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Abstract

This is a list of reviewers who served the Journal of Micro/Nanolithography, MEMS, and MOEMS in 2019.

The Journal of Micro/Nanolithography, MEMS, and MOEMS would like to sincerely thank the following individuals who served as reviewers in 2019. The success of our publication hinges on the voluntary contributions of time and energy put forth by these professionals.

  • Hideaki Abe

  • Jinho Ahn

  • Masafumi Asano

  • Mohsen Asghari

  • Artur Balasinski

  • Bryan Barnes

  • Ralf Bauer

  • Gary Bernstein

  • Somashekara Bhat

  • Anatoly Bourov

  • James Brennan III

  • Philipp Brenner

  • Robert Bristol

  • Alan Brodie

  • Keith Brown

  • Timothy Brunner

  • Stefano Cabrini

  • Giuseppe Calafiore

  • James Cameron

  • Dongmei Cao

  • Luigi Capodieci

  • William Cassarly

  • Tsunglin Chen

  • Xuanxuan Chen

  • Xuemei Chen

  • Yi Chiu

  • Venkata Bharadwaj Chivukula

  • Kwon Chon

  • Karin Chumbimuni-Torres

  • Aaron Cordes

  • Masoud Dahmardeh

  • Maxime Darnon

  • Prasad Dasari

  • Peter De Bisschop

  • Claire Deeb

  • Greg Denbeaux

  • Shaloo Devi

  • Ronald Dixson

  • Shumay Dou Shang

  • Ilan Englard

  • Andreas Erdmann

  • Georg Erley

  • Germain Fenger

  • Johann Foucher

  • Emily Gallagher

  • Bernd Geh

  • Patrice Gergaud

  • Valeriy Ginzburg

  • Andrew Grieco

  • Timothy Groves

  • Florian Gstrein

  • Yan Gu

  • Sandip Halder

  • Tetsuo Harada

  • Dihan Hasan

  • Mark-Alexander Henn

  • Craig Higgins

  • Shannon Hill

  • Hartmut Hillmer

  • Ulrich Hofmann

  • Jingtian Hu

  • Thomas Huisman

  • Stefan Hunsche

  • Soichi Inoue

  • Abid Iqbal

  • Ningning Jia

  • Pinggang Jia

  • Fan Jiang

  • Sumit Jindal

  • Taher Kagalwala

  • Chih-Ming Ke

  • Kahraman Keskinbora

  • Ryoung-han Kim

  • SeongSue Kim

  • Marie Krysak

  • Ashish Kumar

  • Varun Kumar

  • Neal Lafferty

  • Michele Laus

  • Chang-Chun Lee

  • Soo-Young Lee

  • Harry Levinson

  • Fengyuan Li

  • Lijie Li

  • Peng Li

  • Xiaohai Li

  • Ted Liang

  • Yichen Liang

  • Chichun Liu

  • Huicong Liu

  • Ke Liu

  • Rui Liu

  • Jordi Llobet

  • Daniel Lopez

  • Gian Lorusso

  • Eric Louis

  • Rajesh Luharuka

  • Larry Luo

  • Xu Ma

  • Ruben Maas

  • Chris Mack

  • Chiatto Matteo

  • Moyra McManus

  • Henry Megens

  • Lawrence Melvin, III

  • Sascha Migura

  • Marshal Miller

  • Paul Mirkarimi

  • Chad Mirkin

  • Hiroyuki Miyazoe

  • Boris Mizaikoff

  • Yasutaka Morikawa

  • Nezih Mrad

  • Sameer Mulani

  • Jan Mulkens

  • Viviana Mulloni

  • Mark Neisser

  • Christopher Ober

  • Ndubuisi Orji

  • Prem Pal

  • Piyush Pathak

  • John Petersen

  • Michael Postek

  • Lingling Pu

  • Zhenyun Qian

  • Lei Qiao

  • Manasi Raje

  • Ivo Rangelow

  • Alan Rosenbluth

  • Alon Rosenthal

  • Ildar Salakhutdinov

  • Amin Sandoughsaz

  • Iqbal Saraf

  • Marc Schnieper

  • Frank Scholze

  • Bernd Schulz

  • Kazunori Seki

  • Apo Sezginer

  • Akshdeep Sharma

  • Abraham Slachter

  • Mark Smith

  • LaVern Starman

  • Bo Su

  • Vishnu-Baba Sundaresan

  • Makoto Suzuki

  • N. Kumar Swamy

  • Zishan Ali Syed Mohammed

  • Tanguy Terlier

  • Brad Thiel

  • Chuan-Kang Ting

  • Juan Torres

  • Ilhami Torunoglu

  • Istvan Ulbert

  • Nilesh Vasa

  • John Villarrubia

  • Andras Vladar

  • Marko Vogler

  • Justin Wan

  • Dapeng Wang

  • Fei Wang

  • Hao Wang

  • Peng Wang

  • Wentao Wang

  • Takeo Watanabe

  • Rich Wise

  • Qiang Wu

  • Jiwen Xiang

  • Hong Xiao

  • Jin Xie

  • Kaikai Xu

  • Kenji Yamazoe

  • Bin Yang

  • Longfei Yang

  • Xiaodong Yang

  • Yansheng Zhang

  • Jinlong Zhu

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE)
"2019 List of Reviewers," Journal of Micro/Nanolithography, MEMS, and MOEMS 19(1), 010102 (20 January 2020). https://doi.org/10.1117/1.JMM.19.1.010102
Published: 20 January 2020
JOURNAL ARTICLE
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