Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 4 | October 2019
CONTENTS
JM3 Letters
J. Micro/Nanolith. MEMS MOEMS 18(4), 040501 (18 December 2019)https://doi.org/10.1117/1.JMM.18.4.040501
TOPICS: Double patterning technology, Optical lithography, Critical dimension metrology, Scanning electron microscopy, Transmission electron microscopy, Dry etching, Semiconductors, Extreme ultraviolet, Atomic layer deposition, Cadmium sulfide
Review Articles
J. Micro/Nanolith. MEMS MOEMS 18(4), 040901 (8 October 2019)https://doi.org/10.1117/1.JMM.18.4.040901
TOPICS: Glasses, Electrodes, Dielectrics, Optical lithography, Aluminum, Manufacturing, Microelectromechanical systems, Camera shutters, Reliability
J. Micro/Nanolith. MEMS MOEMS 18(4), 040902 (26 November 2019)https://doi.org/10.1117/1.JMM.18.4.040902
TOPICS: Transistors, Lithography, Very large scale integration, Clocks, Switching, Capacitance, Photomasks, Silicon, Logic, Resolution enhancement technologies
Lithography
J. Micro/Nanolith. MEMS MOEMS 18(4), 043501 (4 October 2019)https://doi.org/10.1117/1.JMM.18.4.043501
TOPICS: Extreme ultraviolet lithography, Mirrors, Microlens, Point spread functions, Diffraction, Photomasks, Scanners, Microlens array, Projection systems
J. Micro/Nanolith. MEMS MOEMS 18(4), 043502 (10 October 2019)https://doi.org/10.1117/1.JMM.18.4.043502
TOPICS: Bridges, Annealing, Directed self assembly, Data modeling, Etching, Scanning electron microscopy, Polymethylmethacrylate, Picosecond phenomena, Wet etching, Optical inspection
J. Micro/Nanolith. MEMS MOEMS 18(4), 043503 (17 October 2019)https://doi.org/10.1117/1.JMM.18.4.043503
TOPICS: Waveguides, Lithography, Photonic integrated circuits, Resonators, Electron beam lithography, Scanning electron microscopy, Photonics, Electron beams, Etching, Waveguide modes
J. Micro/Nanolith. MEMS MOEMS 18(4), 043504 (9 November 2019)https://doi.org/10.1117/1.JMM.18.4.043504
TOPICS: Thin films, Zinc, Extreme ultraviolet lithography, Photoresist materials, Metals, FT-IR spectroscopy, Lithography, Absorption, Spectroscopy
J. Micro/Nanolith. MEMS MOEMS 18(4), 043505 (12 November 2019)https://doi.org/10.1117/1.JMM.18.4.043505
TOPICS: Semiconducting wafers, Forward error correction, Sensors, Scanners, Optimization (mathematics), Control systems, Contamination, Optical lithography, Chemical mechanical planarization, Databases
J. Micro/Nanolith. MEMS MOEMS 18(4), 043506 (18 November 2019)https://doi.org/10.1117/1.JMM.18.4.043506
TOPICS: Lithography, Model-based design, Optimization (mathematics), Neural networks, Data modeling, Machine learning, Photomasks, Mathematical modeling, Ultrafast phenomena, Source mask optimization
J. Micro/Nanolith. MEMS MOEMS 18(4), 043507 (19 November 2019)https://doi.org/10.1117/1.JMM.18.4.043507
TOPICS: Photomasks, Optical lithography, Etching, Microsystems, Grayscale lithography, Device simulation, Photoresist processing, Photoresist materials, Liquids, Lithography
Metrology
J. Micro/Nanolith. MEMS MOEMS 18(4), 044001 (10 October 2019)https://doi.org/10.1117/1.JMM.18.4.044001
TOPICS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 18(4), 044002 (30 October 2019)https://doi.org/10.1117/1.JMM.18.4.044002
TOPICS: Electrons, Scanning electron microscopy, Surface plasmons, Scattering, Monte Carlo methods, Interfaces, Aluminum, Plasmons, Selenium, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 18(4), 044003 (5 December 2019)https://doi.org/10.1117/1.JMM.18.4.044003
TOPICS: Monte Carlo methods, Scattering, Scanning electron microscopy, Dielectrics, Electron microscopes, Silicon, Statistical modeling, Copper, Clouds, Oxides
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 18(4), 044501 (30 October 2019)https://doi.org/10.1117/1.JMM.18.4.044501
TOPICS: Etching, Silicon, Isotropic etching, Photomasks, Resonators, Semiconducting wafers, Ultrasonics, Low pressure chemical vapor deposition, Deep reactive ion etching, Photography
J. Micro/Nanolith. MEMS MOEMS 18(4), 044502 (28 December 2019)https://doi.org/10.1117/1.JMM.18.4.044502
TOPICS: Hydrogen, Silicon, Plasma, Silicon films, Molybdenum, Ions, Atomic force microscopy, Camera shutters, Data modeling, Photomicroscopy
Micro-optoelectromechanical systems (MOEMS)
J. Micro/Nanolith. MEMS MOEMS 18(4), 045501 (28 November 2019)https://doi.org/10.1117/1.JMM.18.4.045501
TOPICS: Rhodamine B, Optical spheres, Glasses, Ultraviolet radiation, Optical microcavities, Adhesives, Polymethylmethacrylate, Refractive index, Absorption, Microresonators
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