Editorial
J. Micro/Nanolith. MEMS MOEMS 18(2), 020101 (22 June 2019) https://doi.org/10.1117/1.JMM.18.2.020101
TOPICS: Coherence (optics), Coherence imaging, Lithography, Image transmission, Computer simulations, Standards development, Diffraction, Zernike polynomials, Mathematics, Lithographic illumination
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 18(2), 020501 (7 May 2019) https://doi.org/10.1117/1.JMM.18.2.020501
TOPICS: Optical lithography, Transmission electron microscopy, Silicon, Scanning electron microscopy, Lithography, Prototyping, Nanostructures, Diffraction, Excitons, Semiconductors
Classic Paper
J. Micro/Nanolith. MEMS MOEMS 18(2), 021101 (18 June 2019) https://doi.org/10.1117/1.JMM.18.2.021101
TOPICS: Mathematics, Light sources, Coherence (optics), Imaging systems, Transmittance, Information theory, Optical imaging, Matrices, Fourier transforms, Applied physics
Special Section on Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay
J. Micro/Nanolith. MEMS MOEMS 18(2), 021201 (17 June 2019) https://doi.org/10.1117/1.JMM.18.2.021201
TOPICS: Overlay metrology, Scanning electron microscopy, Metrology, Optical lithography, Integrated circuits, Edge detection, Critical dimension metrology, Control systems, Distance measurement, Data analysis
J. Micro/Nanolith. MEMS MOEMS 18(2), 021202 (4 April 2019) https://doi.org/10.1117/1.JMM.18.2.021202
TOPICS: Overlay metrology, Error analysis, Optical lithography, Metals, Composites, Semiconducting wafers, Received signal strength, Semiconductors, Control systems, Double patterning technology
J. Micro/Nanolith. MEMS MOEMS 18(2), 021203 (15 April 2019) https://doi.org/10.1117/1.JMM.18.2.021203
TOPICS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners
J. Micro/Nanolith. MEMS MOEMS 18(2), 021204 (6 April 2019) https://doi.org/10.1117/1.JMM.18.2.021204
TOPICS: Critical dimension metrology, Monte Carlo methods, Electron microscopes, Scanning electron microscopy, Cadmium, Edge detection, Silicon, Optical simulations, Metrology, Inspection
J. Micro/Nanolith. MEMS MOEMS 18(2), 021205 (4 April 2019) https://doi.org/10.1117/1.JMM.18.2.021205
TOPICS: Inspection, Scanning electron microscopy, Capacitance, Resistance, Nanowires, Field effect transistors, Silicon, Transmission electron microscopy, Selenium, Semiconducting wafers
J. Micro/Nanolith. MEMS MOEMS 18(2), 021206 (13 June 2019) https://doi.org/10.1117/1.JMM.18.2.021206
TOPICS: Overlay metrology, Scanning electron microscopy, Metrology, Semiconducting wafers, Etching, Selenium, Signal detection, Edge detection, Manufacturing, Scanners
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(2), 023501 (14 May 2019) https://doi.org/10.1117/1.JMM.18.2.023501
TOPICS: Lithography, Optical proximity correction, Image processing, Feature extraction, Machine learning, Photomasks, Data modeling, Image classification, Calibration, Binary data
J. Micro/Nanolith. MEMS MOEMS 18(2), 023502 (15 May 2019) https://doi.org/10.1117/1.JMM.18.2.023502
TOPICS: X-ray lithography, Photomasks, Gold, X-rays, Photoresist materials, Near field diffraction, Titanium, Electrons, Photons, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 18(2), 023503 (30 May 2019) https://doi.org/10.1117/1.JMM.18.2.023503
TOPICS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction
J. Micro/Nanolith. MEMS MOEMS 18(2), 023504 (6 June 2019) https://doi.org/10.1117/1.JMM.18.2.023504
TOPICS: Ions, Polymers, Silicon, Photoresist materials, Mass spectrometry, Molecules, Photoresist developing, Neodymium, Gold, Chemical analysis
J. Micro/Nanolith. MEMS MOEMS 18(2), 023505 (19 June 2019) https://doi.org/10.1117/1.JMM.18.2.023505
TOPICS: Semiconducting wafers, Palladium, Inspection, Standards development, Scanning electron microscopy, Etching, Lithography, Defect detection, Electron beam lithography, Silicon
Metrology
J. Micro/Nanolith. MEMS MOEMS 18(2), 024001 (29 April 2019) https://doi.org/10.1117/1.JMM.18.2.024001
TOPICS: Scanning electron microscopy, Neural networks, Line width roughness, Denoising, Line edge roughness, Machine learning, Monte Carlo methods, Computer simulations, Convolutional neural networks, Wavelets
J. Micro/Nanolith. MEMS MOEMS 18(2), 024002 (3 May 2019) https://doi.org/10.1117/1.JMM.18.2.024002
TOPICS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection
J. Micro/Nanolith. MEMS MOEMS 18(2), 024003 (3 May 2019) https://doi.org/10.1117/1.JMM.18.2.024003
TOPICS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 18(2), 024501 (10 May 2019) https://doi.org/10.1117/1.JMM.18.2.024501
TOPICS: Etching, Silicon, Polymers, Ions, Lithium, Semiconducting wafers, Photomasks, Image processing, Scanning electron microscopy, Deep reactive ion etching
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 18(2), 025001 (5 June 2019) https://doi.org/10.1117/1.JMM.18.2.025001
TOPICS: Sensors, Polymers, Gas sensors, Polymeric sensors, Actuators, Microelectromechanical systems, Metals, Oxides, Resistance, Toxic gases
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 18(2), 025501 (20 May 2019) https://doi.org/10.1117/1.JMM.18.2.025501
TOPICS: Actuators, Electrodes, Deformable mirrors, Etching, Silicon, Semiconducting wafers, Mirrors, Chemical elements, Microelectromechanical systems, Signal attenuation
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