Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 16 · NO. 4 | October 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16 (4), 040101 (2 November 2017) https://doi.org/10.1117/1.JMM.16.4.040101 Open Access
TOPICS: Transparency, Americium
Special Section on Extreme Ultraviolet Lithography for the 3-nm Node and Beyond
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041001 (27 December 2017) https://doi.org/10.1117/1.JMM.16.4.041001 Open Access
TOPICS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical lithography, Pellicles, Inspection, Optical proximity correction, Free electron lasers, Printing, Scanners
Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W. van de Kruijs, Arash Edrisi, Frank Scholze, Christian Laubis, Mathias Irmscher, Sandra Naasz, Christian Reuter, Eric Hendrickx
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041002 (1 August 2017) https://doi.org/10.1117/1.JMM.16.4.041002
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041003 (27 July 2017) https://doi.org/10.1117/1.JMM.16.4.041003
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041004 (19 August 2017) https://doi.org/10.1117/1.JMM.16.4.041004
TOPICS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041005 (19 August 2017) https://doi.org/10.1117/1.JMM.16.4.041005
TOPICS: Photomasks, Diffraction, Extreme ultraviolet, Computer simulations, Pellicles, Particles, Systems modeling, Waveguides, Imaging systems, 3D modeling
Yohei Ikebe, Hirofumi Kozakai, Tsutomu Shoki, Takahiro Onoue
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041006 (1 September 2017) https://doi.org/10.1117/1.JMM.16.4.041006
TOPICS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films
Vasiliki Kosma, Kazuki Kasahara, Hong Xu, Jérémy Odent, Christopher Ober, Emmanuel Giannelis
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041007 (27 September 2017) https://doi.org/10.1117/1.JMM.16.4.041007
TOPICS: Photoresist materials, Zirconium, Optical lithography, FT-IR spectroscopy, Metals, Extreme ultraviolet lithography, Photoresist developing, Oxides, Deep ultraviolet, Electron beam lithography
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041008 (12 October 2017) https://doi.org/10.1117/1.JMM.16.4.041008
TOPICS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing
Erik Hosler, Obert Wood II, William Barletta
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041009 (30 October 2017) https://doi.org/10.1117/1.JMM.16.4.041009
TOPICS: Free electron lasers, Extreme ultraviolet lithography, Electron beams, Extreme ultraviolet, Electrons, Lithography, Monochromators, Light sources, Scanners, Optical resonators
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041010 (30 October 2017) https://doi.org/10.1117/1.JMM.16.4.041010
TOPICS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Nanoimprint lithography, Projection systems, Wafer-level optics
Akira Endo, Martin Smrž, Jiří Mužík, Ondřej Novák, Michal Chyla, Tomáš Mocek
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041011 (24 November 2017) https://doi.org/10.1117/1.JMM.16.4.041011 Open Access
TOPICS: Picosecond phenomena, Extreme ultraviolet, Free electron lasers, Laser applications, Optical amplifiers, Pulsed laser operation, Tin, Solid state lasers, Plasma, Gas lasers
Stuart Sherwin, Andrew Neureuther, Patrick Naulleau
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041012 (9 December 2017) https://doi.org/10.1117/1.JMM.16.4.041012 Open Access
TOPICS: Photomasks, Etching, Extreme ultraviolet, Finite-difference time-domain method, Diffraction, Printing, Reflectivity, Extreme ultraviolet lithography, SRAF, Phase shifts
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041013 (29 December 2017) https://doi.org/10.1117/1.JMM.16.4.041013
TOPICS: Stochastic processes, Printing, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Scanning electron microscopy, Photomasks, Optical proximity correction, Inspection
J. Micro/Nanolith. MEMS MOEMS 16 (4), 041014 (29 December 2017) https://doi.org/10.1117/1.JMM.16.4.041014
TOPICS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers
Lithography
Benjamin Nation, Caleb Breaux, Peter Ludovice, Clifford Henderson
J. Micro/Nanolith. MEMS MOEMS 16 (4), 043501 (20 October 2017) https://doi.org/10.1117/1.JMM.16.4.043501 Open Access
TOPICS: Directed self assembly, Thermodynamics, Polymers, Annealing, Nanoimprint lithography, Extreme ultraviolet lithography, Device simulation, Optical lithography, Semiconductors, Lithography
Benjamin D. Nation, Andrew J. Peters, Richard A. Lawson, Peter J. Ludovice, Clifford L. Henderson
J. Micro/Nanolith. MEMS MOEMS 16 (4), 043502 (27 October 2017) https://doi.org/10.1117/1.JMM.16.4.043502
TOPICS: Line edge roughness, Line width roughness, Optical lithography, Double patterning technology, Interfaces, Directed self assembly, Polymers, Polymerization, Etching, Chemical species
Narendra Chaudhary, Serap Savari
J. Micro/Nanolith. MEMS MOEMS 16 (4), 043503 (7 November 2017) https://doi.org/10.1117/1.JMM.16.4.043503 Open Access
TOPICS: Photomasks, Clocks, Data communications, Logic, Data compression, Telecommunications, Digital electronics, Image compression, Computer architecture, Video compression
J. Micro/Nanolith. MEMS MOEMS 16 (4), 043504 (15 November 2017) https://doi.org/10.1117/1.JMM.16.4.043504
TOPICS: Photomasks, Optical lithography, Source mask optimization, SRAF, Detection and tracking algorithms, Photovoltaics, Semiconducting wafers, Optical proximity correction, Computer simulations, Model-based design
Benjamin Nation, Peter Ludovice, Clifford Henderson
J. Micro/Nanolith. MEMS MOEMS 16 (4), 043505 (22 November 2017) https://doi.org/10.1117/1.JMM.16.4.043505 Open Access
TOPICS: Interfaces, Thin films, Polymers, Bridges, Optical lithography, Polymerization, Device simulation, Skin, Algorithms, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 16 (4), 044001 (19 October 2017) https://doi.org/10.1117/1.JMM.16.4.044001
TOPICS: 3D modeling, Indium arsenide, Polarization, Data modeling, 3D acquisition, Metrology, 3D metrology, Optical fiber cables, Error analysis, Model-based design
Microfabrication
Muhamad Buyong, Farhad Larki, Yuzuru Takamura, Burhanuddin Yeop Majlis
J. Micro/Nanolith. MEMS MOEMS 16 (4), 044501 (23 December 2017) https://doi.org/10.1117/1.JMM.16.4.044501
TOPICS: Particles, Dielectrophoresis, Etching, Aluminum, Finite element methods, Electronic filtering, Device simulation, Electrodes, Photoresist processing, Scanning electron microscopy
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16 (4), 045001 (6 October 2017) https://doi.org/10.1117/1.JMM.16.4.045001
TOPICS: Sensors, Capacitance, Oxides, Microelectromechanical systems, Modeling and simulation, Silicon, Electrodes, MATLAB, Mathematical modeling, Numerical simulations
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 16 (4), 045501 (6 October 2017) https://doi.org/10.1117/1.JMM.16.4.045501
TOPICS: Silicon, Etching, Reflectivity, Semiconducting wafers, Cryogenics, Microopto electromechanical systems, Mirrors, Deformable mirrors, Dry etching, Imaging systems
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