Journal of Micro/Nanolithography, MEMS, and MOEMS
VOL. 2 · NO. 2 | April 2003
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1568106
ELECTROTHERMAL ACTUATORS
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1564595
TOPICS: Actuators, Microelectromechanical systems, Thin films, Low pressure chemical vapor deposition, Finite element methods, Oxides, Interferometers, Microactuators, Thin film devices, Interfaces
IMAGING OPTICS
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562930
TOPICS: Diffractive optical elements, Modulation, Phase shift keying, Holograms, Optical components, Chemical elements, Carbon, Etching, Near field optics, Photomasks
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562929
TOPICS: Chromatic aberrations, Image enhancement, Lithography, Excimer lasers, Image processing, Electroluminescence, Optical simulations, Lithographic illumination, Monochromatic aberrations, Deep ultraviolet
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563262
TOPICS: Dielectrics, Anisotropy, Crystals, Absorption, Excitons, Birefringence, Electrons, Geometrical optics, Crystal optics, Dielectric polarization
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562931
TOPICS: Resolution enhancement technologies, Optical proximity correction, SRAF, Model-based design, Lithography, Image processing, Photomasks, Inspection, Solids, Scattering
CRITICAL DIMENSION CONTROL
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1564594
TOPICS: Semiconducting wafers, Critical dimension metrology, Reticles, Photoresist processing, Optical lithography, Lithography, Metrology, Error analysis, Control systems, Optical testing
EXTREME UV LITHOGRAPHY
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1532350
TOPICS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Metrology, X-rays, X-ray technology, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563645
TOPICS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz
ELECTRON PROJECTION LITHOGRAPHY
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563646
TOPICS: Photomasks, Mask making, Manufacturing, Electron beam lithography, Performance modeling, Projection lithography, Finite element methods, 3D modeling, Device simulation, Semiconducting wafers
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