.JMM.16.3.034504
TOPICS: Sensors, Etching, Quantum efficiency, Infrared radiation, Semiconducting wafers, Infrared photography, Photodetectors, Staring arrays, Optical instrument design, Absorption
J. Micro/Nanolith. MEMS MOEMS 16(3), 034505 (19 September 2017) https://doi.org/10.1117/1.JMM.16.3.034505
TOPICS: Computer aided design, Analytics, Neural networks, Semiconductors, Optical lithography, Machine learning, Network architectures, Neurons, Artificial neural networks, Evolutionary algorithms
J. Micro/Nanolith. MEMS MOEMS 16(3), 034506 (27 September 2017) https://doi.org/10.1117/1.JMM.16.3.034506
TOPICS: Polymethylmethacrylate, Liquids, Carbon monoxide, Capillaries, X-ray lithography, Photoresist materials, Microfluidics, Carbon dioxide, Microelectromechanical systems, Bioalcohols
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16(3), 035001 (20 July 2017) https://doi.org/10.1117/1.JMM.16.3.035001
TOPICS: Spatial resolution, Sensors, Capacitors, Device simulation, Detector development, Data analysis
J. Micro/Nanolith. MEMS MOEMS 16(3), 035002 (19 August 2017) https://doi.org/10.1117/1.JMM.16.3.035002
TOPICS: Dielectrics, Structural sensing, Signal attenuation, Information operations, Signal processing, Electrodes, Sensing systems, Magnesium, Microelectromechanical systems, Temperature metrology
Errata
J. Micro/Nanolith. MEMS MOEMS 16(3), 039801 (19 September 2017) https://doi.org/10.1117/1.JMM.16.3.039801
TOPICS: Lithography, Stochastic processes, Microelectromechanical systems, Microopto electromechanical systems
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