journal of micro nanolithography mems and moems
VOL. 16 · NO. 4 | October 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(4), 040101 (2 November 2017) doi:10.1117/1.JMM.16.4.040101
TOPICS: Transparency, Americium
Special Section on Extreme Ultraviolet Lithography for the 3-nm Node and Beyond
J. Micro/Nanolith. MEMS MOEMS 16(4), 041002 (1 August 2017) doi:10.1117/1.JMM.16.4.041002
J. Micro/Nanolith. MEMS MOEMS 16(4), 041003 (27 July 2017) doi:10.1117/1.JMM.16.4.041003
J. Micro/Nanolith. MEMS MOEMS 16(4), 041004 (19 August 2017) doi:10.1117/1.JMM.16.4.041004
TOPICS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems
J. Micro/Nanolith. MEMS MOEMS 16(4), 041005 (19 August 2017) doi:10.1117/1.JMM.16.4.041005
TOPICS: Photomasks, Diffraction, Extreme ultraviolet, Computer simulations, Pellicles, Particles, Systems modeling, Waveguides, Imaging systems, 3D modeling
J. Micro/Nanolith. MEMS MOEMS 16(4), 041006 (1 September 2017) doi:10.1117/1.JMM.16.4.041006
TOPICS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films
Vasiliki Kosma, Kazuki Kasahara, Hong Xu, Jérémy Odent, Christopher Ober, Emmanuel Giannelis
J. Micro/Nanolith. MEMS MOEMS 16(4), 041007 (27 September 2017) doi:10.1117/1.JMM.16.4.041007
TOPICS: Photoresist materials, Zirconium, Optical lithography, FT-IR spectroscopy, Metals, Extreme ultraviolet lithography, Photoresist developing, Oxides, Deep ultraviolet, Electron beam lithography
J. Micro/Nanolith. MEMS MOEMS 16(4), 041008 (12 October 2017) doi:10.1117/1.JMM.16.4.041008
TOPICS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing
Erik Hosler, Obert Wood, William Barletta
J. Micro/Nanolith. MEMS MOEMS 16(4), 041009 (30 October 2017) doi:10.1117/1.JMM.16.4.041009
TOPICS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators
J. Micro/Nanolith. MEMS MOEMS 16(4), 041010 (30 October 2017) doi:10.1117/1.JMM.16.4.041010
TOPICS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics
J. Micro/Nanolith. MEMS MOEMS 16(4), 041011 (24 November 2017) doi:10.1117/1.JMM.16.4.041011
TOPICS: Picosecond phenomena, Extreme ultraviolet, Free electron lasers, Laser applications, Optical amplifiers, Pulsed laser operation, Tin, Solid state lasers, Plasma, Gas lasers
Stuart Sherwin, Andrew Neureuther, Patrick Naulleau
J. Micro/Nanolith. MEMS MOEMS 16(4), 041012 (9 December 2017) doi:10.1117/1.JMM.16.4.041012
TOPICS: Photomasks, Etching, Extreme ultraviolet, Finite-difference time-domain method, Diffraction, Printing, Reflectivity, Extreme ultraviolet lithography, SRAF, Phase shifts
Lithography
J. Micro/Nanolith. MEMS MOEMS 16(4), 043501 (20 October 2017) doi:10.1117/1.JMM.16.4.043501
TOPICS: Directed self assembly, Thermodynamics, Polymers, Annealing, Nanoimprint lithography, Extreme ultraviolet lithography, Device simulation, Optical lithography, Semiconductors, Lithography
J. Micro/Nanolith. MEMS MOEMS 16(4), 043502 (27 October 2017) doi:10.1117/1.JMM.16.4.043502
TOPICS: Line edge roughness, Line width roughness, Optical lithography, Double patterning technology, Interfaces, Directed self assembly, Polymers, Polymerization, Etching, Chemical species
J. Micro/Nanolith. MEMS MOEMS 16(4), 043503 (7 November 2017) doi:10.1117/1.JMM.16.4.043503
TOPICS: Photomasks, Clocks, Data communications, Logic, Data compression, Telecommunications, Digital electronics, Image compression, Computer architecture, Video compression
J. Micro/Nanolith. MEMS MOEMS 16(4), 043504 (15 November 2017) doi:10.1117/1.JMM.16.4.043504
TOPICS: Photomasks, Optical lithography, Source mask optimization, SRAF, Detection and tracking algorithms, Photovoltaics, Semiconducting wafers, Optical proximity correction, Computer simulations, Model-based design
J. Micro/Nanolith. MEMS MOEMS 16(4), 043505 (22 November 2017) doi:10.1117/1.JMM.16.4.043505
TOPICS: Interfaces, Thin films, Polymers, Bridges, Optical lithography, Polymerization, Device simulation, Skin, Algorithms, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(4), 044001 (19 October 2017) doi:10.1117/1.JMM.16.4.044001
TOPICS: 3D modeling, Indium arsenide, Polarization, Data modeling, 3D acquisition, Metrology, 3D metrology, Optical fiber cables, Error analysis, Model-based design
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16(4), 045001 (6 October 2017) doi:10.1117/1.JMM.16.4.045001
TOPICS: Sensors, Capacitance, Oxides, Microelectromechanical systems, Modeling and simulation, Silicon, Electrodes, MATLAB, Mathematical modeling, Numerical simulations
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 16(4), 045501 (6 October 2017) doi:10.1117/1.JMM.16.4.045501
TOPICS: Silicon, Etching, Reflectivity, Semiconducting wafers, Cryogenics, Microopto electromechanical systems, Mirrors, Deformable mirrors, Dry etching, Imaging systems
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