Lithographic Stochastics: Beyond 3σ (erratum)

19 September 2017 Lithographic Stochastics: Beyond 3σ (erratum)

Robert L. Bristol, Marie E. Krysak

Abstract

This article corrects an error in the original publication.

Equation 4 of the article [J. Micro/Nanolithography, MEMS, and MOEMS 16(2), 023505 (12 June 2017)] contains an error. The correct version is below. The authors wish to thank Chris Mack for pointing this out. All online versions of the article were corrected on 11 September 2017. Eq. (4) $C D (D) = 2 \sqrt{2} \cdot τ \sqrt{\ln (D / D_{0})}$

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Robert L. Bristol and Marie E. Krysak "Lithographic Stochastics: Beyond 3σ (erratum)," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 039801 (19 September 2017). https://doi.org/10.1117/1.JMM.16.3.039801

Published: 19 September 2017

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