journal of micro nanolithography mems and moems
VOL. 2 · NO. 1 | January 2003
CONTENTS
Editorial
IMAGING EQUIPMENT
Rian Rubingh, Youri van Dommelen, Sjef Tempelaars, Marc Boonman, Roger Irwin, Edwin van Donkelaar, Hans Burgers, Guustaaf Savenije, Bert Koek, Michael Thier, Oliver Roempp, Christian Hembd-Soellner
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1531190
TOPICS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Reticles, Lithography, Monochromatic aberrations, Metrology, Imaging systems, Optical scanning systems, Distortion
157-NM LITHOGRAPHY
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1528948
TOPICS: Pellicles, Absorption, Sensors, Lithography, Contamination, Laser irradiation, Oxygen, Antireflective coatings, Lamps, Thin film coatings
FUTURE LITHOGRAPHY
Minoru Sugawara, Masaaki Ito, Taro Ogawa, Eiichi Hoshino, Akira Chiba, Shinji Okazaki
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1530571
TOPICS: Optical proximity correction, Photomasks, Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Ruthenium, Head, Optical calibration, Monochromatic aberrations
Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce Terris, Wilhelm Bruenger, Gerhard Gross, Olaf Fortagne, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Wolfe
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1528946
TOPICS: Ions, Ion beams, Photomasks, Particle beams, Photodynamic therapy, Maskless lithography, Magnetism, Lithography, Semiconducting wafers, Charged particle optics
MICRO-OPTICAL SYSTEMS
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1531192
TOPICS: Matrices, Tolerancing, Optical alignment, Geometrical optics, Manufacturing, Optics manufacturing, Optical components, Ray tracing, Mirrors, Systems modeling
MASK TECHNOLOGY
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1530570
TOPICS: Etching, Chromium, Plasma, Plasma etching, Ions, Diffractive optical elements, Critical dimension metrology, Oxygen, Cadmium, Electrons
ABERRATIONS
Peter Dirksen, Joseph Braat, Augustus Janssen, Casper Juffermans
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1531191
TOPICS: Phase retrieval, Monochromatic aberrations, Lithography, Microscopes, Photomasks, Reticles, Scanning electron microscopy, Testing and analysis, Objectives, Optical inspection
PROCESS MONITORING AND DEFECT DETECTION
Sumio Hosaka, Takafumi Morimoto, Hiroshi Kuroda, Yasushi Minomoto, Yukio Kembo, Hirokazu Koyabu
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1530572
TOPICS: Atomic force microscopy, Servomechanisms, Semiconducting wafers, Control systems, Error analysis, Photoresist materials, Imaging systems, Scanning electron microscopy, Silicon, Image processing
Juanita Miller, Lloyd Lee, Michael Pham, David Pham, Manyam Khaja, Kathleen Hennessey
J. Micro/Nanolith. MEMS MOEMS 2(1), (1 January 2003) https://doi.org/10.1117/1.1528947
TOPICS: Semiconducting wafers, Defect detection, Inspection, Classification systems, Wafer inspection, Manufacturing, System integration, Semiconductors, Optical lithography, Yield improvement
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