journal of micro nanolithography mems and moems
VOL. 17 · NO. 2 | April 2018
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 17(2), 020101 (3 May 2018) https://doi.org/10.1117/1.JMM.17.2.020101
TOPICS: Stochastic processes, Lithography, Optical lithography, Photons, Molecules, Semiconductors, Materials processing, Metrology, Etching, Extreme ultraviolet lithography
Review Articles
J. Micro/Nanolith. MEMS MOEMS 17(2), 020901 (27 April 2018) https://doi.org/10.1117/1.JMM.17.2.020901
TOPICS: Reticles, Semiconductors, Sensors, Microelectronics, Manufacturing, Air contamination, Semiconductor manufacturing, Metals, Semiconducting wafers, Electric field sensors
Lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 023501 (11 April 2018) https://doi.org/10.1117/1.JMM.17.2.023501
TOPICS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography
Ling Ma, Qiang Wu, Lisong Dong, Qiaoqiao Li, Yayi Wei, Tianchun Ye
J. Micro/Nanolith. MEMS MOEMS 17(2), 023502 (23 April 2018) https://doi.org/10.1117/1.JMM.17.2.023502
TOPICS: Semiconducting wafers, Particles, Optical lithography, Nitrogen, Photomasks, Semiconductor manufacturing, Lithium, Lithography, Fluid dynamics, Photoresist materials
J. Micro/Nanolith. MEMS MOEMS 17(2), 023503 (28 April 2018) https://doi.org/10.1117/1.JMM.17.2.023503
TOPICS: Calibration, Data modeling, Process modeling, Autoregressive models, Lithography, Photomasks, Statistical modeling, Monte Carlo methods, Photoresist processing, Optical proximity correction
Jiyeah Rhie, Dukhyung Lee, Young-Mi Bahk, Jeeyoon Jeong, Geunchang Choi, Youjin Lee, Sunghwan Kim, Seunghun Hong, Dai-Sik Kim
J. Micro/Nanolith. MEMS MOEMS 17(2), 023504 (3 May 2018) https://doi.org/10.1117/1.JMM.17.2.023504
TOPICS: Photoresist materials, Etching, Scanning electron microscopy, Metals, Atomic layer deposition, Ion beams, Chromium, Photomasks, Gold, Lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 023505 (10 May 2018) https://doi.org/10.1117/1.JMM.17.2.023505
TOPICS: Absorption, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin, Zirconium, Metals, Lithography, Oxides, Chemical elements
Johnpeter Ngunjiri, Gregory Meyers, James Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim
J. Micro/Nanolith. MEMS MOEMS 17(2), 023506 (22 June 2018) https://doi.org/10.1117/1.JMM.17.2.023506
TOPICS: Atomic force microscopy, Line edge roughness, Photoresist processing, Photoresist developing, Image processing, Standards development, Photoresist materials, Optical lithography, Polymers, Pulmonary function tests
Metrology
Tien-Chan Chang, Chun-An Liao, Zhi-Yu Lin, Yiin-Kuen Fuh
J. Micro/Nanolith. MEMS MOEMS 17(2), 024001 (10 April 2018) https://doi.org/10.1117/1.JMM.17.2.024001
TOPICS: Composites, Graphene, Interfaces, Thermal effects, Field effect transistors, Anisotropy, Electronic components, Raman spectroscopy, Particles, Transmission electron microscopy
Takeyoshi Ohashi, Atsuko Yamaguchi, Kazuhisa Hasumi, Masami Ikota, Gian Lorusso, Chi Lim Tan, Geert Van den bosch, Arnaud Furnémont
J. Micro/Nanolith. MEMS MOEMS 17(2), 024002 (15 June 2018) https://doi.org/10.1117/1.JMM.17.2.024002
TOPICS: Semiconducting wafers, Oxides, Transmission electron microscopy, Etching, Thin films, Ellipsometry, Electron microscopes, Wafer testing, Edge detection, Thin film devices
Microelectromechanical systems (MEMS)
Yuying Chiang, Chingfu Tsou, Bi-Chang Chen, Ruey-Hwang Chou
J. Micro/Nanolith. MEMS MOEMS 17(2), 025001 (12 April 2018) https://doi.org/10.1117/1.JMM.17.2.025001
TOPICS: Electrodes, Luminescence, Lung cancer, Microscopes, Diffusion, Cancer, Glasses, Image processing, Solids, Optical lithography
J. Micro/Nanolith. MEMS MOEMS 17(2), 025002 (14 May 2018) https://doi.org/10.1117/1.JMM.17.2.025002
TOPICS: Microfluidics, 3D printing, Printing, Finite element methods, Computer aided design, Synthetic aperture radar, Numerical simulations, 3D modeling, Chemical analysis, Diffusion
Jaione Tirapu-Azpiroz, Ademir Ferreira Silva, Matheus Esteves Ferreira, William Fernando Lopez Candela, Peter William Bryant, Ricardo Luis Ohta, Michael Engel, Mathias Bernhard Steiner
J. Micro/Nanolith. MEMS MOEMS 17(2), 025003 (5 June 2018) https://doi.org/10.1117/1.JMM.17.2.025003
TOPICS: Liquids, Microfluidics, Capillaries, Fluid dynamics, Data modeling, Computational fluid dynamics, Image segmentation, Control systems, Instrument modeling, Water
Micro-optoelectromechanical systems (MOEMS)
Matthew Hamblin, Thane Downing, Sophia Anderson, Erik Hamilton, Doyoung Kim, Aaron Hawkins
J. Micro/Nanolith. MEMS MOEMS 17(2), 025501 (23 April 2018) https://doi.org/10.1117/1.JMM.17.2.025501
TOPICS: Antireflective coatings, Reflectivity, Coating, Silicon, Reflection, Liquids, Thin films, Etching, Polishing, Absorption
Wenbo Han, Xueye Chen, Zengliang Hu, Kun Yang
J. Micro/Nanolith. MEMS MOEMS 17(2), 025502 (13 June 2018) https://doi.org/10.1117/1.JMM.17.2.025502
TOPICS: Numerical simulations, Microfluidics, Protactinium, Interfaces, Microelectromechanical systems, 3D modeling, Capillaries, Fluid dynamics, Resistance, Solids
Vittorino Lanzio, Melanie West, Alexander Koshelev, Gregory Telian, Paolo Micheletti, Raquel Lambert, Scott Dhuey, Hillel Adesnik, Simone Sassolini, Stefano Cabrini
J. Micro/Nanolith. MEMS MOEMS 17(2), 025503 (30 June 2018) https://doi.org/10.1117/1.JMM.17.2.025503
TOPICS: Waveguides, Electrodes, Silicon, Brain, Tissue optics, Optical design, Optical fibers, Fabrication, Etching, In vivo imaging
Back to Top