Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 4 | October 2019
ISSUES IN PROGRESS
IN PROGRESS
SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.
IN THIS ISSUE

Metrology (2)
Review Articles
J. Micro/Nanolith. MEMS MOEMS 18(4), 040901 (8 October 2019) https://doi.org/10.1117/1.JMM.18.4.040901
TOPICS: Glasses, Electrodes, Dielectrics, Optical lithography, Aluminum, Manufacturing, Microelectromechanical systems, Camera shutters, Reliability, Silicon
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(4), 043502 (10 October 2019) https://doi.org/10.1117/1.JMM.18.4.043502
TOPICS: Bridges, Annealing, Directed self assembly, Data modeling, Etching, Scanning electron microscopy, Polymethylmethacrylate, Picosecond phenomena, Wet etching, Optical inspection
J. Micro/Nanolith. MEMS MOEMS 18(4), 043503 (17 October 2019) https://doi.org/10.1117/1.JMM.18.4.043503
TOPICS: Waveguides, Lithography, Photonic integrated circuits, Resonators, Electron beam lithography, Scanning electron microscopy, Photonics, Electron beams, Etching, Waveguide modes
Metrology
J. Micro/Nanolith. MEMS MOEMS 18(4), 044001 (10 October 2019) https://doi.org/10.1117/1.JMM.18.4.044001
TOPICS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 18(4), 044002 (30 October 2019) https://doi.org/10.1117/1.JMM.18.4.044002
TOPICS: Electrons, Scanning electron microscopy, Surface plasmons, Scattering, Monte Carlo methods, Interfaces, Aluminum, Plasmons, Selenium, Dielectrics
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 18(4), 044501 (30 October 2019) https://doi.org/10.1117/1.JMM.18.4.044501
TOPICS: Etching, Silicon, Isotropic etching, Photomasks, Resonators, Semiconducting wafers, Ultrasonics, Low pressure chemical vapor deposition, Deep reactive ion etching, Photography
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