Editorial
J. Micro/Nanolith. MEMS MOEMS 18(1), 010102 (29 January 2019) https://doi.org/10.1117/1.JMM.18.1.010102
TOPICS: Lithium, Sun, Holmium, Microelectromechanical systems, Microopto electromechanical systems, Chaos, Fluctuations and noise, Local area networks, Lutetium, Alternate lighting of surfaces
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 18(1), 010501 (5 February 2019) https://doi.org/10.1117/1.JMM.18.1.010501
TOPICS: Signal to noise ratio, Microelectromechanical systems, Acoustics, Aluminum nitride, Ear, Signal detection, Electrodes, Scanning probe lithography, Amplifiers, Finite element methods
Special Section on Challenges and Approaches to EUV-Based Patterning for High-Volume Manufacturing Applications
J. Micro/Nanolith. MEMS MOEMS 18(1), 011001 (8 January 2019) https://doi.org/10.1117/1.JMM.18.1.011001
TOPICS: Optical lithography, Extreme ultraviolet, High volume manufacturing, Extreme ultraviolet lithography, Lithography, Photomasks, Roads, Photoresist technology, Plasma etching, Image processing
J. Micro/Nanolith. MEMS MOEMS 18(1), 011002 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011002
TOPICS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip
J. Micro/Nanolith. MEMS MOEMS 18(1), 011003 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011003
TOPICS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 011004 (31 July 2018) https://doi.org/10.1117/1.JMM.18.1.011004
TOPICS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces
J. Micro/Nanolith. MEMS MOEMS 18(1), 011005 (11 August 2018) https://doi.org/10.1117/1.JMM.18.1.011005
TOPICS: Photomasks, Nanoimprint lithography, Extreme ultraviolet, Phase shifts, Refractive index, Nickel, Ruthenium, Lithography, Reflectivity, Binary data
J. Micro/Nanolith. MEMS MOEMS 18(1), 011006 (5 September 2018) https://doi.org/10.1117/1.JMM.18.1.011006
TOPICS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 011007 (8 December 2018) https://doi.org/10.1117/1.JMM.18.1.011007
TOPICS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Oxides, Optical lithography, Lithography, Hafnium, Etching, Metals, Zirconium
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(1), 013501 (14 January 2019) https://doi.org/10.1117/1.JMM.18.1.013501
TOPICS: Polarization, Extreme ultraviolet, Lithography, Photomasks, Diffraction gratings, Printing, Extreme ultraviolet lithography, Diffraction, Semiconducting wafers, Silicon
J. Micro/Nanolith. MEMS MOEMS 18(1), 013502 (24 January 2019) https://doi.org/10.1117/1.JMM.18.1.013502
TOPICS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration
J. Micro/Nanolith. MEMS MOEMS 18(1), 013503 (8 February 2019) https://doi.org/10.1117/1.JMM.18.1.013503
TOPICS: Extreme ultraviolet, Stochastic processes, Absorption, Scattering, Extreme ultraviolet lithography, Monte Carlo methods, Projection lithography, Photon transport, Deep ultraviolet, Diffusion
J. Micro/Nanolith. MEMS MOEMS 18(1), 013504 (27 February 2019) https://doi.org/10.1117/1.JMM.18.1.013504
TOPICS: Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, Thin films, Metals, Spectroscopy, Switches, X-rays, Crystals, Scattering
J. Micro/Nanolith. MEMS MOEMS 18(1), 013505 (12 March 2019) https://doi.org/10.1117/1.JMM.18.1.013505
TOPICS: Photoresist materials, Line edge roughness, Optical lithography, Lithography, Diffraction, Nanoimprint lithography, Photoresist developing, Electron beam lithography, Deep ultraviolet, Near field optics
J. Micro/Nanolith. MEMS MOEMS 18(1), 013506 (18 March 2019) https://doi.org/10.1117/1.JMM.18.1.013506
TOPICS: Photomasks, Nickel, Extreme ultraviolet, Inspection, Signal to noise ratio, Line edge roughness, Extreme ultraviolet lithography, Reflectivity, Image acquisition, Diffraction
J. Micro/Nanolith. MEMS MOEMS 18(1), 013507 (22 March 2019) https://doi.org/10.1117/1.JMM.18.1.013507
TOPICS: Lithography, Convolution, Feature extraction, Manufacturing, Neural networks, Data modeling, Performance modeling, Fuzzy logic, Process modeling, Design for manufacturability
Metrology
J. Micro/Nanolith. MEMS MOEMS 18(1), 014001 (11 February 2019) https://doi.org/10.1117/1.JMM.18.1.014001
TOPICS: Semiconducting wafers, Signal processing, Manufacturing, High volume manufacturing, Front end of line, Signal detection, Back end of line, Lithography, Inspection, Contamination
J. Micro/Nanolith. MEMS MOEMS 18(1), 014002 (13 March 2019) https://doi.org/10.1117/1.JMM.18.1.014002
TOPICS: Pellicles, Extreme ultraviolet, Scattering, Reticles, Diffraction, Image quality, Inspection, Coating, Photomasks, Carbon nanotubes
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 18(1), 015001 (14 January 2019) https://doi.org/10.1117/1.JMM.18.1.015001
TOPICS: Mirrors, Micromirrors, Microelectromechanical systems, Magnetism, Actuators, Silicon, Semiconducting wafers, Finite element methods, Motion measurement, Electromagnetism
J. Micro/Nanolith. MEMS MOEMS 18(1), 015002 (19 February 2019) https://doi.org/10.1117/1.JMM.18.1.015002
TOPICS: Microsensors, Curium, Electrodes, Silicon, Microelectromechanical systems, Transistors, Packaging, Magnesium, Reactive ion etching, Etching
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 18(1), 015501 (15 February 2019) https://doi.org/10.1117/1.JMM.18.1.015501
TOPICS: Nanoparticles, Photoresist materials, Antireflective coatings, Reflectivity, Optical lithography, Aluminum, Visible radiation, Scattering, Light scattering, Silicon
J. Micro/Nanolith. MEMS MOEMS 18(1), 015502 (19 February 2019) https://doi.org/10.1117/1.JMM.18.1.015502
TOPICS: Ultraviolet radiation, Adhesives, Waveguides, Optical fibers, Tissue optics, Brain, UV optics, Neurons, Polymers, Light sources
J. Micro/Nanolith. MEMS MOEMS 18(1), 015503 (21 February 2019) https://doi.org/10.1117/1.JMM.18.1.015503
TOPICS: Waveguides, Dense wavelength division multiplexing, Optical filters, Microelectromechanical systems, Microopto electromechanical systems, Bragg gratings, Silicon, Tunable filters, Electrodes, Photoresist materials
Errata
J. Micro/Nanolith. MEMS MOEMS 18(1), 019801 (27 February 2019) https://doi.org/10.1117/1.JMM.18.1.019801
TOPICS: Photomasks, Extreme ultraviolet lithography, Lithium, EUV optics, Mechanics
Back to Top