Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 2 | April 2019
ISSUES IN PROGRESS
IN PROGRESS
SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 18(2), 020501 (7 May 2019) https://doi.org/10.1117/1.JMM.18.2.020501
TOPICS: Optical lithography, Transmission electron microscopy, Silicon, Scanning electron microscopy, Lithography, Prototyping, Nanostructures, Diffraction, Excitons, Semiconductors
Special Section on Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay
J. Micro/Nanolith. MEMS MOEMS 18(2), 021202 (4 April 2019) https://doi.org/10.1117/1.JMM.18.2.021202
TOPICS: Overlay metrology, Error analysis, Optical lithography, Metals, Composites, Semiconducting wafers, Received signal strength, Semiconductors, Control systems, Double patterning technology
J. Micro/Nanolith. MEMS MOEMS 18(2), 021203 (15 April 2019) https://doi.org/10.1117/1.JMM.18.2.021203
TOPICS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners
J. Micro/Nanolith. MEMS MOEMS 18(2), 021204 (6 April 2019) https://doi.org/10.1117/1.JMM.18.2.021204
TOPICS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection
J. Micro/Nanolith. MEMS MOEMS 18(2), 021205 (4 April 2019) https://doi.org/10.1117/1.JMM.18.2.021205
TOPICS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Silicon, Transmission electron microscopy, Selenium, Semiconducting wafers
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(2), 023501 (14 May 2019) https://doi.org/10.1117/1.JMM.18.2.023501
TOPICS: Lithography, Optical proximity correction, Image processing, Feature extraction, Machine learning, Photomasks, Data modeling, Image classification, Calibration, Binary data
J. Micro/Nanolith. MEMS MOEMS 18(2), 023502 (15 May 2019) https://doi.org/10.1117/1.JMM.18.2.023502
TOPICS: X-ray lithography, Photomasks, Gold, X-rays, Photoresist materials, Near field diffraction, Titanium, Electrons, Photons, Scanning electron microscopy
Metrology
J. Micro/Nanolith. MEMS MOEMS 18(2), 024001 (29 April 2019) https://doi.org/10.1117/1.JMM.18.2.024001
TOPICS: Scanning electron microscopy, Neural networks, Line width roughness, Denoising, Line edge roughness, Machine learning, Monte Carlo methods, Computer simulations, Convolutional neural networks, Wavelets
J. Micro/Nanolith. MEMS MOEMS 18(2), 024002 (3 May 2019) https://doi.org/10.1117/1.JMM.18.2.024002
TOPICS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection
J. Micro/Nanolith. MEMS MOEMS 18(2), 024003 (3 May 2019) https://doi.org/10.1117/1.JMM.18.2.024003
TOPICS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 18(2), 024501 (10 May 2019) https://doi.org/10.1117/1.JMM.18.2.024501
TOPICS: Etching, Silicon, Polymers, Ions, Lithium, Semiconducting wafers, Photomasks, Image processing, Scanning electron microscopy, Deep reactive ion etching
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 18(2), 025501 (20 May 2019) https://doi.org/10.1117/1.JMM.18.2.025501
TOPICS: Actuators, Electrodes, Deformable mirrors, Etching, Silicon, Semiconducting wafers, Mirrors, Chemical elements, Microelectromechanical systems, Signal attenuation
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