journal of micro nanolithography mems and moems
VOL. 2 · NO. 2 | April 2003
CONTENTS
Editorial
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1568106
ELECTROTHERMAL ACTUATORS
Weider Tang, Mingching Wu, Weileun Fang
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1564595
TOPICS: Actuators, Microelectromechanical systems, Thin films, Low pressure chemical vapor deposition, Finite element methods, Oxides, Interferometers, Microactuators, Thin film devices, Interfaces
IMAGING OPTICS
Luiz Neto, Patricia Cardona, Giuseppe Cirino, Ronaldo Mansano, Patrick Verdonck
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562930
TOPICS: Diffractive optical elements, Modulation, Phase shift keying, Holograms, Optical components, Chemical elements, Carbon, Etching, Near field optics, Photomasks
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562929
TOPICS: Chromatic aberrations, Image enhancement, Lithography, Excimer lasers, Image processing, Electroluminescence, Optical simulations, Lithographic illumination, Monochromatic aberrations, Deep ultraviolet
Martin Letz, W. Mannstadt, Matthias Brinkmann, Lutz Parthier, G. Wehrhan, Ewald Moersen
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563262
TOPICS: Dielectrics, Anisotropy, Crystals, Absorption, Excitons, Birefringence, Electrons, Geometrical optics, Crystal optics, Dielectric polarization
RESOLUTION ENHANCEMENT TECHNIQUES
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1562931
TOPICS: Resolution enhancement technologies, Optical proximity correction, SRAF, Model-based design, Lithography, Image processing, Photomasks, Inspection, Solids, Scattering
CRITICAL DIMENSION CONTROL
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1564594
TOPICS: Semiconducting wafers, Critical dimension metrology, Reticles, Photoresist processing, Optical lithography, Lithography, Metrology, Error analysis, Control systems, Optical testing
EXTREME UV LITHOGRAPHY
Andre Egbert, Bjoern Mader, Boris Tkachenko, Andreas Ostendorf, Carsten Fallnich, Boris Chichkov, Thomas Miflalla, Max Schuermann, Kai Gaebel, Guido Schriever, Uwe Stamm
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1532350
TOPICS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Metrology, X-rays, X-ray technology, Extreme ultraviolet lithography
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563645
TOPICS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz
ELECTRON PROJECTION LITHOGRAPHY
Phillip Reu, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell, Michael Lercel, Obert Wood, R. Mackay
J. Micro/Nanolith. MEMS MOEMS 2(2), (1 April 2003) https://doi.org/10.1117/1.1563646
TOPICS: Photomasks, Mask making, Manufacturing, Electron beam lithography, Performance modeling, Projection lithography, Finite element methods, 3D modeling, Device simulation, Semiconducting wafers
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