Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 18 · NO. 4 | October 2019
SPIE publishes accepted journal articles as soon as they are approved for publication. Journal issues are considered In Progress until all articles for an issue have been published. Articles published ahead of the completed issue are fully citable.

Metrology (2)
Review Articles
J. Micro/Nanolith. MEMS MOEMS 18(4), 040901 (8 October 2019)
TOPICS: Glasses, Electrodes, Dielectrics, Optical lithography, Aluminum, Manufacturing, Microelectromechanical systems, Camera shutters, Reliability, Silicon
J. Micro/Nanolith. MEMS MOEMS 18(4), 043502 (10 October 2019)
TOPICS: Bridges, Annealing, Directed self assembly, Data modeling, Etching, Scanning electron microscopy, Polymethylmethacrylate, Picosecond phenomena, Wet etching, Optical inspection
J. Micro/Nanolith. MEMS MOEMS 18(4), 043503 (17 October 2019)
TOPICS: Waveguides, Lithography, Photonic integrated circuits, Resonators, Electron beam lithography, Scanning electron microscopy, Photonics, Electron beams, Etching, Waveguide modes
J. Micro/Nanolith. MEMS MOEMS 18(4), 044001 (10 October 2019)
TOPICS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy
J. Micro/Nanolith. MEMS MOEMS 18(4), 044002 (30 October 2019)
TOPICS: Electrons, Scanning electron microscopy, Surface plasmons, Scattering, Monte Carlo methods, Interfaces, Aluminum, Plasmons, Selenium, Dielectrics
J. Micro/Nanolith. MEMS MOEMS 18(4), 044501 (30 October 2019)
TOPICS: Etching, Silicon, Isotropic etching, Photomasks, Resonators, Semiconducting wafers, Ultrasonics, Low pressure chemical vapor deposition, Deep reactive ion etching, Photography
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