Translator Disclaimer
6 November 2020 Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography
Author Affiliations +
Abstract

We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.

© 2020 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2020/$28.00 © 2020 SPIE
Anthony Yen "Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 19(4), 040501 (6 November 2020). https://doi.org/10.1117/1.JMM.19.4.040501
Received: 18 August 2020; Accepted: 16 October 2020; Published: 6 November 2020
JOURNAL ARTICLE
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top