Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 19 · NO. 2 | April 2020
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 19(2), 020101 (19 May 2020)https://doi.org/10.1117/1.JMM.19.2.020101
TOPICS: Metrology, Lithography, Microopto electromechanical systems, Electronic components, Optical microsystems, Optical lithography, Process control, Etching, Microsystems, Optical engineering
Metrology
J. Micro/Nanolith. MEMS MOEMS 19(2), 024001 (5 May 2020)https://doi.org/10.1117/1.JMM.19.2.024001
TOPICS: Photomasks, Scatterometry, Lithography, Chaos, Inverse problems, Stochastic processes, Bayesian inference, Silicon, Error analysis, Oxides
J. Micro/Nanolith. MEMS MOEMS 19(2), 024002 (12 May 2020)https://doi.org/10.1117/1.JMM.19.2.024002
TOPICS: 3D metrology, 3D applications, Monte Carlo methods, Cadmium, Solids, Scanning electron microscopy, Critical dimension metrology, Signal detection, Semiconducting wafers, Metrology
Masks, reticles and pellicles
J. Micro/Nanolith. MEMS MOEMS 19(2), 024401 (6 May 2020)https://doi.org/10.1117/1.JMM.19.2.024401
TOPICS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum
Microfabrication
J. Micro/Nanolith. MEMS MOEMS 19(2), 024501 (23 April 2020)https://doi.org/10.1117/1.JMM.19.2.024501
TOPICS: Microfluidics, Laser ablation, Multilayers, Polymers, Surface roughness, Gas lasers, Fabrication, Polymethylmethacrylate, Carbon monoxide, Cobalt
Photoresists and other lithographic materials
J. Micro/Nanolith. MEMS MOEMS 19(2), 024601 (12 May 2020)https://doi.org/10.1117/1.JMM.19.2.024601
TOPICS: Stochastic processes, Monte Carlo methods, Polymers, Diffusion, Absorption, Extreme ultraviolet lithography, Extreme ultraviolet, Selenium, Photon transport, Photomasks
Process control
J. Micro/Nanolith. MEMS MOEMS 19(2), 024801 (20 April 2020)https://doi.org/10.1117/1.JMM.19.2.024801
TOPICS: Data modeling, Convolution, Semiconductors, Defect detection, Performance modeling, Semiconducting wafers, Image classification, Inspection, Content addressable memory, Process modeling
Microelectromechanical systems (MEMS)
J. Micro/Nanolith. MEMS MOEMS 19(2), 025001 (13 May 2020)https://doi.org/10.1117/1.JMM.19.2.025001
TOPICS: Microelectromechanical systems, Mathematical modeling, Silicon, Capacitance, Crystals, Protactinium, Capacitors, Finite element methods, Systems modeling, Device simulation
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