Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 1 | January 2019
SPIE publishes accepted journal articles as soon as they are approved for publication Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
J. Micro/Nanolith. MEMS MOEMS 18(1), 011002 (31 July 2018)
TOPICS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip
J. Micro/Nanolith. MEMS MOEMS 18(1), 011003 (31 July 2018)
TOPICS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 011004 (31 July 2018)
TOPICS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces
J. Micro/Nanolith. MEMS MOEMS 18(1), 011005 (11 August 2018)
TOPICS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data
J. Micro/Nanolith. MEMS MOEMS 18(1), 011006 (5 September 2018)
TOPICS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography
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