19 September 2017 Lithographic Stochastics: Beyond 3σ (erratum)
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Abstract
This article corrects an error in the original publication.
Bristol and Krysak: Lithographic Stochastics: Beyond 3σ (erratum)

Equation 4 of the article [J. Micro/Nanolithography, MEMS, and MOEMS 16(2), 023505 (12 June 2017)] contains an error. The correct version is below. The authors wish to thank Chris Mack for pointing this out. All online versions of the article were corrected on 11 September 2017.

(4)

CD(D)=22·τln(D/D0)

© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Robert L. Bristol, Marie E. Krysak, "Lithographic Stochastics: Beyond 3σ (erratum)," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 039801 (19 September 2017). https://doi.org/10.1117/1.JMM.16.3.039801
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