journal of micro nanolithography mems and moems
VOL. 17 · NO. 1 | January 2018
J. Micro/Nanolith. MEMS MOEMS 17(1), 010101 (26 January 2018) doi:10.1117/1.JMM.17.1.010101
TOPICS: Data archive systems, Materials processing, Beryllium
J. Micro/Nanolith. MEMS MOEMS 17(1), 010102 (19 January 2018) doi:10.1117/1.JMM.17.1.010102
TOPICS: Lithium, Microelectromechanical systems, Microopto electromechanical systems, Sun, Fluctuations and noise
J. Micro/Nanolith. MEMS MOEMS 17(1), 013501 (2 January 2018) doi:10.1117/1.JMM.17.1.013501
TOPICS: Lithography, Nanolithography, Nanostructures, Gold, Fabrication, Chromium, Scanning electron microscopy, Optical lithography, Plasmonics, Edge roughness
Jingyu Wang, William Wilkinson
J. Micro/Nanolith. MEMS MOEMS 17(1), 013502 (2 January 2018) doi:10.1117/1.JMM.17.1.013502
TOPICS: Optical proximity correction, Back end of line, Semiconducting wafers, Optical lithography, Photomasks, Diffraction, Lithography, Lithographic illumination, Optical instrument design, Instrumentation engineering
Luca Mattii, Dragomir Milojevic, Peter Debacker, Mladen Berekovic, Syed Muhammad Yasser Sherazi, Bharani Chava, Marie Garcia Bardon, Pieter Schuddinck, Dimitrios Rodopoulos, Rogier Baert, Vassilios Gerousis, Julien Ryckaert, Praveen Raghavan
J. Micro/Nanolith. MEMS MOEMS 17(1), 013503 (18 January 2018) doi:10.1117/1.JMM.17.1.013503
TOPICS: Metals, Standards development, Electronic design automation, Optical lithography, Back end of line, Switching, CMOS technology, Lithography, Front end of line, Integrated circuit design
J. Micro/Nanolith. MEMS MOEMS 17(1), 013504 (25 January 2018) doi:10.1117/1.JMM.17.1.013504
TOPICS: Critical dimension metrology, Photoresist materials, Reflection, Fin field effect transistor, Printing, Silicon, Cadmium, Solids, Fin field effect transitor, 3D modeling
François Weisbuch, Andrey Lutich, Jirka Schatz
J. Micro/Nanolith. MEMS MOEMS 17(1), 013505 (6 March 2018) doi:10.1117/1.JMM.17.1.013505
TOPICS: Etching, Scanning electron microscopy, Data modeling, Optical proximity correction, Optical lithography, Performance modeling, Calibration, Anisotropic etching, Artificial neural networks, 3D modeling
Steven G. Hansen
J. Micro/Nanolith. MEMS MOEMS 17(1), 013506 (14 March 2018) doi:10.1117/1.JMM.17.1.013506
TOPICS: Stochastic processes, Photons, Photoresist processing, Data modeling, Line edge roughness, Photoresist materials, Semiconducting wafers, Critical dimension metrology, Quenching (fluorescence), Image processing
Rituraj Singh Rathore, Ashwani K. Rana
J. Micro/Nanolith. MEMS MOEMS 17(1), 013507 (19 March 2018) doi:10.1117/1.JMM.17.1.013507
Yi-Sha Ku, Wei-Ting Wang, Yi-Chang Chen, Ming-Chang Chen, Chia-Liang Yeh, Chun-Wei Lo
J. Micro/Nanolith. MEMS MOEMS 17(1), 014001 (24 February 2018) doi:10.1117/1.JMM.17.1.014001
TOPICS: Diffraction, Diffraction gratings, Extreme ultraviolet, Sensors, Charge-coupled devices, CCD cameras, Laser scattering, CCD image sensors, Scatterometry, Scanning electron microscopy
Zishan Ali Syed Mohammed, Poenar Daniel Puiu, Sheel Aditya
J. Micro/Nanolith. MEMS MOEMS 17(1), 014501 (9 January 2018) doi:10.1117/1.JMM.17.1.014501
TOPICS: Copper, Silicon, Resistance, Electroplating, Etching, Diffractive optical elements, Wet etching, Semiconducting wafers, Signal to noise ratio, Plating
Microelectromechanical systems (MEMS)
Zhiwei Kou, Jun Liu, Huiliang Cao, Ziqi Han, Yanan Sun, Yunbo Shi, Senxin Ren, Yingjie Zhang
J. Micro/Nanolith. MEMS MOEMS 17(1), 015001 (16 January 2018) doi:10.1117/1.JMM.17.1.015001
TOPICS: Gyroscopes, Resonators, Electrodes, Microelectromechanical systems, Silicon, Finite element methods, Glasses, Manufacturing, Prototyping, Semiconducting wafers
Bahram Azizollah Ganji, Sedighe Babaei Sedaghat, Alberto Roncaglia, Luca Belsito, Reza Ansari
J. Micro/Nanolith. MEMS MOEMS 17(1), 015002 (12 February 2018) doi:10.1117/1.JMM.17.1.015002
TOPICS: Semiconducting wafers, Silicon, Microelectromechanical systems, Etching, Photomasks, Acoustics, Photoresist materials, Oxides, Dry etching, Wet etching
Jose Joseph, Shiv Govind Singh, Siva Rama Krishna Vanjari
J. Micro/Nanolith. MEMS MOEMS 17(1), 015003 (14 February 2018) doi:10.1117/1.JMM.17.1.015003
TOPICS: Transducers, Etching, Semiconducting wafers, Finite element methods, Electrodes, Copper, Ultrasonics, Ultrasonography, Titanium, Acoustics
Banibrata Mukherjee, Kenkere Balashanthamurthy Mruthyunjaya Swamy, Siddhartha Sen
J. Micro/Nanolith. MEMS MOEMS 17(1), 015004 (5 March 2018) doi:10.1117/1.JMM.17.1.015004
TOPICS: Microactuators, Capacitance, Actuators, Silicon, Photomasks, Deep reactive ion etching, Calibration, MATLAB, Communication engineering, Statistical analysis
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 17(1), 015501 (25 January 2018) doi:10.1117/1.JMM.17.1.015501
TOPICS: Laser scanners, Laser optics, Actuators, 3D scanning, Optical simulations, Finite element methods, Microopto electromechanical systems, Refraction, Polygon scanners, Scalable video coding
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