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27 August 2020 Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations
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Abstract

In extreme ultraviolet (EUV) lithography, chemistry is driven by secondary electrons. A deeper understanding of these processes is needed. However, electron-driven processes are inherently difficult to experimentally characterize for EUV materials, impeding targeted material engineering. A computational framework is needed to provide information for rational material engineering and identification at a molecular level. We demonstrate that density functional theory calculations can fulfill this purpose. We first demonstrate that primary electron energy spectrum can be predicted accurately. Second, the dynamics of a photoacid generator upon excitation or electron attachment are studied with ab-initio molecular dynamics calculations. Third, we demonstrate that electron attachment affinity is a good predictor of reduction potential and dose to clear. The correlation between such calculations and experiments suggests that these methods can be applied to computationally screen and design molecular components of EUV material and speed up the development process.

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2020/$28.00 © 2020 SPIE
Jonathan H. Ma, Han Wang, David G. Prendergast, Andrew R. Neureuther, and Patrick P. Naulleau "Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations," Journal of Micro/Nanolithography, MEMS, and MOEMS 19(3), 034601 (27 August 2020). https://doi.org/10.1117/1.JMM.19.3.034601
Received: 15 April 2020; Accepted: 4 August 2020; Published: 27 August 2020
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CHORUS Article. This article will be made freely available starting 27 August 2021

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