journal of micro nanolithography mems and moems
VOL. 16 · NO. 3 | July 2017
J. Micro/Nanolith. MEMS MOEMS 16(3), 030101 (20 September 2017) doi:10.1117/1.JMM.16.3.030101
TOPICS: Information security, Databases
Congying Fan, Xuelin Wang, Long Liu, Jian Zhang, Yushuang Cui, Peng Zhan, Changsheng Yuan, Haixiong Ge, Zhenlin Wang, Yanfeng Chen
J. Micro/Nanolith. MEMS MOEMS 16(3), 033501 (30 June 2017) doi:10.1117/1.JMM.16.3.033501
TOPICS: Nanolithography, Metals, Gold, Nickel, Nanoimprint lithography, Nanotechnology, Etching, Optical storage, Biosensing, Optical components
J. Micro/Nanolith. MEMS MOEMS 16(3), 033502 (25 July 2017) doi:10.1117/1.JMM.16.3.033502
J. Micro/Nanolith. MEMS MOEMS 16(3), 033503 (21 August 2017) doi:10.1117/1.JMM.16.3.033503
TOPICS: Directed self assembly, System on a chip, Picosecond phenomena, Polymethylmethacrylate, Optical lithography, Scanning electron microscopy, Polymers, Annealing, Semiconducting wafers, Lithography
J. Micro/Nanolith. MEMS MOEMS 16(3), 033504 (24 August 2017) doi:10.1117/1.JMM.16.3.033504
TOPICS: Lithography, Neural networks, Convolution, Neurons, Machine learning, Photomasks, Performance modeling, Feature extraction, Convolutional neural networks, Sensors
J. Micro/Nanolith. MEMS MOEMS 16(3), 033505 (24 August 2017) doi:10.1117/1.JMM.16.3.033505
TOPICS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing
J. Micro/Nanolith. MEMS MOEMS 16(3), 033506 (28 August 2017) doi:10.1117/1.JMM.16.3.033506
TOPICS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing
J. Micro/Nanolith. MEMS MOEMS 16(3), 033507 (8 September 2017) doi:10.1117/1.JMM.16.3.033507
TOPICS: Photoresist materials, Maskless lithography, Lithography, Convolution, Optimization (mathematics), Photoresist developing, Process modeling, Matrices, Model-based design, Optical simulations
Jinhai Shao, Jianan Deng, W. Lu, Yifang Chen
J. Micro/Nanolith. MEMS MOEMS 16(3), 033508 (12 September 2017) doi:10.1117/1.JMM.16.3.033508
TOPICS: Etching, Electron beam lithography, Polymethylmethacrylate, Nanofabrication, Double patterning technology, Reactive ion etching, Photoresist processing, Dry etching, Head, Scanning electron microscopy
Lijun Zhao, Lisong Dong, Wenhui Chen, Yayi Wei, Tianchun Ye, Liwan Yue, Yuntao Jiang, Qiang Wu
J. Micro/Nanolith. MEMS MOEMS 16(3), 033509 (13 September 2017) doi:10.1117/1.JMM.16.3.033509
TOPICS: Source mask optimization, Data modeling, Calibration, Photoresist processing, Semiconducting wafers, Wafer-level optics, Image processing, Electroluminescence, Critical dimension metrology, Diffusion
J. Micro/Nanolith. MEMS MOEMS 16(3), 033510 (15 September 2017) doi:10.1117/1.JMM.16.3.033510
TOPICS: Optical lithography, Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Absorption, Silicon, Molecules, Chemical species
Temitope Onanuga, Maximilian Rumler, Andreas Erdmann
J. Micro/Nanolith. MEMS MOEMS 16(3), 033511 (20 September 2017) doi:10.1117/1.JMM.16.3.033511
TOPICS: Polymerization, Polymers, Optical simulations, Photoresist materials, 3D modeling, Direct write lithography, Nanoimprint lithography, Lithography, Calibration, Computer simulations
J. Micro/Nanolith. MEMS MOEMS 16(3), 034001 (22 August 2017) doi:10.1117/1.JMM.16.3.034001
TOPICS: Line edge roughness, Diode pumped solid state lasers, Statistical analysis, Error analysis, Signal to noise ratio, Metrology, Edge roughness, Scanning electron microscopy, Semiconductors, Resolution enhancement technologies
Mohammed Ashraf, Sree Sundararajan, Gianluca Grenci
J. Micro/Nanolith. MEMS MOEMS 16(3), 034501 (10 July 2017) doi:10.1117/1.JMM.16.3.034501
TOPICS: Reactive ion etching, Etching, Silicon, Oxygen, Gases, Photoresist materials, Oxides
Wenhe Zhou, Xuan He, Jianyun Wu, Liang-Bi Wang, Liangcheng Wang
J. Micro/Nanolith. MEMS MOEMS 16(3), 034502 (4 August 2017) doi:10.1117/1.JMM.16.3.034502
Xiaoli Zhu, Hailiang Li, Leifeng Cao, Shenye Liu, Peixiong Shi, Changqing Xie
J. Micro/Nanolith. MEMS MOEMS 16(3), 034503 (19 August 2017) doi:10.1117/1.JMM.16.3.034503
TOPICS: X-rays, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, X-ray characterization, Nanofabrication, Diffraction gratings, Photomasks, Diffraction
J. Micro/Nanolith. MEMS MOEMS 16(3), 034504 (1 September 2017) doi:10.1117/1.JMM.16.3.034504
TOPICS: Sensors, Etching, Quantum efficiency, Infrared radiation, Semiconducting wafers, Infrared photography, Photodetectors, Staring arrays, Optical instrument design, Absorption
J. Micro/Nanolith. MEMS MOEMS 16(3), 034505 (19 September 2017) doi:10.1117/1.JMM.16.3.034505
TOPICS: Computer aided design, Analytics, Neural networks, Semiconductors, Optical lithography, Machine learning, Network architectures, Neurons, Artificial neural networks, Evolutionary algorithms
Rahul Shukla, Lala Abhinandan, Shivdutt Sharma
J. Micro/Nanolith. MEMS MOEMS 16(3), 034506 (27 September 2017) doi:10.1117/1.JMM.16.3.034506
TOPICS: Polymethylmethacrylate, Liquids, Carbon monoxide, Capillaries, X-ray lithography, Photoresist materials, Microfluidics, Carbon dioxide, Microelectromechanical systems, Bioalcohols
Microelectromechanical systems (MEMS)
Mochtar Chandra, Shi-Yu Ke, Rongshun Chen, Cheng-Yao Lo
J. Micro/Nanolith. MEMS MOEMS 16(3), 035001 (20 July 2017) doi:10.1117/1.JMM.16.3.035001
TOPICS: Spatial resolution, Sensors, Capacitors, Device simulation, Detector development, Data analysis
Hao Qu, Huijun Yu, Bei Peng, Peng Peng, Hao Wang, Xiaoping He, Wu Zhou
J. Micro/Nanolith. MEMS MOEMS 16(3), 035002 (19 August 2017) doi:10.1117/1.JMM.16.3.035002
TOPICS: Dielectrics, Structural sensing, Signal attenuation, Information operations, Signal processing, Electrodes, Sensing systems, Magnesium, Microelectromechanical systems, Temperature metrology
J. Micro/Nanolith. MEMS MOEMS 16(3), 039801 (19 September 2017) doi:10.1117/1.JMM.16.3.039801
TOPICS: Lithography, Stochastic processes, Microelectromechanical systems, Microopto electromechanical systems
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