journal of micro nanolithography mems and moems
VOL. 17 · NO. 4 | October 2018
SPIE publishes accepted journal articles as soon as they are approved for publication Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects
J. Micro/Nanolith. MEMS MOEMS 17(4), 041002 (11 July 2018)
TOPICS: Particles, Lithography, Stochastic processes, Molecules, Failure analysis, Extreme ultraviolet lithography, Photoresist materials, Chemical species, Extreme ultraviolet, Vacuum tubes
J. Micro/Nanolith. MEMS MOEMS 17(4), 041003 (11 July 2018)
TOPICS: Monte Carlo methods, Quantum efficiency, Photons, Stochastic processes, Data modeling, Extreme ultraviolet lithography, Particles, Performance modeling, Absorption, Extreme ultraviolet
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