Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 16 · NO. 1 | January 2017
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 16(1), 010102 (22 February 2017) https://doi.org/10.1117/1.JMM.16.1.010102
TOPICS: Lithium, Microelectromechanical systems, Alternate lighting of surfaces, Chaos, Fluctuations and noise, Microopto electromechanical systems, Mendelevium, Baryon acoustic oscillations, Holmium, Sun
Letters
J. Micro/Nanolith. MEMS MOEMS 16(1), 010501 (5 January 2017) https://doi.org/10.1117/1.JMM.16.1.010501
TOPICS: Error analysis, Line edge roughness, Line width roughness, Statistical analysis, Metrology, Edge roughness, Fourier transforms, Roads, Lithography, Stochastic processes
Lithography
J. Micro/Nanolith. MEMS MOEMS 16(1), 013501 (12 January 2017) https://doi.org/10.1117/1.JMM.16.1.013501
TOPICS: Photomasks, X-rays, X-ray imaging, Synchrotrons, Scanners, Visibility, Gold, Sensors, Phase shifts, Interferometers
J. Micro/Nanolith. MEMS MOEMS 16(1), 013502 (7 February 2017) https://doi.org/10.1117/1.JMM.16.1.013502
TOPICS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 16(1), 013503 (16 February 2017) https://doi.org/10.1117/1.JMM.16.1.013503
TOPICS: Field effect transistors, Line edge roughness, Optical lithography, Doping, Metals, Oxides, Tin, Statistical analysis, Calibration
J. Micro/Nanolith. MEMS MOEMS 16(1), 013504 (16 March 2017) https://doi.org/10.1117/1.JMM.16.1.013504
TOPICS: Signal to noise ratio, Interference (communication), Inspection, Speckle, Extreme ultraviolet, Optical design, Cameras, Defect detection, Speckle pattern, Photomasks
J. Micro/Nanolith. MEMS MOEMS 16(1), 013505 (28 March 2017) https://doi.org/10.1117/1.JMM.16.1.013505
TOPICS: Photomasks, Extreme ultraviolet, Lithography, Legal, Electron beam lithography, Germanium, Surface plasmons, Optical lithography, Double patterning technology, Directed self assembly
Metrology
J. Micro/Nanolith. MEMS MOEMS 16(1), 014001 (8 February 2017) https://doi.org/10.1117/1.JMM.16.1.014001
TOPICS: Scattering, Laser scattering, Silicon, X-rays, Sensors, X-ray sources, Synchrotrons, Semiconductors, Dimensional metrology
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 16(1), 014501 (28 January 2017) https://doi.org/10.1117/1.JMM.16.1.014501
TOPICS: Etching, Electroplating, Silicon, Copper, Gold, Electrochemical etching, Hydrogen, Metals, Photoresist materials, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 16(1), 014502 (1 February 2017) https://doi.org/10.1117/1.JMM.16.1.014502
TOPICS: Metals, Etching, Silicon, Nanostructures, Gold, Nanolithography, Scanning electron microscopy, Anisotropy, Wet etching, Oxides
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 16(1), 015001 (2 January 2017) https://doi.org/10.1117/1.JMM.16.1.015001
TOPICS: Liquids, Microfluidics, Point-of-care devices, Silicon, Polymethylmethacrylate, Adhesives, Lithium, Temperature metrology, Chaos, Quantitative analysis
J. Micro/Nanolith. MEMS MOEMS 16(1), 015002 (6 January 2017) https://doi.org/10.1117/1.JMM.16.1.015002
TOPICS: Gas sensors, Sensors, Microelectromechanical systems, Silicon, Resistance, Platinum, Computer simulations, Infrared cameras, Thermography, Electrodes
J. Micro/Nanolith. MEMS MOEMS 16(1), 015003 (23 January 2017) https://doi.org/10.1117/1.JMM.16.1.015003
TOPICS: Glasses, Silicon, Semiconducting wafers, Estimation theory, Temperature metrology, Finite element methods, Wafer bonding, Thermal modeling, Borosilicate glass, Silicon films
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 16(1), 015501 (24 February 2017) https://doi.org/10.1117/1.JMM.16.1.015501
TOPICS: Micromirrors, Fluctuations and noise, Mirrors, Laser scanners, 3D scanning, Actuators, Metals, Prototyping, Lens design, Signal generators
Errata
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